JP2006501673A5 - - Google Patents

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Publication number
JP2006501673A5
JP2006501673A5 JP2004541539A JP2004541539A JP2006501673A5 JP 2006501673 A5 JP2006501673 A5 JP 2006501673A5 JP 2004541539 A JP2004541539 A JP 2004541539A JP 2004541539 A JP2004541539 A JP 2004541539A JP 2006501673 A5 JP2006501673 A5 JP 2006501673A5
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JP
Japan
Prior art keywords
manufacturing process
quality
generating
critical
acceptable
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JP2004541539A
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English (en)
Japanese (ja)
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JP4478574B2 (ja
JP2006501673A (ja
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Priority claimed from US10/261,569 external-priority patent/US6915177B2/en
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Publication of JP2006501673A publication Critical patent/JP2006501673A/ja
Publication of JP2006501673A5 publication Critical patent/JP2006501673A5/ja
Application granted granted Critical
Publication of JP4478574B2 publication Critical patent/JP4478574B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2004541539A 2002-09-30 2003-09-12 製品設計および歩留りのフィードバックシステムに基づいた総括的な統合リソグラフィプロセス制御システム Expired - Lifetime JP4478574B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/261,569 US6915177B2 (en) 2002-09-30 2002-09-30 Comprehensive integrated lithographic process control system based on product design and yield feedback system
PCT/US2003/028682 WO2004031859A2 (en) 2002-09-30 2003-09-12 Comprehensive integrated lithographic process control system based on product design and yield feedback system

Publications (3)

Publication Number Publication Date
JP2006501673A JP2006501673A (ja) 2006-01-12
JP2006501673A5 true JP2006501673A5 (enExample) 2009-01-15
JP4478574B2 JP4478574B2 (ja) 2010-06-09

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004541539A Expired - Lifetime JP4478574B2 (ja) 2002-09-30 2003-09-12 製品設計および歩留りのフィードバックシステムに基づいた総括的な統合リソグラフィプロセス制御システム

Country Status (9)

Country Link
US (1) US6915177B2 (enExample)
JP (1) JP4478574B2 (enExample)
KR (1) KR100994271B1 (enExample)
CN (1) CN1685492B (enExample)
AU (1) AU2003276881A1 (enExample)
DE (1) DE10393394B4 (enExample)
GB (1) GB2410834B (enExample)
TW (1) TWI332129B (enExample)
WO (1) WO2004031859A2 (enExample)

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IL210832A (en) * 2010-02-19 2016-11-30 Asml Netherlands Bv Lithographic facility and method of manufacturing facility
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KR101508641B1 (ko) * 2013-08-08 2015-04-08 국립대학법인 울산과학기술대학교 산학협력단 생산 공정에서 데이터마이닝을 이용하여 제품 상태를 예측하는 장치 및 방법
CN107850861B (zh) * 2015-07-16 2020-08-07 Asml荷兰有限公司 光刻设备和器件制造方法
US10289109B2 (en) * 2015-10-01 2019-05-14 Globalfoundries Inc. Methods of error detection in fabrication processes
US10241502B2 (en) 2015-10-01 2019-03-26 Globalfoundries Inc. Methods of error detection in fabrication processes
US10311186B2 (en) * 2016-04-12 2019-06-04 Globalfoundries Inc. Three-dimensional pattern risk scoring
CN106205528B (zh) * 2016-07-19 2019-04-16 深圳市华星光电技术有限公司 一种goa电路及液晶显示面板
EP3279737A1 (en) * 2016-08-05 2018-02-07 ASML Netherlands B.V. Diagnostic system for an industrial process
JP7229686B2 (ja) * 2017-10-06 2023-02-28 キヤノン株式会社 制御装置、リソグラフィ装置、測定装置、加工装置、平坦化装置及び物品製造方法
CN110246775B (zh) * 2018-03-09 2022-05-03 联华电子股份有限公司 控制机台操作的装置与方法
CN110071059B (zh) * 2019-03-29 2020-12-22 福建省福联集成电路有限公司 一种监控蚀刻的工艺方法及系统
CN111861050B (zh) * 2019-04-25 2024-02-20 富联精密电子(天津)有限公司 生产制程管控装置、方法及计算机可读存储介质
DE102020215716A1 (de) 2020-12-11 2022-06-15 Robert Bosch Gesellschaft mit beschränkter Haftung Verfahren zur Herstellung eines Halbleiterbauelements und Fertigungslinie
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