JP2006113533A5 - - Google Patents
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- Publication number
- JP2006113533A5 JP2006113533A5 JP2005136902A JP2005136902A JP2006113533A5 JP 2006113533 A5 JP2006113533 A5 JP 2006113533A5 JP 2005136902 A JP2005136902 A JP 2005136902A JP 2005136902 A JP2005136902 A JP 2005136902A JP 2006113533 A5 JP2006113533 A5 JP 2006113533A5
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- optical element
- projection optical
- crystal material
- projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims 198
- 239000000463 material Substances 0.000 claims 77
- 239000013078 crystal Substances 0.000 claims 58
- 239000000395 magnesium oxide Substances 0.000 claims 38
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims 38
- 239000000292 calcium oxide Substances 0.000 claims 37
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims 37
- 239000007788 liquid Substances 0.000 claims 22
- 239000000758 substrate Substances 0.000 claims 17
- 238000007654 immersion Methods 0.000 claims 15
- 238000003384 imaging method Methods 0.000 claims 10
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 claims 9
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 3
- 230000005540 biological transmission Effects 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000011575 calcium Substances 0.000 claims 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims 1
- 239000002178 crystalline material Substances 0.000 claims 1
- 239000010436 fluorite Substances 0.000 claims 1
- 238000005286 illumination Methods 0.000 claims 1
- 239000011777 magnesium Substances 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005136902A JP2006113533A (ja) | 2004-08-03 | 2005-05-10 | 投影光学系、露光装置、および露光方法 |
| HK07110333.8A HK1102284B (en) | 2004-08-03 | 2005-07-22 | Projection optical system, exposure apparatus, and exposure method |
| KR1020077005157A KR20070041609A (ko) | 2004-08-03 | 2005-07-22 | 투영 광학계, 노광 장치 및 노광 방법 |
| PCT/JP2005/013447 WO2006013734A1 (ja) | 2004-08-03 | 2005-07-22 | 投影光学系、露光装置、および露光方法 |
| EP05766167A EP1783525A4 (en) | 2004-08-03 | 2005-07-22 | OPTICAL PROJECTION SYSTEM, EXPOSURE DEVICE AND EXPOSURE METHOD |
| CN2005800263699A CN101002127B (zh) | 2004-08-03 | 2005-07-22 | 投影光学系统、曝光装置以及曝光方法 |
| US11/658,918 US8102508B2 (en) | 2004-08-03 | 2005-07-22 | Projection optical system, exposure apparatus, and exposure method |
| TW094125534A TW200609690A (en) | 2004-08-03 | 2005-07-28 | Projection optical system, exposure device and method of exposure |
| IL181136A IL181136A0 (en) | 2004-08-03 | 2007-02-01 | Projection optical system, exposure apparatus, and exposure method |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004227226 | 2004-08-03 | ||
| JP2004267319 | 2004-09-14 | ||
| JP2005136902A JP2006113533A (ja) | 2004-08-03 | 2005-05-10 | 投影光学系、露光装置、および露光方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006113533A JP2006113533A (ja) | 2006-04-27 |
| JP2006113533A5 true JP2006113533A5 (https=) | 2008-05-08 |
Family
ID=35787025
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005136902A Pending JP2006113533A (ja) | 2004-08-03 | 2005-05-10 | 投影光学系、露光装置、および露光方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8102508B2 (https=) |
| EP (1) | EP1783525A4 (https=) |
| JP (1) | JP2006113533A (https=) |
| KR (1) | KR20070041609A (https=) |
| IL (1) | IL181136A0 (https=) |
| TW (1) | TW200609690A (https=) |
| WO (1) | WO2006013734A1 (https=) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US7466489B2 (en) * | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
| US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| KR20160085375A (ko) | 2004-05-17 | 2016-07-15 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| JP2008532273A (ja) * | 2005-02-25 | 2008-08-14 | カール ツァイス エスエムテー アクチエンゲゼルシャフト | マイクロ・リソグラフィー投影露光装置のための光学システム |
| EP2280295A1 (de) * | 2005-03-08 | 2011-02-02 | Schott Ag | Verfahren zur Herstellung von optischen Elementen für die Mikrolithographie, damit erhältliche Linsensysteme und deren Verwendung |
| JP2006309220A (ja) * | 2005-04-29 | 2006-11-09 | Carl Zeiss Smt Ag | 投影対物レンズ |
| WO2007017473A1 (de) * | 2005-08-10 | 2007-02-15 | Carl Zeiss Smt Ag | Abbildungssystem, insbesondere projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage |
| WO2007132619A1 (ja) * | 2006-05-12 | 2007-11-22 | Nikon Corporation | 結像光学系、露光装置、およびデバイス製造方法 |
| US7557997B2 (en) * | 2006-09-28 | 2009-07-07 | Nikon Corporation | Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element |
| JP5588176B2 (ja) * | 2006-12-28 | 2014-09-10 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 傾斜偏向ミラーを有する反射屈折投影対物器械、投影露光装置、投影露光方法、及びミラー |
| JP2008216498A (ja) | 2007-03-01 | 2008-09-18 | Canon Inc | 投影光学系、露光装置及びデバイス製造方法 |
| JP2009031603A (ja) | 2007-07-27 | 2009-02-12 | Canon Inc | 投影光学系、露光装置及びデバイス製造方法 |
| JP2009086038A (ja) | 2007-09-27 | 2009-04-23 | Canon Inc | 投影光学系、露光装置及びデバイス製造方法 |
| US20090091728A1 (en) * | 2007-09-28 | 2009-04-09 | Carl Zeiss Smt Ag | Compact High Aperture Folded Catadioptric Projection Objective |
| FR2927708A1 (fr) * | 2008-02-19 | 2009-08-21 | Commissariat Energie Atomique | Procede de photolithographie ultraviolette a immersion |
| US8345350B2 (en) | 2008-06-20 | 2013-01-01 | Carl Zeiss Smt Gmbh | Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same |
| DE102009011329A1 (de) | 2009-03-05 | 2010-09-09 | Carl Zeiss Smt Ag | Kompaktes katadioptrisches Projektionsobjektiv für die Immersionslithographie sowie Projektionsbelichtungsverfahren |
| DE102009037077B3 (de) | 2009-08-13 | 2011-02-17 | Carl Zeiss Smt Ag | Katadioptrisches Projektionsobjektiv |
| US9651873B2 (en) * | 2012-12-27 | 2017-05-16 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium |
| CN110114710B (zh) * | 2016-10-31 | 2020-11-27 | 德遁公司 | 毫微微投影仪光学系统 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2830492B2 (ja) * | 1991-03-06 | 1998-12-02 | 株式会社ニコン | 投影露光装置及び投影露光方法 |
| JP3246615B2 (ja) | 1992-07-27 | 2002-01-15 | 株式会社ニコン | 照明光学装置、露光装置、及び露光方法 |
| JPH06188169A (ja) | 1992-08-24 | 1994-07-08 | Canon Inc | 結像方法及び該方法を用いる露光装置及び該方法を用いるデバイス製造方法 |
| JPH06124873A (ja) * | 1992-10-09 | 1994-05-06 | Canon Inc | 液浸式投影露光装置 |
| JP3555230B2 (ja) * | 1994-05-18 | 2004-08-18 | 株式会社ニコン | 投影露光装置 |
| EP1944654A3 (en) | 1996-11-28 | 2010-06-02 | Nikon Corporation | An exposure apparatus and an exposure method |
| WO1998028665A1 (en) | 1996-12-24 | 1998-07-02 | Koninklijke Philips Electronics N.V. | Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device |
| JP3747566B2 (ja) | 1997-04-23 | 2006-02-22 | 株式会社ニコン | 液浸型露光装置 |
| WO1999049504A1 (fr) | 1998-03-26 | 1999-09-30 | Nikon Corporation | Procede et systeme d'exposition par projection |
| JP2000133588A (ja) | 1998-08-18 | 2000-05-12 | Nikon Corp | 露光装置及び方法、該露光装置の製造方法並びに該露光装置を用いたデバイス製造方法 |
| US6451507B1 (en) * | 1998-08-18 | 2002-09-17 | Nikon Corporation | Exposure apparatus and method |
| WO2001023933A1 (en) * | 1999-09-29 | 2001-04-05 | Nikon Corporation | Projection optical system |
| WO2001023935A1 (en) * | 1999-09-29 | 2001-04-05 | Nikon Corporation | Projection exposure method and apparatus and projection optical system |
| US7301605B2 (en) * | 2000-03-03 | 2007-11-27 | Nikon Corporation | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
| JP2001345245A (ja) | 2000-05-31 | 2001-12-14 | Nikon Corp | 露光方法及び露光装置並びにデバイス製造方法 |
| GB2368219A (en) * | 2000-09-13 | 2002-04-24 | Roke Manor Research | Camera system with GPS |
| US6788389B2 (en) * | 2001-07-10 | 2004-09-07 | Nikon Corporation | Production method of projection optical system |
| TW571344B (en) * | 2001-07-10 | 2004-01-11 | Nikon Corp | Manufacturing method for projection optic system |
| JP4333078B2 (ja) | 2002-04-26 | 2009-09-16 | 株式会社ニコン | 投影光学系、該投影光学系を備えた露光装置および該投影光学系を用いた露光方法並びにデバイス製造方法 |
| JP4338434B2 (ja) | 2002-06-07 | 2009-10-07 | 富士フイルム株式会社 | 透過型２次元光変調素子及びそれを用いた露光装置 |
| JP4305611B2 (ja) * | 2002-07-18 | 2009-07-29 | 株式会社ニコン | 照明光学装置、露光装置および露光方法 |
| KR20050035890A (ko) * | 2002-08-23 | 2005-04-19 | 가부시키가이샤 니콘 | 투영 광학계, 포토리소그래피 방법, 노광 장치 및 그 이용방법 |
| DE10253679A1 (de) * | 2002-11-18 | 2004-06-03 | Infineon Technologies Ag | Optische Einrichtung zur Verwendung bei einem Lithographie-Verfahren, insbesondere zur Herstellung eines Halbleiter-Bauelements, sowie optisches Lithographieverfahren |
| JP2004205698A (ja) * | 2002-12-24 | 2004-07-22 | Nikon Corp | 投影光学系、露光装置および露光方法 |
| WO2007071569A1 (en) | 2005-12-23 | 2007-06-28 | Carl Zeiss Smt Ag | Projection objective of a microlithographic projection exposure apparatus |
| US7557997B2 (en) * | 2006-09-28 | 2009-07-07 | Nikon Corporation | Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element |
-
2005
- 2005-05-10 JP JP2005136902A patent/JP2006113533A/ja active Pending
- 2005-07-22 KR KR1020077005157A patent/KR20070041609A/ko not_active Withdrawn
- 2005-07-22 US US11/658,918 patent/US8102508B2/en not_active Expired - Fee Related
- 2005-07-22 EP EP05766167A patent/EP1783525A4/en not_active Withdrawn
- 2005-07-22 WO PCT/JP2005/013447 patent/WO2006013734A1/ja not_active Ceased
- 2005-07-28 TW TW094125534A patent/TW200609690A/zh unknown
-
2007
- 2007-02-01 IL IL181136A patent/IL181136A0/en unknown
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