JP5277163B2 - 複数の部分を有する窓をもつ研磨パッド - Google Patents
複数の部分を有する窓をもつ研磨パッド Download PDFInfo
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- JP5277163B2 JP5277163B2 JP2009518606A JP2009518606A JP5277163B2 JP 5277163 B2 JP5277163 B2 JP 5277163B2 JP 2009518606 A JP2009518606 A JP 2009518606A JP 2009518606 A JP2009518606 A JP 2009518606A JP 5277163 B2 JP5277163 B2 JP 5277163B2
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- JP
- Japan
- Prior art keywords
- polishing
- layer
- polishing pad
- light transmissive
- outer portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
Description
Claims (14)
- 貫通アパーチャーを有し且つ研磨面を有する不透明な研磨層と、
上記アパーチャーにおける固体の光透過窓と、を備え、
上記固体の光透過窓は、
上記研磨層に固定された外側部分であって、上記研磨面に対してくぼんだ上面を有する外側部分、及び
上記外側部分に固定された内側部分であって、上記研磨面と実質的に同一平面である上面を有する内側部分、を含むものであり、
上記外側部分は、上記内側部分よりも硬い、研磨パッド。 - 上記外側部分が上記内側部分を取り巻く、請求項1に記載の研磨パッド。
- 上記内側部分及び上記研磨層は、実質的に同じ硬度を有する、請求項1に記載の研磨パッド。
- 上記外側部分は、上記研磨層と実質的に同じ硬度を有する、請求項1に記載の研磨パッド。
- 上記外側部分の上面より上に突出する上記内側部分の角が平滑化される、請求項1に記載の研磨パッド。
- 上記外側部分の上面より上に突出する上記研磨層の内縁の角が平滑化される、請求項1に記載の研磨パッド。
- 上記内側部分は、上記外側部分に成形される、請求項1に記載の研磨パッド。
- 上記研磨層、上記第1部分及び上記第2部分の底面は、実質的に同一平面上にある、請求項1に記載の研磨パッド。
- 上記研磨層は、微孔性フェールト基板上に配設されたポロメリック被覆を含む、請求項1に記載の研磨パッド。
- 研磨パッドを製造する方法であって、
不透明な研磨層のアパーチャーに、該研磨層の研磨面に対してくぼんだ上面を有する外側の第1の光透過層を形成するステップと、
上記第1の光透過層のアパーチャーに、上記研磨面と実質的に同一平面である上面を有する内側の第2の光透過層を形成するステップと、を備え、
上記外側の第1の光透過層は、上記内側の第2の光透過層よりも硬い、方法。 - 第1の光透過層のアパーチャーに第2の光透過層を形成する上記ステップは、上記第1の光透過層に穴をカットする段階を含む、請求項10に記載の方法。
- 第1の光透過層のアパーチャーに第2の光透過層を形成する上記ステップは、上記第1の光透過層の穴を液体先駆体で埋めて、上記研磨面より上に突出するメニスカスを生成する段階と、上記先駆体を硬化させる段階とを含む、請求項10に記載の方法。
- 上記第2部分の上面が上記研磨面と実質的に同一平面となるまで上記本体を磨く段階を更に含む、請求項12に記載の方法。
- 上記第1部分の上面より上に突出する上記第2部分の角を平滑化するステップを更に備えた、請求項10に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US81842306P | 2006-07-03 | 2006-07-03 | |
US60/818,423 | 2006-07-03 | ||
PCT/US2007/072690 WO2008005951A2 (en) | 2006-07-03 | 2007-07-02 | Polishing pad with window having multiple portions |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009542451A JP2009542451A (ja) | 2009-12-03 |
JP2009542451A5 JP2009542451A5 (ja) | 2010-08-12 |
JP5277163B2 true JP5277163B2 (ja) | 2013-08-28 |
Family
ID=38895428
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009518606A Active JP5277163B2 (ja) | 2006-07-03 | 2007-07-02 | 複数の部分を有する窓をもつ研磨パッド |
Country Status (4)
Country | Link |
---|---|
US (2) | US7942724B2 (ja) |
JP (1) | JP5277163B2 (ja) |
TW (1) | TWI370039B (ja) |
WO (1) | WO2008005951A2 (ja) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7967661B2 (en) * | 2008-06-19 | 2011-06-28 | Micron Technology, Inc. | Systems and pads for planarizing microelectronic workpieces and associated methods of use and manufacture |
US9017140B2 (en) | 2010-01-13 | 2015-04-28 | Nexplanar Corporation | CMP pad with local area transparency |
US20110281510A1 (en) * | 2010-05-12 | 2011-11-17 | Applied Materials, Inc. | Pad Window Insert |
US9156124B2 (en) | 2010-07-08 | 2015-10-13 | Nexplanar Corporation | Soft polishing pad for polishing a semiconductor substrate |
TWI521625B (zh) * | 2010-07-30 | 2016-02-11 | 應用材料股份有限公司 | 使用光譜監測來偵測層級清除 |
WO2012068428A2 (en) * | 2010-11-18 | 2012-05-24 | Cabot Microelectronics Corporation | Polishing pad comprising transmissive region |
US8920219B2 (en) * | 2011-07-15 | 2014-12-30 | Nexplanar Corporation | Polishing pad with alignment aperture |
JP2014113644A (ja) * | 2012-12-06 | 2014-06-26 | Toyo Tire & Rubber Co Ltd | 研磨パッド |
US8961266B2 (en) | 2013-03-15 | 2015-02-24 | Applied Materials, Inc. | Polishing pad with secondary window seal |
US20160144477A1 (en) * | 2014-11-21 | 2016-05-26 | Diane Scott | Coated compressive subpad for chemical mechanical polishing |
US9475168B2 (en) * | 2015-03-26 | 2016-10-25 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Polishing pad window |
KR20230058559A (ko) * | 2016-02-26 | 2023-05-03 | 어플라이드 머티어리얼스, 인코포레이티드 | 얇은 연마 패드 내의 윈도우 |
US10213894B2 (en) * | 2016-02-26 | 2019-02-26 | Applied Materials, Inc. | Method of placing window in thin polishing pad |
JP2019528187A (ja) * | 2016-08-31 | 2019-10-10 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 環状プラテン又は研磨パッドを有する研磨システム |
JP7022647B2 (ja) | 2018-05-08 | 2022-02-18 | 株式会社荏原製作所 | 光透過性部材、研磨パッドおよび基板研磨装置 |
US11633830B2 (en) | 2020-06-24 | 2023-04-25 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | CMP polishing pad with uniform window |
US20220203495A1 (en) | 2020-12-29 | 2022-06-30 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Cmp polishing pad with window having transparency at low wavelengths and material useful in such window |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5893796A (en) * | 1995-03-28 | 1999-04-13 | Applied Materials, Inc. | Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus |
US6068539A (en) * | 1998-03-10 | 2000-05-30 | Lam Research Corporation | Wafer polishing device with movable window |
JP3367496B2 (ja) * | 2000-01-20 | 2003-01-14 | 株式会社ニコン | 研磨体、平坦化装置、半導体デバイス製造方法、および半導体デバイス |
WO2000060650A1 (fr) * | 1999-03-31 | 2000-10-12 | Nikon Corporation | Corps de polissage, dispositif de polissage, procede de reglage du dispositif de polissage, dispositif de mesure de l'epaisseur du film poli ou du point terminal de polissage, procede de fabrication d'un dispositif a semi-conducteur |
US6454630B1 (en) * | 1999-09-14 | 2002-09-24 | Applied Materials, Inc. | Rotatable platen having a transparent window for a chemical mechanical polishing apparatus and method of making the same |
US6685537B1 (en) * | 2000-06-05 | 2004-02-03 | Speedfam-Ipec Corporation | Polishing pad window for a chemical mechanical polishing tool |
US6641470B1 (en) * | 2001-03-30 | 2003-11-04 | Lam Research Corporation | Apparatus for accurate endpoint detection in supported polishing pads |
DE60228784D1 (de) * | 2001-04-25 | 2008-10-23 | Jsr Corp | Lichtduchlässiges Polierkissen für eine Halbleiterschleife |
JP4570286B2 (ja) * | 2001-07-03 | 2010-10-27 | ニッタ・ハース株式会社 | 研磨パッド |
JP2003133270A (ja) * | 2001-10-26 | 2003-05-09 | Jsr Corp | 化学機械研磨用窓材及び研磨パッド |
US7175503B2 (en) * | 2002-02-04 | 2007-02-13 | Kla-Tencor Technologies Corp. | Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current device |
JP2003285259A (ja) * | 2002-03-28 | 2003-10-07 | Toray Ind Inc | 研磨パッド、研磨装置及び半導体デバイスの製造方法 |
KR20040093402A (ko) | 2003-04-22 | 2004-11-05 | 제이에스알 가부시끼가이샤 | 연마 패드 및 반도체 웨이퍼의 연마 방법 |
US6997777B2 (en) * | 2003-06-17 | 2006-02-14 | Cabot Microelectronics Corporation | Ultrasonic welding method for the manufacture of a polishing pad comprising an optically transmissive region |
US7264536B2 (en) * | 2003-09-23 | 2007-09-04 | Applied Materials, Inc. | Polishing pad with window |
US7258602B2 (en) * | 2003-10-22 | 2007-08-21 | Iv Technologies Co., Ltd. | Polishing pad having grooved window therein and method of forming the same |
CN100424830C (zh) * | 2004-04-23 | 2008-10-08 | Jsr株式会社 | 用于抛光半导体晶片的抛光垫、层叠体和方法 |
-
2007
- 2007-06-29 US US11/771,765 patent/US7942724B2/en active Active
- 2007-07-02 JP JP2009518606A patent/JP5277163B2/ja active Active
- 2007-07-02 WO PCT/US2007/072690 patent/WO2008005951A2/en active Application Filing
- 2007-07-03 TW TW096124191A patent/TWI370039B/zh active
-
2011
- 2011-05-12 US US13/106,635 patent/US8475228B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US7942724B2 (en) | 2011-05-17 |
WO2008005951A2 (en) | 2008-01-10 |
US8475228B2 (en) | 2013-07-02 |
US20080003923A1 (en) | 2008-01-03 |
US20110212673A1 (en) | 2011-09-01 |
WO2008005951A3 (en) | 2009-04-09 |
TWI370039B (en) | 2012-08-11 |
TW200824841A (en) | 2008-06-16 |
JP2009542451A (ja) | 2009-12-03 |
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