TW200745729A - Illumination apparatus for exposure - Google Patents
Illumination apparatus for exposureInfo
- Publication number
- TW200745729A TW200745729A TW096111741A TW96111741A TW200745729A TW 200745729 A TW200745729 A TW 200745729A TW 096111741 A TW096111741 A TW 096111741A TW 96111741 A TW96111741 A TW 96111741A TW 200745729 A TW200745729 A TW 200745729A
- Authority
- TW
- Taiwan
- Prior art keywords
- lamp
- voltage
- lighted
- power source
- exposure
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
- H01L21/0275—Photolithographic processes using lasers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Circuit Arrangement For Electric Light Sources In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
An objective of the present invention is to provide an illumination apparatus for exposure having a plurality of lamps and capable of well knowing status of each lamp. A power source module 2 is provided for every lamp 1, while said plurality of power source module 2 are controlled by a control device 3 to perform lighting of each lamp 1. The power source module 2 has a lighting circuit 20, while a lighting detector 21 is attached to the lighting circuit 20, and a lighted/unlighted signal of each lamp 1 is sent to the control device 3 and shown in a display device 4. A voltage detecting device 22 is connected to the lighting circuit 20, to detect a voltage when the lamp 1 is lighted, and a voltage determining device 23 determines whether the lamp is lighted with a rated specification voltage. Upper limit and lower limit reference voltages in the voltage determining device 23 can be arbitrarily set by an upper limit/lower limit reference voltage setting device 5, and reference for determining whether the lamp voltage is appropriate can be changed according to characteristics of the lamp 1 and conditions of exposure. The determination result caused by the voltage determining device 23 is sent to the control device 3 and shown in the display device 4, to make notification.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006164901A JP2007333965A (en) | 2006-06-14 | 2006-06-14 | Illumination device for exposure |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200745729A true TW200745729A (en) | 2007-12-16 |
TWI388920B TWI388920B (en) | 2013-03-11 |
Family
ID=38933511
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096111741A TWI388920B (en) | 2006-06-14 | 2007-04-03 | Exposure lighting device |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2007333965A (en) |
KR (1) | KR20070119487A (en) |
CN (1) | CN101089732B (en) |
TW (1) | TWI388920B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5345443B2 (en) * | 2009-04-21 | 2013-11-20 | 株式会社日立ハイテクノロジーズ | Exposure apparatus, exposure light irradiation method, and display panel substrate manufacturing method |
CN101609264B (en) * | 2009-07-24 | 2011-03-30 | 上海微电子装备有限公司 | Method for improving focusing and leveling measurement accuracy |
KR101409670B1 (en) * | 2010-02-05 | 2014-06-18 | 엔에스케이 테쿠노로지 가부시키가이샤 | Light irradiating apparatus for exposure apparatus, lighting control method thereof, exposure apparatus, exposure method and substrate |
TW201314380A (en) * | 2011-09-02 | 2013-04-01 | Orc Mfg Co Ltd | Exposure light adjustment device |
JP5869713B1 (en) * | 2015-04-13 | 2016-02-24 | フェニックス電機株式会社 | Light source apparatus, exposure apparatus, and inspection method thereof |
KR102666946B1 (en) * | 2018-10-26 | 2024-05-17 | 엘지이노텍 주식회사 | Lighting apparatus for stepper |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62200345A (en) * | 1986-02-28 | 1987-09-04 | Fuji Xerox Co Ltd | Illuminating device |
JP4169135B2 (en) * | 1998-03-25 | 2008-10-22 | ハリソン東芝ライティング株式会社 | Lamp lighting device |
CN1137572C (en) * | 1999-09-27 | 2004-02-04 | 虹光精密工业股份有限公司 | Optical scanner able to regulate image induced voltage by controlling exposure time |
JP2001307988A (en) * | 2000-04-24 | 2001-11-02 | Canon Inc | Illumination device and illumination method, and aligner with the illumination device and device manufacturing method by means of them |
JP3593654B2 (en) * | 2000-05-25 | 2004-11-24 | 東京エレクトロン株式会社 | Substrate processing apparatus and substrate processing method |
JP2005227465A (en) * | 2004-02-12 | 2005-08-25 | Mejiro Genossen:Kk | Method of use of illumination optical system and method for manufacturing flat panel display |
-
2006
- 2006-06-14 JP JP2006164901A patent/JP2007333965A/en active Pending
-
2007
- 2007-04-03 TW TW096111741A patent/TWI388920B/en active
- 2007-04-04 KR KR1020070033203A patent/KR20070119487A/en not_active Application Discontinuation
- 2007-05-16 CN CN2007101038171A patent/CN101089732B/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN101089732B (en) | 2011-01-05 |
CN101089732A (en) | 2007-12-19 |
TWI388920B (en) | 2013-03-11 |
JP2007333965A (en) | 2007-12-27 |
KR20070119487A (en) | 2007-12-20 |
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