TW200745729A - Illumination apparatus for exposure - Google Patents

Illumination apparatus for exposure

Info

Publication number
TW200745729A
TW200745729A TW096111741A TW96111741A TW200745729A TW 200745729 A TW200745729 A TW 200745729A TW 096111741 A TW096111741 A TW 096111741A TW 96111741 A TW96111741 A TW 96111741A TW 200745729 A TW200745729 A TW 200745729A
Authority
TW
Taiwan
Prior art keywords
lamp
voltage
lighted
power source
exposure
Prior art date
Application number
TW096111741A
Other languages
Chinese (zh)
Other versions
TWI388920B (en
Inventor
Gunji Mizutani
Hiroyuki Imai
Tadahiro Toju
Yuzuru Orito
Original Assignee
Adtec Eng Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adtec Eng Co Ltd filed Critical Adtec Eng Co Ltd
Publication of TW200745729A publication Critical patent/TW200745729A/en
Application granted granted Critical
Publication of TWI388920B publication Critical patent/TWI388920B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0275—Photolithographic processes using lasers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Circuit Arrangement For Electric Light Sources In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

An objective of the present invention is to provide an illumination apparatus for exposure having a plurality of lamps and capable of well knowing status of each lamp. A power source module 2 is provided for every lamp 1, while said plurality of power source module 2 are controlled by a control device 3 to perform lighting of each lamp 1. The power source module 2 has a lighting circuit 20, while a lighting detector 21 is attached to the lighting circuit 20, and a lighted/unlighted signal of each lamp 1 is sent to the control device 3 and shown in a display device 4. A voltage detecting device 22 is connected to the lighting circuit 20, to detect a voltage when the lamp 1 is lighted, and a voltage determining device 23 determines whether the lamp is lighted with a rated specification voltage. Upper limit and lower limit reference voltages in the voltage determining device 23 can be arbitrarily set by an upper limit/lower limit reference voltage setting device 5, and reference for determining whether the lamp voltage is appropriate can be changed according to characteristics of the lamp 1 and conditions of exposure. The determination result caused by the voltage determining device 23 is sent to the control device 3 and shown in the display device 4, to make notification.
TW096111741A 2006-06-14 2007-04-03 Exposure lighting device TWI388920B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006164901A JP2007333965A (en) 2006-06-14 2006-06-14 Illumination device for exposure

Publications (2)

Publication Number Publication Date
TW200745729A true TW200745729A (en) 2007-12-16
TWI388920B TWI388920B (en) 2013-03-11

Family

ID=38933511

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096111741A TWI388920B (en) 2006-06-14 2007-04-03 Exposure lighting device

Country Status (4)

Country Link
JP (1) JP2007333965A (en)
KR (1) KR20070119487A (en)
CN (1) CN101089732B (en)
TW (1) TWI388920B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5345443B2 (en) * 2009-04-21 2013-11-20 株式会社日立ハイテクノロジーズ Exposure apparatus, exposure light irradiation method, and display panel substrate manufacturing method
CN101609264B (en) * 2009-07-24 2011-03-30 上海微电子装备有限公司 Method for improving focusing and leveling measurement accuracy
KR101409670B1 (en) * 2010-02-05 2014-06-18 엔에스케이 테쿠노로지 가부시키가이샤 Light irradiating apparatus for exposure apparatus, lighting control method thereof, exposure apparatus, exposure method and substrate
TW201314380A (en) * 2011-09-02 2013-04-01 Orc Mfg Co Ltd Exposure light adjustment device
JP5869713B1 (en) * 2015-04-13 2016-02-24 フェニックス電機株式会社 Light source apparatus, exposure apparatus, and inspection method thereof
KR102666946B1 (en) * 2018-10-26 2024-05-17 엘지이노텍 주식회사 Lighting apparatus for stepper

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62200345A (en) * 1986-02-28 1987-09-04 Fuji Xerox Co Ltd Illuminating device
JP4169135B2 (en) * 1998-03-25 2008-10-22 ハリソン東芝ライティング株式会社 Lamp lighting device
CN1137572C (en) * 1999-09-27 2004-02-04 虹光精密工业股份有限公司 Optical scanner able to regulate image induced voltage by controlling exposure time
JP2001307988A (en) * 2000-04-24 2001-11-02 Canon Inc Illumination device and illumination method, and aligner with the illumination device and device manufacturing method by means of them
JP3593654B2 (en) * 2000-05-25 2004-11-24 東京エレクトロン株式会社 Substrate processing apparatus and substrate processing method
JP2005227465A (en) * 2004-02-12 2005-08-25 Mejiro Genossen:Kk Method of use of illumination optical system and method for manufacturing flat panel display

Also Published As

Publication number Publication date
CN101089732B (en) 2011-01-05
CN101089732A (en) 2007-12-19
TWI388920B (en) 2013-03-11
JP2007333965A (en) 2007-12-27
KR20070119487A (en) 2007-12-20

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