JP2005025169A - 光重合性組成物及びこれを用いたカラーフィルター - Google Patents

光重合性組成物及びこれを用いたカラーフィルター Download PDF

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Publication number
JP2005025169A
JP2005025169A JP2004113367A JP2004113367A JP2005025169A JP 2005025169 A JP2005025169 A JP 2005025169A JP 2004113367 A JP2004113367 A JP 2004113367A JP 2004113367 A JP2004113367 A JP 2004113367A JP 2005025169 A JP2005025169 A JP 2005025169A
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JP
Japan
Prior art keywords
group
carbon atoms
photopolymerizable composition
resin
color filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004113367A
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English (en)
Japanese (ja)
Inventor
Shigeo Tsuji
成夫 辻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
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Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=37336798&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP2005025169(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP2004113367A priority Critical patent/JP2005025169A/ja
Publication of JP2005025169A publication Critical patent/JP2005025169A/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/94—[b, c]- or [b, d]-condensed containing carbocyclic rings other than six-membered
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/23—Photochromic filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
JP2004113367A 2002-10-28 2004-04-07 光重合性組成物及びこれを用いたカラーフィルター Pending JP2005025169A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004113367A JP2005025169A (ja) 2002-10-28 2004-04-07 光重合性組成物及びこれを用いたカラーフィルター

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2002312161 2002-10-28
JP2003045932 2003-02-24
JP2003165484 2003-06-10
JP2004113367A JP2005025169A (ja) 2002-10-28 2004-04-07 光重合性組成物及びこれを用いたカラーフィルター

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2003342896 Division 2002-10-28 2003-10-01

Publications (1)

Publication Number Publication Date
JP2005025169A true JP2005025169A (ja) 2005-01-27

Family

ID=37336798

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004113367A Pending JP2005025169A (ja) 2002-10-28 2004-04-07 光重合性組成物及びこれを用いたカラーフィルター

Country Status (3)

Country Link
JP (1) JP2005025169A (ko)
KR (2) KR100895595B1 (ko)
TW (1) TW200714651A (ko)

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005242279A (ja) * 2003-04-24 2005-09-08 Sumitomo Chemical Co Ltd 黒色感光性樹脂組成物
JP2007304392A (ja) * 2006-05-12 2007-11-22 Toppan Printing Co Ltd カラーフィルタ及びそれを用いた液晶表示装置
WO2008078678A1 (ja) 2006-12-27 2008-07-03 Adeka Corporation オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP2008249866A (ja) * 2007-03-29 2008-10-16 Fujifilm Corp カラーフィルタ及びその製造方法
WO2009081483A1 (ja) 2007-12-25 2009-07-02 Adeka Corporation オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP2009242604A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp 重合性組成物および固体撮像素子
EP2327689A1 (en) 2009-11-27 2011-06-01 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the same
US8133656B2 (en) 2006-12-27 2012-03-13 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the same
WO2015108386A1 (ko) 2014-01-17 2015-07-23 주식회사 삼양사 신규한 β-옥심에스테르 플루오렌 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR20160091721A (ko) 2015-01-26 2016-08-03 주식회사 삼양사 신규한 디옥심에스테르 화합물 및 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR20160096960A (ko) 2015-02-06 2016-08-17 주식회사 삼양사 신규한 옥심에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR20160121623A (ko) 2015-04-09 2016-10-20 주식회사 삼양사 신규한 플루오렌일 옥심 에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR20160144161A (ko) 2015-06-08 2016-12-16 주식회사 삼양사 신규한 플루오란텐 옥심 에스테르 유도체, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR20160150086A (ko) 2008-07-09 2016-12-28 도쿄 오카 고교 가부시키가이샤 착색 감광성 수지 조성물 및 옥심계 광중합 개시제
KR20170009794A (ko) 2015-07-17 2017-01-25 타코마테크놀러지 주식회사 옥심에스테르 화합물 및 이를 포함하는 감광성 수지 조성물
KR20170050618A (ko) 2015-10-30 2017-05-11 주식회사 삼양사 신규한 퀴놀리닐 베타 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 포토레지스트 조성물
KR20170131218A (ko) 2016-05-19 2017-11-29 주식회사 삼양사 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 감광성 조성물
KR20180090135A (ko) 2017-02-02 2018-08-10 주식회사 삼양사 신규한 옥심에스테르 비페닐 화합물, 이를 포함하는 광중합 개시제 및 감광성 조성물
KR20190067602A (ko) 2017-12-07 2019-06-17 주식회사 삼양사 카바졸 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 감광성 조성물
KR20200081810A (ko) 2018-12-28 2020-07-08 주식회사 삼양사 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물

Families Citing this family (9)

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JP2005300994A (ja) * 2004-04-13 2005-10-27 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
JP4448381B2 (ja) * 2004-05-26 2010-04-07 東京応化工業株式会社 感光性組成物
JP4492238B2 (ja) * 2004-07-26 2010-06-30 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
TWI385485B (zh) * 2004-11-17 2013-02-11 Jsr Corp A photosensitive resin composition, a display panel spacer, and a display panel
JP2006195425A (ja) * 2004-12-15 2006-07-27 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
KR100671106B1 (ko) * 2004-12-29 2007-01-17 제일모직주식회사 고감도 감광성 수지 조성물 및 이를 이용한 블랙매트릭스
JP4640971B2 (ja) * 2005-09-08 2011-03-02 東京応化工業株式会社 プラズマディスプレイの遮光性パターン形成用感光性樹脂組成物
JP5270113B2 (ja) * 2007-06-06 2013-08-21 新日鉄住金化学株式会社 ブラックレジスト用感光性樹脂組成物及びこれを用いた遮光膜並びにカラーフィルター
KR101032275B1 (ko) * 2007-11-08 2011-05-06 주식회사 엘지화학 착색 분산액, 감광성 수지조성물 및 블랙매트릭스

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JPH1184126A (ja) * 1997-09-03 1999-03-26 Mitsubishi Chem Corp カラーフィルター用光重合性組成物及びカラーフィルター
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
NL1016815C2 (nl) * 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester-fotoinitiatoren.
KR100467360B1 (ko) * 2002-04-02 2005-01-24 (주)아이컴포넌트 디스플레이용 유기/무기 하이브리드형 코팅제
JP2004113367A (ja) * 2002-09-25 2004-04-15 Kyowa:Kk 鞄用吊下具

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4595374B2 (ja) * 2003-04-24 2010-12-08 住友化学株式会社 黒色感光性樹脂組成物
JP2005242279A (ja) * 2003-04-24 2005-09-08 Sumitomo Chemical Co Ltd 黒色感光性樹脂組成物
JP2007304392A (ja) * 2006-05-12 2007-11-22 Toppan Printing Co Ltd カラーフィルタ及びそれを用いた液晶表示装置
WO2008078678A1 (ja) 2006-12-27 2008-07-03 Adeka Corporation オキシムエステル化合物及び該化合物を含有する光重合開始剤
US11667730B2 (en) 2006-12-27 2023-06-06 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the same
US8133656B2 (en) 2006-12-27 2012-03-13 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the same
JP2008249866A (ja) * 2007-03-29 2008-10-16 Fujifilm Corp カラーフィルタ及びその製造方法
US8182968B2 (en) 2007-03-29 2012-05-22 Fujifilm Corporation Color filter and method for producing the same
US8202679B2 (en) 2007-12-25 2012-06-19 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the same
WO2009081483A1 (ja) 2007-12-25 2009-07-02 Adeka Corporation オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP2009242604A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp 重合性組成物および固体撮像素子
KR20160150086A (ko) 2008-07-09 2016-12-28 도쿄 오카 고교 가부시키가이샤 착색 감광성 수지 조성물 및 옥심계 광중합 개시제
EP2327689A1 (en) 2009-11-27 2011-06-01 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the same
US8148045B2 (en) 2009-11-27 2012-04-03 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the same
WO2015108386A1 (ko) 2014-01-17 2015-07-23 주식회사 삼양사 신규한 β-옥심에스테르 플루오렌 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR20160091721A (ko) 2015-01-26 2016-08-03 주식회사 삼양사 신규한 디옥심에스테르 화합물 및 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR20160096960A (ko) 2015-02-06 2016-08-17 주식회사 삼양사 신규한 옥심에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR20160121623A (ko) 2015-04-09 2016-10-20 주식회사 삼양사 신규한 플루오렌일 옥심 에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR20160144161A (ko) 2015-06-08 2016-12-16 주식회사 삼양사 신규한 플루오란텐 옥심 에스테르 유도체, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR20170009794A (ko) 2015-07-17 2017-01-25 타코마테크놀러지 주식회사 옥심에스테르 화합물 및 이를 포함하는 감광성 수지 조성물
KR20170050618A (ko) 2015-10-30 2017-05-11 주식회사 삼양사 신규한 퀴놀리닐 베타 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 포토레지스트 조성물
KR20170131218A (ko) 2016-05-19 2017-11-29 주식회사 삼양사 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 감광성 조성물
KR20180090135A (ko) 2017-02-02 2018-08-10 주식회사 삼양사 신규한 옥심에스테르 비페닐 화합물, 이를 포함하는 광중합 개시제 및 감광성 조성물
KR20190067602A (ko) 2017-12-07 2019-06-17 주식회사 삼양사 카바졸 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 감광성 조성물
KR20200081810A (ko) 2018-12-28 2020-07-08 주식회사 삼양사 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물

Also Published As

Publication number Publication date
TW200714651A (en) 2007-04-16
KR20040038687A (ko) 2004-05-08
KR100952864B1 (ko) 2010-04-13
KR100895595B1 (ko) 2009-05-06
TWI343930B (ko) 2011-06-21
KR20090032052A (ko) 2009-03-31

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