JP2005519474A - 高周波半導体デバイスとその製造方法 - Google Patents
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Abstract
Description
5間の静電容量に寄与している。
ここまでは通常、高周波領域で主に用いられる低静電容量のプラスチックパッケージに包まれたLDMOSデバイスの構造と方法について述べてきた。本発明の構造と方法はゲートバス25、第1の金属層から画定される第1の接地シールド24、そしてゲートバス25の上の第2の金属層から画定された第2の接地シールド31を利用する。第1の接地シールド24と第2の接地シールド31はゲートとドレインとの間の静電容量を減少させる作用をする。本発明のLDMOSデバイスは、高周波領域で良い性能を示し、従来の金属/セラミックパッケージされたLDMOSデバイスより低コストにできることが重要である。
Claims (12)
- 半導体本体を供給する工程と;
同半導体本体の上にゲート構造を形成する工程と;
同半導体本体中にソース領域とドレイン領域を形成する工程であって、同ソース領域は前記ゲート構造近傍の一方の側面にあり、同ドレイン領域は前記ゲート構造近傍の他方の側面にあることと;
前記ゲート構造の上、および同ソース領域近傍の同半導体本体の一部分の上に第1の誘電体層を形成する工程と;
同ソース領域に電気的接続するソース接触を形成する工程と;
同ソース領域近傍の同第1の誘電体層上にゲートバスを形成する工程と;
同ゲートバスと同ソース接触の上に第2の誘電体層を形成する工程と;
金属層を前記ゲートバス上の第2の誘電体層の上部に形成して、同ソース接触と電気的接続させる工程と、からなる半導体デバイスの作製方法。 - 前記第1の誘電体層を形成する前記工程が、ケイ酸ガラス層からなる第1の誘電体層を形成すること、からなる請求項1に記載の方法。
- 前記ソース接触を形成する前記工程が、前記ゲート構造と前記ドレイン領域との間の静電容量を減らす為の第1の接地シールドを提供する前記ソース接触を特徴とすること、から更になる請求項1に記載の方法。
- 前記ソース接触および前記ゲートバスを形成する前記工程が、同一のメタイライズ層からソース接触とゲートバスを形成すること、からなる請求項1に記載の方法。
- 前記金属層を形成する前記工程が、前記ゲートバスと前記ドレイン領域との間の静電容量を減らす為の第2の接地シールドを提供する前記金属層を形成すること、から更になる請求項1に記載の方法。
- 前記ソース接触を形成する前記工程は第1の接地シールド形成からなり、前記金属層を形成する前記工程は第2の接地シールドを形成すること、からなる請求項1に記載の方法。
- プラスチックパッケージ中に半導体本体を封止する工程、を更に含む請求項1に記載の方法。
- 半導体本体を供給する工程と;
同半導体本体の上にゲート構造を形成する工程と;
同半導体本体中にソース領域とドレイン領域を形成する工程であって、同ソース領域は前記ゲート構造近傍の一方の側面にあり、同ドレイン領域は前記ゲート構造近傍の他方の側面にあることと;
同ゲート構造の上、及び前記ソース領域近傍の前記半導体本体の一部分の上に第1の中間誘電体層を形成する工程と;
前記ソース領域と電気的接続しており、同ゲート構造の上に、第1の接地シールドを形成する工程と;
前記ソース領域近傍の前記第1の誘電体層の上にあるゲートバスを形成する工程と;
前記ゲートバスと前記第1の接地シールドの上にある第2の中間誘電体層を形成する工程と;
前記ゲートバス上の前記第2の誘電体層の一部分の上に、前記第1の接地シールドと電気的接続をしている第2の接地シールドを形成する工程と、からなる半導体デバイスの作製
方法。 - 半導体本体と;
同半導体本体の上のゲート構造と;
同半導体本体中にあるソース領域とドレイン領域であり、同ソース領域はゲート構造近傍の一方の側面にあり、同ドレイン領域はゲート構造近傍の他方の側面にあることと;同ゲート構造の上にあり、同ソース領域近傍の前記半導体本体の一部分の上にある第1の誘電体層と;
同ソース領域と電気的接続しているソース接触と;
同ソース領域近傍の同第1の誘電体層の上にあるゲートバスと;
同ゲートバスと同ソース接触の上の第2の誘電体層と;
同ゲートバスの上の第2の誘電体層の一部分の上にあり、同ソース接触と電気的接続している金属層と、からなる半導体デバイス。 - 前記半導体デバイスを封止するプラスチック、から更になる請求項9に記載の半導体。
- 前記ソース接触は前記ゲート構造と前記ドレイン領域との間の静電容量を減らす為の第1の接地シールド、である請求項9に記載の半導体。
- 前記金属層は前記ゲートバスと前記ドレイン領域との間の静電容量を減らす為の第2の接地シールド、である請求項9に記載の半導体。
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US10/086,061 US6744117B2 (en) | 2002-02-28 | 2002-02-28 | High frequency semiconductor device and method of manufacture |
PCT/US2003/005104 WO2003075354A1 (en) | 2002-02-28 | 2003-02-19 | High frequency semiconductor device and method of manufacture |
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JP2005519474A true JP2005519474A (ja) | 2005-06-30 |
JP2005519474A5 JP2005519474A5 (ja) | 2010-01-21 |
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US (1) | US6744117B2 (ja) |
EP (1) | EP1479110A1 (ja) |
JP (1) | JP2005519474A (ja) |
KR (1) | KR100968058B1 (ja) |
CN (1) | CN100356580C (ja) |
AU (1) | AU2003211162A1 (ja) |
WO (1) | WO2003075354A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007503717A (ja) * | 2003-08-27 | 2007-02-22 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Ldmosトランジスタを有する電子装置 |
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JP2014120770A (ja) * | 2012-12-12 | 2014-06-30 | Freescale Semiconductor Inc | 集積型受動素子を含む集積回路およびその製造方法 |
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Also Published As
Publication number | Publication date |
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WO2003075354A1 (en) | 2003-09-12 |
AU2003211162A1 (en) | 2003-09-16 |
US20030160324A1 (en) | 2003-08-28 |
KR20040087325A (ko) | 2004-10-13 |
KR100968058B1 (ko) | 2010-07-08 |
US6744117B2 (en) | 2004-06-01 |
EP1479110A1 (en) | 2004-11-24 |
CN100356580C (zh) | 2007-12-19 |
CN1639871A (zh) | 2005-07-13 |
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