WO2009041510A1 - 樹脂成形体の製造方法、その製造方法により得られる樹脂成形体、光デバイス、マイクロレンズ、マイクロレンズアレイ、及びマイクロ流体デバイス - Google Patents
樹脂成形体の製造方法、その製造方法により得られる樹脂成形体、光デバイス、マイクロレンズ、マイクロレンズアレイ、及びマイクロ流体デバイス Download PDFInfo
- Publication number
- WO2009041510A1 WO2009041510A1 PCT/JP2008/067310 JP2008067310W WO2009041510A1 WO 2009041510 A1 WO2009041510 A1 WO 2009041510A1 JP 2008067310 W JP2008067310 W JP 2008067310W WO 2009041510 A1 WO2009041510 A1 WO 2009041510A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- molded product
- resin molded
- resin composition
- photocurable resin
- microlens
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0888—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds
- B29C35/0894—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds provided with masks or diaphragms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C39/00—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
- B29C39/02—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of definite length, i.e. discrete articles
- B29C39/026—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of definite length, i.e. discrete articles characterised by the shape of the surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Thermal Sciences (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Toxicology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
Abstract
良質な樹脂成形体を製造できる樹脂成形体の製造方法等を提供する。 その樹脂成形体の製造方法は、固体のエポキシ化合物、液状のエポキシ化合物及び光重合開始剤を混合することにより、加熱により溶融又は軟化させることができかつ冷却により固化させることができる光硬化性樹脂組成物を調製する調製工程と、基材上の所定の位置に前記光硬化性樹脂組成物を配置する工程と、前記所定の位置に配置された光硬化性樹脂組成物を加熱して溶融又は軟化させ、その光硬化性樹脂組成物に所望の転写形状を有する型を押圧接触させて押圧接触状態を保持したまま冷却して固化して、離型することにより一次成形体を形成する成形工程と、を備えた。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-247886 | 2007-09-25 | ||
JP2007247886A JP2010274417A (ja) | 2007-09-25 | 2007-09-25 | 樹脂成形体の製造方法、その製造方法により得られる樹脂成形体、光デバイス、マイクロレンズ、マイクロレンズアレイ、及びマイクロ流体デバイス |
JP2008082040A JP2010276623A (ja) | 2008-03-26 | 2008-03-26 | 立体基板上に透明樹脂構造体を形成させる方法 |
JP2008-082040 | 2008-03-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009041510A1 true WO2009041510A1 (ja) | 2009-04-02 |
Family
ID=40511393
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/067310 WO2009041510A1 (ja) | 2007-09-25 | 2008-09-25 | 樹脂成形体の製造方法、その製造方法により得られる樹脂成形体、光デバイス、マイクロレンズ、マイクロレンズアレイ、及びマイクロ流体デバイス |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2009041510A1 (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010126116A1 (ja) * | 2009-04-30 | 2010-11-04 | 日立化成工業株式会社 | 光導波路形成用樹脂組成物、光導波路形成用樹脂フィルム及び光導波路 |
CN103852972A (zh) * | 2014-03-28 | 2014-06-11 | 西安交通大学 | 一种双焦点微透镜阵列的微米压印与激光诱导成形方法 |
WO2016003983A1 (en) * | 2014-07-01 | 2016-01-07 | Isola Usa Corp. | Prepregs including uv curable resins useful for manufacturing semi-flexible pcbs |
US9764532B2 (en) | 2014-07-01 | 2017-09-19 | Isola Usa Corp. | Prepregs including UV curable resins useful for manufacturing semi-flexible PCBs |
TWI614107B (zh) * | 2015-07-15 | 2018-02-11 | 趙崇禮 | 透鏡陣列的模具設備及其使用方法 |
JP2018067718A (ja) * | 2017-11-16 | 2018-04-26 | 大日本印刷株式会社 | インプリント用の転写基板 |
CN111319175A (zh) * | 2019-01-15 | 2020-06-23 | 陈龙 | 耳机壳及其制作方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06194502A (ja) * | 1992-12-24 | 1994-07-15 | Ricoh Opt Ind Co Ltd | マイクロレンズ・マイクロレンズアレイ及びその製造方法 |
JP2004200577A (ja) * | 2002-12-20 | 2004-07-15 | Fuji Photo Film Co Ltd | 微細構造体の形成方法 |
WO2006009626A2 (en) * | 2004-06-16 | 2006-01-26 | Hewlett-Packard Development Company, L. P. | Imprinting lithography using the liquid/solid transition of metals and their alloys |
WO2006124552A2 (en) * | 2005-05-13 | 2006-11-23 | Microchem Corp. | Method of forming a photoresist element |
JP2007084771A (ja) * | 2004-12-13 | 2007-04-05 | Hitachi Chem Co Ltd | 光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれを用いた光導波路 |
JP2007522531A (ja) * | 2004-02-13 | 2007-08-09 | マイクロケム コーポレイション | 永久レジスト組成物、その硬化生成物、及びその使用 |
-
2008
- 2008-09-25 WO PCT/JP2008/067310 patent/WO2009041510A1/ja active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06194502A (ja) * | 1992-12-24 | 1994-07-15 | Ricoh Opt Ind Co Ltd | マイクロレンズ・マイクロレンズアレイ及びその製造方法 |
JP2004200577A (ja) * | 2002-12-20 | 2004-07-15 | Fuji Photo Film Co Ltd | 微細構造体の形成方法 |
JP2007522531A (ja) * | 2004-02-13 | 2007-08-09 | マイクロケム コーポレイション | 永久レジスト組成物、その硬化生成物、及びその使用 |
WO2006009626A2 (en) * | 2004-06-16 | 2006-01-26 | Hewlett-Packard Development Company, L. P. | Imprinting lithography using the liquid/solid transition of metals and their alloys |
JP2007084771A (ja) * | 2004-12-13 | 2007-04-05 | Hitachi Chem Co Ltd | 光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれを用いた光導波路 |
WO2006124552A2 (en) * | 2005-05-13 | 2006-11-23 | Microchem Corp. | Method of forming a photoresist element |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010126116A1 (ja) * | 2009-04-30 | 2010-11-04 | 日立化成工業株式会社 | 光導波路形成用樹脂組成物、光導波路形成用樹脂フィルム及び光導波路 |
CN102414591A (zh) * | 2009-04-30 | 2012-04-11 | 日立化成工业株式会社 | 光波导形成用树脂组合物、光波导形成用树脂膜和光波导 |
US8787723B2 (en) | 2009-04-30 | 2014-07-22 | Hitachi Chemical Company, Ltd. | Resin composition for forming optical waveguide, resin film for forming optical waveguide, and optical waveguide |
CN103852972A (zh) * | 2014-03-28 | 2014-06-11 | 西安交通大学 | 一种双焦点微透镜阵列的微米压印与激光诱导成形方法 |
CN103852972B (zh) * | 2014-03-28 | 2016-08-17 | 西安交通大学 | 一种双焦点微透镜阵列的微米压印与激光诱导成形方法 |
WO2016003983A1 (en) * | 2014-07-01 | 2016-01-07 | Isola Usa Corp. | Prepregs including uv curable resins useful for manufacturing semi-flexible pcbs |
US9764532B2 (en) | 2014-07-01 | 2017-09-19 | Isola Usa Corp. | Prepregs including UV curable resins useful for manufacturing semi-flexible PCBs |
US10307989B2 (en) | 2014-07-01 | 2019-06-04 | Isola Usa Corp. | Prepregs including UV curable resins useful for manufacturing semi-flexible PCBs |
TWI614107B (zh) * | 2015-07-15 | 2018-02-11 | 趙崇禮 | 透鏡陣列的模具設備及其使用方法 |
JP2018067718A (ja) * | 2017-11-16 | 2018-04-26 | 大日本印刷株式会社 | インプリント用の転写基板 |
CN111319175A (zh) * | 2019-01-15 | 2020-06-23 | 陈龙 | 耳机壳及其制作方法 |
CN111319175B (zh) * | 2019-01-15 | 2022-06-07 | 陈龙 | 耳机壳及其制作方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2009041510A1 (ja) | 樹脂成形体の製造方法、その製造方法により得られる樹脂成形体、光デバイス、マイクロレンズ、マイクロレンズアレイ、及びマイクロ流体デバイス | |
WO2010065748A3 (en) | Method for producing patterned materials | |
WO2008036607A3 (en) | Polyolefin contact lens molds and uses thereof | |
EP2020283A4 (en) | MOLDING TOOL FOR FORMING THERMOPLASTIC RESIN, CAVITY MOLDING TOOL AND METHOD FOR PRODUCING HOLLOW MOLDING TOOL | |
WO2010003882A3 (de) | Duales herstellungverfahren und duale herstellungsvorrichtung fur kleinserienprodukte | |
EP1792943A4 (en) | SILICONE RUBBER FORM BODY AND MANUFACTURING METHOD THEREFOR | |
CN105682907A (zh) | 光学透镜、光学透镜制造装置以及制造方法 | |
CN101767403A (zh) | 模内装饰制品的成形方法 | |
TW200640982A (en) | Process for producing molded object of curable resin and molded cured resin | |
JP2010208223A (ja) | 金属ガラスと高分子材料との一体成形品の成形方法、及び、一体成形品用成形装置 | |
KR20120038964A (ko) | 감소된 수축 부위를 가지는 후벽 플라스틱 성형 부품을 사출 성형 또는 엠보싱에 의해 제조하기 위한 장치 및 방법 | |
HRP20150246T1 (hr) | Postupak proizvodnje ekspandiranih plastiäśnih materijala | |
EP4119588A4 (en) | PHOTO-CURING RESIN COMPOSITION FOR PRINTING MOLD, RESIN MOLD, PATTERN MOLD AND METHOD FOR MANUFACTURING THE SAME | |
CN103448204A (zh) | 碳纤板点胶注塑接著成型方法及其产品 | |
WO2009034952A1 (ja) | 非晶質パーフルオロ樹脂の成形方法及び光学素子 | |
WO2009072499A1 (ja) | 熱可塑性組成物成形体の製造方法 | |
WO2008085820A8 (en) | Method of reinforcing low melting temperature cast metal parts | |
WO2006103013A3 (de) | Verfahren zur herstellung eines kunststoffteils und vorrichtung mit diesem kunststoffteil | |
CN105392612B (zh) | 膜和用于对膜进行成型的成型方法、模具、以及包括膜的成型品及其成型方法 | |
WO2009025500A3 (en) | Method for manufacturing glass or plastic or crystal product and glass or plastic or crystal product manufactured by said method | |
WO2008153336A3 (en) | Case for electronic apparatus and method of manufacturing case for electronic apparatus | |
CN101396855B (zh) | 液晶显示模组、液晶显示模组的固定框及其制造工艺 | |
WO2012167076A3 (en) | Nanochannel-guided patterning for polymeric substrates | |
EP1621315A4 (en) | MOLDING METHOD AND FORMING DEVICE, THE BZW. THE ULTRASONIC VIBRATIONS USED AND OPTICAL LENS | |
US10406778B2 (en) | Swiss cheese attachment |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 08833932 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 08833932 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: JP |