JP2006146079A - レチクル搬送容器 - Google Patents
レチクル搬送容器 Download PDFInfo
- Publication number
- JP2006146079A JP2006146079A JP2004339375A JP2004339375A JP2006146079A JP 2006146079 A JP2006146079 A JP 2006146079A JP 2004339375 A JP2004339375 A JP 2004339375A JP 2004339375 A JP2004339375 A JP 2004339375A JP 2006146079 A JP2006146079 A JP 2006146079A
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- door
- transport container
- retainer
- pod
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67353—Closed carriers specially adapted for a single substrate
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67383—Closed carriers characterised by substrate supports
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67386—Closed carriers characterised by the construction of the closed carrier
Abstract
【解決手段】 レクチル12を収納するポッド13と、このポッド13を塞いで気密にシールする扉14およびシール15とを備えたレチクル搬送容器11である。ポッド13及び扉14の各内側面に一対のレチクルリテーナー25,45を有し、各レチクルリテーナー25,45が、レチクル12の周縁の上側角部12A又は下側角部12Bに当接して弾性的に支持する傾斜面部28を備えた。傾斜面部28の内側には、レチクル12の周縁の上側角部12A又は下側角部12Bが当接したときに上記傾斜面部28の撓みを許容して弾性的に支持する緩衝機能を持たせる凹部31,52を備えた。
【選択図】 図1
Description
Claims (5)
- 一端に開口を有しレクチルを収納する内部を有し、前記開口を覆って塞ぐ扉と、前記扉で前記ポッドを塞いだときに内部を気密にシールするシール材とを備えたレチクル搬送容器であって、
上記ポッド及び扉の各内側面に一対のリテーナーを有し、
当該各リテーナーが、上記レチクルの周縁の上側角部又は下側角部に当接して弾性的に支持する傾斜面部を備えたことを特徴とするレチクル搬送容器。 - 一端に開口を有しレクチルを収納する内部を有し、前記開口を覆って塞ぐ扉と、前記扉で前記ポッドを塞いだときに内部を気密にシールするシール材とを備えたレチクル搬送容器であって、
上記ポッド及び扉の各内側面に一対のリテーナーを有し、
当該各リテーナーが、弾性部材で成形されると共に、上記レチクルの周縁の上側角部又は下側角部に当接する傾斜面部と、当該傾斜面部の内側に設けられ上記レチクルの周縁の上側角部又は下側角部が当接したときに上記傾斜面部の撓みを許容して弾性的に支持する緩衝機能を持たせる凹部とを備えたことを特徴とするレチクル搬送容器。 - 請求項1又は2に記載のレチクル搬送容器において、
上記ポッド又は扉の少なくとも1カ所にメンブレンフィルター取り付け部が形成され、当該メンブレンフィルター取り付け部にメンブレンフィルターが取り付けられていることを特徴とするレチクル搬送容器。 - 請求項1ないし3のいずれか1項に記載のレチクル搬送容器において、
上記扉又はポッドの外側表面の少なくとも1カ所に無線タグが取り付けられていることを特徴とするレチクル搬送容器。 - 請求項4に記載のレチクル搬送容器において、
上記無線タグが、上記扉又はポッドの外側表面に、密封収納されたことを特徴とするレチクル搬送容器。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004339375A JP4667018B2 (ja) | 2004-11-24 | 2004-11-24 | レチクル搬送容器 |
TW094137795A TWI345545B (en) | 2004-11-24 | 2005-10-28 | Reticle-carrying container |
EP05024325A EP1662324A3 (en) | 2004-11-24 | 2005-11-08 | Reticle-carrying container |
US11/282,575 US7450219B2 (en) | 2004-11-24 | 2005-11-21 | Reticle-carrying container |
KR1020050111834A KR101077719B1 (ko) | 2004-11-24 | 2005-11-22 | 레티클 반송용기 |
CN2005101272555A CN1781826B (zh) | 2004-11-24 | 2005-11-24 | 模版输送容器 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004339375A JP4667018B2 (ja) | 2004-11-24 | 2004-11-24 | レチクル搬送容器 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006146079A true JP2006146079A (ja) | 2006-06-08 |
JP4667018B2 JP4667018B2 (ja) | 2011-04-06 |
Family
ID=35541843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004339375A Expired - Fee Related JP4667018B2 (ja) | 2004-11-24 | 2004-11-24 | レチクル搬送容器 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7450219B2 (ja) |
EP (1) | EP1662324A3 (ja) |
JP (1) | JP4667018B2 (ja) |
KR (1) | KR101077719B1 (ja) |
CN (1) | CN1781826B (ja) |
TW (1) | TWI345545B (ja) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008040810A (ja) * | 2006-08-07 | 2008-02-21 | Shin Etsu Polymer Co Ltd | Rfidシステム用成形品 |
WO2008062537A1 (fr) | 2006-11-24 | 2008-05-29 | Miraial Co., Ltd. | Système de support de stockage de feuilles et boîtier à réticule utilisant celui-ci |
JP2008166799A (ja) * | 2006-12-29 | 2008-07-17 | Ind Technol Res Inst | 弾性位置決め構造体を有するクリーン容器 |
JP2011126546A (ja) * | 2009-12-15 | 2011-06-30 | Shin-Etsu Chemical Co Ltd | ガラス基板搬送用ケースおよびガラス基板搬送用台車 |
JP2011203309A (ja) * | 2010-03-24 | 2011-10-13 | Shin-Etsu Chemical Co Ltd | ペリクルの収納容器およびペリクル収納容器の搬送用台車 |
JP2013011723A (ja) * | 2011-06-29 | 2013-01-17 | Arakawa Jushi:Kk | マスクケースのマスク係止具 |
JP2017037893A (ja) * | 2015-08-07 | 2017-02-16 | アキレス株式会社 | 基板収納容器 |
JP6286090B1 (ja) * | 2017-01-26 | 2018-02-28 | 家登精密工業股▲ふん▼有限公司 | レチクルポッド |
JP7457741B2 (ja) | 2021-03-12 | 2024-03-28 | 家登精密工業股▲ふん▼有限公司 | レチクル保管ポッド及びレチクル保持方法 |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006173273A (ja) | 2004-12-14 | 2006-06-29 | Miraial Kk | レチクル搬送容器 |
JP2006173276A (ja) | 2004-12-14 | 2006-06-29 | Miraial Kk | レチクル処理システム |
JP4789566B2 (ja) * | 2005-09-30 | 2011-10-12 | ミライアル株式会社 | 薄板保持容器及び薄板保持容器用処理装置 |
US7581372B2 (en) * | 2006-08-17 | 2009-09-01 | Microtome Precision, Inc. | High cleanliness article transport system |
US20090152162A1 (en) * | 2007-12-13 | 2009-06-18 | Silicon Genesis Corporation | Carrier apparatus and method for shaped sheet materials |
TWI344926B (en) * | 2008-12-05 | 2011-07-11 | Gudeng Prec Industral Co Ltd | Reticle pod |
TWI411563B (zh) | 2009-09-25 | 2013-10-11 | Gudeng Prec Industral Co Ltd | 光罩盒 |
TWI378887B (en) * | 2009-12-29 | 2012-12-11 | Gudeng Prec Industral Co Ltd | Reticle pod and supporting components therebetween |
TWI389828B (zh) * | 2010-07-21 | 2013-03-21 | Gudeng Prec Industral Co Ltd | 具有感測器之光罩盒 |
US9376267B2 (en) * | 2011-05-02 | 2016-06-28 | Murata Machinery, Ltd. | Orientation adjustment device and orientation adjustment method |
US8925290B2 (en) | 2011-09-08 | 2015-01-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mask storage device for mask haze prevention and methods thereof |
JP6577130B2 (ja) | 2015-07-13 | 2019-09-18 | インテグリス・インコーポレーテッド | 収納部が強化された基板容器 |
WO2018044678A1 (en) * | 2016-08-27 | 2018-03-08 | Entegris, Inc. | Reticle pod having side containment of reticle |
CN110945434B (zh) * | 2017-07-21 | 2022-06-21 | 恩特格里斯公司 | 具有透明窗组合件的用于固持及传送光罩的容器 |
CN114995071A (zh) * | 2018-10-29 | 2022-09-02 | 家登精密工业股份有限公司 | 光罩固持系统及提供光罩固持系统观察光罩的方法 |
TWI803860B (zh) * | 2020-04-30 | 2023-06-01 | 美商恩特葛瑞斯股份有限公司 | 光罩盒密封 |
TWI755795B (zh) * | 2020-07-23 | 2022-02-21 | 家登精密工業股份有限公司 | 具有導位構件的光罩盒 |
TW202324578A (zh) * | 2021-10-25 | 2023-06-16 | 美商恩特葛瑞斯股份有限公司 | 極紫外光內盒密封間隙 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH1010705A (ja) * | 1996-06-25 | 1998-01-16 | Nikon Corp | レチクルケース |
JPH10305894A (ja) * | 1997-03-03 | 1998-11-17 | Nikon Corp | 基板収納ケースおよび半導体製造プロセス |
JPH11255332A (ja) * | 1998-03-10 | 1999-09-21 | Sigma Meltec Kk | 基板収納ケース |
JP2003222992A (ja) * | 2002-01-31 | 2003-08-08 | Arakawa Jushi:Kk | マスクケース |
JP2004071729A (ja) * | 2002-08-05 | 2004-03-04 | Sendai Nikon:Kk | レチクル保持方法、レチクル保持装置及び露光装置 |
JP2004165249A (ja) * | 2002-11-11 | 2004-06-10 | Sony Corp | 露光装置及び露光方法 |
JP2005321529A (ja) * | 2004-05-07 | 2005-11-17 | Arakawa Jushi:Kk | マスクケース |
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JPH10163094A (ja) | 1996-12-03 | 1998-06-19 | Nikon Corp | 露光装置及び露光方法並びに搬送装置 |
US6216873B1 (en) | 1999-03-19 | 2001-04-17 | Asyst Technologies, Inc. | SMIF container including a reticle support structure |
US7304720B2 (en) * | 2002-02-22 | 2007-12-04 | Asml Holding N.V. | System for using a two part cover for protecting a reticle |
US6825916B2 (en) * | 2002-07-05 | 2004-11-30 | Entegris, Inc. | Reticle carrier with positioning cover |
-
2004
- 2004-11-24 JP JP2004339375A patent/JP4667018B2/ja not_active Expired - Fee Related
-
2005
- 2005-10-28 TW TW094137795A patent/TWI345545B/zh not_active IP Right Cessation
- 2005-11-08 EP EP05024325A patent/EP1662324A3/en not_active Withdrawn
- 2005-11-21 US US11/282,575 patent/US7450219B2/en not_active Expired - Fee Related
- 2005-11-22 KR KR1020050111834A patent/KR101077719B1/ko not_active IP Right Cessation
- 2005-11-24 CN CN2005101272555A patent/CN1781826B/zh not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH1010705A (ja) * | 1996-06-25 | 1998-01-16 | Nikon Corp | レチクルケース |
JPH10305894A (ja) * | 1997-03-03 | 1998-11-17 | Nikon Corp | 基板収納ケースおよび半導体製造プロセス |
JPH11255332A (ja) * | 1998-03-10 | 1999-09-21 | Sigma Meltec Kk | 基板収納ケース |
JP2003222992A (ja) * | 2002-01-31 | 2003-08-08 | Arakawa Jushi:Kk | マスクケース |
JP2004071729A (ja) * | 2002-08-05 | 2004-03-04 | Sendai Nikon:Kk | レチクル保持方法、レチクル保持装置及び露光装置 |
JP2004165249A (ja) * | 2002-11-11 | 2004-06-10 | Sony Corp | 露光装置及び露光方法 |
JP2005321529A (ja) * | 2004-05-07 | 2005-11-17 | Arakawa Jushi:Kk | マスクケース |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008040810A (ja) * | 2006-08-07 | 2008-02-21 | Shin Etsu Polymer Co Ltd | Rfidシステム用成形品 |
WO2008062537A1 (fr) | 2006-11-24 | 2008-05-29 | Miraial Co., Ltd. | Système de support de stockage de feuilles et boîtier à réticule utilisant celui-ci |
JP2008166799A (ja) * | 2006-12-29 | 2008-07-17 | Ind Technol Res Inst | 弾性位置決め構造体を有するクリーン容器 |
JP4512634B2 (ja) * | 2006-12-29 | 2010-07-28 | 財団法人工業技術研究院 | 弾性位置決め構造体を有するクリーン容器 |
JP2011126546A (ja) * | 2009-12-15 | 2011-06-30 | Shin-Etsu Chemical Co Ltd | ガラス基板搬送用ケースおよびガラス基板搬送用台車 |
JP2011203309A (ja) * | 2010-03-24 | 2011-10-13 | Shin-Etsu Chemical Co Ltd | ペリクルの収納容器およびペリクル収納容器の搬送用台車 |
JP2013011723A (ja) * | 2011-06-29 | 2013-01-17 | Arakawa Jushi:Kk | マスクケースのマスク係止具 |
JP2017037893A (ja) * | 2015-08-07 | 2017-02-16 | アキレス株式会社 | 基板収納容器 |
JP6286090B1 (ja) * | 2017-01-26 | 2018-02-28 | 家登精密工業股▲ふん▼有限公司 | レチクルポッド |
JP2018120200A (ja) * | 2017-01-26 | 2018-08-02 | 家登精密工業股▲ふん▼有限公司 | レチクルポッド |
JP7457741B2 (ja) | 2021-03-12 | 2024-03-28 | 家登精密工業股▲ふん▼有限公司 | レチクル保管ポッド及びレチクル保持方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1662324A2 (en) | 2006-05-31 |
JP4667018B2 (ja) | 2011-04-06 |
KR101077719B1 (ko) | 2011-10-27 |
TWI345545B (en) | 2011-07-21 |
US7450219B2 (en) | 2008-11-11 |
KR20060058021A (ko) | 2006-05-29 |
EP1662324A3 (en) | 2007-06-27 |
US20060109449A1 (en) | 2006-05-25 |
CN1781826A (zh) | 2006-06-07 |
CN1781826B (zh) | 2010-06-09 |
TW200621596A (en) | 2006-07-01 |
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