CN105045044B - 光学装置、投影光学系统、曝光装置及物品的制造方法 - Google Patents

光学装置、投影光学系统、曝光装置及物品的制造方法 Download PDF

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Publication number
CN105045044B
CN105045044B CN201510216833.6A CN201510216833A CN105045044B CN 105045044 B CN105045044 B CN 105045044B CN 201510216833 A CN201510216833 A CN 201510216833A CN 105045044 B CN105045044 B CN 105045044B
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China
Prior art keywords
mirror
bottom plate
optical devices
vibration
actuator
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CN201510216833.6A
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English (en)
Chinese (zh)
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CN105045044A (zh
Inventor
浅田克己
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Canon Inc
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Canon Inc
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Control Of Position Or Direction (AREA)
CN201510216833.6A 2014-05-02 2015-04-30 光学装置、投影光学系统、曝光装置及物品的制造方法 Active CN105045044B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014095510A JP6371576B2 (ja) 2014-05-02 2014-05-02 光学装置、投影光学系、露光装置、および物品の製造方法
JP2014-095510 2014-05-02

Publications (2)

Publication Number Publication Date
CN105045044A CN105045044A (zh) 2015-11-11
CN105045044B true CN105045044B (zh) 2018-04-03

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CN201510216833.6A Active CN105045044B (zh) 2014-05-02 2015-04-30 光学装置、投影光学系统、曝光装置及物品的制造方法

Country Status (5)

Country Link
US (1) US9678444B2 (enExample)
JP (1) JP6371576B2 (enExample)
KR (2) KR101885524B1 (enExample)
CN (1) CN105045044B (enExample)
TW (1) TWI598654B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6866131B2 (ja) * 2016-01-27 2021-04-28 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
JP6748482B2 (ja) * 2016-05-25 2020-09-02 キヤノン株式会社 露光装置、および、物品の製造方法
JP2018013510A (ja) * 2016-07-19 2018-01-25 キヤノン株式会社 光学装置、リソグラフィ装置及び物品の製造方法
CN107797387A (zh) * 2016-08-30 2018-03-13 上海微电子装备（集团）股份有限公司 工件台运动控制方法
JP6853659B2 (ja) * 2016-12-09 2021-03-31 キヤノン株式会社 決定方法、光学装置、投影光学系、露光装置及び物品の製造方法
JP6875925B2 (ja) * 2017-05-09 2021-05-26 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品製造方法
CN110320756B (zh) * 2018-03-30 2020-09-22 上海微电子装备（集团）股份有限公司 运动控制装置、运动控制方法、掩模台系统和光刻机
CN111580359B (zh) * 2020-04-29 2021-06-18 中国科学院光电技术研究所 一种用于超分辨光刻精密掩模的智能校正装置控制系统
DE102022203255A1 (de) * 2022-04-01 2023-10-05 Carl Zeiss Smt Gmbh Ansteuervorrichtung, optisches system und lithographieanlage

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101122679A (zh) * 2006-08-09 2008-02-13 船井电机株式会社 可变形镜及该可变形镜的制造方法
CN101226274A (zh) * 2007-11-29 2008-07-23 上海交通大学 压电驱动的可变形反射镜及其制造方法
CN101504487A (zh) * 2009-03-20 2009-08-12 中国科学院光电技术研究所 大口径可拆卸压电变形反射镜
CN101923214A (zh) * 2010-08-04 2010-12-22 中国科学院光电技术研究所 基于压电驱动器的变形次镜
CN103502891A (zh) * 2011-05-06 2014-01-08 卡尔蔡司Smt有限责任公司 致动投射曝光设备中的元件的装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5142132A (en) 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
JP2700728B2 (ja) * 1991-07-05 1998-01-21 特許機器株式会社 除振台のフィードフォワード制御方法
JPH09184536A (ja) * 1996-01-04 1997-07-15 Canon Inc 防振装置
EP1143492A4 (en) 1998-09-03 2004-06-02 Nikon Corp EXPOSURE APPARATUS AND METHOD, DEVICE AND METHOD FOR PRODUCING SAID APPARATUS
TW490598B (en) * 1999-11-30 2002-06-11 Asm Lithography Bv Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus
CN101546575B (zh) * 2001-01-30 2012-11-07 松下电器产业株式会社 备有可形变镜子的信息装置
US6840638B2 (en) 2002-07-03 2005-01-11 Nikon Corporation Deformable mirror with passive and active actuators
US6842277B2 (en) * 2002-07-23 2005-01-11 Nikon Corporation Deformable mirror with high-bandwidth servo for rigid body control
JP4327520B2 (ja) * 2003-07-04 2009-09-09 特許機器株式会社 アクティブ除振装置
US20050200984A1 (en) * 2004-03-12 2005-09-15 Browne Alan L. Active mirror assemblies
US8197076B2 (en) * 2006-05-11 2012-06-12 Massachusetts Institute Of Technology Magnetic membrane mirror
US8908144B2 (en) * 2006-09-27 2014-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2011096930A (ja) * 2009-10-30 2011-05-12 Nikon Corp 駆動装置、光学系、露光装置及びデバイスの製造方法
EP2689427B1 (en) 2011-03-23 2017-05-03 Carl Zeiss SMT GmbH Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement
JP5743838B2 (ja) 2011-10-13 2015-07-01 キヤノン株式会社 像ブレ補正装置、光学機器および像ブレ補正方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101122679A (zh) * 2006-08-09 2008-02-13 船井电机株式会社 可变形镜及该可变形镜的制造方法
CN101226274A (zh) * 2007-11-29 2008-07-23 上海交通大学 压电驱动的可变形反射镜及其制造方法
CN101504487A (zh) * 2009-03-20 2009-08-12 中国科学院光电技术研究所 大口径可拆卸压电变形反射镜
CN101923214A (zh) * 2010-08-04 2010-12-22 中国科学院光电技术研究所 基于压电驱动器的变形次镜
CN103502891A (zh) * 2011-05-06 2014-01-08 卡尔蔡司Smt有限责任公司 致动投射曝光设备中的元件的装置

Also Published As

Publication number Publication date
JP6371576B2 (ja) 2018-08-08
KR20180090765A (ko) 2018-08-13
KR101885524B1 (ko) 2018-08-09
KR20150126292A (ko) 2015-11-11
KR101913273B1 (ko) 2018-10-30
US20150316852A1 (en) 2015-11-05
JP2015212775A (ja) 2015-11-26
TWI598654B (zh) 2017-09-11
TW201543102A (zh) 2015-11-16
US9678444B2 (en) 2017-06-13
CN105045044A (zh) 2015-11-11

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