KR100662662B1 - 노광장치 및 반도체 디바이스의 제조방법 - Google Patents

노광장치 및 반도체 디바이스의 제조방법 Download PDF

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Publication number
KR100662662B1
KR100662662B1 KR1020050065740A KR20050065740A KR100662662B1 KR 100662662 B1 KR100662662 B1 KR 100662662B1 KR 1020050065740 A KR1020050065740 A KR 1020050065740A KR 20050065740 A KR20050065740 A KR 20050065740A KR 100662662 B1 KR100662662 B1 KR 100662662B1
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KR
South Korea
Prior art keywords
stage
surface plate
counter mass
counter
mass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020050065740A
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English (en)
Korean (ko)
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KR20060053939A (ko
Inventor
다케히꼬 마야마
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20060053939A publication Critical patent/KR20060053939A/ko
Application granted granted Critical
Publication of KR100662662B1 publication Critical patent/KR100662662B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F7/00—Vibration-dampers; Shock-absorbers
    • F16F7/10—Vibration-dampers; Shock-absorbers using inertia effect
    • F16F7/1005—Vibration-dampers; Shock-absorbers using inertia effect characterised by active control of the mass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Acoustics & Sound (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020050065740A 2004-07-20 2005-07-20 노광장치 및 반도체 디바이스의 제조방법 Expired - Fee Related KR100662662B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00211961 2004-07-20
JP2004211961A JP2006032788A (ja) 2004-07-20 2004-07-20 露光装置及び半導体デバイスの製造方法

Publications (2)

Publication Number Publication Date
KR20060053939A KR20060053939A (ko) 2006-05-22
KR100662662B1 true KR100662662B1 (ko) 2007-01-02

Family

ID=35116127

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050065740A Expired - Fee Related KR100662662B1 (ko) 2004-07-20 2005-07-20 노광장치 및 반도체 디바이스의 제조방법

Country Status (4)

Country Link
US (1) US20060017908A1 (enExample)
EP (1) EP1619407A1 (enExample)
JP (1) JP2006032788A (enExample)
KR (1) KR100662662B1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190013593A (ko) * 2017-07-27 2019-02-11 구라시키 가코 가부시키가이샤 능동형 제진장치

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7366642B2 (en) * 2005-04-26 2008-04-29 Nikon Corporation Minimum force output control method for counter-mass with cable
JP4834439B2 (ja) * 2006-03-30 2011-12-14 キヤノン株式会社 ステージ装置及びその制御方法、露光装置及びデバイス製造方法
US7898204B2 (en) * 2007-01-05 2011-03-01 Active Precision, Inc. High-speed substrate manipulator
US7782446B2 (en) * 2007-03-01 2010-08-24 Asml Netherlands B.V. Stage system and lithographic apparatus comprising such stage system
NL1036290A1 (nl) 2007-12-19 2009-06-22 Asml Netherlands Bv Lithographic apparatus.
KR101584827B1 (ko) 2008-03-07 2016-01-13 가부시키가이샤 니콘 이동체 장치 및 노광 장치
US8773640B2 (en) * 2008-05-29 2014-07-08 Asml Netherlands B.V. Inspection method and apparatus
JP5382777B2 (ja) * 2009-03-03 2014-01-08 富士機械製造株式会社 位置決め制御系の外乱非干渉化補償装置
JP5090392B2 (ja) * 2009-03-17 2012-12-05 株式会社日立ハイテクノロジーズ ステージ装置
US8735774B2 (en) * 2009-03-27 2014-05-27 Electro Scientific Industries, Inc. Force reaction compensation system
JP5295855B2 (ja) * 2009-04-28 2013-09-18 住友重機械工業株式会社 反力処理機構
JP5789153B2 (ja) * 2011-08-15 2015-10-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP2014220265A (ja) * 2013-04-30 2014-11-20 キヤノン株式会社 ステージ装置、リソグラフィ装置、および物品の製造方法
CN105493237B (zh) * 2013-06-28 2021-07-09 株式会社尼康 移动体装置和曝光装置以及器件制造方法
DE102014204523A1 (de) 2014-03-12 2015-09-17 Carl Zeiss Smt Gmbh Schwingungskompensiertes optisches system, lithographieanlage und verfahren
EP3189377B1 (en) * 2014-09-02 2018-05-16 ASML Netherlands B.V. Sensor, object positioning system, lithographic apparatus and device device manufacturing method
KR20180029145A (ko) 2016-09-09 2018-03-20 삼성전자주식회사 기판 처리 장치
US10477747B2 (en) * 2016-09-29 2019-11-12 Assembléon B.V. Component placement device and method of driving the same
EP3570419B1 (en) * 2017-01-11 2021-01-20 Mitsubishi Electric Corporation Recoilless device and directivity control mirror system
US20210246962A1 (en) * 2018-08-31 2021-08-12 Panasonic Intellectual Property Management Co., Ltd. Damping device
JP7248806B2 (ja) * 2019-02-04 2023-03-29 エーエスエムエル ネザーランズ ビー．ブイ． 電子システム、加速度計、較正方法、リソグラフィ装置、デバイス製造方法
DE102020110657B4 (de) 2020-04-20 2022-02-17 Additive Manufacturing in Motion GmbH Ruckentkopplung aktiver Linearantriebe
JP2023004875A (ja) * 2021-06-25 2023-01-17 日立金属株式会社 制御システム、姿勢調整装置及び制御方法
CN115059730B (zh) * 2022-07-01 2023-09-26 上海隐冠半导体技术有限公司 运动系统
CN114810930B (zh) * 2022-07-01 2022-09-16 上海隐冠半导体技术有限公司 运动系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10311364A (ja) * 1997-05-09 1998-11-24 Canon Inc 能動的除振制振装置
JPH11294520A (ja) * 1998-04-08 1999-10-29 Canon Inc 除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法
JP2003314610A (ja) * 2002-04-19 2003-11-06 Canon Inc 能動制振装置、露光装置及びデバイス製造方法

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US6408045B1 (en) * 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same
JPH11189332A (ja) * 1997-12-26 1999-07-13 Canon Inc ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
JP2002221249A (ja) * 2000-11-27 2002-08-09 Canon Inc 能動制振装置、その制御方法および能動制振装置を備えた露光装置
US20020080339A1 (en) * 2000-12-25 2002-06-27 Nikon Corporation Stage apparatus, vibration control method and exposure apparatus
US20020179806A1 (en) * 2001-05-30 2002-12-05 Ting-Chien Teng Adjustable force damper for passive vibration control

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10311364A (ja) * 1997-05-09 1998-11-24 Canon Inc 能動的除振制振装置
JPH11294520A (ja) * 1998-04-08 1999-10-29 Canon Inc 除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法
JP2003314610A (ja) * 2002-04-19 2003-11-06 Canon Inc 能動制振装置、露光装置及びデバイス製造方法

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
10311364
11294520
15314610

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190013593A (ko) * 2017-07-27 2019-02-11 구라시키 가코 가부시키가이샤 능동형 제진장치
KR102142330B1 (ko) * 2017-07-27 2020-08-07 구라시키 가코 가부시키가이샤 능동형 제진장치

Also Published As

Publication number Publication date
EP1619407A1 (en) 2006-01-25
KR20060053939A (ko) 2006-05-22
US20060017908A1 (en) 2006-01-26
JP2006032788A (ja) 2006-02-02

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