JP2005501040A5 - - Google Patents
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- Publication number
- JP2005501040A5 JP2005501040A5 JP2003513963A JP2003513963A JP2005501040A5 JP 2005501040 A5 JP2005501040 A5 JP 2005501040A5 JP 2003513963 A JP2003513963 A JP 2003513963A JP 2003513963 A JP2003513963 A JP 2003513963A JP 2005501040 A5 JP2005501040 A5 JP 2005501040A5
- Authority
- JP
- Japan
- Prior art keywords
- branched
- alkyl
- linear
- straight
- different
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000217 alkyl group Chemical group 0.000 claims description 26
- 125000002723 alicyclic group Chemical group 0.000 claims description 14
- 125000003118 aryl group Chemical group 0.000 claims description 13
- 125000004103 aminoalkyl group Chemical group 0.000 claims description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 9
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 8
- 229910052717 sulfur Inorganic materials 0.000 claims description 7
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical group S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims description 6
- 125000002947 alkylene group Chemical group 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 125000005842 heteroatom Chemical group 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims description 4
- -1 O-alkyl Chemical group 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000004414 alkyl thio group Chemical group 0.000 claims description 3
- 125000005358 mercaptoalkyl group Chemical group 0.000 claims description 3
- 125000006577 C1-C6 hydroxyalkyl group Chemical group 0.000 claims description 2
- 125000005366 cycloalkylthio group Chemical group 0.000 claims description 2
- 125000000524 functional group Chemical group 0.000 claims description 2
- 229910052794 bromium Inorganic materials 0.000 claims 3
- 229910052801 chlorine Inorganic materials 0.000 claims 3
- 229910052731 fluorine Inorganic materials 0.000 claims 3
- 229910052740 iodine Inorganic materials 0.000 claims 3
- 229910052787 antimony Inorganic materials 0.000 claims 2
- 229910052785 arsenic Inorganic materials 0.000 claims 2
- 229910052796 boron Inorganic materials 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical class 0.000 claims 2
- 125000005062 perfluorophenyl group Chemical group FC1=C(C(=C(C(=C1F)F)F)F)* 0.000 claims 2
- 229910052698 phosphorus Inorganic materials 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 238000007336 electrophilic substitution reaction Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 125000003375 sulfoxide group Chemical group 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT2001MI001543A ITMI20011543A1 (it) | 2001-07-19 | 2001-07-19 | Sali di solfonio processo di preparazione e loro impiego come fotoiniziatori di composizioni polimerizzabili mediante radizioni elettromagne |
| IT2001MI001544A ITMI20011544A1 (it) | 2001-07-19 | 2001-07-19 | Sali di solfonio processo di preparazione e loro impiego come fotoinziatori di composizioni polimerizzabili meidante radiazioni elettromagne |
| PCT/EP2002/007415 WO2003008404A2 (en) | 2001-07-19 | 2002-07-04 | Sulfonium salts as phtoinitiators for radiation curable systems |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005501040A JP2005501040A (ja) | 2005-01-13 |
| JP2005501040A5 true JP2005501040A5 (enExample) | 2009-10-08 |
| JP4480393B2 JP4480393B2 (ja) | 2010-06-16 |
Family
ID=26332781
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003513963A Expired - Lifetime JP4480393B2 (ja) | 2001-07-19 | 2002-07-04 | スルホニウム塩、これらの製造方法および放射線硬化性系のための光開始剤としてのこれらの使用 |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US7230121B2 (enExample) |
| EP (1) | EP1417198B1 (enExample) |
| JP (1) | JP4480393B2 (enExample) |
| KR (1) | KR100918556B1 (enExample) |
| CN (1) | CN1269812C (enExample) |
| AT (1) | ATE438638T1 (enExample) |
| AU (1) | AU2002331332A1 (enExample) |
| BR (1) | BR0205767B1 (enExample) |
| CA (1) | CA2452566C (enExample) |
| DE (1) | DE60233234D1 (enExample) |
| ES (1) | ES2329345T3 (enExample) |
| WO (1) | WO2003008404A2 (enExample) |
Families Citing this family (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4701231B2 (ja) * | 2002-02-13 | 2011-06-15 | 富士フイルム株式会社 | 電子線、ｅｕｖ又はｘ線用ネガ型レジスト組成物及びそれを用いたパターン形成方法 |
| GB0204467D0 (en) * | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
| GB0204468D0 (en) * | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel thioxanthone derivatives, and their use as cationic photoinitiators |
| CA2485516A1 (en) * | 2002-05-16 | 2003-11-27 | Rensselaer Polytechnic Institute | Photopolymerizable compositions comprising thianthrenium salt cationic photoinitiators |
| US7230122B2 (en) | 2003-11-04 | 2007-06-12 | National Starch And Chemical Investment Holding Corporation | Sulfonium salt photinitiators and use thereof |
| KR101197539B1 (ko) | 2003-11-04 | 2012-11-12 | 헨켈 아게 운트 코. 카게아아 | 술포늄염 광개시제 및 그의 용도 |
| JP2005263897A (ja) * | 2004-03-17 | 2005-09-29 | Konica Minolta Medical & Graphic Inc | インクジェット用インク組成物及び画像形成方法 |
| EP1789188A2 (en) * | 2004-07-21 | 2007-05-30 | CIBA SPECIALTY CHEMICALS HOLDING INC. Patent Departement | Process for the photoactivation and use of a catalyst by an inverted two-stage procedure |
| JP4439409B2 (ja) * | 2005-02-02 | 2010-03-24 | 富士フイルム株式会社 | レジスト組成物及びそれを用いたパターン形成方法 |
| JP4677353B2 (ja) * | 2005-02-18 | 2011-04-27 | 富士フイルム株式会社 | レジスト組成物、該レジスト組成物に用いる化合物及び該レジスト組成物を用いたパターン形成方法 |
| US7541131B2 (en) * | 2005-02-18 | 2009-06-02 | Fujifilm Corporation | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition |
| JP4505357B2 (ja) * | 2005-03-16 | 2010-07-21 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法 |
| ATE473209T1 (de) * | 2005-07-01 | 2010-07-15 | Basf Se | Sulfoniumsalzinitiatoren |
| JP4792299B2 (ja) | 2006-02-07 | 2011-10-12 | 富士フイルム株式会社 | 新規なスルホニウム化合物、該化合物を含有する感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| JP2007254454A (ja) * | 2006-02-23 | 2007-10-04 | Fujifilm Corp | スルホニウム塩、硬化性組成物、インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版 |
| JP5313873B2 (ja) * | 2006-04-13 | 2013-10-09 | チバ ホールディング インコーポレーテッド | スルホニウム塩開始剤 |
| US8012672B2 (en) | 2006-10-04 | 2011-09-06 | Basf Se | Sulphonium salt photoinitiators |
| JP4936848B2 (ja) * | 2006-10-16 | 2012-05-23 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物およびその積層体 |
| CN101558110B (zh) | 2006-10-24 | 2012-06-13 | 西巴控股有限公司 | 热稳定的可阳离子光固化组合物 |
| RU2330033C1 (ru) * | 2007-01-09 | 2008-07-27 | Новосибирский институт органической химии им. Н.Н. Ворожцова СО РАН (НИОХ СО РАН) | Гексафторфосфат 2-(2-тозил-2-метилпропионил)-9-оксо-10-(4-гептилоксифенил)-9н-тиоксантения как инициатор фотополимеризации непредельных соединений |
| US7488568B2 (en) * | 2007-04-09 | 2009-02-10 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, compound and acid generator |
| JP4866790B2 (ja) * | 2007-05-23 | 2012-02-01 | 東京応化工業株式会社 | レジスト組成物およびレジストパターン形成方法 |
| JP5066405B2 (ja) * | 2007-08-02 | 2012-11-07 | 富士フイルム株式会社 | 電子線、ｘ線又はｅｕｖ用レジスト組成物及び該組成物を用いたパターン形成方法 |
| WO2009047105A1 (en) | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
| CN102026967B (zh) | 2007-10-10 | 2013-09-18 | 巴斯夫欧洲公司 | 锍盐引发剂 |
| WO2009047151A1 (en) | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
| WO2010046240A1 (en) | 2008-10-20 | 2010-04-29 | Basf Se | Sulfonium derivatives and the use therof as latent acids |
| JP2010235911A (ja) | 2009-03-11 | 2010-10-21 | Konica Minolta Ij Technologies Inc | 活性エネルギー線硬化型インクジェットインク、インクジェット記録方法及び印刷物 |
| JP5964007B2 (ja) | 2009-04-02 | 2016-08-03 | コニカミノルタ株式会社 | 活性エネルギー線硬化型インクジェットインク、インクジェット記録方法及び印刷物 |
| DE102016111590A1 (de) | 2016-06-24 | 2017-12-28 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Einkomponentenmasse auf Basis von Alkoxysilanen und Verfahren zum Fügen oder Vergießen von Bauteilen unter Verwendung der Masse |
| DE102017126215A1 (de) | 2017-11-09 | 2019-05-09 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Verfahren zur Erzeugung opaker Beschichtungen, Verklebungen und Vergüsse sowie härtbare Masse zur Verwendung in dem Verfahren |
| DE102018127854A1 (de) | 2018-11-08 | 2020-05-14 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Feuchtigkeitshärtbare Einkomponentenmasse und Verfahren zum Fügen, Vergießen und Beschichten unter Verwendung der Masse |
| DE102018131513A1 (de) | 2018-12-10 | 2020-06-10 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Kationisch härtbare Masse und Verfahren zum Fügen, Vergießen und Beschichten von Substraten unter Verwendung der Masse |
| CN118271281A (zh) * | 2022-12-30 | 2024-07-02 | 常州强力电子新材料股份有限公司 | 一种噻吨硫鎓盐光引发剂及其制备方法和应用 |
| GB2640960A (en) | 2024-05-10 | 2025-11-12 | Henkel Ag & Co Kgaa | Debonding of a cured composition |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4161478A (en) * | 1974-05-02 | 1979-07-17 | General Electric Company | Photoinitiators |
| JPS61190524A (ja) | 1985-01-25 | 1986-08-25 | Asahi Denka Kogyo Kk | エネルギ−線硬化性組成物 |
| JPH04161478A (ja) * | 1990-10-26 | 1992-06-04 | Matsushita Electric Works Ltd | 蓄熱体 |
| TW237466B (enExample) | 1992-07-21 | 1995-01-01 | Giba Gerigy Ag | |
| US5731364A (en) * | 1996-01-24 | 1998-03-24 | Shipley Company, L.L.C. | Photoimageable compositions comprising multiple arylsulfonium photoactive compounds |
| EP0869393B1 (en) | 1997-03-31 | 2000-05-31 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
| GB0204467D0 (en) * | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
-
2002
- 2002-07-04 AT AT02767172T patent/ATE438638T1/de not_active IP Right Cessation
- 2002-07-04 AU AU2002331332A patent/AU2002331332A1/en not_active Abandoned
- 2002-07-04 WO PCT/EP2002/007415 patent/WO2003008404A2/en not_active Ceased
- 2002-07-04 US US10/484,358 patent/US7230121B2/en not_active Expired - Lifetime
- 2002-07-04 DE DE60233234T patent/DE60233234D1/de not_active Expired - Lifetime
- 2002-07-04 CN CNB028145038A patent/CN1269812C/zh not_active Expired - Fee Related
- 2002-07-04 BR BRPI0205767-0B1A patent/BR0205767B1/pt not_active IP Right Cessation
- 2002-07-04 JP JP2003513963A patent/JP4480393B2/ja not_active Expired - Lifetime
- 2002-07-04 KR KR1020037003928A patent/KR100918556B1/ko not_active Expired - Fee Related
- 2002-07-04 ES ES02767172T patent/ES2329345T3/es not_active Expired - Lifetime
- 2002-07-04 EP EP02767172A patent/EP1417198B1/en not_active Expired - Lifetime
- 2002-07-04 CA CA2452566A patent/CA2452566C/en not_active Expired - Fee Related
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