TWI343930B - - Google Patents

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Publication number
TWI343930B
TWI343930B TW095146906A TW95146906A TWI343930B TW I343930 B TWI343930 B TW I343930B TW 095146906 A TW095146906 A TW 095146906A TW 95146906 A TW95146906 A TW 95146906A TW I343930 B TWI343930 B TW I343930B
Authority
TW
Taiwan
Prior art keywords
group
photopolymerizable composition
acid
compound
resin
Prior art date
Application number
TW095146906A
Other languages
English (en)
Chinese (zh)
Other versions
TW200714651A (en
Inventor
Tsuji Shigeo
Original Assignee
Mitsubishi Chem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=37336798&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TWI343930(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Mitsubishi Chem Corp filed Critical Mitsubishi Chem Corp
Publication of TW200714651A publication Critical patent/TW200714651A/zh
Application granted granted Critical
Publication of TWI343930B publication Critical patent/TWI343930B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/94—[b, c]- or [b, d]-condensed containing carbocyclic rings other than six-membered
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/23—Photochromic filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
TW95146906A 2002-10-28 2003-09-17 Photopolymerization composition and color filter using the same TW200714651A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002312161 2002-10-28
JP2003045932 2003-02-24
JP2003165484 2003-06-10

Publications (2)

Publication Number Publication Date
TW200714651A TW200714651A (en) 2007-04-16
TWI343930B true TWI343930B (ko) 2011-06-21

Family

ID=37336798

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95146906A TW200714651A (en) 2002-10-28 2003-09-17 Photopolymerization composition and color filter using the same

Country Status (3)

Country Link
JP (1) JP2005025169A (ko)
KR (2) KR100895595B1 (ko)
TW (1) TW200714651A (ko)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4595374B2 (ja) * 2003-04-24 2010-12-08 住友化学株式会社 黒色感光性樹脂組成物
JP2005300994A (ja) * 2004-04-13 2005-10-27 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
JP4448381B2 (ja) * 2004-05-26 2010-04-07 東京応化工業株式会社 感光性組成物
JP4492238B2 (ja) * 2004-07-26 2010-06-30 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
TWI385485B (zh) * 2004-11-17 2013-02-11 Jsr Corp A photosensitive resin composition, a display panel spacer, and a display panel
JP2006195425A (ja) * 2004-12-15 2006-07-27 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
KR100671106B1 (ko) * 2004-12-29 2007-01-17 제일모직주식회사 고감도 감광성 수지 조성물 및 이를 이용한 블랙매트릭스
JP4640971B2 (ja) * 2005-09-08 2011-03-02 東京応化工業株式会社 プラズマディスプレイの遮光性パターン形成用感光性樹脂組成物
JP4867466B2 (ja) * 2006-05-12 2012-02-01 凸版印刷株式会社 カラーフィルタ及びそれを用いた液晶表示装置
EP2128132B1 (en) 2006-12-27 2014-01-15 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the same
WO2008078678A1 (ja) 2006-12-27 2008-07-03 Adeka Corporation オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP5030638B2 (ja) * 2007-03-29 2012-09-19 富士フイルム株式会社 カラーフィルタ及びその製造方法
JP5270113B2 (ja) * 2007-06-06 2013-08-21 新日鉄住金化学株式会社 ブラックレジスト用感光性樹脂組成物及びこれを用いた遮光膜並びにカラーフィルター
KR101032275B1 (ko) * 2007-11-08 2011-05-06 주식회사 엘지화학 착색 분산액, 감광성 수지조성물 및 블랙매트릭스
JPWO2009081483A1 (ja) 2007-12-25 2011-05-06 株式会社Ａｄｅｋａ オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP5344843B2 (ja) * 2008-03-31 2013-11-20 富士フイルム株式会社 重合性組成物および固体撮像素子
JP5336274B2 (ja) 2008-07-09 2013-11-06 東京応化工業株式会社 着色感光性樹脂組成物及びオキシム系光重合開始剤
JP4818458B2 (ja) 2009-11-27 2011-11-16 株式会社Ａｄｅｋａ オキシムエステル化合物及び該化合物を含有する光重合開始剤
KR101435652B1 (ko) 2014-01-17 2014-08-28 주식회사 삼양사 신규한 β-옥심에스테르 플루오렌 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR101824429B1 (ko) 2015-01-26 2018-02-06 주식회사 삼양사 신규한 디옥심에스테르 화합물 및 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR101824443B1 (ko) 2015-04-09 2018-02-05 주식회사 삼양사 신규한 플루오렌일 옥심 에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR101828927B1 (ko) 2015-02-06 2018-02-14 주식회사 삼양사 신규한 옥심에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR101777845B1 (ko) 2015-06-08 2017-09-12 주식회사 삼양사 신규한 플루오란텐 옥심 에스테르 유도체, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
KR102613079B1 (ko) 2015-07-17 2023-12-12 타코마테크놀러지 주식회사 옥심에스테르 화합물 및 이를 포함하는 감광성 수지 조성물
KR102509606B1 (ko) 2015-10-30 2023-03-14 주식회사 삼양사 신규한 퀴놀리닐 베타 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 포토레지스트 조성물
KR101892086B1 (ko) 2016-05-19 2018-08-27 주식회사 삼양사 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 감광성 조성물
KR20180090135A (ko) 2017-02-02 2018-08-10 주식회사 삼양사 신규한 옥심에스테르 비페닐 화합물, 이를 포함하는 광중합 개시제 및 감광성 조성물
KR101991903B1 (ko) 2017-12-07 2019-10-01 주식회사 삼양사 카바졸 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 감광성 조성물
KR102228630B1 (ko) 2018-12-28 2021-03-16 주식회사 삼양사 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1184126A (ja) * 1997-09-03 1999-03-26 Mitsubishi Chem Corp カラーフィルター用光重合性組成物及びカラーフィルター
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
NL1016815C2 (nl) * 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester-fotoinitiatoren.
KR100467360B1 (ko) * 2002-04-02 2005-01-24 (주)아이컴포넌트 디스플레이용 유기/무기 하이브리드형 코팅제
JP2004113367A (ja) * 2002-09-25 2004-04-15 Kyowa:Kk 鞄用吊下具

Also Published As

Publication number Publication date
JP2005025169A (ja) 2005-01-27
TW200714651A (en) 2007-04-16
KR20040038687A (ko) 2004-05-08
KR100952864B1 (ko) 2010-04-13
KR100895595B1 (ko) 2009-05-06
KR20090032052A (ko) 2009-03-31

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