JP2015212775A5 - - Google Patents

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Publication number
JP2015212775A5
JP2015212775A5 JP2014095510A JP2014095510A JP2015212775A5 JP 2015212775 A5 JP2015212775 A5 JP 2015212775A5 JP 2014095510 A JP2014095510 A JP 2014095510A JP 2014095510 A JP2014095510 A JP 2014095510A JP 2015212775 A5 JP2015212775 A5 JP 2015212775A5
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JP
Japan
Prior art keywords
mirror
base plate
optical device
unit
detection unit
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JP2014095510A
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English (en)
Japanese (ja)
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JP6371576B2 (ja
JP2015212775A (ja
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Priority claimed from JP2014095510A external-priority patent/JP6371576B2/ja
Priority to JP2014095510A priority Critical patent/JP6371576B2/ja
Priority to TW104112396A priority patent/TWI598654B/zh
Priority to KR1020150060192A priority patent/KR101885524B1/ko
Priority to US14/699,365 priority patent/US9678444B2/en
Priority to CN201510216833.6A priority patent/CN105045044B/zh
Publication of JP2015212775A publication Critical patent/JP2015212775A/ja
Publication of JP2015212775A5 publication Critical patent/JP2015212775A5/ja
Priority to KR1020180088320A priority patent/KR101913273B1/ko
Publication of JP6371576B2 publication Critical patent/JP6371576B2/ja
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JP2014095510A 2014-05-02 2014-05-02 光学装置、投影光学系、露光装置、および物品の製造方法 Active JP6371576B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2014095510A JP6371576B2 (ja) 2014-05-02 2014-05-02 光学装置、投影光学系、露光装置、および物品の製造方法
TW104112396A TWI598654B (zh) 2014-05-02 2015-04-17 光學裝置、投影光學系統、曝光裝置及製造物品的方法
KR1020150060192A KR101885524B1 (ko) 2014-05-02 2015-04-29 광학장치, 투영 광학계, 노광 장치, 및 물품의 제조 방법
US14/699,365 US9678444B2 (en) 2014-05-02 2015-04-29 Optical apparatus, projection optical system, exposure apparatus, and method of manufacturing article
CN201510216833.6A CN105045044B (zh) 2014-05-02 2015-04-30 光学装置、投影光学系统、曝光装置及物品的制造方法
KR1020180088320A KR101913273B1 (ko) 2014-05-02 2018-07-30 광학장치, 투영 광학계, 노광 장치, 및 물품의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014095510A JP6371576B2 (ja) 2014-05-02 2014-05-02 光学装置、投影光学系、露光装置、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015212775A JP2015212775A (ja) 2015-11-26
JP2015212775A5 true JP2015212775A5 (enExample) 2017-06-15
JP6371576B2 JP6371576B2 (ja) 2018-08-08

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ID=54355172

Family Applications (1)

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JP2014095510A Active JP6371576B2 (ja) 2014-05-02 2014-05-02 光学装置、投影光学系、露光装置、および物品の製造方法

Country Status (5)

Country Link
US (1) US9678444B2 (enExample)
JP (1) JP6371576B2 (enExample)
KR (2) KR101885524B1 (enExample)
CN (1) CN105045044B (enExample)
TW (1) TWI598654B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6866131B2 (ja) * 2016-01-27 2021-04-28 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
JP6748482B2 (ja) * 2016-05-25 2020-09-02 キヤノン株式会社 露光装置、および、物品の製造方法
JP2018013510A (ja) * 2016-07-19 2018-01-25 キヤノン株式会社 光学装置、リソグラフィ装置及び物品の製造方法
CN107797387A (zh) * 2016-08-30 2018-03-13 上海微电子装备（集团）股份有限公司 工件台运动控制方法
JP6853659B2 (ja) * 2016-12-09 2021-03-31 キヤノン株式会社 決定方法、光学装置、投影光学系、露光装置及び物品の製造方法
JP6875925B2 (ja) * 2017-05-09 2021-05-26 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品製造方法
CN110320756B (zh) * 2018-03-30 2020-09-22 上海微电子装备（集团）股份有限公司 运动控制装置、运动控制方法、掩模台系统和光刻机
CN111580359B (zh) * 2020-04-29 2021-06-18 中国科学院光电技术研究所 一种用于超分辨光刻精密掩模的智能校正装置控制系统
DE102022203255A1 (de) * 2022-04-01 2023-10-05 Carl Zeiss Smt Gmbh Ansteuervorrichtung, optisches system und lithographieanlage

Family Cites Families (20)

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Publication number Priority date Publication date Assignee Title
US5142132A (en) 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
JP2700728B2 (ja) * 1991-07-05 1998-01-21 特許機器株式会社 除振台のフィードフォワード制御方法
JPH09184536A (ja) * 1996-01-04 1997-07-15 Canon Inc 防振装置
EP1143492A4 (en) 1998-09-03 2004-06-02 Nikon Corp EXPOSURE APPARATUS AND METHOD, DEVICE AND METHOD FOR PRODUCING SAID APPARATUS
TW490598B (en) * 1999-11-30 2002-06-11 Asm Lithography Bv Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus
CN101546575B (zh) * 2001-01-30 2012-11-07 松下电器产业株式会社 备有可形变镜子的信息装置
US6840638B2 (en) 2002-07-03 2005-01-11 Nikon Corporation Deformable mirror with passive and active actuators
US6842277B2 (en) * 2002-07-23 2005-01-11 Nikon Corporation Deformable mirror with high-bandwidth servo for rigid body control
JP4327520B2 (ja) * 2003-07-04 2009-09-09 特許機器株式会社 アクティブ除振装置
US20050200984A1 (en) * 2004-03-12 2005-09-15 Browne Alan L. Active mirror assemblies
US8197076B2 (en) * 2006-05-11 2012-06-12 Massachusetts Institute Of Technology Magnetic membrane mirror
JP2008040299A (ja) 2006-08-09 2008-02-21 Funai Electric Co Ltd 形状可変ミラー及び形状可変ミラーの製造方法
US8908144B2 (en) * 2006-09-27 2014-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100587547C (zh) 2007-11-29 2010-02-03 上海交通大学 压电驱动的可变形反射镜及其制造方法
CN101504487A (zh) 2009-03-20 2009-08-12 中国科学院光电技术研究所 大口径可拆卸压电变形反射镜
JP2011096930A (ja) * 2009-10-30 2011-05-12 Nikon Corp 駆動装置、光学系、露光装置及びデバイスの製造方法
CN101923214A (zh) 2010-08-04 2010-12-22 中国科学院光电技术研究所 基于压电驱动器的变形次镜
EP2689427B1 (en) 2011-03-23 2017-05-03 Carl Zeiss SMT GmbH Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement
DE102011075393B4 (de) 2011-05-06 2013-08-14 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung eines Elementes in einer Projektionsbelichtungsanlage
JP5743838B2 (ja) 2011-10-13 2015-07-01 キヤノン株式会社 像ブレ補正装置、光学機器および像ブレ補正方法

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