WO2012167076A3 - Nanochannel-guided patterning for polymeric substrates - Google Patents

Nanochannel-guided patterning for polymeric substrates Download PDF

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Publication number
WO2012167076A3
WO2012167076A3 PCT/US2012/040454 US2012040454W WO2012167076A3 WO 2012167076 A3 WO2012167076 A3 WO 2012167076A3 US 2012040454 W US2012040454 W US 2012040454W WO 2012167076 A3 WO2012167076 A3 WO 2012167076A3
Authority
WO
WIPO (PCT)
Prior art keywords
polymeric substrate
curable liquid
microscale
nanochannel
mold
Prior art date
Application number
PCT/US2012/040454
Other languages
French (fr)
Other versions
WO2012167076A2 (en
Inventor
Jong G. OK
Se Hyun AHN
Lingjie Jay Guo
Original Assignee
The Regents Of The University Of Michigan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by The Regents Of The University Of Michigan filed Critical The Regents Of The University Of Michigan
Publication of WO2012167076A2 publication Critical patent/WO2012167076A2/en
Publication of WO2012167076A3 publication Critical patent/WO2012167076A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
    • B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2207/00—Microstructural systems or auxiliary parts thereof
    • B81B2207/05—Arrays
    • B81B2207/056—Arrays of static structures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2300/00—Characterised by the use of unspecified polymers
    • C08J2300/24—Thermosetting resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2363/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins

Abstract

Novel continuous high speed techniques are provided to fabricate high aspect-ratio microscale structures by using curable liquid materials on a deformable polymeric substrate by a mold-guided pattern formation process with a rigid mold. Methods comprise contacting a patterned surface of a rigid mold with a curable liquid material disposed on a moldable polymeric substrate. The patterned surface has one or more cavities defining at least one microscale feature, so that the curable liquid material flows into the cavity and the major surface is at least partially deformed during the contacting. The liquid is cured to form a cured polymer having the at least one microscale feature over the moldable polymeric substrate.
PCT/US2012/040454 2011-06-01 2012-06-01 Nanochannel-guided patterning for polymeric substrates WO2012167076A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161492283P 2011-06-01 2011-06-01
US61/492,283 2011-06-01

Publications (2)

Publication Number Publication Date
WO2012167076A2 WO2012167076A2 (en) 2012-12-06
WO2012167076A3 true WO2012167076A3 (en) 2013-03-21

Family

ID=47260378

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2012/040454 WO2012167076A2 (en) 2011-06-01 2012-06-01 Nanochannel-guided patterning for polymeric substrates

Country Status (1)

Country Link
WO (1) WO2012167076A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150060113A1 (en) * 2013-01-22 2015-03-05 Yongcai Wang Photocurable composition, article, and method of use
US9547107B2 (en) 2013-03-15 2017-01-17 The Regents Of The University Of Michigan Dye and pigment-free structural colors and angle-insensitive spectrum filters
US10704763B2 (en) 2016-01-08 2020-07-07 Dai Nippon Printing Co., Ltd. Diffractive optical element and light irradiation apparatus
WO2018026378A1 (en) * 2016-08-05 2018-02-08 Applied Materials, Inc. Method of imprint lithography of conductive materials; stamp for imprint lithography, and apparatus for imprint lithograph

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070056680A1 (en) * 2003-05-23 2007-03-15 The Regents Of The University Of Michigan Imprinting polymer film on patterned substrate
US20090046362A1 (en) * 2007-04-10 2009-02-19 Lingjie Jay Guo Roll to roll nanoimprint lithography
US20090256287A1 (en) * 2008-04-09 2009-10-15 Peng-Fei Fu UV Curable Silsesquioxane Resins For Nanoprint Lithography
US20100120982A1 (en) * 2004-06-30 2010-05-13 Nektar Therapeutics Polymer-factor ix moiety conjugates

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070056680A1 (en) * 2003-05-23 2007-03-15 The Regents Of The University Of Michigan Imprinting polymer film on patterned substrate
US20100120982A1 (en) * 2004-06-30 2010-05-13 Nektar Therapeutics Polymer-factor ix moiety conjugates
US20090046362A1 (en) * 2007-04-10 2009-02-19 Lingjie Jay Guo Roll to roll nanoimprint lithography
US20090256287A1 (en) * 2008-04-09 2009-10-15 Peng-Fei Fu UV Curable Silsesquioxane Resins For Nanoprint Lithography

Also Published As

Publication number Publication date
WO2012167076A2 (en) 2012-12-06

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