JP2006032788A5 - - Google Patents
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- Publication number
- JP2006032788A5 JP2006032788A5 JP2004211961A JP2004211961A JP2006032788A5 JP 2006032788 A5 JP2006032788 A5 JP 2006032788A5 JP 2004211961 A JP2004211961 A JP 2004211961A JP 2004211961 A JP2004211961 A JP 2004211961A JP 2006032788 A5 JP2006032788 A5 JP 2006032788A5
- Authority
- JP
- Japan
- Prior art keywords
- exposure apparatus
- surface plate
- counter mass
- stage device
- sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000005484 gravity Effects 0.000 claims 6
- 230000001133 acceleration Effects 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 238000001514 detection method Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 claims 1
- 238000006073 displacement reaction Methods 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004211961A JP2006032788A (ja) | 2004-07-20 | 2004-07-20 | 露光装置及び半導体デバイスの製造方法 |
| EP05015330A EP1619407A1 (en) | 2004-07-20 | 2005-07-14 | Exposure apparatus and semiconductor device manufacturing method |
| US11/182,010 US20060017908A1 (en) | 2004-07-20 | 2005-07-15 | Exposure apparatus and semiconductor device manufacturing method |
| KR1020050065740A KR100662662B1 (ko) | 2004-07-20 | 2005-07-20 | 노광장치 및 반도체 디바이스의 제조방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004211961A JP2006032788A (ja) | 2004-07-20 | 2004-07-20 | 露光装置及び半導体デバイスの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006032788A JP2006032788A (ja) | 2006-02-02 |
| JP2006032788A5 true JP2006032788A5 (enExample) | 2007-09-06 |
Family
ID=35116127
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004211961A Withdrawn JP2006032788A (ja) | 2004-07-20 | 2004-07-20 | 露光装置及び半導体デバイスの製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20060017908A1 (enExample) |
| EP (1) | EP1619407A1 (enExample) |
| JP (1) | JP2006032788A (enExample) |
| KR (1) | KR100662662B1 (enExample) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7366642B2 (en) * | 2005-04-26 | 2008-04-29 | Nikon Corporation | Minimum force output control method for counter-mass with cable |
| JP4834439B2 (ja) * | 2006-03-30 | 2011-12-14 | キヤノン株式会社 | ステージ装置及びその制御方法、露光装置及びデバイス製造方法 |
| US7898204B2 (en) * | 2007-01-05 | 2011-03-01 | Active Precision, Inc. | High-speed substrate manipulator |
| US7782446B2 (en) * | 2007-03-01 | 2010-08-24 | Asml Netherlands B.V. | Stage system and lithographic apparatus comprising such stage system |
| NL1036290A1 (nl) | 2007-12-19 | 2009-06-22 | Asml Netherlands Bv | Lithographic apparatus. |
| KR101584827B1 (ko) * | 2008-03-07 | 2016-01-13 | 가부시키가이샤 니콘 | 이동체 장치 및 노광 장치 |
| NL2002920A1 (nl) * | 2008-05-29 | 2009-12-01 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
| JP5382777B2 (ja) * | 2009-03-03 | 2014-01-08 | 富士機械製造株式会社 | 位置決め制御系の外乱非干渉化補償装置 |
| JP5090392B2 (ja) * | 2009-03-17 | 2012-12-05 | 株式会社日立ハイテクノロジーズ | ステージ装置 |
| US8735774B2 (en) * | 2009-03-27 | 2014-05-27 | Electro Scientific Industries, Inc. | Force reaction compensation system |
| JP5295855B2 (ja) * | 2009-04-28 | 2013-09-18 | 住友重機械工業株式会社 | 反力処理機構 |
| JP5789153B2 (ja) * | 2011-08-15 | 2015-10-07 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
| JP2014220265A (ja) * | 2013-04-30 | 2014-11-20 | キヤノン株式会社 | ステージ装置、リソグラフィ装置、および物品の製造方法 |
| EP3611572B1 (en) * | 2013-06-28 | 2023-04-05 | Nikon Corporation | Mobile body apparatus, exposure apparatus, and device manufacturing method |
| DE102014204523A1 (de) * | 2014-03-12 | 2015-09-17 | Carl Zeiss Smt Gmbh | Schwingungskompensiertes optisches system, lithographieanlage und verfahren |
| EP3189377B1 (en) | 2014-09-02 | 2018-05-16 | ASML Netherlands B.V. | Sensor, object positioning system, lithographic apparatus and device device manufacturing method |
| KR20180029145A (ko) | 2016-09-09 | 2018-03-20 | 삼성전자주식회사 | 기판 처리 장치 |
| CN110089209B (zh) * | 2016-09-29 | 2022-03-29 | 安必昂公司 | 部件放置装置及其驱动方法 |
| US11586231B2 (en) * | 2017-01-11 | 2023-02-21 | Mitsubishi Electric Corporation | Reaction compensation device and fast steering mirror system |
| JP6556196B2 (ja) * | 2017-07-27 | 2019-08-07 | 倉敷化工株式会社 | アクティブ除振装置 |
| CN112119240A (zh) * | 2018-08-31 | 2020-12-22 | 松下知识产权经营株式会社 | 减振装置 |
| NL2024599A (en) | 2019-02-04 | 2020-08-19 | Asml Netherlands Bv | Electronic system, accelerometer, calibration method, lithographic apparatus and device manufacturing method |
| DE102020110657B4 (de) | 2020-04-20 | 2022-02-17 | Additive Manufacturing in Motion GmbH | Ruckentkopplung aktiver Linearantriebe |
| JP2023004875A (ja) * | 2021-06-25 | 2023-01-17 | 日立金属株式会社 | 制御システム、姿勢調整装置及び制御方法 |
| CN114810930B (zh) * | 2022-07-01 | 2022-09-16 | 上海隐冠半导体技术有限公司 | 运动系统 |
| CN115059730B (zh) * | 2022-07-01 | 2023-09-26 | 上海隐冠半导体技术有限公司 | 运动系统 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10311364A (ja) | 1997-05-09 | 1998-11-24 | Canon Inc | 能動的除振制振装置 |
| US6408045B1 (en) * | 1997-11-11 | 2002-06-18 | Canon Kabushiki Kaisha | Stage system and exposure apparatus with the same |
| JPH11189332A (ja) * | 1997-12-26 | 1999-07-13 | Canon Inc | ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法 |
| JPH11294520A (ja) | 1998-04-08 | 1999-10-29 | Canon Inc | 除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法 |
| JP2002221249A (ja) * | 2000-11-27 | 2002-08-09 | Canon Inc | 能動制振装置、その制御方法および能動制振装置を備えた露光装置 |
| US20020080339A1 (en) * | 2000-12-25 | 2002-06-27 | Nikon Corporation | Stage apparatus, vibration control method and exposure apparatus |
| US20020179806A1 (en) * | 2001-05-30 | 2002-12-05 | Ting-Chien Teng | Adjustable force damper for passive vibration control |
| JP4109891B2 (ja) * | 2002-04-19 | 2008-07-02 | キヤノン株式会社 | 能動制振装置、露光装置及びデバイス製造方法 |
-
2004
- 2004-07-20 JP JP2004211961A patent/JP2006032788A/ja not_active Withdrawn
-
2005
- 2005-07-14 EP EP05015330A patent/EP1619407A1/en not_active Withdrawn
- 2005-07-15 US US11/182,010 patent/US20060017908A1/en not_active Abandoned
- 2005-07-20 KR KR1020050065740A patent/KR100662662B1/ko not_active Expired - Fee Related
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