JP2007044872A - 窓漏れの少ない透明窓を有するケミカルメカニカルポリシング装置用ポリシングパッド - Google Patents
窓漏れの少ない透明窓を有するケミカルメカニカルポリシング装置用ポリシングパッド Download PDFInfo
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- JP2007044872A JP2007044872A JP2006277897A JP2006277897A JP2007044872A JP 2007044872 A JP2007044872 A JP 2007044872A JP 2006277897 A JP2006277897 A JP 2006277897A JP 2006277897 A JP2006277897 A JP 2006277897A JP 2007044872 A JP2007044872 A JP 2007044872A
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- Prior art keywords
- polishing
- polishing pad
- transparent sheet
- layer
- opening
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S451/00—Abrading
- Y10S451/921—Pad for lens shaping tool
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
【解決手段】ケミカルメカニカルポリシング装置用のポリシングパッドおよびこのポリシングパッドの作製方法を提供する。このポリシングパッドは、上層66および下層60、上層上の研磨面、ならびに2層間に挟まれた材料からなる透明シート64を備えている。ケミカルメカニカルポリシングプロセスからのスラリーは、不浸透性の透明シートを浸透してポリシングパッドの下層に至ることはできなくなる。
【選択図】 図7
Description
Claims (23)
- ケミカルメカニカルポリシング装置用のポリシングパッドであって、
研磨面および底面を有する研磨層と、
前記研磨層に形成され、前記研磨面から前記底面まで前記研磨層を貫通して延びる開口と、
前記開口をシールして前記研磨層の前記底面からの流体漏れを防ぐように前記研磨層の下方に配置された透明シートと、
を備え、
前記透明シートは前記研磨層より薄いことを特徴とするポリシングパッド。 - 前記透明シートが当該ポリシングパッド内において前記研磨面と前記底面との間に配置され、前記開口全体を横断して延在している、請求項1記載のポリシングパッド。
- 前記研磨面と前記底面が実質的に平坦で相互に平行であり、前記透明シートが前記研磨面および前記底面に平行な面内にある、請求項2記載のポリシングパッド。
- 前記研磨面と前記底面が実質的に平坦で相互に平行であり、前記透明シートが前記研磨面および前記底面に平行な面内にある、請求項1記載のポリシングパッド。
- 前記透明シートが化学機械研磨スラリーに対して実質的に非反応性の材料から形成されている、請求項4記載のポリシングパッド。
- 前記材料がPETまたはマイラーを含んでいる、請求項5記載のポリシングパッド。
- 前記透明シートの上方において前記開口内に配置され、前記透明シートから前記研磨面に向かって延在する窓を更に備え、前記窓が透明なブロック材料を備えている、請求項1記載のポリシングパッド。
- 前記透明シートの厚さは、0.005インチ(0.127mm)以下である、請求項1記載のポリシングパッド。
- ポリシングパッドの形成方法であって、
研磨層内に前記研磨層の研磨面から前記研磨層の底面まで延びる開口を形成するステップと、
前記ポリシングパッドの前記研磨層の下方において、前記開口をシールして前記ポリシングパッドの前記研磨層における前記研磨層からの前記底面への流体漏れを防ぐ位置に透明シートを固定するステップと、
を備え、
前記透明シートは前記研磨層より薄いことを特徴とするポリシングパッドの形成方法。 - 透明シートを固定する前記ステップが、前記開口内において前記上面と前記底面の間に前記透明シートを配置するステップを含んでいる、請求項9記載の方法。
- 前記透明シートがPETまたはマイラーを含んでいる、請求項10記載の方法。
- 前記ポリシングパッドが、前記ポリシングパッドの前記研磨面を形成する第1平坦面および前記ポリシングパッドの第1内面を形成する第2平坦面を有する上層と、前記ポリシングパッドの底面を形成する第1平坦面および前記ポリシングパッドの第2内面を形成する第2平坦面を有する下層と、を含んでいる、請求項11記載の方法。
- 透明シートを配置する前記ステップが、前記透明シートを前記下層の第2内面上に取り付けるステップを含んでいる、請求項12記載の方法。
- ポリシングパッド内に開口を形成する前記ステップが、前記下層内に開口を形成するステップおよび前記上層内に開口を形成するステップを含んでいる、請求項13記載の方法。
- 前記透明シートが前記ポリシングパッドの第2内面の実質的に全体にわたって延在している、請求項14記載の方法。
- 前記上層内の前記開口中に透明な窓ブロックを取り付けるステップを更に備える請求項15記載の方法。
- 前記上層内の前記開口が前記下層内の前記開口より大きく、前記ポリシングパッドの前記第1内面に接する前記透明シートの表面が感圧接着剤で被覆されており、透明窓ブロックを取り付ける前記ステップが、前記上層内の前記開口中における前記透明シート上の前記感圧接着剤に前記ブロックを押し付けるステップを含んでいる、請求項16記載の方法。
- 前記透明窓ブロックが透明ポリウレタンを含み、前記上層がブローンポリウレタンを含み、前記下層がフェルトポリウレタンを含んでいる、請求項17記載の方法。
- 前記透明シートの厚さは、0.005インチ(0.127mm)以下である、請求項9記載の方法。
- 研磨面および底面を有する不透明な研磨材と、
前記不透明研磨材内に形成され、前記研磨面から前記底面に至る透明窓と、
前記底面の下方に配置され、前記透明窓を覆う透明シートと、
を備え、
前記透明シートが前記不透明研磨材よりも薄いことを特徴とするポリシングパッド。 - 前記透明シートの下方に配置されたバッキング層を更に備える請求項20記載のポリシングパッド。
- 前記バッキング層内に形成され、前記研磨層内の前記透明窓と位置合わせされた開口を更に備える請求項21記載のポリシングパッド。
- 前記透明シートの厚さは、0.005インチ(0.127mm)以下である、請求項20記載のポリシングパッド。
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US15366599P | 1999-09-14 | 1999-09-14 | |
US60/153665 | 1999-09-14 |
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JP2000280082A Division JP3913969B2 (ja) | 1999-09-14 | 2000-09-14 | 窓漏れの少ない透明窓を有するケミカルメカニカルポリシング装置用ポリシングパッド |
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JP2007044872A true JP2007044872A (ja) | 2007-02-22 |
JP5001619B2 JP5001619B2 (ja) | 2012-08-15 |
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JP2006277897A Expired - Lifetime JP5001619B2 (ja) | 1999-09-14 | 2006-10-11 | 窓漏れの少ない透明窓を有するケミカルメカニカルポリシング装置用ポリシングパッド |
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Cited By (2)
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JP2018026588A (ja) * | 2013-03-15 | 2018-02-15 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 補助窓シール付き研磨パッド |
JP2019072835A (ja) * | 2017-09-15 | 2019-05-16 | ローム アンド ハース エレクトロニック マテリアルズ シーエムピー ホウルディングス インコーポレイテッド | フランジ付き光学的終了点検出窓及びそれを含むcmp用研磨パッド |
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JP2018026588A (ja) * | 2013-03-15 | 2018-02-15 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 補助窓シール付き研磨パッド |
JP2019072835A (ja) * | 2017-09-15 | 2019-05-16 | ローム アンド ハース エレクトロニック マテリアルズ シーエムピー ホウルディングス インコーポレイテッド | フランジ付き光学的終了点検出窓及びそれを含むcmp用研磨パッド |
JP7338959B2 (ja) | 2017-09-15 | 2023-09-05 | ローム アンド ハース エレクトロニック マテリアルズ シーエムピー ホウルディングス インコーポレイテッド | フランジ付き光学的終了点検出窓及びそれを含むcmp用研磨パッド |
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US20060154568A1 (en) | 2006-07-13 |
JP3913969B2 (ja) | 2007-05-09 |
JP5001619B2 (ja) | 2012-08-15 |
JP2001291686A (ja) | 2001-10-19 |
US7189141B2 (en) | 2007-03-13 |
US7677959B2 (en) | 2010-03-16 |
US6896585B2 (en) | 2005-05-24 |
US6524164B1 (en) | 2003-02-25 |
US20030171070A1 (en) | 2003-09-11 |
US20030109197A1 (en) | 2003-06-12 |
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