JP6371576B2 - 光学装置、投影光学系、露光装置、および物品の製造方法 - Google Patents

光学装置、投影光学系、露光装置、および物品の製造方法 Download PDF

Info

Publication number
JP6371576B2
JP6371576B2 JP2014095510A JP2014095510A JP6371576B2 JP 6371576 B2 JP6371576 B2 JP 6371576B2 JP 2014095510 A JP2014095510 A JP 2014095510A JP 2014095510 A JP2014095510 A JP 2014095510A JP 6371576 B2 JP6371576 B2 JP 6371576B2
Authority
JP
Japan
Prior art keywords
mirror
base plate
optical device
actuator
vibration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014095510A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015212775A5 (enExample
JP2015212775A (ja
Inventor
克己 浅田
克己 浅田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2014095510A priority Critical patent/JP6371576B2/ja
Priority to TW104112396A priority patent/TWI598654B/zh
Priority to US14/699,365 priority patent/US9678444B2/en
Priority to KR1020150060192A priority patent/KR101885524B1/ko
Priority to CN201510216833.6A priority patent/CN105045044B/zh
Publication of JP2015212775A publication Critical patent/JP2015212775A/ja
Publication of JP2015212775A5 publication Critical patent/JP2015212775A5/ja
Priority to KR1020180088320A priority patent/KR101913273B1/ko
Application granted granted Critical
Publication of JP6371576B2 publication Critical patent/JP6371576B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Control Of Position Or Direction (AREA)
JP2014095510A 2014-05-02 2014-05-02 光学装置、投影光学系、露光装置、および物品の製造方法 Active JP6371576B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2014095510A JP6371576B2 (ja) 2014-05-02 2014-05-02 光学装置、投影光学系、露光装置、および物品の製造方法
TW104112396A TWI598654B (zh) 2014-05-02 2015-04-17 光學裝置、投影光學系統、曝光裝置及製造物品的方法
KR1020150060192A KR101885524B1 (ko) 2014-05-02 2015-04-29 광학장치, 투영 광학계, 노광 장치, 및 물품의 제조 방법
US14/699,365 US9678444B2 (en) 2014-05-02 2015-04-29 Optical apparatus, projection optical system, exposure apparatus, and method of manufacturing article
CN201510216833.6A CN105045044B (zh) 2014-05-02 2015-04-30 光学装置、投影光学系统、曝光装置及物品的制造方法
KR1020180088320A KR101913273B1 (ko) 2014-05-02 2018-07-30 광학장치, 투영 광학계, 노광 장치, 및 물품의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014095510A JP6371576B2 (ja) 2014-05-02 2014-05-02 光学装置、投影光学系、露光装置、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015212775A JP2015212775A (ja) 2015-11-26
JP2015212775A5 JP2015212775A5 (enExample) 2017-06-15
JP6371576B2 true JP6371576B2 (ja) 2018-08-08

Family

ID=54355172

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014095510A Active JP6371576B2 (ja) 2014-05-02 2014-05-02 光学装置、投影光学系、露光装置、および物品の製造方法

Country Status (5)

Country Link
US (1) US9678444B2 (enExample)
JP (1) JP6371576B2 (enExample)
KR (2) KR101885524B1 (enExample)
CN (1) CN105045044B (enExample)
TW (1) TWI598654B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6866131B2 (ja) * 2016-01-27 2021-04-28 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
JP6748482B2 (ja) * 2016-05-25 2020-09-02 キヤノン株式会社 露光装置、および、物品の製造方法
JP2018013510A (ja) * 2016-07-19 2018-01-25 キヤノン株式会社 光学装置、リソグラフィ装置及び物品の製造方法
CN107797387A (zh) * 2016-08-30 2018-03-13 上海微电子装备（集团）股份有限公司 工件台运动控制方法
JP6853659B2 (ja) * 2016-12-09 2021-03-31 キヤノン株式会社 決定方法、光学装置、投影光学系、露光装置及び物品の製造方法
JP6875925B2 (ja) * 2017-05-09 2021-05-26 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品製造方法
CN110320756B (zh) * 2018-03-30 2020-09-22 上海微电子装备（集团）股份有限公司 运动控制装置、运动控制方法、掩模台系统和光刻机
CN111580359B (zh) * 2020-04-29 2021-06-18 中国科学院光电技术研究所 一种用于超分辨光刻精密掩模的智能校正装置控制系统
DE102022203255A1 (de) * 2022-04-01 2023-10-05 Carl Zeiss Smt Gmbh Ansteuervorrichtung, optisches system und lithographieanlage

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5142132A (en) 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
JP2700728B2 (ja) * 1991-07-05 1998-01-21 特許機器株式会社 除振台のフィードフォワード制御方法
JPH09184536A (ja) * 1996-01-04 1997-07-15 Canon Inc 防振装置
EP1143492A4 (en) 1998-09-03 2004-06-02 Nikon Corp EXPOSURE APPARATUS AND METHOD, DEVICE AND METHOD FOR PRODUCING SAID APPARATUS
TW490598B (en) * 1999-11-30 2002-06-11 Asm Lithography Bv Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus
CN101546575B (zh) * 2001-01-30 2012-11-07 松下电器产业株式会社 备有可形变镜子的信息装置
US6840638B2 (en) 2002-07-03 2005-01-11 Nikon Corporation Deformable mirror with passive and active actuators
US6842277B2 (en) * 2002-07-23 2005-01-11 Nikon Corporation Deformable mirror with high-bandwidth servo for rigid body control
JP4327520B2 (ja) * 2003-07-04 2009-09-09 特許機器株式会社 アクティブ除振装置
US20050200984A1 (en) * 2004-03-12 2005-09-15 Browne Alan L. Active mirror assemblies
US8197076B2 (en) * 2006-05-11 2012-06-12 Massachusetts Institute Of Technology Magnetic membrane mirror
JP2008040299A (ja) 2006-08-09 2008-02-21 Funai Electric Co Ltd 形状可変ミラー及び形状可変ミラーの製造方法
US8908144B2 (en) * 2006-09-27 2014-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100587547C (zh) 2007-11-29 2010-02-03 上海交通大学 压电驱动的可变形反射镜及其制造方法
CN101504487A (zh) 2009-03-20 2009-08-12 中国科学院光电技术研究所 大口径可拆卸压电变形反射镜
JP2011096930A (ja) * 2009-10-30 2011-05-12 Nikon Corp 駆動装置、光学系、露光装置及びデバイスの製造方法
CN101923214A (zh) 2010-08-04 2010-12-22 中国科学院光电技术研究所 基于压电驱动器的变形次镜
EP2689427B1 (en) 2011-03-23 2017-05-03 Carl Zeiss SMT GmbH Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement
DE102011075393B4 (de) 2011-05-06 2013-08-14 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung eines Elementes in einer Projektionsbelichtungsanlage
JP5743838B2 (ja) 2011-10-13 2015-07-01 キヤノン株式会社 像ブレ補正装置、光学機器および像ブレ補正方法

Also Published As

Publication number Publication date
KR20180090765A (ko) 2018-08-13
KR101885524B1 (ko) 2018-08-09
KR20150126292A (ko) 2015-11-11
KR101913273B1 (ko) 2018-10-30
US20150316852A1 (en) 2015-11-05
JP2015212775A (ja) 2015-11-26
CN105045044B (zh) 2018-04-03
TWI598654B (zh) 2017-09-11
TW201543102A (zh) 2015-11-16
US9678444B2 (en) 2017-06-13
CN105045044A (zh) 2015-11-11

Similar Documents

Publication Publication Date Title
JP6371576B2 (ja) 光学装置、投影光学系、露光装置、および物品の製造方法
JP4756052B2 (ja) ステージシステムおよび該ステージシステムを備えたリソグラフィ装置
JP6336274B2 (ja) 光学装置、投影光学系、露光装置、および物品の製造方法
JP2013258283A (ja) 露光装置及びデバイス製造方法
JP6218459B2 (ja) 除振装置、除振方法、リソグラフィ装置及びデバイスの製造方法
TW201805734A (zh) 微影方法
US20200409274A1 (en) Position measurement system, interferometer system and lithographic apparatus
JP2016092366A (ja) 光学装置、投影光学系、露光装置、および物品の製造方法
JP7302035B2 (ja) ミラー較正方法、位置測定方法、リソグラフィ装置、及びデバイス製造方法
JPWO2005085671A1 (ja) 防振装置、露光装置、及び防振方法
JP2018066958A (ja) 光学装置、投影光学系、露光装置及び物品の製造方法
US11774865B2 (en) Method of controlling a position of a first object relative to a second object, control unit, lithographic apparatus and apparatus
JP2007192675A (ja) 干渉計測方法、装置及びそれを搭載した露光装置
CN114185249B (zh) 曝光装置以及物品的制造方法
US12140876B2 (en) Processing apparatus and article manufacturing method
JP7453790B2 (ja) 露光装置、および物品の製造方法
NL2024768A (en) Inspection apparatus, lithographic apparatus, measurement method
JP2018189850A (ja) 光学装置、投影光学系、露光装置、および物品製造方法
JP2021089361A (ja) ステージ駆動装置
JP2009065058A (ja) 駆動装置の設計方法、ステージ装置の設計方法、ステージ装置の製造方法、露光装置の製造方法、およびステージ装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170428

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20170428

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20180112

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180119

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180316

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180409

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180605

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20180615

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20180713

R151 Written notification of patent or utility model registration

Ref document number: 6371576

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151