JP2007522531A5 - - Google Patents

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Publication number
JP2007522531A5
JP2007522531A5 JP2006553295A JP2006553295A JP2007522531A5 JP 2007522531 A5 JP2007522531 A5 JP 2007522531A5 JP 2006553295 A JP2006553295 A JP 2006553295A JP 2006553295 A JP2006553295 A JP 2006553295A JP 2007522531 A5 JP2007522531 A5 JP 2007522531A5
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JP
Japan
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cured product
process step
composition
photoresist
hardened
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JP2006553295A
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English (en)
Japanese (ja)
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JP2007522531A (ja
JP4691047B2 (ja
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Priority claimed from US11/054,651 external-priority patent/US20050260522A1/en
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Publication of JP2007522531A5 publication Critical patent/JP2007522531A5/ja
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Publication of JP4691047B2 publication Critical patent/JP4691047B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2006553295A 2004-02-13 2005-02-10 永久レジスト組成物、その硬化生成物、及びその使用 Expired - Lifetime JP4691047B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US54440304P 2004-02-13 2004-02-13
US60/544,403 2004-02-13
US11/054,651 US20050260522A1 (en) 2004-02-13 2005-02-09 Permanent resist composition, cured product thereof, and use thereof
US11/054,651 2005-02-09
PCT/US2005/004504 WO2005079330A2 (en) 2004-02-13 2005-02-10 Permanent resist composition, cured product thereof, and use thereof

Publications (3)

Publication Number Publication Date
JP2007522531A JP2007522531A (ja) 2007-08-09
JP2007522531A5 true JP2007522531A5 (https=) 2010-01-14
JP4691047B2 JP4691047B2 (ja) 2011-06-01

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JP2006553295A Expired - Lifetime JP4691047B2 (ja) 2004-02-13 2005-02-10 永久レジスト組成物、その硬化生成物、及びその使用

Country Status (8)

Country Link
US (1) US20050260522A1 (https=)
EP (1) EP1730592A4 (https=)
JP (1) JP4691047B2 (https=)
KR (1) KR20070007080A (https=)
CA (1) CA2555544A1 (https=)
IL (1) IL177325A0 (https=)
TW (1) TW200628540A (https=)
WO (1) WO2005079330A2 (https=)

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