JP2005531680A5 - - Google Patents

Download PDF

Info

Publication number
JP2005531680A5
JP2005531680A5 JP2004519232A JP2004519232A JP2005531680A5 JP 2005531680 A5 JP2005531680 A5 JP 2005531680A5 JP 2004519232 A JP2004519232 A JP 2004519232A JP 2004519232 A JP2004519232 A JP 2004519232A JP 2005531680 A5 JP2005531680 A5 JP 2005531680A5
Authority
JP
Japan
Prior art keywords
composition
cyclic
solvent
branched
structural formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004519232A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005531680A (ja
JP4623419B2 (ja
Filing date
Publication date
Priority claimed from US10/465,511 external-priority patent/US7022790B2/en
Application filed filed Critical
Publication of JP2005531680A publication Critical patent/JP2005531680A/ja
Publication of JP2005531680A5 publication Critical patent/JP2005531680A5/ja
Application granted granted Critical
Publication of JP4623419B2 publication Critical patent/JP4623419B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004519232A 2002-07-03 2003-07-02 多環式コポリマーに基づく感光性組成物 Expired - Fee Related JP4623419B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US39372602P 2002-07-03 2002-07-03
US10/465,511 US7022790B2 (en) 2002-07-03 2003-06-19 Photosensitive compositions based on polycyclic polymers
PCT/JP2003/008407 WO2004006020A1 (en) 2002-07-03 2003-07-02 Photosensitive compositions based on polycyclic polymers

Publications (3)

Publication Number Publication Date
JP2005531680A JP2005531680A (ja) 2005-10-20
JP2005531680A5 true JP2005531680A5 (https=) 2006-08-03
JP4623419B2 JP4623419B2 (ja) 2011-02-02

Family

ID=30118385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004519232A Expired - Fee Related JP4623419B2 (ja) 2002-07-03 2003-07-02 多環式コポリマーに基づく感光性組成物

Country Status (11)

Country Link
US (2) US7022790B2 (https=)
EP (1) EP1532486B1 (https=)
JP (1) JP4623419B2 (https=)
KR (1) KR100688632B1 (https=)
CN (2) CN102298265B (https=)
AT (1) ATE453135T1 (https=)
AU (1) AU2003243013A1 (https=)
DE (1) DE60330672D1 (https=)
MY (1) MY142759A (https=)
TW (2) TWI398459B (https=)
WO (1) WO2004006020A1 (https=)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060020068A1 (en) * 2004-07-07 2006-01-26 Edmund Elce Photosensitive compositions based on polycyclic polymers for low stress, high temperature films
US7022790B2 (en) * 2002-07-03 2006-04-04 Sumitomo Bakelite Company, Ltd. Photosensitive compositions based on polycyclic polymers
US7501230B2 (en) * 2002-11-04 2009-03-10 Meagley Robert P Photoactive adhesion promoter
US6893985B2 (en) * 2003-03-31 2005-05-17 Intel Corporation UV-activated dielectric layer
ATE450813T1 (de) * 2004-05-17 2009-12-15 Fujifilm Corp Verfahren zur erzeugung eines musters
JP4759311B2 (ja) * 2004-05-17 2011-08-31 富士フイルム株式会社 パターン形成方法
JP2006096812A (ja) * 2004-09-28 2006-04-13 Sumitomo Bakelite Co Ltd 半導体表面保護膜用樹脂組成物、及びそれを用いた半導体装置
JP2006100562A (ja) * 2004-09-29 2006-04-13 Sumitomo Bakelite Co Ltd 半導体装置
TW200628981A (en) * 2004-09-29 2006-08-16 Sumitomo Bakelite Co Semiconductor device
JP4556598B2 (ja) * 2004-09-30 2010-10-06 住友ベークライト株式会社 半導体装置
JP4170277B2 (ja) * 2004-09-30 2008-10-22 住友ベークライト株式会社 感光性樹脂組成物および半導体装置
JP2006098949A (ja) * 2004-09-30 2006-04-13 Sumitomo Bakelite Co Ltd 半導体装置
JP2006124648A (ja) * 2004-10-01 2006-05-18 Sumitomo Bakelite Co Ltd 樹脂組成物、樹脂層、樹脂層付きキャリア材料および回路基板
US20090008682A1 (en) * 2004-10-13 2009-01-08 Junya Kusunoki Light-Receiving Device
TW200619843A (en) * 2004-10-20 2006-06-16 Sumitomo Bakelite Co Semiconductor wafer and semiconductor device
KR100789247B1 (ko) 2005-01-05 2008-01-02 주식회사 엘지화학 광반응성 중합체 및 이의 제조 방법
KR100655801B1 (ko) 2005-01-18 2006-12-08 삼성전자주식회사 포토레지스트 조성물 및 이를 이용한 포토레지스트 패턴형성 방법
EP1788434B2 (en) * 2005-11-18 2019-01-02 Agfa Nv Method of making a lithographic printing plate
WO2008002066A1 (en) * 2006-06-26 2008-01-03 Lg Chem, Ltd. Method for preparing norbornene monomer composition, norbornene polymer prepared therefrom, optical film comprising the norbornene polymer, and method for preparing the norbornene polymer
JP5040432B2 (ja) * 2007-05-15 2012-10-03 住友ベークライト株式会社 感光性樹脂組成物
KR101451802B1 (ko) * 2007-07-31 2014-10-16 삼성에스디아이 주식회사 글리시딜 에테르계 화합물을 채용한 유기전해액 및 리튬전지
US7994238B2 (en) * 2007-09-04 2011-08-09 General Electric Company Article and associated method
US8039543B2 (en) * 2007-09-04 2011-10-18 General Electric Company Composition comprising a coupling agent and a cycloolefin, the coupling agent comprising a reaction product of an epoxy-substituted cycloolefin and an aromatic amine
US8039544B2 (en) * 2007-09-04 2011-10-18 General Electric Company Coupling agent comprising a reaction product of an epoxy-substituted cycloolefin and an aromatic amine
US7906568B2 (en) * 2007-09-04 2011-03-15 General Electric Company Coupling agent composition and associated method
PT2221666E (pt) 2007-11-12 2013-10-31 Hitachi Chemical Co Ltd Composição de resina fotossensível de tipo positivo, método para a produção de um padrão de revestimento fotossensível e dispositivo semicondutor
US7902279B2 (en) * 2007-12-04 2011-03-08 General Electric Company Composition, article, and associated method
US7879963B2 (en) * 2007-12-18 2011-02-01 General Electric Company Composition, article, and associated method
US8609574B2 (en) * 2008-04-25 2013-12-17 Promerus Llc In situ olefin polymerization catalyst system
CN102132212B (zh) 2008-09-04 2013-08-28 日立化成株式会社 正型感光性树脂组合物、抗蚀图形的制造方法以及电子部件
EP2372457B1 (en) 2008-12-26 2014-11-26 Hitachi Chemical Company, Ltd. Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device
JP5656413B2 (ja) * 2009-01-30 2015-01-21 富士フイルム株式会社 ネガ型レジストパターン形成方法、それに用いられる現像液及びネガ型化学増幅型レジスト組成物、並びにレジストパターン
JP4620174B2 (ja) * 2009-04-20 2011-01-26 旭化成イーマテリアルズ株式会社 感光性樹脂積層体
US8753790B2 (en) * 2009-07-01 2014-06-17 Promerus, Llc Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom
KR101238403B1 (ko) 2009-09-04 2013-02-28 주식회사 엘지화학 광 반응성기를 갖는 노보넨계 중합체를 포함하는 액정 배향용 조성물 및 이를 포함하는 광 배향 필름
US8580477B2 (en) * 2009-09-21 2013-11-12 Promerus Llc Aqueous base-developable negative-tone films based on functionalized norbornene polymers
CN104597712A (zh) * 2010-02-25 2015-05-06 日立化成工业株式会社 负型感光性树脂组合物、层间绝缘膜及其形成方法
CN102402137B (zh) * 2010-09-15 2014-04-09 无锡华润上华半导体有限公司 孔的光刻方法
US8829087B2 (en) * 2010-12-14 2014-09-09 Promerus, Llc Transparent layer forming polymer
CN103562796A (zh) * 2011-06-01 2014-02-05 日本瑞翁株式会社 树脂组合物及半导体元件基板
KR101364229B1 (ko) * 2012-12-20 2014-02-17 동우 화인켐 주식회사 감광성 수지 조성물 및 이로부터 제조되는 절연막
KR101825673B1 (ko) * 2013-08-21 2018-02-05 어플라이드 머티어리얼스, 인코포레이티드 반도체 박막 제조들에서의 가변 주파수 마이크로파(vfm) 프로세스들 및 애플리케이션들
WO2015085428A1 (en) * 2013-12-13 2015-06-18 Transfert Plus, Société En Commandite Insertion polynorbornene-based thermoset resins
JP6459192B2 (ja) * 2014-03-20 2019-01-30 住友ベークライト株式会社 感光性樹脂組成物
JPWO2015141525A1 (ja) * 2014-03-20 2017-04-06 住友ベークライト株式会社 感光性樹脂組成物、および電子装置
US10245562B2 (en) * 2014-08-15 2019-04-02 Promerus, Llc Pervaporation membranes derived from polycyclo-olefinic block copolymers
JP6550275B2 (ja) * 2015-06-15 2019-07-24 東京応化工業株式会社 ナノインプリント用組成物、硬化物、パターン形成方法及びパターンを含む物品
TWI705079B (zh) * 2016-06-14 2020-09-21 日商住友電木股份有限公司 負型光敏組成物
JP6558479B2 (ja) * 2018-07-18 2019-08-14 住友ベークライト株式会社 ポリマー、および感光性樹脂組成物
US12077627B2 (en) 2022-04-26 2024-09-03 Chevron Phillips Chemical Company Lp Aqueous methods for titanating a chromium/silica catalyst with an alkali metal
KR102515739B1 (ko) * 2022-12-07 2023-03-30 타코마테크놀러지 주식회사 감광성 수지 및 이를 포함하는 포토레지스트 조성물

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5468819A (en) 1993-11-16 1995-11-21 The B.F. Goodrich Company Process for making polymers containing a norbornene repeating unit by addition polymerization using an organo (nickel or palladium) complex
GB2288404B (en) 1994-03-14 1998-09-02 Nippon Zeon Co Composition of epoxy group-containing cycloolefin resin
JP3588498B2 (ja) 1994-03-14 2004-11-10 日本ゼオン株式会社 エポキシ基を有する環状オレフィン系樹脂組成物および該樹脂組成物を用いた絶縁材料
US6294616B1 (en) 1995-05-25 2001-09-25 B. F. Goodrich Company Blends and alloys of polycyclic polymers
US6232417B1 (en) 1996-03-07 2001-05-15 The B. F. Goodrich Company Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
WO1997033198A1 (en) * 1996-03-07 1997-09-12 The B.F. Goodrich Company Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
WO1998020394A1 (en) * 1996-11-04 1998-05-14 The B.F. Goodrich Company Photodefinable dielectric compositions
JP3971476B2 (ja) 1996-11-29 2007-09-05 日本ゼオン株式会社 エポキシ基含有ノルボルネン系付加型共重合体、その製造方法、及び架橋性重合体組成物
US5712407A (en) 1997-01-14 1998-01-27 Ppg Industries, Inc. Method for the preparation of alpha-chlorinated chloroformates
EP0997482B1 (en) * 1997-07-18 2007-01-17 Nippon Zeon Co., Ltd. Modified cycloolefin addition polymer and curable resin composition containing the same
US5879592A (en) 1997-12-10 1999-03-09 Ppg Industries, Inc. Water soluble photochromic compounds, compositions and optical elements comprising the compounds
ID27889A (id) * 1998-07-01 2001-05-03 Goodrich Co B F Komposisi-komposisi kopolimer polisiklik
EP1034196B1 (en) 1998-10-05 2005-01-12 Promerus LLC Catalyst and methods for polymerizing cycloolefins
DE19921913C2 (de) * 1999-05-12 2001-06-13 Groz Beckert Kg Nähmaschinennadel mit schlankem Öhr
US7022790B2 (en) 2002-07-03 2006-04-04 Sumitomo Bakelite Company, Ltd. Photosensitive compositions based on polycyclic polymers

Similar Documents

Publication Publication Date Title
JP2005531680A5 (https=)
TWI470007B (zh) A polymer compound containing an epoxy group, a photohardenable resin composition using the compound, a method for forming a pattern, and a method for protecting the electronic parts
CN102712741B (zh) 固化性的含有长链亚烷基的环氧树脂组合物
EP1532486B1 (en) Photosensitive compositions based on polycyclic polymers
JP6502754B2 (ja) 光硬化性樹脂組成物及びこれを用いた光硬化性ドライフィルム
KR102262719B1 (ko) 실리콘 골격 함유 고분자 화합물, 네가티브형 레지스트 재료, 광경화성 드라이 필름, 패턴 형성 방법 및 전기·전자 부품 보호용 피막
KR102629442B1 (ko) 에폭시계 반응성 희석제 및 이것을 포함하는 에폭시 수지 조성물
KR102605591B1 (ko) 실리콘 골격 함유 고분자 화합물, 감광성 수지 조성물, 감광성 수지 피막, 감광성 드라이 필름, 적층체, 및 패턴 형성 방법
JP2007522531A5 (https=)
KR102453575B1 (ko) 감광성 수지 조성물, 감광성 드라이 필름, 감광성 수지 피막, 및 패턴 형성 방법
JP2017002279A (ja) 半導体装置、積層型半導体装置、封止後積層型半導体装置、及びこれらの製造方法
KR102006028B1 (ko) 하지제, 블록 코폴리머를 함유하는 층의 패턴 형성 방법
KR102494437B1 (ko) 장쇄 알킬렌기함유 에폭시 수지 조성물
EP3043206B1 (en) Silicone skeleton-containing polymer compound, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, substrate, and semiconductor apparatus
KR101926076B1 (ko) 다관능 에폭시 화합물
KR101821643B1 (ko) 화학 증폭 포지티브형 레지스트 재료 및 패턴 형성 방법
KR101886060B1 (ko) 다관능 에폭시 화합물
JP4646439B2 (ja) 光重合性樹脂組成物、その硬化物および製造方法
JP2005321667A (ja) 微細パターン転写用原版の形成材料、転写用原版及びその作製方法
JPWO2008126499A1 (ja) ポリマー光導波路形成用材料、ポリマー光導波路、及びポリマー光導波路製造方法
TWI355560B (en) Photosensitive resin composition and pattern formi
KR102605592B1 (ko) 에폭시기 함유 이소시아누르산 변성 실리콘 수지, 감광성 수지 조성물, 감광성 드라이 필름, 적층체 및 패턴 형성 방법
JP2009294620A (ja) 感光性樹脂組成物、感光性樹脂積層体およびパターン形成方法
CN114127635B (zh) 感光性树脂组合物、感光性干膜、层叠体和图案形成方法
EP1532487A1 (en) Radiation-sensitive negative-type resist composition for pattern formation and pattern formation method