JP2006032788A - 露光装置及び半導体デバイスの製造方法 - Google Patents

露光装置及び半導体デバイスの製造方法 Download PDF

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Publication number
JP2006032788A
JP2006032788A JP2004211961A JP2004211961A JP2006032788A JP 2006032788 A JP2006032788 A JP 2006032788A JP 2004211961 A JP2004211961 A JP 2004211961A JP 2004211961 A JP2004211961 A JP 2004211961A JP 2006032788 A JP2006032788 A JP 2006032788A
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JP
Japan
Prior art keywords
surface plate
stage device
stage
exposure apparatus
counter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004211961A
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English (en)
Japanese (ja)
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JP2006032788A5 (enExample
Inventor
Takehiko Mayama
武彦 間山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004211961A priority Critical patent/JP2006032788A/ja
Priority to EP05015330A priority patent/EP1619407A1/en
Priority to US11/182,010 priority patent/US20060017908A1/en
Priority to KR1020050065740A priority patent/KR100662662B1/ko
Publication of JP2006032788A publication Critical patent/JP2006032788A/ja
Publication of JP2006032788A5 publication Critical patent/JP2006032788A5/ja
Withdrawn legal-status Critical Current

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F7/00—Vibration-dampers; Shock-absorbers
    • F16F7/10—Vibration-dampers; Shock-absorbers using inertia effect
    • F16F7/1005—Vibration-dampers; Shock-absorbers using inertia effect characterised by active control of the mass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Acoustics & Sound (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2004211961A 2004-07-20 2004-07-20 露光装置及び半導体デバイスの製造方法 Withdrawn JP2006032788A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004211961A JP2006032788A (ja) 2004-07-20 2004-07-20 露光装置及び半導体デバイスの製造方法
EP05015330A EP1619407A1 (en) 2004-07-20 2005-07-14 Exposure apparatus and semiconductor device manufacturing method
US11/182,010 US20060017908A1 (en) 2004-07-20 2005-07-15 Exposure apparatus and semiconductor device manufacturing method
KR1020050065740A KR100662662B1 (ko) 2004-07-20 2005-07-20 노광장치 및 반도체 디바이스의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004211961A JP2006032788A (ja) 2004-07-20 2004-07-20 露光装置及び半導体デバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2006032788A true JP2006032788A (ja) 2006-02-02
JP2006032788A5 JP2006032788A5 (enExample) 2007-09-06

Family

ID=35116127

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004211961A Withdrawn JP2006032788A (ja) 2004-07-20 2004-07-20 露光装置及び半導体デバイスの製造方法

Country Status (4)

Country Link
US (1) US20060017908A1 (enExample)
EP (1) EP1619407A1 (enExample)
JP (1) JP2006032788A (enExample)
KR (1) KR100662662B1 (enExample)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007273633A (ja) * 2006-03-30 2007-10-18 Canon Inc ステージ装置及びその制御方法、露光装置及びデバイス製造方法
JP2009152597A (ja) * 2007-12-19 2009-07-09 Asml Netherlands Bv リソグラフィ装置
WO2009110202A1 (ja) * 2008-03-07 2009-09-11 株式会社ニコン 移動体装置及び露光装置
JP2010204878A (ja) * 2009-03-03 2010-09-16 Fuji Mach Mfg Co Ltd 位置決め制御系の外乱非干渉化補償装置
JP2010217032A (ja) * 2009-03-17 2010-09-30 Hitachi High-Technologies Corp ステージ装置
WO2014208634A1 (ja) * 2013-06-28 2014-12-31 株式会社ニコン 移動体装置及び露光装置、並びにデバイス製造方法
TWI485028B (zh) * 2009-04-28 2015-05-21 Sumitomo Heavy Industries Reaction force handling mechanism
JP2017534895A (ja) * 2014-09-02 2017-11-24 エーエスエムエル ネザーランズ ビー．ブイ． センサ、オブジェクト位置決めシステム、リソグラフィ装置、及びデバイス製造方法
JP2022520752A (ja) * 2019-02-04 2022-04-01 エーエスエムエル ネザーランズ ビー．ブイ． 電子システム、加速度計、較正方法、リソグラフィ装置、デバイス製造方法
JP2023004875A (ja) * 2021-06-25 2023-01-17 日立金属株式会社 制御システム、姿勢調整装置及び制御方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7366642B2 (en) * 2005-04-26 2008-04-29 Nikon Corporation Minimum force output control method for counter-mass with cable
US7898204B2 (en) * 2007-01-05 2011-03-01 Active Precision, Inc. High-speed substrate manipulator
US7782446B2 (en) * 2007-03-01 2010-08-24 Asml Netherlands B.V. Stage system and lithographic apparatus comprising such stage system
NL2002920A1 (nl) * 2008-05-29 2009-12-01 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
US8735774B2 (en) * 2009-03-27 2014-05-27 Electro Scientific Industries, Inc. Force reaction compensation system
JP5789153B2 (ja) * 2011-08-15 2015-10-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP2014220265A (ja) * 2013-04-30 2014-11-20 キヤノン株式会社 ステージ装置、リソグラフィ装置、および物品の製造方法
DE102014204523A1 (de) * 2014-03-12 2015-09-17 Carl Zeiss Smt Gmbh Schwingungskompensiertes optisches system, lithographieanlage und verfahren
KR20180029145A (ko) 2016-09-09 2018-03-20 삼성전자주식회사 기판 처리 장치
CN110089209B (zh) * 2016-09-29 2022-03-29 安必昂公司 部件放置装置及其驱动方法
US11586231B2 (en) * 2017-01-11 2023-02-21 Mitsubishi Electric Corporation Reaction compensation device and fast steering mirror system
JP6556196B2 (ja) * 2017-07-27 2019-08-07 倉敷化工株式会社 アクティブ除振装置
CN112119240A (zh) * 2018-08-31 2020-12-22 松下知识产权经营株式会社 减振装置
DE102020110657B4 (de) 2020-04-20 2022-02-17 Additive Manufacturing in Motion GmbH Ruckentkopplung aktiver Linearantriebe
CN114810930B (zh) * 2022-07-01 2022-09-16 上海隐冠半导体技术有限公司 运动系统
CN115059730B (zh) * 2022-07-01 2023-09-26 上海隐冠半导体技术有限公司 运动系统

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10311364A (ja) 1997-05-09 1998-11-24 Canon Inc 能動的除振制振装置
US6408045B1 (en) * 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same
JPH11189332A (ja) * 1997-12-26 1999-07-13 Canon Inc ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
JPH11294520A (ja) 1998-04-08 1999-10-29 Canon Inc 除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法
JP2002221249A (ja) * 2000-11-27 2002-08-09 Canon Inc 能動制振装置、その制御方法および能動制振装置を備えた露光装置
US20020080339A1 (en) * 2000-12-25 2002-06-27 Nikon Corporation Stage apparatus, vibration control method and exposure apparatus
US20020179806A1 (en) * 2001-05-30 2002-12-05 Ting-Chien Teng Adjustable force damper for passive vibration control
JP4109891B2 (ja) * 2002-04-19 2008-07-02 キヤノン株式会社 能動制振装置、露光装置及びデバイス製造方法

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007273633A (ja) * 2006-03-30 2007-10-18 Canon Inc ステージ装置及びその制御方法、露光装置及びデバイス製造方法
US9378722B2 (en) 2007-12-19 2016-06-28 Asml Netherlands B.V. Lithographic apparatus with actuator to compensate acoustic vibration
JP2009152597A (ja) * 2007-12-19 2009-07-09 Asml Netherlands Bv リソグラフィ装置
WO2009110202A1 (ja) * 2008-03-07 2009-09-11 株式会社ニコン 移動体装置及び露光装置
JP5505871B2 (ja) * 2008-03-07 2014-05-28 株式会社ニコン 移動体装置及び露光装置
US8891064B2 (en) 2008-03-07 2014-11-18 Nikon Corporation Moving body apparatus and exposure apparatus
JP2010204878A (ja) * 2009-03-03 2010-09-16 Fuji Mach Mfg Co Ltd 位置決め制御系の外乱非干渉化補償装置
JP2010217032A (ja) * 2009-03-17 2010-09-30 Hitachi High-Technologies Corp ステージ装置
TWI485028B (zh) * 2009-04-28 2015-05-21 Sumitomo Heavy Industries Reaction force handling mechanism
JPWO2014208634A1 (ja) * 2013-06-28 2017-02-23 株式会社ニコン 移動体装置及び露光装置、並びにデバイス製造方法
WO2014208634A1 (ja) * 2013-06-28 2014-12-31 株式会社ニコン 移動体装置及び露光装置、並びにデバイス製造方法
US10048598B2 (en) 2013-06-28 2018-08-14 Nikon Corporation Movable body apparatus, exposure apparatus, and device manufacturing method
US10353300B2 (en) 2013-06-28 2019-07-16 Nikon Corporation Movable body apparatus, exposure apparatus, and device manufacturing method
US10788760B2 (en) 2013-06-28 2020-09-29 Nikon Corporation Movable body apparatus, exposure apparatus, and device manufacturing method
US11181832B2 (en) 2013-06-28 2021-11-23 Nikon Corporation Movable body apparatus, exposure apparatus, and device manufacturing method
JP2017534895A (ja) * 2014-09-02 2017-11-24 エーエスエムエル ネザーランズ ビー．ブイ． センサ、オブジェクト位置決めシステム、リソグラフィ装置、及びデバイス製造方法
US10061213B2 (en) 2014-09-02 2018-08-28 Asml Netherlands B.V. Sensor, object positioning system, lithographic apparatus and device manufacturing method
JP2022520752A (ja) * 2019-02-04 2022-04-01 エーエスエムエル ネザーランズ ビー．ブイ． 電子システム、加速度計、較正方法、リソグラフィ装置、デバイス製造方法
US11561479B2 (en) 2019-02-04 2023-01-24 Asml Netherlands B.V. Electronic system, accelerometer, calibration method, lithographic apparatus and device manufacturing method
JP7248806B2 (ja) 2019-02-04 2023-03-29 エーエスエムエル ネザーランズ ビー．ブイ． 電子システム、加速度計、較正方法、リソグラフィ装置、デバイス製造方法
JP2023004875A (ja) * 2021-06-25 2023-01-17 日立金属株式会社 制御システム、姿勢調整装置及び制御方法

Also Published As

Publication number Publication date
US20060017908A1 (en) 2006-01-26
KR100662662B1 (ko) 2007-01-02
EP1619407A1 (en) 2006-01-25
KR20060053939A (ko) 2006-05-22

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