AU2003276881A1 - Comprehensive integrated lithographic process control system based on product design and yield feedback system - Google Patents

Comprehensive integrated lithographic process control system based on product design and yield feedback system

Info

Publication number
AU2003276881A1
AU2003276881A1 AU2003276881A AU2003276881A AU2003276881A1 AU 2003276881 A1 AU2003276881 A1 AU 2003276881A1 AU 2003276881 A AU2003276881 A AU 2003276881A AU 2003276881 A AU2003276881 A AU 2003276881A AU 2003276881 A1 AU2003276881 A1 AU 2003276881A1
Authority
AU
Australia
Prior art keywords
design
product
process control
lithographic process
control system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003276881A
Other languages
English (en)
Other versions
AU2003276881A8 (en
Inventor
Khoi A. Phan
Bharath Rangarajan
Bhanwar Singh
Ramkumar Subramanian
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Micro Devices Inc
Original Assignee
Advanced Micro Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Micro Devices Inc filed Critical Advanced Micro Devices Inc
Publication of AU2003276881A1 publication Critical patent/AU2003276881A1/en
Publication of AU2003276881A8 publication Critical patent/AU2003276881A8/xx
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Feedback Control In General (AREA)
  • General Factory Administration (AREA)
AU2003276881A 2002-09-30 2003-09-12 Comprehensive integrated lithographic process control system based on product design and yield feedback system Abandoned AU2003276881A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/261,569 2002-09-30
US10/261,569 US6915177B2 (en) 2002-09-30 2002-09-30 Comprehensive integrated lithographic process control system based on product design and yield feedback system
PCT/US2003/028682 WO2004031859A2 (en) 2002-09-30 2003-09-12 Comprehensive integrated lithographic process control system based on product design and yield feedback system

Publications (2)

Publication Number Publication Date
AU2003276881A1 true AU2003276881A1 (en) 2004-04-23
AU2003276881A8 AU2003276881A8 (en) 2004-04-23

Family

ID=32030023

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003276881A Abandoned AU2003276881A1 (en) 2002-09-30 2003-09-12 Comprehensive integrated lithographic process control system based on product design and yield feedback system

Country Status (9)

Country Link
US (1) US6915177B2 (enExample)
JP (1) JP4478574B2 (enExample)
KR (1) KR100994271B1 (enExample)
CN (1) CN1685492B (enExample)
AU (1) AU2003276881A1 (enExample)
DE (1) DE10393394B4 (enExample)
GB (1) GB2410834B (enExample)
TW (1) TWI332129B (enExample)
WO (1) WO2004031859A2 (enExample)

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US7808643B2 (en) * 2005-02-25 2010-10-05 Nanometrics Incorporated Determining overlay error using an in-chip overlay target
WO2006093722A2 (en) * 2005-02-25 2006-09-08 Accent Optical Technologies, Inc. Methods and systems for determining overlay error based on target image symmetry
US20070240121A1 (en) * 2006-01-31 2007-10-11 Caterpillar Inc. System for evaluating component value
US7352439B2 (en) * 2006-08-02 2008-04-01 Asml Netherlands B.V. Lithography system, control system and device manufacturing method
GB0621408D0 (en) * 2006-10-27 2006-12-06 Ibm A method, apparatus and software for determining a relative measure of build quality for a built system
US7359820B1 (en) 2007-01-03 2008-04-15 International Business Machines Corporation In-cycle system test adaptation
US8142966B2 (en) * 2008-05-21 2012-03-27 Kla-Tenor Corporation Substrate matrix to decouple tool and process effects
US8321263B2 (en) * 2009-04-17 2012-11-27 Hartford Fire Insurance Company Processing and display of service provider performance data
JP5399191B2 (ja) * 2009-09-30 2014-01-29 大日本スクリーン製造株式会社 基板処理装置、基板処理装置のための検査装置、ならびに検査用コンピュータプログラムおよびそれを記録した記録媒体
IL210832A (en) * 2010-02-19 2016-11-30 Asml Netherlands Bv Lithographic facility and method of manufacturing facility
CN102800563B (zh) * 2011-05-26 2014-11-05 中芯国际集成电路制造(上海)有限公司 晶片投片方法与晶片投片装置
US9227295B2 (en) 2011-05-27 2016-01-05 Corning Incorporated Non-polished glass wafer, thinning system and method for using the non-polished glass wafer to thin a semiconductor wafer
KR101530848B1 (ko) * 2012-09-20 2015-06-24 국립대학법인 울산과학기술대학교 산학협력단 데이터마이닝을 이용하여 생산 공정에서 품질을 관리하는 장치 및 방법
KR101508641B1 (ko) * 2013-08-08 2015-04-08 국립대학법인 울산과학기술대학교 산학협력단 생산 공정에서 데이터마이닝을 이용하여 제품 상태를 예측하는 장치 및 방법
CN107850861B (zh) * 2015-07-16 2020-08-07 Asml荷兰有限公司 光刻设备和器件制造方法
US10289109B2 (en) * 2015-10-01 2019-05-14 Globalfoundries Inc. Methods of error detection in fabrication processes
US10241502B2 (en) 2015-10-01 2019-03-26 Globalfoundries Inc. Methods of error detection in fabrication processes
US10311186B2 (en) * 2016-04-12 2019-06-04 Globalfoundries Inc. Three-dimensional pattern risk scoring
CN106205528B (zh) * 2016-07-19 2019-04-16 深圳市华星光电技术有限公司 一种goa电路及液晶显示面板
EP3279737A1 (en) * 2016-08-05 2018-02-07 ASML Netherlands B.V. Diagnostic system for an industrial process
JP7229686B2 (ja) * 2017-10-06 2023-02-28 キヤノン株式会社 制御装置、リソグラフィ装置、測定装置、加工装置、平坦化装置及び物品製造方法
CN110246775B (zh) * 2018-03-09 2022-05-03 联华电子股份有限公司 控制机台操作的装置与方法
CN110071059B (zh) * 2019-03-29 2020-12-22 福建省福联集成电路有限公司 一种监控蚀刻的工艺方法及系统
CN111861050B (zh) * 2019-04-25 2024-02-20 富联精密电子(天津)有限公司 生产制程管控装置、方法及计算机可读存储介质
DE102020215716A1 (de) 2020-12-11 2022-06-15 Robert Bosch Gesellschaft mit beschränkter Haftung Verfahren zur Herstellung eines Halbleiterbauelements und Fertigungslinie
US20240231242A9 (en) * 2021-03-02 2024-07-11 Asml Netherlands B.V. Operating a metrology system, lithographic apparatus, and methods thereof
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CN114326620B (zh) * 2021-12-25 2022-09-27 北京国控天成科技有限公司 一种全流程自动控制方法、装置及电子设备
US12321159B2 (en) * 2022-02-04 2025-06-03 University Of South Florida Systems, methods, and media for monitoring the production process of a product

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Also Published As

Publication number Publication date
DE10393394T5 (de) 2005-08-11
TWI332129B (en) 2010-10-21
WO2004031859A3 (en) 2004-06-17
KR20050062576A (ko) 2005-06-23
AU2003276881A8 (en) 2004-04-23
CN1685492B (zh) 2012-12-26
GB2410834A (en) 2005-08-10
JP4478574B2 (ja) 2010-06-09
WO2004031859A2 (en) 2004-04-15
KR100994271B1 (ko) 2010-11-12
GB0505193D0 (en) 2005-04-20
JP2006501673A (ja) 2006-01-12
US6915177B2 (en) 2005-07-05
GB2410834B (en) 2006-04-19
CN1685492A (zh) 2005-10-19
TW200408919A (en) 2004-06-01
DE10393394B4 (de) 2016-10-13
US20040063009A1 (en) 2004-04-01

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase