JP2006086534A - 高温基板処理用の粗面サセプタ - Google Patents

高温基板処理用の粗面サセプタ Download PDF

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Publication number
JP2006086534A
JP2006086534A JP2005268362A JP2005268362A JP2006086534A JP 2006086534 A JP2006086534 A JP 2006086534A JP 2005268362 A JP2005268362 A JP 2005268362A JP 2005268362 A JP2005268362 A JP 2005268362A JP 2006086534 A JP2006086534 A JP 2006086534A
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JP
Japan
Prior art keywords
substrate support
susceptor
semiconductor substrate
substrate
silicon carbide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005268362A
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English (en)
Japanese (ja)
Other versions
JP2006086534A5 (https=
Inventor
Den Berg Jannes Remco Van
レムコ ファン デン ベルフ ヤンネス
Ernst H A Grannemann
ハー．アー．フラッネマン エルンスト
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASM International NV
Original Assignee
ASM International NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASM International NV filed Critical ASM International NV
Publication of JP2006086534A publication Critical patent/JP2006086534A/ja
Publication of JP2006086534A5 publication Critical patent/JP2006086534A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0434—Apparatus for thermal treatment mainly by convection
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/14—Substrate holders or susceptors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/12—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • H10P72/123—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterised by a material, a roughness, a coating or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7612—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by lifting arrangements, e.g. lift pins

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical Vapour Deposition (AREA)
JP2005268362A 2004-09-17 2005-09-15 高温基板処理用の粗面サセプタ Pending JP2006086534A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US61099304P 2004-09-17 2004-09-17

Publications (2)

Publication Number Publication Date
JP2006086534A true JP2006086534A (ja) 2006-03-30
JP2006086534A5 JP2006086534A5 (https=) 2008-10-16

Family

ID=35519641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005268362A Pending JP2006086534A (ja) 2004-09-17 2005-09-15 高温基板処理用の粗面サセプタ

Country Status (3)

Country Link
US (2) US20060060145A1 (https=)
EP (2) EP1638135A3 (https=)
JP (1) JP2006086534A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008277781A (ja) * 2007-03-30 2008-11-13 Covalent Materials Corp 縦型ウエハボート

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1031985C2 (nl) * 2006-06-12 2007-12-13 Xycarb Ceramics B V Werkwijze voor het vervaardigen van een inrichting voor het ondersteunen van een substraat tijdens de vervaardiging van halfgeleider-componenten alsmede een dergelijke inrichting.
CN101563771A (zh) * 2006-11-10 2009-10-21 圣戈本陶瓷及塑料股份有限公司 衬托器和使用该衬托器形成led器件的方法
FR2914488B1 (fr) * 2007-03-30 2010-08-27 Soitec Silicon On Insulator Substrat chauffage dope
JP5444607B2 (ja) * 2007-10-31 2014-03-19 株式会社Ｓｕｍｃｏ エピタキシャル膜形成装置用のサセプタ、エピタキシャル膜形成装置、エピタキシャルウェーハの製造方法
JP5415853B2 (ja) * 2009-07-10 2014-02-12 東京エレクトロン株式会社 表面処理方法
WO2011105370A1 (ja) * 2010-02-26 2011-09-01 株式会社日立国際電気 半導体装置の製造方法及び基板製造方法及び基板処理装置
US8455374B2 (en) 2010-05-06 2013-06-04 Applied Materials, Inc. Radiation heating efficiency by increasing optical absorption of a silicon containing material
US10316412B2 (en) 2012-04-18 2019-06-11 Veeco Instruments Inc. Wafter carrier for chemical vapor deposition systems
CN104619881A (zh) * 2012-08-17 2015-05-13 株式会社Ihi 耐热复合材料的制造方法及制造装置
US10167571B2 (en) 2013-03-15 2019-01-01 Veeco Instruments Inc. Wafer carrier having provisions for improving heating uniformity in chemical vapor deposition systems
US10763154B2 (en) 2018-08-28 2020-09-01 Applied Materials, Inc. Measurement of flatness of a susceptor of a display CVD chamber
US12512362B2 (en) 2023-02-10 2025-12-30 Applied Materials, Inc. Susceptor improvement

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0745534A (ja) * 1993-07-30 1995-02-14 Sony Corp 縦型ｃｖｄ装置
JPH0758041A (ja) * 1993-08-20 1995-03-03 Toshiba Ceramics Co Ltd サセプタ
JPH10321543A (ja) * 1997-05-20 1998-12-04 Sumitomo Metal Ind Ltd ウェハ支持体及び縦型ボート
JPH11176710A (ja) * 1997-12-11 1999-07-02 Asahi Glass Co Ltd 半導体製造装置用部材
JP2002503884A (ja) * 1998-02-11 2002-02-05 アプライド マテリアルズ インコーポレイテッド 熱処理チャンバ用基板支持体

Family Cites Families (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT219865B (de) * 1960-05-17 1962-02-26 Plansee Metallwerk Suszeptor aus hochschmelzenden Metallen für Induktionsöfen und Verfahren zu dessen Herstellung
US3972704A (en) * 1971-04-19 1976-08-03 Sherwood Refractories, Inc. Apparatus for making vitreous silica receptacles
US4322592A (en) * 1980-08-22 1982-03-30 Rca Corporation Susceptor for heating semiconductor substrates
US4468259A (en) * 1981-12-04 1984-08-28 Ushio Denki Kabushiki Kaisha Uniform wafer heating by controlling light source and circumferential heating of wafer
US4499147A (en) * 1981-12-28 1985-02-12 Ibiden Co., Ltd. Silicon carbide substrates and a method of producing the same
US4407654A (en) * 1982-01-21 1983-10-04 The Potters Supply Company Handling and support system for kiln fired ware
US4770590A (en) * 1986-05-16 1988-09-13 Silicon Valley Group, Inc. Method and apparatus for transferring wafers between cassettes and a boat
US4772498A (en) * 1986-11-20 1988-09-20 Air Products And Chemicals, Inc. Silicon carbide capillaries
JPH0617295Y2 (ja) * 1987-11-27 1994-05-02 大日本スクリーン製造株式会社 基板受け渡し装置
US4978567A (en) * 1988-03-31 1990-12-18 Materials Technology Corporation, Subsidiary Of The Carbon/Graphite Group, Inc. Wafer holding fixture for chemical reaction processes in rapid thermal processing equipment and method for making same
US4900214A (en) * 1988-05-25 1990-02-13 American Telephone And Telegraph Company Method and apparatus for transporting semiconductor wafers
JP2683675B2 (ja) * 1989-01-26 1997-12-03 東京エレクトロン株式会社 搬送装置
US5110248A (en) * 1989-07-17 1992-05-05 Tokyo Electron Sagami Limited Vertical heat-treatment apparatus having a wafer transfer mechanism
US5162047A (en) * 1989-08-28 1992-11-10 Tokyo Electron Sagami Limited Vertical heat treatment apparatus having wafer transfer mechanism and method for transferring wafers
KR0153250B1 (ko) * 1990-06-28 1998-12-01 카자마 겐쥬 종형 열처리 장치
US5310339A (en) * 1990-09-26 1994-05-10 Tokyo Electron Limited Heat treatment apparatus having a wafer boat
US5192371A (en) * 1991-05-21 1993-03-09 Asm Japan K.K. Substrate supporting apparatus for a CVD apparatus
JPH05102056A (ja) * 1991-10-11 1993-04-23 Rohm Co Ltd ウエハー支持具
JP3234617B2 (ja) * 1991-12-16 2001-12-04 東京エレクトロン株式会社 熱処理装置用基板支持具
NL9200446A (nl) * 1992-03-10 1993-10-01 Tempress B V Inrichting voor het behandelen van microschakeling-schijven (wafers).
JP3100252B2 (ja) * 1992-05-26 2000-10-16 東京エレクトロン株式会社 被処理体用ボート及びそれを用いた被処理体の移し換え方法ならびに熱処理装置
US5492229A (en) * 1992-11-27 1996-02-20 Toshiba Ceramics Co., Ltd. Vertical boat and a method for making the same
JP3348936B2 (ja) * 1993-10-21 2002-11-20 東京エレクトロン株式会社 縦型熱処理装置
JP3125199B2 (ja) * 1993-03-18 2001-01-15 東京エレクトロン株式会社 縦型熱処理装置
EP0634787B1 (en) * 1993-07-15 1997-05-02 Applied Materials, Inc. Subsrate tray and ceramic blade for semiconductor processing apparatus
US5556275A (en) * 1993-09-30 1996-09-17 Tokyo Electron Limited Heat treatment apparatus
US5565034A (en) * 1993-10-29 1996-10-15 Tokyo Electron Limited Apparatus for processing substrates having a film formed on a surface of the substrate
US5663558A (en) * 1994-07-07 1997-09-02 Brother Kogyo Kabushiki Kaisha Optical beam scanning unit with slit for producing horizontal synchronizing signal
JP4079992B2 (ja) * 1994-10-17 2008-04-23 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド 導電性被処理体を載置部材に締め付けるための装置及び静電クランピング方法
CN1079577C (zh) * 1995-05-05 2002-02-20 圣戈本陶瓷及塑料股份有限公司 半导体晶圆片用的竖直支架
JP3504784B2 (ja) * 1995-09-07 2004-03-08 東京エレクトロン株式会社 熱処理方法
JPH0992625A (ja) * 1995-09-20 1997-04-04 Tokyo Electron Ltd 熱処理用ボ−ト
SE9503426D0 (sv) * 1995-10-04 1995-10-04 Abb Research Ltd A device for heat treatment of objects and a method for producing a susceptor
WO1997017728A1 (en) * 1995-11-06 1997-05-15 Tokyo Electron Limited Transfer device, transfer method, processing device, and processing method
US6111225A (en) * 1996-02-23 2000-08-29 Tokyo Electron Limited Wafer processing apparatus with a processing vessel, upper and lower separately sealed heating vessels, and means for maintaining the vessels at predetermined pressures
SE9600705D0 (sv) * 1996-02-26 1996-02-26 Abb Research Ltd A susceptor for a device for epitaxially growing objects and such a device
EP0884769A1 (en) * 1996-02-29 1998-12-16 Tokyo Electron Limited Heat-treating boat for semiconductor wafer
JPH09306980A (ja) * 1996-05-17 1997-11-28 Asahi Glass Co Ltd 縦型ウエハボート
US5879311A (en) * 1996-05-17 1999-03-09 Mercury Diagnostics, Inc. Body fluid sampling device and methods of use
US5800623A (en) * 1996-07-18 1998-09-01 Accord Seg, Inc. Semiconductor wafer support platform
NL1005410C2 (nl) * 1997-02-28 1998-08-31 Advanced Semiconductor Mat Stelsel voor het laden, behandelen en ontladen van op een drager aangebrachte substraten.
US6022587A (en) * 1997-05-13 2000-02-08 Applied Materials, Inc. Method and apparatus for improving film deposition uniformity on a substrate
US6321680B2 (en) * 1997-08-11 2001-11-27 Torrex Equipment Corporation Vertical plasma enhanced process apparatus and method
US6068441A (en) * 1997-11-21 2000-05-30 Asm America, Inc. Substrate transfer system for semiconductor processing equipment
JPH11176822A (ja) * 1997-12-05 1999-07-02 Hitachi Ltd 半導体処理装置
US6204194B1 (en) * 1998-01-16 2001-03-20 F.T.L. Co., Ltd. Method and apparatus for producing a semiconductor device
US5931666A (en) * 1998-02-27 1999-08-03 Saint-Gobain Industrial Ceramics, Inc. Slip free vertical rack design having rounded horizontal arms
US6203617B1 (en) * 1998-03-26 2001-03-20 Tokyo Electron Limited Conveying unit and substrate processing unit
KR20000002833A (ko) * 1998-06-23 2000-01-15 윤종용 반도체 웨이퍼 보트
US6033952A (en) * 1998-11-30 2000-03-07 Mitsubishi Denki Kabushiki Kaisha Method of manufacturing a semiconductor device
JP4255091B2 (ja) * 1999-04-07 2009-04-15 株式会社日立国際電気 半導体製造方法
US6099645A (en) * 1999-07-09 2000-08-08 Union Oil Company Of California Vertical semiconductor wafer carrier with slats
TWI250604B (en) * 1999-07-29 2006-03-01 Ibm Improved ladder boat for supporting wafers
JP2001118664A (ja) * 1999-08-09 2001-04-27 Ibiden Co Ltd セラミックヒータ
US6296716B1 (en) * 1999-10-01 2001-10-02 Saint-Gobain Ceramics And Plastics, Inc. Process for cleaning ceramic articles
JP2001176808A (ja) * 1999-12-21 2001-06-29 Toshiba Ceramics Co Ltd 気相薄膜成長装置におけるウエハ搬送方法およびそれに用いるウエハ支持部材
US6939821B2 (en) * 2000-02-24 2005-09-06 Shipley Company, L.L.C. Low resistivity silicon carbide
US6341935B1 (en) * 2000-06-14 2002-01-29 Taiwan Semiconductor Manufacturing Company, Ltd. Wafer boat having improved wafer holding capability
WO2002019400A1 (en) * 2000-08-30 2002-03-07 Ibiden Co., Ltd. Ceramic heater for semiconductor manufacturing and inspecting equipment
US6464445B2 (en) * 2000-12-19 2002-10-15 Infineon Technologies Richmond, Lp System and method for improved throughput of semiconductor wafer processing
TWI272689B (en) * 2001-02-16 2007-02-01 Tokyo Electron Ltd Method and apparatus for transferring heat from a substrate to a chuck
US6896968B2 (en) * 2001-04-06 2005-05-24 Honeywell International Inc. Coatings and method for protecting carbon-containing components from oxidation
US6896738B2 (en) * 2001-10-30 2005-05-24 Cree, Inc. Induction heating devices and methods for controllably heating an article
US6835039B2 (en) * 2002-03-15 2004-12-28 Asm International N.V. Method and apparatus for batch processing of wafers in a furnace
US6582221B1 (en) * 2002-07-19 2003-06-24 Asm International N.V. Wafer boat and method for treatment of substrates
US7256375B2 (en) * 2002-08-30 2007-08-14 Asm International N.V. Susceptor plate for high temperature heat treatment
KR100840705B1 (ko) * 2004-04-21 2008-06-24 가부시키가이샤 히다치 고쿠사이 덴키 열처리장치

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0745534A (ja) * 1993-07-30 1995-02-14 Sony Corp 縦型ｃｖｄ装置
JPH0758041A (ja) * 1993-08-20 1995-03-03 Toshiba Ceramics Co Ltd サセプタ
JPH10321543A (ja) * 1997-05-20 1998-12-04 Sumitomo Metal Ind Ltd ウェハ支持体及び縦型ボート
JPH11176710A (ja) * 1997-12-11 1999-07-02 Asahi Glass Co Ltd 半導体製造装置用部材
JP2002503884A (ja) * 1998-02-11 2002-02-05 アプライド マテリアルズ インコーポレイテッド 熱処理チャンバ用基板支持体

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008277781A (ja) * 2007-03-30 2008-11-13 Covalent Materials Corp 縦型ウエハボート

Also Published As

Publication number Publication date
US20060060145A1 (en) 2006-03-23
EP1638135A2 (en) 2006-03-22
EP1965412A1 (en) 2008-09-03
EP1638135A3 (en) 2008-03-19
US20080124470A1 (en) 2008-05-29

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