KR101885524B1 - 광학장치, 투영 광학계, 노광 장치, 및 물품의 제조 방법 - Google Patents

광학장치, 투영 광학계, 노광 장치, 및 물품의 제조 방법 Download PDF

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KR101885524B1
KR101885524B1 KR1020150060192A KR20150060192A KR101885524B1 KR 101885524 B1 KR101885524 B1 KR 101885524B1 KR 1020150060192 A KR1020150060192 A KR 1020150060192A KR 20150060192 A KR20150060192 A KR 20150060192A KR 101885524 B1 KR101885524 B1 KR 101885524B1
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base plate
mirror
substrate
vibration
detection unit
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Korean (ko)
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KR20150126292A (ko
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카쓰미 아사다
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Control Of Position Or Direction (AREA)
KR1020150060192A 2014-05-02 2015-04-29 광학장치, 투영 광학계, 노광 장치, 및 물품의 제조 방법 Active KR101885524B1 (ko)

Applications Claiming Priority (2)

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JPJP-P-2014-095510 2014-05-02
JP2014095510A JP6371576B2 (ja) 2014-05-02 2014-05-02 光学装置、投影光学系、露光装置、および物品の製造方法

Related Child Applications (1)

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KR1020180088320A Division KR101913273B1 (ko) 2014-05-02 2018-07-30 광학장치, 투영 광학계, 노광 장치, 및 물품의 제조 방법

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KR20150126292A KR20150126292A (ko) 2015-11-11
KR101885524B1 true KR101885524B1 (ko) 2018-08-09

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KR1020180088320A Active KR101913273B1 (ko) 2014-05-02 2018-07-30 광학장치, 투영 광학계, 노광 장치, 및 물품의 제조 방법

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US (1) US9678444B2 (enExample)
JP (1) JP6371576B2 (enExample)
KR (2) KR101885524B1 (enExample)
CN (1) CN105045044B (enExample)
TW (1) TWI598654B (enExample)

Families Citing this family (9)

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Publication number Priority date Publication date Assignee Title
JP6866131B2 (ja) * 2016-01-27 2021-04-28 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
JP6748482B2 (ja) * 2016-05-25 2020-09-02 キヤノン株式会社 露光装置、および、物品の製造方法
JP2018013510A (ja) * 2016-07-19 2018-01-25 キヤノン株式会社 光学装置、リソグラフィ装置及び物品の製造方法
CN107797387A (zh) * 2016-08-30 2018-03-13 上海微电子装备（集团）股份有限公司 工件台运动控制方法
JP6853659B2 (ja) * 2016-12-09 2021-03-31 キヤノン株式会社 決定方法、光学装置、投影光学系、露光装置及び物品の製造方法
JP6875925B2 (ja) * 2017-05-09 2021-05-26 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品製造方法
CN110320756B (zh) * 2018-03-30 2020-09-22 上海微电子装备（集团）股份有限公司 运动控制装置、运动控制方法、掩模台系统和光刻机
CN111580359B (zh) * 2020-04-29 2021-06-18 中国科学院光电技术研究所 一种用于超分辨光刻精密掩模的智能校正装置控制系统
DE102022203255A1 (de) * 2022-04-01 2023-10-05 Carl Zeiss Smt Gmbh Ansteuervorrichtung, optisches system und lithographieanlage

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100697569B1 (ko) 1998-09-03 2007-03-21 가부시키가이샤 니콘 노광장치 및 노광방법, 그리고 디바이스 및 그의 제조방법
KR100863850B1 (ko) 2001-01-30 2008-10-15 마츠시타 덴끼 산교 가부시키가이샤 가변형 미러와 당해 가변형 미러를 구비한 정보 장치 및 보상 광학 장치
US20100027143A1 (en) * 2006-05-11 2010-02-04 Massachusetts Institute Of Technology Magnetic membrane mirror

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5142132A (en) 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
JP2700728B2 (ja) * 1991-07-05 1998-01-21 特許機器株式会社 除振台のフィードフォワード制御方法
JPH09184536A (ja) * 1996-01-04 1997-07-15 Canon Inc 防振装置
TW490598B (en) * 1999-11-30 2002-06-11 Asm Lithography Bv Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus
US6840638B2 (en) * 2002-07-03 2005-01-11 Nikon Corporation Deformable mirror with passive and active actuators
US6842277B2 (en) * 2002-07-23 2005-01-11 Nikon Corporation Deformable mirror with high-bandwidth servo for rigid body control
JP4327520B2 (ja) * 2003-07-04 2009-09-09 特許機器株式会社 アクティブ除振装置
US20050200984A1 (en) * 2004-03-12 2005-09-15 Browne Alan L. Active mirror assemblies
JP2008040299A (ja) 2006-08-09 2008-02-21 Funai Electric Co Ltd 形状可変ミラー及び形状可変ミラーの製造方法
US8908144B2 (en) * 2006-09-27 2014-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100587547C (zh) 2007-11-29 2010-02-03 上海交通大学 压电驱动的可变形反射镜及其制造方法
CN101504487A (zh) 2009-03-20 2009-08-12 中国科学院光电技术研究所 大口径可拆卸压电变形反射镜
JP2011096930A (ja) * 2009-10-30 2011-05-12 Nikon Corp 駆動装置、光学系、露光装置及びデバイスの製造方法
CN101923214A (zh) 2010-08-04 2010-12-22 中国科学院光电技术研究所 基于压电驱动器的变形次镜
CN103443863B (zh) 2011-03-23 2017-03-08 卡尔蔡司Smt有限责任公司 Euv反射镜布置、包括euv反射镜布置的光学系统以及操作包括euv反射镜布置的光学系统的方法
DE102011075393B4 (de) 2011-05-06 2013-08-14 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung eines Elementes in einer Projektionsbelichtungsanlage
JP5743838B2 (ja) 2011-10-13 2015-07-01 キヤノン株式会社 像ブレ補正装置、光学機器および像ブレ補正方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100697569B1 (ko) 1998-09-03 2007-03-21 가부시키가이샤 니콘 노광장치 및 노광방법, 그리고 디바이스 및 그의 제조방법
KR100863850B1 (ko) 2001-01-30 2008-10-15 마츠시타 덴끼 산교 가부시키가이샤 가변형 미러와 당해 가변형 미러를 구비한 정보 장치 및 보상 광학 장치
US20100027143A1 (en) * 2006-05-11 2010-02-04 Massachusetts Institute Of Technology Magnetic membrane mirror

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US20150316852A1 (en) 2015-11-05
US9678444B2 (en) 2017-06-13
KR101913273B1 (ko) 2018-10-30
TWI598654B (zh) 2017-09-11
CN105045044B (zh) 2018-04-03
KR20180090765A (ko) 2018-08-13
JP2015212775A (ja) 2015-11-26
KR20150126292A (ko) 2015-11-11
CN105045044A (zh) 2015-11-11
TW201543102A (zh) 2015-11-16
JP6371576B2 (ja) 2018-08-08

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