TWI343930B - - Google Patents

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TWI343930B
TWI343930B TW095146906A TW95146906A TWI343930B TW I343930 B TWI343930 B TW I343930B TW 095146906 A TW095146906 A TW 095146906A TW 95146906 A TW95146906 A TW 95146906A TW I343930 B TWI343930 B TW I343930B
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group
photopolymerizable composition
acid
compound
resin
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TW095146906A
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Chinese (zh)
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TW200714651A (en
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Tsuji Shigeo
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Mitsubishi Chem Corp
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56Ring systems containing three or more rings
    • C07D209/80[b, c]- or [b, d]-condensed
    • C07D209/94[b, c]- or [b, d]-condensed containing carbocyclic rings other than six-membered
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/23Photochromic filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Description

1343930 (1) 九、發明說明 【發明所屬之技術領域】 本發明係關於彩色電視、液晶顯示元件、固體攝影元 件、照相機等所使用之光學濾色器製造所使用之濾色器用 光聚合性組成物及由該組成物所得濾色器、詳言之、本發 明係關於在具高遮光性同時高感度且解像性優異之黑色基 質(Black Matrix。以下、簡稱爲BM。)製造上爲極適合 之濾色器用光聚合性組成物及具有高精度、高遮光性之樹 脂B Μ之濾色器。 【先前技術】 濾色器、通常係在玻璃、塑膠薄片等透明基板表面形 成黒色基質、接著、依順序將紅、綠、藍等3種以上不同 之色相、以條紋狀或鑲嵌(mosaic )狀等之色樣形成》色 樣大小因濾色器用途及各種色而有不同,爲5〜700 μηι左 右。又、重疊(superposition)之位置精度爲數〜數十μηι 、可由尺寸精度高的微細加工技術來製造。 濾色器之代表性的製造方法有、染色法、印刷法、顔 料分散法、電解澱積法等。該等之中、尤其是、將含有色 材料之光聚合性組成物、塗敷於透明基板上、使畫像曝光 、顯像、並依需要予以重複硬化之,以形成濾色器畫像之 顔料分散法、因濾色器畫素位置、膜厚等精度高、耐光性 •耐熱性等耐久性優異、故針孔(pin hole)等缺陷少、而 廣受採用。 -4- (2) (2)1343930 BM在、紅、綠、藍色樣間配置成格子狀、條紋狀或 鑲嵌狀爲一般、對因各色間混色抑制所致對比之提高或對 光漏所致薄膜電晶體(Thin Film Transistor : TFT)誤動 作之防止,有其作用。因此、對BM則要求要有高度遮光 性。習知之BM係由鉻等金屬膜所形成方法爲一般。此方 法係在透明基板上將鉻等金屬予以蒸鍍、經由照相石板步 驟將鉻層予以蝕刻處理、故在薄的膜厚下高遮光性可在高 精度下獲得。相反的、因爲係製造步驟長且生産性低之方 法,需高成本、又、會有因蝕刻處理之廢棄液等引起的環 境問題等。 因此、以使遮光性顔料、染料分散之感光性樹脂,來 形成低成本、無公害之樹脂BM之形成方法被全力的硏究 著。但是、樹脂BM因會有後述等問題、故在目前並無法 實用化。在樹脂BM中、爲了顯現鉻等金屬膜所致與BM 有同等遮光性(光學濃度)、則可使遮光性之顔料、染料 等含有量變多、或者 '有必要使膜厚變厚。 在使膜厚變厚之方法中、受到BM凹凸之影響、會損 及其上所形成RGB着色畫素之平坦性。因此、會引起液 晶晶胞間隔(cell gap )之不均勻化或液晶定向之紊亂, 造成顯示能力降低。又、亦會有設於濾色器上之透明電極 ITO (銦錫氧化物)膜之斷線(平面狀膜之破損)等之問 題產生。 又、在使遮光性顔料、染料含有量變多之方法中、會 有感光性樹脂(黑色抗蝕劑)感度、顯像性、解像性、密 -5- (3)1343930 接性等悪化之問題、不僅生産性降低而且濾色器所要求之 精度、信頼性亦無法獲得。亦即 '在薄膜、高遮光性之條 件下因可發揮感度、解像性之感光材料無法被實現,故阻 礙了樹脂BM之實用化。 習知之一般的感光性樹脂、或者 '濾色器用之着色感 光性組成物等具有一定光透過性之感光性樹脂中,就改善 感度、解像性性能的方法爲周知。例如、作爲使顔料分散 之濾色器用着色組成物則有黏合劑樹脂、多官能丙烯單體 、含有三蜻化合物所成引發劑之感光性組成物爲周知(請 參照專利文獻1〜4 )。又、在同様組成中引發劑爲雙咪唑 爲周知(請參照專利文獻5〜6 )、在該等所揭示之組成物 之場合、在空氣中曝光之情況受到因氧所致之聚合阻礙、 故實用上無法獲得感度。 如樹脂BM般在光之全波長領域中有要求遮光能力之 情形、(1)曝光部分與未曝光部分中要使交聯密度有所 差別極爲困難、(2)即使在被曝光之部分,相對於膜厚 方向之交聯密度有所差別、就是說、在光照射面即使予以 充分硬化、在基底面仍然不會硬化、(3)在顯像液配合 有不溶性的多量黒色色材,造成顯像性顯著降低等、則在 賦予感光特性上造成障礙》 尤其是、上述(1)與(2)之顯像爲相反、若使曝光 厚光勻 膜曝均 則當法 、、 無 成又度 組。密 之低化 化降硬 硬力之 爲像部 更解光 分成曝 部造與 , 差之 大度液 變密像 差聯顯 度交的 密之強 化部力 硬光解 之曝溶 之未’ (4) (4)1343930 使用亦顯困難,造成顯像性之改良亦爲困難。周知之樹脂 Β Μ形成用感光性組成物(例如、請參照日本專利文獻7 〜8)、可避免此等狀況、但並非形成與金屬ΒΜ相同程 度之遮光樹脂ΒΜ、而是使某種程度之光透過以獲得感光 能力,但其遮光能力顯著降低並無法實際使用。因此、既 然高膜厚、低遮光性之樹脂ΒΜ —旦形成後在固化(cure )步驟中予以膜收縮、得以獲得在薄膜具有高遮光度之樹 脂BM被提案出(請參照專利文獻9 )、但步驟變得複雑 、故因膜收縮時之變形(strain )蓄積使得密接性降低等 之問題’實用化亦有困難。這樣的話、所謂遮光、則會與 原來與光反應相反之條件下產生光反應,如此乍見之下實 在相當矛盾、因此要實現樹脂BM之實用化有其困難。 又、作爲光聚合引發劑,使用特定之肟酯化合物之技 術爲周知(請參照專利文獻〗〇 )、習知之樹脂所使用 之引發劑(例如、雙咪唑或三蜻系引發劑)、若只是取代 該聘化合物、則無法改善樹脂β Μ所要求之畫像特性、亦 即無法改善感度或解像性。 【專利文獻1】日本特開平^^449號公報 【專利文獻2】日本特開平i_2S4918號公報 【專利文獻3】日本特開平2·ι53353號公報 【專利文獻4】日本特開平2_8〇4號公報 【專利文獻5】日本特開平6_75372號公報 【專利文獻6】日本特開平6_75373號公報 【專利文獻7】日本特開平6_5〗499號公報 (5) (5)1343930 【專利文獻8】日本特開平6-3518號公報 【專利文獻9】日本特開平8_44〇5〇號公報 【專利文獻10】日本特開2000-80068號公報 【發明內容】 〔發明欲解決課題〕 本發明係爲解決上述問題,提供一種使具有薄膜、高 遮光性之圖案以照相平版法(photo lithography)更容易 形成、擁有充分之感度、解像性之抗蝕劑材料、使得濾色 器之樹脂BM可在高精度、低成本下製造。又使用如此方 式製造之濾色器的液晶顯示裝置,其對比等之顯示能力優 異。又、藉由BM之樹脂化可衡量濾色器之高畫質化、無 公害化。 〔解決課題之手段〕 本發明人等經努力硏究結果、發現作爲光聚合引發劑 ’係使特定之肟酯化合物、且作爲有機結合劑,係使具有 羧基之環氧丙烯酸酯樹脂加以組合所含有之光聚合性組成 物來加以使用、而可達成上述目的,因而完成本發明。 亦即、本發明之要旨、係在含有(a )黒色色材、(b )有機結合材及(c)光聚合引發劑之光聚合性組成物中 ' (b)爲具有羧基之環氧丙烯酸酯樹脂、(c)爲肟酯系 化合物,爲其特徴之前述光聚合性組成物。 又、本發明之上述光聚合性組成物、進而含有(d) -8 - (6) 1343930 光聚合性單體,爲其特徴之光聚合性組成物。 • 又、本發明中上述光聚合性組成物、進而含有(e) .具鹼性官能基之高分子分散劑,爲其特徴之光聚合性組成 物。 又、本發明係、在基板上具有上述光聚合性組成物所 形成之BM,爲其特徵之濾色器、及使用如此方式製造出 之濾色器來製造之液晶顯示裝置。 〔發明之効果〕 本發明之光聚合性組成物、在薄膜中有高遮光性,同 • 時感度、解像性優異、故可在低成本形成高品質之樹脂 , B Μ。使用本發明之樹脂B Μ之濾色器,在精度、平坦性、 耐久性均優異、故可提高液晶元件顯示品質。又、製造步 驟及濾色器本身亦不含有害物質、故對於人體之危險性可 予減低並提高環境安全性。 〔實施發明之最佳形態〕 (a )黒色色材 本發明之黒色色材、可使用單獨黒色色材、或紅、綠 、藍色等混合所致之黒色色材。該等黒色色材、可自無機 ' 或者有機之顔料、染料之中適宜選擇、亦可單獨使用或多 種混合使用。 單獨之黒色色材、有例如碳黑、乙炔黑、燈黑(lamP black)、骨黑(bone black)、黒錯、鐵黒 '苯胺黑、花 -9 · (7)1343930 青黑(cyanin black)等。該等中、尤其是碳黑就遮光率 、畫像特性之觀點言之較佳。相關碳黑之市售品之例、有 以下等之品牌。 三菱化學公司製:MA7、MA8、MA 11、MA 100、MA 220、MA 23 0、#52、井 50、井 47、井 45、井 2700、井 2650、井 2200 ' 井 1 000、井 990、#900 等。1343930 (1) EMBODIMENT OF THE INVENTION [Technical Field] The present invention relates to a photopolymerizable composition for a color filter used in the manufacture of an optical color filter used for a color television, a liquid crystal display element, a solid-state imaging device, a camera, or the like. And a color filter obtained from the composition, in particular, the present invention relates to a black matrix (Black Matrix, hereinafter abbreviated as BM) which is excellent in high light-shielding property and excellent in resolution. A photopolymerizable composition for a color filter and a color filter of a resin B having high precision and high light-shielding property. [Prior Art] A color filter is usually formed on a surface of a transparent substrate such as glass or a plastic sheet to form a ochre substrate, and then three or more different hue such as red, green, and blue are sequentially arranged in a stripe shape or a mosaic form. The color sample is formed. The color sample size varies depending on the color filter application and various colors, and is about 5 to 700 μηι. Further, the positional accuracy of superposition is several to several tens of μm, and can be manufactured by a microfabrication technique with high dimensional accuracy. Representative production methods of the color filter include a dyeing method, a printing method, a pigment dispersion method, and an electrolytic deposition method. Among these, in particular, a photopolymerizable composition containing a color material is applied onto a transparent substrate, and the image is exposed, developed, and repeatedly hardened as needed to form a pigment dispersion of the color filter image. The method is excellent in durability such as high-resolution color filter position and film thickness, and excellent in durability such as light resistance and heat resistance, and thus has many defects such as pin holes. -4- (2) (2) 1343930 BM is arranged in a grid, stripe or mosaic in the red, green and blue samples, and the contrast is improved or the light is leaked due to the suppression of color mixing between the colors. The prevention of malfunction of the thin film transistor (TFT) has its effect. Therefore, BM is required to have a high degree of opacity. The conventional BM is formed by a metal film such as chromium. In this method, a metal such as chromium is vapor-deposited on a transparent substrate, and the chromium layer is etched by a lithographic step. Therefore, high light-shielding properties can be obtained with high precision at a thin film thickness. On the contrary, because of the long manufacturing process and low productivity, high cost, environmental problems due to etching treatment, and the like are required. Therefore, a method of forming a low-cost, pollution-free resin BM by using a photosensitive resin in which a light-shielding pigment or a dye is dispersed is fully studied. However, since the resin BM has problems such as those described later, it is currently not practical. In the resin BM, in order to exhibit a light-shielding property (optical density) similar to that of BM in order to develop a metal film such as chromium, the content of a light-shielding pigment or a dye may be increased, or the film thickness may be increased. In the method of increasing the film thickness, it is affected by the BM unevenness, and the flatness of the RGB coloring pixels formed thereon is damaged. Therefore, the unevenness of the cell gap or the disorder of the liquid crystal orientation may be caused, resulting in a decrease in display ability. Further, there is a problem that the transparent electrode ITO (indium tin oxide) film provided on the color filter is broken (damage of the planar film). In addition, in the method of increasing the amount of the light-shielding pigment or the dye, the photosensitive resin (black resist) sensitivity, developability, resolution, and adhesion - 5 - 3343330 bondability The problem, not only the decrease in productivity, but also the accuracy and reliability required for the color filter is not available. That is to say, the photosensitive material which can exhibit sensitivity and resolution under the condition of film and high light-shielding property cannot be realized, and thus the practical use of the resin BM is hindered. A known method of improving the sensitivity and the resolution performance of a photosensitive resin such as a general photosensitive resin or a photosensitive photosensitive composition for a color filter having a certain light transmittance is known. For example, as a coloring composition for a color filter for dispersing a pigment, a photosensitive resin having a binder resin, a polyfunctional propylene monomer, and an initiator containing a triterpenoid compound is known (refer to Patent Documents 1 to 4). Further, in the homofluorene composition, the initiator is known as bisimidazole (see Patent Documents 5 to 6), and in the case of the disclosed compositions, exposure to air is inhibited by polymerization due to oxygen. Sensitivity is not available in practice. As in the case of the resin BM, there is a case where the light-shielding ability is required in the entire wavelength range of light, and (1) it is extremely difficult to make the difference in the crosslinking density in the exposed portion and the unexposed portion, and (2) even in the portion to be exposed, The crosslink density in the film thickness direction is different, that is, even if it is sufficiently hardened on the light-irradiated surface, it does not harden on the base surface, and (3) a large amount of indigo color material is blended in the developing solution, causing significant When the image quality is remarkably lowered, the photosensitive property is impaired. In particular, the development of (1) and (2) above is reversed, and if the exposure is thick, the film is exposed, and the method is unsuccessful. group. The density is reduced, the hard and hard force is reduced to the image part, and the light is divided into the exposed part. The difference is the large degree of liquid density, and the difference between the hard part and the hard part is not dissolved. (4) (4) 1343930 It is also difficult to use, and it is difficult to improve the imaging performance. A photosensitive composition for forming ruthenium ruthenium (for example, refer to Japanese Patent Laid-Open No. Hei 7-8), which can avoid such a situation, but does not form a light-shielding resin of the same degree as the metal ruthenium, but to some extent Light passes through to obtain photosensitivity, but its light-shielding ability is significantly reduced and cannot be practically used. Therefore, since the resin having a high film thickness and a low light-shielding property is formed by shrinking the film in the cure step after the formation, a resin BM having a high light-shielding property in the film is proposed (refer to Patent Document 9). However, since the step is re-examined, the problem of the decrease in the adhesion due to the accumulation of the strain at the time of film shrinkage is difficult to put into practical use. In this case, the so-called shading causes a photoreaction under the condition that the original reaction with the light is reversed, so that it is quite contradictory in view of this, and therefore it is difficult to realize the practical use of the resin BM. Further, as a photopolymerization initiator, a technique using a specific oxime ester compound is known (refer to Patent Document 〇), an initiator used in a conventional resin (for example, a diimidazole or a triazine initiator), if only In place of the compound, the image characteristics required for the resin β Μ cannot be improved, that is, the sensitivity or the resolution cannot be improved. [Patent Document 1] Japanese Unexamined Patent Application Publication No. JP-A No. Hei. No. Hei. [Patent Document 5] Japanese Laid-Open Patent Publication No. Hei 6-75373 (Patent Document 7) Japanese Laid-Open Patent Publication No. Hei 6-75373 (Patent Document 7) Japanese Patent Laid-Open No. Hei 6-5 (499) (5) 1343930 [Patent Document 8] [Patent Document 9] Japanese Laid-Open Patent Publication No. Hei. No. 2000-80068 (Patent Document 10) [Problems to be Solved by the Invention] The present invention has been made to solve the above problems. Provided is a resist material which is more easily formed by photolithography with a film and a high light-shielding pattern, and which has sufficient sensitivity and resolution, so that the resin BM of the color filter can be high precision and low. Manufactured under cost. Further, a liquid crystal display device using a color filter manufactured in such a manner is excellent in display capability such as contrast. Moreover, the resin of BM can measure the high image quality and pollution-free color of the color filter. [Means for Solving the Problem] The present inventors have found that a specific oxime ester compound as a photopolymerization initiator is used as a photopolymerization initiator, and an epoxy acrylate resin having a carboxyl group is combined as an organic binder. The above object can be attained by using a photopolymerizable composition contained therein, and thus the present invention has been completed. That is, the gist of the present invention is in a photopolymerizable composition containing (a) a ochre color material, (b) an organic binder, and (c) a photopolymerization initiator. (b) is an epoxy acrylate having a carboxyl group. The ester resin and (c) are oxime ester-based compounds, and the above-mentioned photopolymerizable composition is particularly preferred. Further, the photopolymerizable composition of the present invention further contains (d) -8 - (6) 1343930 photopolymerizable monomer, which is a photopolymerizable composition. Further, in the present invention, the photopolymerizable composition further contains (e) a polymer dispersing agent having a basic functional group as a photopolymerizable composition. Further, the present invention relates to a BM formed of the photopolymerizable composition on a substrate, a color filter characterized by the same, and a liquid crystal display device manufactured by using the color filter manufactured in this manner. [Effects of the Invention] The photopolymerizable composition of the present invention has high light-shielding property in a film, and is excellent in sensitivity and resolution, so that a high-quality resin can be formed at a low cost, B Μ. The color filter of the resin B of the present invention is excellent in accuracy, flatness, and durability, so that the display quality of the liquid crystal element can be improved. Moreover, the manufacturing steps and the color filter itself do not contain harmful substances, so the danger to the human body can be reduced and the environmental safety can be improved. [Best Mode for Carrying Out the Invention] (a) Twilight Color Material The green color material of the present invention may be a single color material or a red color material obtained by mixing red, green, blue or the like. These ochre color materials may be selected from inorganic 'or organic pigments and dyes, and may be used singly or in combination. Separate color materials, such as carbon black, acetylene black, lamP black, bone black, erroneous, sputum 'aniline black, flower -9 · (7) 1343930 black (cyanin black )Wait. Among these, in particular, carbon black is preferred in terms of light blocking rate and image characteristics. Examples of commercial products related to carbon black, such as the following brands. Mitsubishi Chemical Corporation: MA7, MA8, MA 11, MA 100, MA 220, MA 23 0, #52, well 50, well 47, well 45, well 2700, well 2650, well 2200 'well 1 000, well 990, #900等.

D egu s s a 公司製:P r i n t ex 95、Printex 90、Printex 85、 Printex 75、 Printex 55、 Printex 45、 Printex 40、 Printex 30、Printex 3、Printex A、Printex G、Special Black 550 、Special Black 3 50、Special Black 250、Special Black 1 00 等。D egu ssa company: P rint ex 95, Printex 90, Printex 85, Printex 75, Printex 55, Printex 45, Printex 40, Printex 30, Printex 3, Printex A, Printex G, Special Black 550, Special Black 3 50, Special Black 250, Special Black 1 00, etc.

Cabot 公司製:Monarch 460、Monarch 430、Monarch 2 8 0 、 Monarch 120 、 Monarch 8 0 0 、 Monarch 4 6 3 0 、 REGAL 99、 REGAL 99R、 REGAL 415 ' REGAL 415R、Cabot company: Monarch 460, Monarch 430, Monarch 2 8 0, Monarch 120, Monarch 8 0 0, Monarch 4 6 3 0, REGAL 99, REGAL 99R, REGAL 415 ' REGAL 415R,

REGAL 2 50、REGAL 2 50R、REGAL 3 3 0、BLACK PEARLS 480、P EARLS 130REGAL 2 50, REGAL 2 50R, REGAL 3 3 0, BLACK PEARLS 480, P EARLS 130

Columbian Carbon 公司製:RAVEN II、RAVEN 15、 RAVEN 30 、 RAVEN 35 、 RAVEN 40 、 RAVEN 410 、 RAVEN 420、RAVEN 450、RAVEN 500、RAVEN 7 80、 RAVEN 8 5 0、RAVEN 8 90H、RAVEN 1 000、RAVEN 1020 、RAVEN 1 040 等。 其次、就混合所致之黒色色材加以説明。作爲混合基 質(base )之色材之具體例、有維多利亞純藍(42595 ) 、金色胺(auramine ) Ο ( 4 1 000 ) 、Kachiron 華麗黃色素 -10- (8)1343930 (briliant flavin )(基色 13)、若丹明(rhodamine) 6GCP ( 45160 )、若丹明 B ( rhodamine B) ( 4 5 1 7 0 )、 藏紅(safranine) OK70:100 ( 50240)、羊毛罌紅( erioglaucine ) ( 4208 0 ) 、NO, 120/ 李奧黃(rionolColumbian Carbon Company: RAVEN II, RAVEN 15, RAVEN 30, RAVEN 35, RAVEN 40, RAVEN 410, RAVEN 420, RAVEN 450, RAVEN 500, RAVEN 7 80, RAVEN 8 5 0, RAVEN 8 90H, RAVEN 1 000, RAVEN 1020, RAVEN 1 040, etc. Next, the description will be made on the color of the ochre material. Specific examples of the color material of the mixed base include Victoria Pure Blue (42595), auramine Ο (4 1 000 ), and Kachiron Gorgeo Yellow -10- (8) 1343930 (briliant flavin) (primary color) 13), rhodamine 6GCP ( 45160 ), rhodamine B ( 4 5 1 7 0 ), safranine OK70: 100 ( 50240), wool erythroid ( erioglaucine ) ( 4208 0 ) , NO, 120 / Li Ao Huang (rionol

yellow) ( 21090)、李奧黃- GRO( 21090)、西姆拉堅牢 黃(shimla fast yellow) -8GF ( 21105)、聯苯胺黃-4T-564D ( 2 1 095 )、西姆拉堅牢紅 4015 ( 12355)、李奧紅 7B440 1 ( 1 5 8 5 0 ) 、Fastgen 藍-TGR-L ( 74 1 60 )、李奧藍- SM (26150)、李奧藍-ES(色素藍-15:6) 、Ri〇no gen 紅 GD (色素紅168 )、李奧綠2YS (色素綠(pigment green )36)等(又、上述之()内之數字、係指比色指數( C.I.))。 又、進而其他可混合使用之顔料,若以C. I .數字表 示、則有例如、C.I.黄色顔料20,24,86,93,109,;! 10Yellow) ( 21090), Li Ao Huang - GRO ( 21090), Shimla fast yellow -8GF ( 21105 ) , Benzidine Yellow - 4T-564D ( 2 1 095 ), Shimla Fast Red 4015 (12355), Li Aohong 7B440 1 (1 5 8 5 0 ), Fastgen Blue-TGR-L (74 1 60 ), Leo Blue-SM (26150), Leo Blue-ES (Pigment Blue-15:6 ), Ri〇no gen red GD (pigment red 168), Leo green 2YS (pigment green 36), etc. (again, the number in the above () refers to the colorimetric index (CI)). Further, other pigments which can be used in combination, if expressed by C.I., are, for example, C.I. yellow pigments 20, 24, 86, 93, 109, ; 10

,117 , 125, 137, 138, 147, 148, 153, 154, 166、 CI 橘色顔料36,43,51,55,59,61、(:.1.紅色顔料9,97 ,122, 123, 149, 168, 177, 180, 192, 215, 216, 217 ’ 220 ’ 223,224,226,227,22 8,240、C.I.紫顔料 19 ,23,29,30,37,40,50、C.I.藍色顔料 15,15:1, 15:4,22,60,64、C.l·綠色顔料7、·棕色顔料23,25 > 26 等。 又、上述碳黑、可與其他黒色或有色之無機、有機顔 料併用。其他之顔料、因比碳黑之遮光性或畫像特性爲低 ’故本身之混合比率有其限制。 -11 - 1343930 ⑼ (b )有機結合材 本發明中作爲(b)有機結合材、係使用具有羧基之 環氧丙烯酸酯樹脂。 上述環氧丙烯酸酯樹脂、係將α,β —不飽和單羧酸 或在酯部分具羧基之a’ β —不飽和單羧酸酯予以加成至 環氧樹脂、進而、與多鹼式酸酐反應來合成。此等反應生 成物在化學構造上、實質上不具有環氧基、且並非限定於 「丙烯酸酯」、但環氧樹脂爲原料、且「丙烯酸酯」係代 表性之例、故依慣用方式如此命名而已。 爲原料之環氧樹脂可恰當的使用、(鄰,間,對-) 甲酚粉醛清漆型環氧樹脂、酚粉醛清漆型環氧樹脂、雙酚 Α型環氧樹脂、雙酚F型環氧樹脂、三酚甲烷型環氧樹脂 、下述[化4]所示環氧樹脂等(請參照專利第28*7 8 48 6號 公報)。環氧樹脂之分子量、以 GPC測定之重量平均分 子量、通常在200〜20万、較佳爲300〜100000之範圍。 分子量未滿上述範圍時在皮膜形成性方面有很多問題會產 生、相反的、超過上述範圍之樹脂則在α,β —不飽和單 羧酸之加成反應時很容易引起膠化,而有難以製造之虞。 -12- 1343930 do) 【化4】,117, 125, 137, 138, 147, 148, 153, 154, 166, CI orange pigment 36, 43, 51, 55, 59, 61, (: 1. red pigment 9, 97, 122, 123, 149, 168, 177, 180, 192, 215, 216, 217 '220 ' 223,224,226,227,22 8,240, CI violet pigment 19,23,29,30,37,40,50,CI blue Color pigments 15, 15:1, 15:4, 22, 60, 64, Cl·green pigment 7, brown pigment 23, 25 > 26, etc. Further, the above carbon black can be combined with other tantalum or colored inorganic, The organic pigments are used in combination. Other pigments have a lower ratio of light-shielding properties or image characteristics than carbon black. Therefore, the mixing ratio of the pigments is limited. -11 - 1343930 (9) (b) Organic binders (b) Organic bonding in the present invention An epoxy acrylate resin having a carboxyl group is used as the material, and the above epoxy acrylate resin is an α,β-unsaturated monocarboxylic acid or an a' β-unsaturated monocarboxylic acid ester having a carboxyl group in the ester moiety. It is synthesized by reacting with an epoxy resin and further with a polybasic acid anhydride. These reaction products are chemically and substantially not The epoxy group is not limited to the "acrylate", but the epoxy resin is a raw material, and the "acrylate" is a representative example. Therefore, the epoxy resin which is a raw material can be suitably used. , (o-, inter-, p-) cresol novolac type epoxy resin, phenolic aldehyde varnish type epoxy resin, bisphenol fluorene type epoxy resin, bisphenol F type epoxy resin, trisphenol methane type epoxy The resin, the epoxy resin shown in the following [Chemical Formula 4], etc. (refer to Patent No. 28*7 8 48 6). The molecular weight of the epoxy resin and the weight average molecular weight measured by GPC are usually 200 to 200,000. Preferably, it is in the range of 300 to 100000. When the molecular weight is less than the above range, there are many problems in film formability, and the opposite, the resin exceeding the above range is in the addition reaction of the α,β-unsaturated monocarboxylic acid. It is easy to cause gelation, but it is difficult to manufacture. -12- 1343930 do) 【化4】

α,β —不飽和單羧酸、有衣康酸、八豆酸、桂皮酸、丙烯 酸、異丁烯酸等、較佳爲、丙烯酸及異丁烯酸、尤其是丙 . 烯酸反應性良好故較佳。在酯部分具有羧基之a,β —不 . 飽和單羧酸酯、有丙烯酸一 2-琥珀醯基氧乙酯、丙烯酸一 2·馬來醯基氧乙酯、丙烯酸一 2 -酞醯基氧乙酯、丙烯酸-2-六氫献醯基氧乙酯、異丁烯酸-2-琥珀醯基氧乙酯、異丁 烯酸一 2_馬來醯基氧乙酯、異丁烯酸一 2-酞醯基氧乙酯、 • 異丁烯酸-2-六氫酞醯基氧乙酯、八豆酸-2-琥珀醯基氧乙 醋等、較佳爲、丙烯酸_2_馬來醯基氧乙酯及丙烯酸-2_酞 醯基氧乙酯、尤其是丙烯酸-2-馬來醯基氧乙酯較佳。 a’ β —不飽和單羧酸或其酯與環氧樹脂之加成反應、 可使用公知方法、例如、可在酯化觸媒存在下、於5〇〜 ' 1 50°C之温度下反應。酯化觸媒可使用三乙胺、三甲胺、 节基二甲胺、苄基二乙胺等之3級胺、氯化四甲基銨、氯 化四乙基錢、氯化十二基三甲基銨等之4級銨鹽等。 a’ p一不飽和單羧酸或其酯之使用量、相對於原料環 氧樹脂之環氧基1當量以0·5〜1.2當量之範圍較佳、更佳 -13- (11) (11)1343930 者爲在0.7〜1.I當量之範圍’ a’ β —不飽和單羧酸或其 醋之使用量若少則不飽和基之導入量不足、接著與多驗式 酸酐之反應亦不充分°又、多量環氧基之殘存亦非有利。 —方面、該使用量若大,則α,β —不飽和單羧酸或其酯 則以未反應物方式殘存。在任一之情形均被認爲會使硬化 特性傾向於悪化。 在附加a,β —不飽和羧酸或其酯之環氧樹脂、進而 予以附加之鹼式酸酐、有馬來酸酐、琥珀酸酐、衣康酸酐 、酞酸酐、四氫酞酸酐、六氫酞酸酐、均苯四甲酸酐、偏 苯三酸酐、二苯基酮四羧酸二酐、甲基六氫酞酸酐、端亞 甲基四氣酞酸酐、氯菌酸(chlorendic)酐、甲基四氣献 酸酐 '聯苯基四羧酸二酐等、較佳爲、有馬來酸酐、琥珀 酸酐、衣康酸酐、酞酸酐、四氫酞酸酐、六氫酞酸酐、均 苯四甲酸酐、偏苯三酸酐、聯苯基四羧酸二酐、最佳之化 合物爲、四氫酞酸酐及聯苯基四羧酸二酐。 關於多鹼式酸酐之附加反應亦可使用公知之手法、在 與a’ β —不飽和羧酸或其酯之附加反應相同條件下繼續 反應之而可獲得。多鹼酸酐之附加量、以生成之環氧丙烯 酸酯樹脂之酸値爲1〇〜150mg KOH/g之範圍較佳、進而 以20〜140mg KOH/g特佳。樹脂酸値在上述範圍以下時 則缺乏鹼顯像性、又、超過上述範圍時被認爲硬化性能傾 向於劣化。 (c )光聚合引發劑 C S ) -14- (12) (12)1343930 本發明之光聚合性組成物、作爲光聚合引發劑則含有 月弓醋系化合物。 較佳之肟酯系化合物、有一般式(2)所示化合物。 【化5】The α,β-unsaturated monocarboxylic acid, itaconic acid, crotonic acid, cinnamic acid, acrylic acid, methacrylic acid, etc., preferably acrylic acid, methacrylic acid, and especially acrylic acid are preferred because of their good reactivity. a, β-un.saturated monocarboxylate having a carboxyl group in the ester moiety, 2-nonylsulfonyloxyethyl acrylate, 2-ondanyloxyethyl acrylate, 2-nonyloxy acrylate Ethyl ester, -2-hexahydroacetic acid ethyl acrylate, 2-succinyloxyethyl methacrylate, methacrylic acid 2- 2 maleic acid ethyl ester, methacrylic acid 2-mercaptooxy oxygen Ethyl ester, • -2-hexahydroindenyloxyethyl methacrylate, octadecyl-2-bromodecyloxy acetoacetate, etc., preferably, _2_maleyl oxyethyl acrylate and acrylic acid - 2_Mercaptooxyethyl ester, especially 2-malonyloxyethyl acrylate is preferred. a' β-addition reaction of an unsaturated monocarboxylic acid or an ester thereof with an epoxy resin, and a known method, for example, in the presence of an esterification catalyst, at a temperature of 5 〇 to 1 50 ° C . The esterification catalyst may be a tertiary amine such as triethylamine, trimethylamine, benzyl dimethylamine or benzyldiethylamine, tetramethylammonium chloride, tetraethyl chlorinated or decyl chloride. A grade 4 ammonium salt such as methylammonium or the like. The amount of the a'p-unsaturated monocarboxylic acid or its ester is preferably in the range of from 0.5 to 1.2 equivalents per 1 equivalent of the epoxy group of the starting epoxy resin, and more preferably -13 (11) (11 ) 1343930 is in the range of 0.7 to 1. I equivalent of ' a' β - the amount of unsaturated monocarboxylic acid or its vinegar is small, the amount of introduction of the unsaturated group is insufficient, and then the reaction with the multi-anhydride is not It is also not advantageous to have a sufficient amount of residual epoxy groups. On the other hand, if the amount used is large, the α,β-unsaturated monocarboxylic acid or its ester remains as an unreacted product. In either case, it is considered that the hardening property tends to be deuterated. An epoxy resin to which an a, β-unsaturated carboxylic acid or an ester thereof is added, and further a basic acid anhydride, maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, Pyromellitic anhydride, trimellitic anhydride, diphenyl ketone tetracarboxylic dianhydride, methyl hexahydrophthalic anhydride, terminal methylene tetraphthalic anhydride, chlorendic anhydride, methyl tetragas anhydride anhydride Phenyltetracarboxylic dianhydride or the like, preferably, maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, pyromellitic anhydride, trimellitic anhydride, biphenyltetracarboxylic acid The acid dianhydride, the most preferred compound, is tetrahydrophthalic anhydride and biphenyltetracarboxylic dianhydride. The additional reaction with a polybasic acid anhydride can also be obtained by continuing the reaction under the same conditions as the additional reaction of the a'β-unsaturated carboxylic acid or its ester by a known method. The amount of the polybasic acid anhydride to be added is preferably in the range of from 1 to 150 mg KOH/g, more preferably from 20 to 140 mg KOH/g, based on the acid cerium of the produced epoxy acrylate resin. When the resin strontium silicate is less than the above range, it lacks alkali developability, and when it exceeds the above range, it is considered that the hardenability is degraded. (c) Photopolymerization initiator C S ) -14- (12) (12) 1343930 The photopolymerizable composition of the present invention contains a moon vinegar-based compound as a photopolymerization initiator. A preferred oxime ester compound is a compound represented by the general formula (2). 【化5】

(式中、R1、爲可各自取代之苯基、碳數1〜10之烷基、 碳數5〜8之環烷基、碳數2〜20之烷醯基、苯甲醯基、 碳數2〜12之烷氧羰基、苯氧羰基、醯胺基或硝基、R2爲 、可各自取代之碳數2〜12之烷醯基、碳數4〜6之烯醯 基(alkenoyl )、苯甲醢基 '碳數2〜6之烷氧羰基或苯氧 鑛基、R3、R4、R5、R6及R7爲、互相獨立之氫原子 '鹵 原子、可各自取代之碳數1〜12之烷基、碳數1〜12之烷 氧基、碳數5〜8之環烷基、苯基、苄基、苯甲醯基、碳 數2〜12之烷醯基、碳數2〜12之烷氧羰基、苯氧羰基或 、-OR8、-SR9、-SOR9、-S02R9 或者-NRMR11、且、R3、 R4、R5、R6及 R7之至少—個、表示_〇R8、-Sr9或_ NR^R11。但R8爲、氫原子 '可各自取代之碳數1〜12之 烷基、碳數2〜8之烷醯基、碳數3〜12之鏈烯基、碳數3 〜6之烯醯基、苯基或-(CH2CH2〇) nH(n爲1〜20之整 -15- (13) (13)1343930 數)、R9爲、氫原子、可各自取代之碳數1〜12之烷基、 碳數3〜12之鏈烯基或苯基、R1Q及R11爲、可互相獨立 之氫原子、可各自取代之碳數1〜12之烷基、碳數2〜4 之羥基烷基、碳數3〜5之鏈烯基或苯基、且R3、R4、R5 ' R6及R7可互相鍵結形成環構造) 此肟酯系化合物、其本身爲公知之化合物、例如、日 本特開2000-80068號公報所記載之一連串化合物之一種 〇 上述肟酯系化合物之中、較佳化合物之置換基係如以 下所示。 R1:可取代之碳數1〜10者、例如甲基、乙基、丙基、 丁基、戊基、己基、庚基、辛基、壬基'癸基等。較佳爲 碳數2〜8之烷基、而更佳爲碳數5〜7者、特佳爲己基。 R2··有乙醯基' 苯醯基' 4-甲基苯醯基、4-氯苯醯基、 2’4’6-三氯苯醯基或3-甲基苯醯基等。較佳爲乙醯基、 苯醯基、而特佳爲苯醯基。 R3 ' R6、R7:氫原子 R4:氫原子或甲氧基 R5:甲基氫硫基、苯基氫硫基或1,4-氧氮雜基 R3、R4、R5、R6及R7可互相鍵結形成環構造、係指 R3〜R7之中2以上爲鍵結形成環構造亦可者。 再者,具體的化合物係、具取代基R1,R2 , R4及R5 之組合以一覧表顯示則如表1所示。又、表1所無記載之 R3’ R6,R7則均爲氫原子。在表1化合物中以21號及22 -16- (14)1343930(wherein R1 is a phenyl group which may be substituted, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 5 to 8 carbon atoms, an alkanoyl group having 2 to 20 carbon atoms, a benzamidine group, a carbon number 2 to 12 alkoxycarbonyl, phenoxycarbonyl, decylamino or nitro, R 2 , an alkanoyl group having 2 to 12 carbon atoms, an alkenoyl group having 4 to 6 carbon atoms, and benzene each independently substituted A mercapto group having a carbon number of 2 to 6 alkoxycarbonyl or a phenoxy alkane group, R 3 , R 4 , R 5 , R 6 and R 7 are mutually independent hydrogen atoms 'halogen atom, each of which may be substituted with a carbon number of 1 to 12 Alkoxy group having a carbon number of 1 to 12, a cycloalkyl group having 5 to 8 carbon atoms, a phenyl group, a benzyl group, a benzamyl group, an alkyl 2 group having 2 to 12 carbon atoms, and an alkyl group having 2 to 12 carbon atoms At least one of oxycarbonyl, phenoxycarbonyl or -OR8, -SR9, -SOR9, -S02R9 or -NRMR11, and R3, R4, R5, R6 and R7, representing _〇R8, -Sr9 or _NR^ R11. However, R8 is an alkyl group having 1 to 12 carbon atoms which may be substituted by a hydrogen atom, an alkanoyl group having 2 to 8 carbon atoms, an alkenyl group having 3 to 12 carbon atoms, and an olefin having a carbon number of 3 to 6. Base, phenyl or -(CH2CH2〇) nH (n is a -15-(13) (13) 1343930 number) of 1 to 20, R9 is a hydrogen atom, Self-substituted alkyl group having 1 to 12 carbon atoms, alkenyl group having 3 to 12 carbon atoms or phenyl group, R1Q and R11 being independently hydrogen atoms, and alkyl groups each having 1 to 12 carbon atoms; a hydroxyalkyl group having 2 to 4 carbon atoms, an alkenyl group having 3 to 5 carbon atoms or a phenyl group, and R 3 , R 4 , R 5 ' R 6 and R 7 may be bonded to each other to form a ring structure). The oxime ester compound itself is A known compound, for example, one of the series of compounds described in JP-A-2000-80068, and the above-mentioned oxime ester-based compound, the preferred substituent of the compound is as follows. R1: a carbon number of 1 to 10 which may be substituted, for example, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a decyl group, and the like. It is preferably an alkyl group having 2 to 8 carbon atoms, more preferably 5 to 7 carbon atoms, particularly preferably a hexyl group. R2·· has an ethyl fluorenyl 'benzoyl' 4-methylphenyl fluorenyl group, a 4-chlorophenyl fluorenyl group, a 2'4'6-trichlorophenyl fluorenyl group or a 3-methylphenyl fluorenyl group. It is preferably an ethyl fluorenyl group, a benzoinyl group, and particularly preferably a benzoquinone group. R3 ' R6, R7: hydrogen atom R4: hydrogen atom or methoxy group R5: methyl thio group, phenyl thio group or 1,4-oxaza group R3, R4, R5, R6 and R7 may be bonded to each other The junction forming ring structure means that two or more of R3 to R7 are bonded to form a ring structure. Further, a specific compound, a combination of the substituents R1, R2, R4 and R5 is shown in Table 1 as shown in Table 1. Further, R3' R6 and R7 which are not described in Table 1 are all hydrogen atoms. Among the compounds in Table 1, 21 and 22 -16- (14) 1343930

號之化合物較佳、尤其是2 1號之化合物更佳。 【表1】 化合 物 番号 R1- R2- R4- R5, 1 C2H5— CH3CO- H CHgS- 2 c2h5- C6H5C0- H CH3S- 3 c2h5- ch3co— H 1,4-氧氮雜- 4 c2h5- C6H5CO- H 1,4-氧氮雜 5 C2He- CHgCO- CH3O- CHaO- 6 C2He— CbH5CO- CH3O- CH30- 7 c6h5- ch3co— H CHgS- 8 c2h5— ch3co- H CH3O- 9 c2h5— c6h5co- H CH3O- 10 C2Hs — ch3co— H c6h5s- 11 c2h5- CeHsCO- H c6h5s- 12 c2h5— 2.4,6-(CH3)3C6H2CO- H CH3S- 13 ch3- c6h5co- H ch3s- 14 n_C6H13 — CH3C0- .H ch3s- 15 n—C6H13 — c6h6co- H ch3s- 16 (CHa)3CCH2CH(CH3)- c6hbco- H ch3s- 17 (CHa) 3CCHzCH (CHa)- CH3CO- H ch3s— 18 n —C6Hi3— 4-CH3C6H4CO- H c6h5s- 19 n—C6H13 — 4 一 CIC6H4CO— H c6h5s- 20 n — C6H13 — 3-CH3C6H4CO- H c6h5s- 21 n—CeHl3 — C6H5C0-- H c6h5s- 22 n—C3H7 — ch3co- H ch3s- 23 η —〇3Η7 — ch3co- H C6HsS- 24 n —C3H7— CsH5C0- H CHgS- 其他之肟酯系化合物、則有下述一般式(3 ) 、 ( 4 )Preferably, the compound of the number No., especially the compound of No. 2 is more preferred. [Table 1] Compound number R1- R2- R4- R5, 1 C2H5-CH3CO-H CHgS- 2 c2h5- C6H5C0-H CH3S- 3 c2h5- ch3co- H 1,4-oxaza- 4 c2h5- C6H5CO- H 1,4-oxaza5C2He-CHgCO-CH3O-CHaO-6 C2He-CbH5CO-CH3O-CH30- 7 c6h5- ch3co- H CHgS- 8 c2h5— ch3co- H CH3O- 9 c2h5— c6h5co- H CH3O- 10 C2Hs — ch3co— H c6h5s- 11 c2h5- CeHsCO- H c6h5s- 12 c2h5— 2.4,6-(CH3)3C6H2CO- H CH3S- 13 ch3- c6h5co- H ch3s- 14 n_C6H13 — CH3C0- .H ch3s- 15 n— C6H13 — c6h6co- H ch3s- 16 (CHa)3CCH2CH(CH3)- c6hbco- H ch3s- 17 (CHa) 3CCHzCH (CHa)-CH3CO- H ch3s— 18 n —C6Hi3—4CH3C6H4CO- H c6h5s- 19 n— C6H13 — 4 CIC6H4CO—H c6h5s- 20 n — C6H13 — 3-CH3C6H4CO- H c6h5s- 21 n—CeHl3 — C6H5C0-- H c6h5s- 22 n—C3H7 — ch3co- H ch3s- 23 η —〇3Η7 — ch3co- H C6HsS- 24 n —C3H7—CsH5C0- H CHgS- Other oxime ester compounds, the following general formulas (3), (4)

(.S -17- (15)1343930 及(5 )所示化合物。 【化6】(.S -17- (15) 1343930 and (5) compounds.

(式中、Rl、 R2、 R3、 R4、 R5、 r6 及 R7 係 (2)中之定義相同、R4〜R6爲互相鍵結可: 又、Μ係表示、(^丨-C丨2烯烴基、環烯烴基、 (CO) o-(c2-c12 烯烴基)-O(CO)-、. ch2ch2o ) 、- ( CO )-或-(CO ) - ( c2-c12 與前述一般式 形成環構造。 亞苯基基、--(CO ) 0-( 烯烴基)-( -18- (16) (16)1343930 CO )。) 上述目弓醋系化合物中、較佳爲一般式(4)所示肟酯 系化合物、更佳爲—般式(4)所示肟酯系化合物之置換 基’如以下所示。 R :可取代之碳數1〜ίο之烷基、例如甲基、乙基、 丙基、丁基、戊基、己基、庚基、辛基、壬基、癸基等。 較佳爲碳數1〜6、更佳爲碳數1〜3、尤其是甲基較佳。 R2:可取代之碳數2〜10之烷醯基或苯甲醯基、碳數2 〜10之烷醯基、有例如乙醯基、丙醯基、丁醯基、戊醯基 己酿基、庚酿基、辛釀基、壬酸基、癸釀基等。較佳爲 碳數2〜5、更佳爲碳數2〜3、尤其以乙醯基較佳。 R3〜R7:氫原子、各自可取代之碳數1〜12之烷基、 碳數2〜12之儲醯基、苯基、节基、苯甲醯基、或_ NRMr11、R4〜R6係可互相鍵結形成環構造。以及r7以均 爲氫原子較佳。又、R3、R7均爲氫原子、且、R4,R5,r6 中至少之一爲、-N R1QRH更好。又、R3及R7均爲氫原子 、且、R4,R5,R6之中、至少之一爲-NRMr11,且、至少 之一爲可取代之苯基特佳。此時、可取代爲苯基之取代基 、有各自可取代之苯基、碳數1〜10之烷基、碳數5〜8 之環烷基、碳數2〜20之烷醯基、苯甲醯基、碳數2〜12 之烷氧羰基 '苯氧羰基、醯胺基或硝基。較佳爲可取代之 苯甲醯基、更佳爲甲苯醯基、尤其是鄰甲苯醯基較佳》R4 〜R6爲可互相鍵結形成之環構造、R4〜R6之中2以上之 任一種彼此之間鍵結亦可。又、環構造可爲芳香族環、脂 (S ) -19 - (17)1343930 肪族環、雜環之任一種、較佳爲雜環、更佳爲雜原子 原子之雜5員環或δ員環、尤其是雜5員環較佳。 上述聘醋系化合物之中、更佳爲下述一般式(亡 不之的醋系化合物 【化7】 爲氮 )所(wherein R1, R2, R3, R4, R5, r6 and R7 are the same definitions in (2), and R4 to R6 are mutually bonded: Further, lanthanide, (^丨-C丨2 olefinic group) , cycloalkenyl group, (CO) o-(c2-c12 alkenyl)-O(CO)-, .ch2ch2o), -(CO)- or -(CO)-(c2-c12 form a ring structure with the above general formula Phenylene group, --(CO ) 0-(alkenyl)-( -18-(16) (16)1343930 CO ). Among the above-mentioned vinegar-based compounds, preferably the general formula (4) The mercaptoester-based compound, more preferably the substituent group of the oxime ester compound represented by the general formula (4), is as follows. R: an alkyl group having a carbon number of 1 to ί, which may be substituted, for example, a methyl group or an ethyl group. And propyl, butyl, pentyl, hexyl, heptyl, octyl, decyl, decyl, etc. Preferably, the carbon number is from 1 to 6, more preferably from 1 to 3, particularly preferably methyl. R2: an alkanoyl group or a benzamidine group having a carbon number of 2 to 10, an alkano group having a carbon number of 2 to 10, and, for example, an ethyl fluorenyl group, a propyl fluorenyl group, a butyl fluorenyl group, a amyl fluorenyl group, and a fluorene group Brewing base, octyl base, decanoic acid group, broth base, etc., preferably having a carbon number of 2 to 5, more preferably a carbon number of 2 to 3, especially Ethyl fluorenyl is preferred. R3 to R7: a hydrogen atom, an alkyl group having 1 to 12 carbon atoms which may be substituted, a fluorenyl group having 2 to 12 carbon atoms, a phenyl group, a benzyl group, a benzamidine group, or _NRMr11, R4 The R6 groups may be bonded to each other to form a ring structure, and r7 is preferably a hydrogen atom. Further, R3 and R7 are each a hydrogen atom, and at least one of R4, R5 and r6 is preferably -N R1QRH. Further, R3 and R7 are each a hydrogen atom, and at least one of R4, R5 and R6 is -NRMr11, and at least one of them is a substitutable phenyl group. In this case, it may be substituted with a phenyl group. a substituent, a phenyl group which may be substituted, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 5 to 8 carbon atoms, an alkyl fluorenyl group having 2 to 20 carbon atoms, a benzamidine group, and a carbon number of 2 to 12 Alkenyloxycarbonyl 'phenoxycarbonyl, decylamino or nitro. Preferred substituted benzamidine, more preferably toluene, especially o-toluene, preferably R4 to R6 are mutually bondable The ring structure formed by the knot and any one of 2 or more of R4 to R6 may be bonded to each other. Further, the ring structure may be an aromatic ring, a lipid (S) -19 - (17) 1343930, a aliphatic ring, or a heterocyclic ring. Any of the rings, preferably miscellaneous More preferably, it is preferably a heterocyclic atom of a 5-membered ring or a δ-membered ring, especially a heterocyclic 5-membered ring. Among the above-mentioned vinegar-based compounds, the following general formula (the vinegar-based compound which is indefinite) is preferred. 7)

⑹ (式中、R1爲、可取代之碳數1〜1〇之烷基R2爲 自可取代之碳數2〜10之烷醯基、苯甲醯基、RlQ爲 相獨立之氫原子、各自可取代之碳數1〜12之烷基、 φ 2〜4之羥烷基、碳數3〜5之鏈烯基或苯基、R1Q爲、 所鍵結之氣原子而鍵結之芳香族環双方或一方之 取代基或芳香族環之碳原子之其一鍵結來形成環構造 、R12、R13、RM及R15、可互爲獨立' 各自可取代之 '碳數1〜10之烷基、碳數5〜8之環烷基、碳數2 之烷醯基、苯甲醯基、碳數2〜12之烷氧羰基、苯氧 、醯胺基或硝基。) " 上記肟酯系化合物中、較佳之化合物之取代基如 不Λ R1:可取代之碳數I〜10之烷基、例如甲基、乙基 、各 、互 碳數 藉由 更與 亦可 苯基 〜20 羰基 下所 、丙 -20- 08)1343930 戊基、己基、庚基、辛基、壬基、癸基等。較 〜6、更佳爲碳數】〜3、特佳爲甲基。 2 · "^τ •nj取代之碳數2〜10之烷醯基、例如乙醯基、丙 酿基' 丁臨基、戊醯基、己醯基、庚醯基、辛醯基、壬醯 基、癸釀基等。較佳爲碳數2〜5者、更佳爲碳數2〜3者 、特佳爲乙醯基。(6) (wherein R1 is a substitutable carbon number of 1 to 1 alkyl group R2 is a substitutable carbon number of 2 to 10 alkyl fluorenyl group, benzamyl group, RlQ is a separate hydrogen atom, and each An alkyl group having 1 to 12 carbon atoms, a hydroxyalkyl group having 2 to 4 carbon atoms, an alkenyl group having 3 to 5 carbon atoms or a phenyl group, and R1Q being an aromatic ring bonded to a bonded gas atom. One or one of the substituents or one of the carbon atoms of the aromatic ring may be bonded to form a ring structure, R12, R13, RM and R15, which may be mutually independent 'each substituted with a carbon number of 1 to 10, a cycloalkyl group having 5 to 8 carbon atoms, an alkyl fluorenyl group having 2 carbon atoms, a benzhydryl group, an alkoxycarbonyl group having 2 to 12 carbon atoms, a phenoxy group, a decylamino group or a nitro group.) " In the compound, a preferred substituent of the compound is not Λ R1: an alkyl group having a carbon number of 1 to 10, for example, a methyl group, an ethyl group, each, and a carbon number may be further substituted with a phenyl group of -20 carbonyl groups. , C - 20 - 08) 1343930 pentyl, hexyl, heptyl, octyl, decyl, decyl and the like. More than -6, more preferably carbon number 〜3, particularly preferably methyl. 2 · "^τ •nj replaces alkane groups with a carbon number of 2 to 10, such as ethyl fluorenyl, propyl aryl, butyl ketone, pentylene, hexyl, decyl, decyl, fluorenyl, fluorene Stuffed base. It is preferably a carbon number of 2 to 5, more preferably a carbon number of 2 to 3, and particularly preferably an ethylene group.

基、丁基、 佳爲碳數1Base, butyl, preferably carbon number 1

Rl〇:可取代之碳數1〜12之烷基、例如甲基、乙基、 丙基、丁基 '戊基、己基、庚基、辛基 '壬基、癸基、十 一基、十二基等。較佳爲碳數2〜8者、更佳爲碳數2〜6 者、特佳爲乙基^Rl〇: an alkyl group having 1 to 12 carbon atoms which may be substituted, for example, methyl, ethyl, propyl, butyl 'pentyl, hexyl, heptyl, octyl' fluorenyl, fluorenyl, eleven, ten Second base and so on. It is preferably a carbon number of 2 to 8, more preferably a carbon number of 2 to 6, and particularly preferably an ethyl group.

Rl2 R14及R15:氫原子Rl2 R14 and R15: hydrogen atom

Rl3:可取代之苯甲醯基、較佳爲甲苯醯基、特佳爲鄰 甲苯醯基。 上述一般式(3 ) 、 ( 4 ) 、 ( 5 )及(6 )所示化合物 亦爲相同’其本身爲周知之化合物、例如、曰本特開 2 000-8 006 8號公報所記載之一連串化合物之一種。 又、本發明之光聚合引發劑,可單獨使用上述肟酯系 化合物、亦可與其他之光聚合引發劑倂用、而可期待倂用 所致之高感度化。例如、可列舉下述之化合物。 2- (4 -甲氧基苯基)-4,6 -雙(三氯甲基)-s-三畊、 2-(4 -甲氧基萘基)-4,6-雙(三氯甲基)-s-三哄、2-( 4-乙氧基萘基)6-雙(三氯甲基)-s-三畊、2-(4-乙 氧基羰基萘基)-4,6-雙(三氯甲基)-s-三畊等之鹵甲基 化三哄衍生物、2-三氯甲基-5- ( 2’-苯並呋喃基)-1,3, -21 - (19) (19)1343930 4-氧二氮茂、2-三氯甲基·5·〔 P- ( 2,-苯並呋喃基)乙烯基 〕-1,3,4-氧二氮茂、2-三氯甲基- 5-〔β-(2,-(6-苯並 呋喃基)乙烯基)〕-1 ’ 3’ 4_氧二氮茂、2-三氯甲基- 5-呋喃基-1 ’ 3,4-氧二氮茂等之鹵甲基化氧二氮茂衍生物、 2- (2·-氯苯基)-4’ 5-二苯基咪唑二聚物、2- (2·-氯苯基 )-4,5-雙(3,-甲氧基苯基)咪唑二聚物、2-(2·-氟苯 基)-4, 5·二苯基咪唑二聚物、2· (2’-甲氧基苯基)-4’ 5 -二苯基咪嗤二聚物、(4^甲氧基苯基)-4,5 -二苯基咪 唑二聚物等之咪唑衍生物、安息香基甲基醚、安息香基苯 基醚、安息香基異丁基醚、安息香基異丙基醚等之安息香 基(benzoin)院酸類、2 -甲基菌醒’ 2 -乙基菌醌’ 2 -弟二 丁基蔥醌、1-氯蔥醌等之蔥醌衍生物、苯并蒽酮( benzanthrone)衍生物、二苯基嗣、米蛋'嗣(Michlers ketone) 、2 -甲基二苯基酮、3 -甲基—本基嗣、4 -甲基一 苯基酮、2 -氯二苯基酮、4 -溴二苯基酮、2 -羧基二苯基酮 等之二苯基酮衍生物、2,2 -二甲氧基-2-苯基乙醯苯、2’ 2_二甲氧基乙醯苯、1-羥基環己基苯酮、a-羥基-2-甲基苯 基丙酮、1-羥基-1-甲基乙基-(P -異丙基苯基)酮、卜羥 基-丨-(P -十二苯基)酮、2 -甲基-(4'•(甲基硫代)苯基 )-2 -嗎琳代(morpholino) -I -丙嗣、1 ’ 1 ’丨_二氯甲基-(P- 丁基苯基)酮等之乙酿苯衍生物、噻噸酮( thioxanth〇ne) 、2-乙基噻噸_、2-異丙基噻噸酮、2-氯噻 噸酮、2.4 -二甲基噻噸酮、2、4_二乙基噻噸酮、2,4 -一 異丙基噻噸酮等之噻噸酮衍生物、P-二甲基胺基苯甲酸乙 -22- (20) (20)1343930 醋、P-二乙基胺基苯甲酸乙酯等之苯甲酸酯衍生物、9_苯 基吖啶(acridine ) ' 9-(對甲氧基苯基)吖啶等之吖啶 衍生物、9,10 -二甲基苯并吩曉(benzphenazine)等之吩 曉衍生物、雙-環戊二烯-Ti-二氯化物、雙-環戊二烯_Ti 一 雙-苯基、雙-環戊二烯_Ti•雙-(2,3,4,5,6-五氟苯卜 基)、雙-環戊二烯- Ti-雙- (2,3,5,6-四氟苯-U基)、 雙-環戊二烯-Ti-雙- (2,4,6-三氟苯-1-基)、雙-環戊 二烯-Ti-2’ 6-二-氟苯-1_基、雙-環戊二烯-Ti-2,4-二-氟 苯-1·基、雙-甲基環戊二烯-Ti_雙_(2’ 3,4,5,6_五氟 苯-1-基)、雙-甲基環戊二烯-Ti·雙-(^^二-氟苯^基 )、雙-環戊二烯-Ti-2,6-二·氟-3-(吡咯(pyrryl ) _丨-基 )-本-1-基等之二茂駄(titanocene)衍生物等。 本發明之光聚合性組成物、除了上述引發劑成分以外 ’進而可添加増感色素(sensitizing dye)。在高遮光下 欲產生光聚合反應、則添加増感色素較佳。此等増感色素 、有例如日本特開平3-239*703號公報、日本特開平5-2893 3 5號公報所記載之具有雜環之香豆素(coumarin)化 合物、日本特開昭63-22 1 1 1 0號公報記載之3-苯并二氫呋 喃酮(ketocoumarin)化合物、日本特開平4-221958號公 報、日本特開平4-219756號公報記載之二苯駢哌喃( X an thene)色素、日本特開平6-19240號公報記載之甲撐 呲咯(pyrromethene)色素、日本特開昭47-252 8號公報 、曰本特開昭54- 1 5 5292號公報、日本特開昭56- 1 6 6 1 54 號公報、日本特開昭59-56403號公報記載之(對二烷基 -23- (21) (21)1343930 胺基亞节基(benzylidene))酮、苯乙嫌基系色素、日本 特開平6-29506 1號公報記載之具有杜烯(durolidyl)基 之増感色素、日本特開平1 -326624號公報記載之二胺基 苯化合物等。 該等増感色素中特佳爲含胺基之増感色素及二苯駢哌 喃色素。 (d )光聚合性單體 本發明之光聚合性單體、係使用具有乙烯性不飽和基 —個以上之化合物(以下、稱爲乙烯性化合物)。具體而 言、有脂肪族(聚)羥基化合物與不飽和羧酸之酯、芳香 族(聚)羥基化合物與不飽和羧酸之酯、不飽和羧酸與多 價羧酸與脂肪族聚羥基化合物所得之酯、芳香族聚羥基化 合物之環氧乙烷、環氧丙烷加成物與不飽和羧酸之酯化反 應物、脂肪族聚羥基化合物之環氧乙烷、環氧丙烷加成物 與不飽和羧酸之酯化反應物、已內酯變性多價醇與不飽和 羧酸之酯、多價醇與多價異氰酸酯與不飽和羧酸之反應物 、苯乙烯基末端化合物、含磷酸不飽和化合物、聚環氧基 與不飽和羧酸之加成物等 該等之中、脂肪族聚羥基化合物與不飽和羧酸之酯, 具體而言、有乙二醇二丙烯酸酯、三乙二醇二丙烯酸酯' 新戊二醇二丙烯酸酯、己二醇二丙烯酸酯、三羥甲基丙烷 三丙烧酸醋、三經甲基乙院三丙稀酸醋、新戊四醇二丙嫌 酸酯、新戊四醇三丙烯酸酯、新戊四醇四丙烯酸酯、二新 < S > -24- (22) (22)1343930 戊四醇四丙烯酸酯、二新戊四醇五丙烯酸酯、二新戊四醇 六丙烯酸酯、甘油丙烯酸酯等之丙烯酸酯、該等例示化合 物之丙烯酸酯被取代爲甲基丙烯酸鹽之甲基丙烯酸酯、同 樣的被取代爲衣康酸鹽之衣康酸酯、被取代爲丁烯酸鹽之 丁烯酸酯或者被取代爲馬來酸鹽之馬來酸酯等。 芳香族聚羥基化合物與不飽和羧酸之酯、有氫醌二丙 烯酸酯、氫醌二甲基丙烯酸酯、間苯二酚二丙烯酸酯、間 苯二酣二甲基丙嫌酸醋、焦糖酌(pyrogallol)等。不飽 和羧酸與多價羧酸及多價羥基化合物之酯化反應所得之酯 並非爲單一物,代表的具體例有、甲基丙烯酸、酞酸及乙 二醇之縮合物、甲基丙烯酸酸、馬來酸及二乙二醇之縮合 物、甲基丙烯酸、對酞酸及新戊四醇之縮合物、甲基丙烯 酸、己二酸、丁二醇及甘油之縮合物等。 其他用於本發明之乙烯性化合物之例、乙烯雙丙烯醯 胺等之丙烯醯胺類;酞酸二烯丙基等之烯丙基酯類;二丙 烯酞酸酯等之含丙烯基化合物等亦爲有用。 以上所舉之乙烯性化合物之中較佳之物爲(甲基)丙 烯醯基、更佳者爲具有丙烯醯基者。此等化合物有三羥甲 基丙烷三丙烯酸酯、三羥甲基乙烷三丙烯酸酯、新戊四醇 二丙烯酸酯、新戊四醇三丙烯酸酯、新戊四醇四丙烯酸酯 、二新戊四醇四丙烯酸酯、二新戊四醇戊烯酸酯、二新戊 四醇己烯酸酯等。 以上所舉本發明之光聚合性組成物之配合量、(b ) 相對於有機結合材100重量份(C)光聚合引發劑通常爲 -25- (23) (23)1343930 0. 1〜50重量份、較佳爲1〜45重量份、(d )光聚合性單 體通常爲0〜200重量份、較佳爲3〜180重量份。又、( 〇黒色色材除了溶劑以外在全固形分中、通常爲30〜70 重量% '較佳爲3 5〜65重量%。再者増感色素、相對於( b)有機結合材1〇〇重量份通常爲〇〜30重量份、較佳爲〇 〜1 0重量份。 光聚合引發劑若不足上述範圍時會成爲低感度,就作 業効率之點而言爲不良、又、若超過上述範圍時對塗膜形 成機能會予不良影響。若光聚合性單體(乙烯性化合物) 不足上述時,交聯密度降低造成耐久性、耐熱性等問題易 於產生、又、超過上述範圍時會有顯像性降低之問題發生 。若黒色色材不足上述範圍時因遮光性降低、故要形成充 分光學濃度之樹脂BM有所困難。相反的、若超過上述範 圍則感度、解像性、顯像性等之降低會很激烈,故畫像形 成有困難。 本發明之光聚合性組成物通常、係在(a )黒色色材 、(b)有機結合材(具羧基之環氧丙烯酸酯樹脂)、(c )光聚合引發劑(肟酯系化合物)、進而因應需要則使( d )光聚合性單體(乙烯性化合物)溶解於溶劑之狀態下 使用。 溶劑方面、可使構成組成物之各成分予以溶解或分散 、選擇沸點爲1〇〇〜200 °C範圍之物較佳。更佳爲具有120 〜170°C沸點者。 此等溶劑有、例如、乙二醇單甲基醚、乙二醇單乙基 -26- (24) (24)1343930 醚、乙二醇單丙基醚、乙二醇單丁基醚、乙二醇單丁基醚 、丙二醇單甲基醚、丙二醇第三丁基醚、二乙二醇單甲基 醚、二乙二醇單乙基醚、甲氧基甲基戊醇、丙二醇單乙基 醚、二丙二醇單乙基醚、二丙二醇單甲基醚、3-甲基-3-甲 氧基丁醇、三丙二醇甲基醚等之乙二醇單烷基醚類;乙 二醇二甲醚、乙二醇二乙醚、二乙二醇二甲醚、二乙二醇 二乙醚、二乙二醇二丙醚、二乙二醇二丁醚等之乙二醇二 烷基醚類; 乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、丙二醇 單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙二醇單丙醚乙酸 酯、甲氧基丁基乙酸酯、甲氧基戊基乙酸酯、二丙二醇單 甲醚乙酸酯、3-甲基-3-甲氧基丁基乙酸酯等之乙二醇烷基 醚乙酸酯類; 二乙醚、二丙醚、二異丙醚、丁醚、二戊烷基醚、乙 基異丁基醚、二己基醚等之醚類; 丙酮、甲基乙基酮、甲基戊烷基酮、甲基異丙基酮、 甲基異戊烷基酮、二異丁基酮、甲基異丙基酮、環己酮、 乙基戊烷基酮、甲基丁基酮、甲基己基酮、甲基壬基酮等 之酮類; 乙醇、丙醇'丁醇、己醇、環己醇、乙二醇、丙二醇 、二乙二醇、二丙二醇、甘油等之1價或多價醇類; 正戊烷、正辛烷、二異丁烯、正己烷、己烷、異戊二 烯、二戊烯、十二烷等之脂肪族烴類: 環己烷、甲基環己烷、甲基環己烯、二環己基等之脂 -27- (25) (25)1343930 環式烴類: 苯、甲苯、二甲苯、枯烯(cumene)等之芳香族烴類 t 甲酸戊醋(amyl formate)、甲酸乙醋、乙酸乙酯' 乙酸丁酯、乙酸丙酯、乙酸戊酯、乙二醇乙酸酯、乙基丙 酸酯、丙基丙酸酯、丁酸丁酯、丁酸異丙酯、異丁酸甲酯 、乙基辛酸酯、丙基硬脂酸酯、乙基苯甲酸酯、3 -乙氧基 丙酸甲酯、3-乙氧基丙酸乙酯、3-甲氧基丙酸甲酯、3-乙 氧基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、 3-甲氧基丙酸丙酯、3-甲氧基丙酸丁酯、γ-丁內酯等之鏈 狀或環狀酯類; 3-甲氧基丙酸、3-乙氧基丙酸等之烷氧基羧酸類; 丁基氯、戊基氯等之鹵烴類: 甲氧基甲基戊酮等之醚酮類: 乙腈、苄腈等之腈類; 該當於上述之溶劑有、礦油精(mineral spirit)、 Barsol #2、APCO # 1 8 Solvent、APCO 稀釋劑(thinner ) 、Solcal 溶齊No.l 及 N0.2、Solbeso #150、Shell TS28 溶 劑、卡比醇、乙基卡比醇、丁基卡比醇(carbital )、甲 基溶纖劑、乙基溶纖劑、乙基溶纖劑乙酸酯、Diglyme等 商品名之市售品。 該等之溶劑、可單獨或數種混合使用。而本發明之光 聚合性組成物、係使用該等之溶劑、使固形成分濃度爲5 〜5 0重量%、較佳爲1 〇〜3 0重量%之範圍之調液爲所望。 -28- (26) (26)1343930 在本發明此等必須成分(a ) 、 ( b )及(c )、可_ 應需要添加任意成分(d )、除此以外可恰當的添加顔料 分散劑、密接提高劑、塗敷性提高劑、顯像改良劑等。尤 其是 '在本發明之組成物係將黒色色材微細地分散、且、 使其分散狀態穩定化,在品質安定上爲重要者,故配合顔 料分散劑爲所望。 顔料分散劑、係(a)黒色色材及(b)有機結合材之 双方具有親和性者、有非離子、陽離子、陰離子等之界面 活性劑、高分子分散劑等、其中、以高分子分散劑較佳、 尤其是一級、二級、或三級胺基、吡啶、嘧啶、毗嗪( pyrazine)等之含氮雜環等之(e)具有鹼性官能基之高分 子分散劑可有利地使用。 (e)作爲具有鹼性官能基之高分子分散劑若欲具體 的例示較佳化學構造、例如、聚異氟酸酯化合物、分子内 具有1個或2個羥基之化合物及同一分子内具有活性氫與 3級胺基之化合物予以反應所得分散樹脂等。 上述聚異氰酸酯化合物之例、有對亞苯基二異氰酸酯 、2’ 4 -亞苄基異氰酸酯、2,6 -亞苄基二異氰酸酯、4, 4^二苯基甲烷二異氰酸酯、萘基-1,5-二異氰酸酯、聯甲 苯胺(to li dine )二異氰酸酯等之芳香族二異氰酸酯、亞 己基二異氰酸酯、賴胺酸甲基酯二異氰酸酯、2,4,4-三 甲基亞己基二異氰酸酯、二聚酸二異氰酸酯等之脂肪族二 異氰酸酯、異氟爾酮(isophorone)二異氰酸_、4,4·-亞 甲基雙(環己基異氰酸酯)、ω,二異氰酸酯二甲基環 -29- (27)1343930 己烷等之脂環族二異氰酸酯、苯二甲基二異氰酸 ,α,,α,-四甲基苯二甲基二異氰酸酯等之具有芳 肪族二異氰酸酯、賴胺酸酯三異氰酸酯、1 ’ 6 烷三異氰酸酯、1,8-二異氰酸酯-4·異氰酸酯甲: ,3,6-亞己基三異氰酸酯、二環庚烷三異氰酸 異氰酸酯苯甲烷)、三(異氰酸酯苯基)硫代( )磷酸酯等之三異氛酸酯、及該等之三聚物' 水 及該等之多元醇(polyol )加成物等。聚異氰酸 有機二異氰酸酯之三聚物、最佳爲亞苄基二異氰 聚物及異氟爾酮二異氰酸酯之三聚物、該等可單 也可倂用。 異氰酸酯三聚物之製造方法、係使前述聚異 使用適當的三聚化觸媒、例如第三級胺類、膦類 金屬類、金屬氧化物、羧酸鹽類等,進行異氰酸 分的三聚化、藉由觸媒毒之添加使三聚化停止後 應之聚異氰酸酯藉由溶劑抽出、薄膜蒸餾而除去 得標的物之含有三聚異氰酸酯(isocyanurate) 氰酸酯的方法。 在同一分子内具有1個或2個羥基之化合物 乙二醇、聚酯乙二醇、聚碳酸酯乙二醇、聚烯烴 、及該等之化合物之一方末端羥基爲碳數1〜25 烷氧基化之物及該等2種類以上之混合物。 聚醚乙二醇有、聚醚二醇、聚醚酯二醇、及 類以上之混合物。聚醚二醇係由環氧化物予以單 醋、α,α :香環之脂 ,11-Η—— 基辛烷、1 酯、三( phosphate .加成物、 酯較佳爲 酸酯之三 獨使用、 氰酸酯類 、烷氧基 酯基之部 、使未反 之,而獲 基之聚異 、有聚醚 乙二醇等 之烷基所 該等2種 獨或共聚 -30- (28) (28)1343930 合所得之物、例如聚乙二醇、聚丙二醇、聚乙烯-丙烯二 醇、聚氧四甲二醇、聚氧己二醇、聚氧辛二醇及該等2種 以上之混合物。 聚醚酯二醇、係使含醚基之二醇或其他之乙二醇之混 合物與二羧酸或該等之無水物反應、或者在聚酯乙二醇使 環氧化物反應所得之物、例如聚(聚氧四亞乙基)己二酸 酯等。聚醚乙二醇,最佳爲聚乙二醇、聚丙二醇、聚氧四 甲二醇或該等之化合物之一方末端羥基爲碳數1〜25之烷 基所烷氧基化之化合物。 聚酯乙二醇有、二羧酸(琥珀酸、戊二酸(glutaric acid )、己二酸、癸二酸、反丁烯二酸、順丁烯二酸、酞 酸等)或該等之之無水物與二醇類(乙二醇、二乙二醇、 三乙二醇、丙二醇、二丙二醇、三丙二醇、1,2-丁二醇 、1,3 -丁 二醇、1,4 -丁 二醇、2,3 -丁 二醇、3 -甲基-1, 5-戊二醇、新戊二醇、2-甲基-1,3-丙二醇、2-甲基-2-丙 基-1,3-丙二醇、2-丁基-2-乙基-1,3-丙二醇、1,5-戊二 醇、1 ’ 6 -己二醇、2 -甲基-2,4-戊二醇、2’ 2,4 -三甲 基-1,3-戊二醇、2-乙基-1,3-戊二醇、2,5-二甲基-2, 5 -己二醇、1,8-辛二醇、2 -甲基-〗,8-辛二醇、丨,9-壬 二醇等之脂肪族乙二醇、雙羥基甲基環己烷等之脂環族二 醇、苯二甲基乙二醇、雙羥基乙氧基苯等之芳香族二醇、 N-甲基二乙醇胺等之N-烷基二烷醇胺等)予以縮聚合所 得者、例如聚乙烯己二酸酯、聚丁烯己二酸酯、聚己烯己 二酸酯、聚乙烯/丙烯己二酸酯等、或前述二醇類或碳數1 -31 - (29) (29)1343930 〜25之1價醇作爲引發劑使用所得之聚內酯二醇或聚內酯 單醇、例如聚己內酯二醇、聚甲基戊內酯(valerolactone )及該等之2種以上混合物。聚酯二醇最佳爲聚己內酯二 醇或碳數1〜25之作爲引發劑之聚己內酯。 聚碳酸酯二醇、有聚(1,6-亞己基)碳酸酯、聚(3-甲基-1,5-亞戊基)碳酸酯等、聚烯烴二醇有聚丁二烯二 醇、氫添加型聚丁二烯二醇、氫添加型聚異戊間二烯( isoprene)二醇等。在同一分子内具有1個或2個羥基化 合物之數平均分子量爲300〜1 0,000、較佳爲500〜6,000 、更佳爲1,000〜4,000。 本發明所用在同一分子内具有活性氫與3級胺基之化 合物加以説明。活性氫、亦即、與氧原子、氮原子或硫磺 原子直接鍵結之氫原子、有羥基、胺基、硫醇(thiol )基 等之官能基中之氫原子、其中以胺基、尤其是1級胺基之 氫原子較佳。3級胺基並無特別限定。又、3級胺基、爲 具有碳數1〜4之烷基之胺基、或雜環構造、更具體言之 、有咪唑環或三唑環。 此等同一分子内具有活性氫與3級胺基之化合物例示 如下、N,N -二甲基-1,3 -丙烷二胺、N,N -二乙基-1,3-丙烷二胺、Ν’ N -二丙基-1,3 -丙烷二胺、N,N -二丁基-1 ’ 3 -丙烷二胺、Ν’ Ν -二甲基乙二胺、Ν, Ν -二乙基乙二 胺、Ν,Ν -二丙基乙二胺、Ν’ Ν -二丁基乙二胺、Ν,Ν -二 甲基-1,4-丁 二胺、Ν, Ν -二乙基-1,4-丁 二胺、Ν, Ν-二丙基-1,4 -丁 二胺、Ν’ Ν-二丁基·ΐ,4-丁二胺等。 -32- (30) (30)1343930 又' 三級胺基爲含氮雜環、則有吡唑(pyraz〇ie)環 、咪唑環、三唑環、四唑環、吲哚環、咔唑(carbazole) 環、吲唑(indazole )環、苯并咪唑環、苯并三唑環、苯 并噁唑環、苯並噻唑環、苯并唾二唑環等之含N雜5員環 、耻陡環、嗟嗅(pyridazine)環、喃陡環、三曉環 '喹 啉(quinoline)環' 吖啶環、異喹琳環、等之含N雜6員 環。該等之含氮雜環,較佳爲咪唑環或三唑環。 該等之具有咪唑環與胺基之化合物,具體例示之、則 有1- ( 3-胺基丙基)咪唑、組織胺(histizine ) 、2-胺基 咪唑、1·(2-胺基乙基)咪唑等。又、具有三唑環與胺基 之化合物,具體例示則有、3-胺基-1,2,4-三唑、5· ( 2-胺基-5-氛苯基)-3 -苯基-1Η-1,2,4 -二哗、4 -胺基-4Η-1 ,2,4 -三唑-3,5 -二醇、3 -胺基-5-苯基-1Η-1,3,4 -三唑 、5 -胺基-1,4 -二苯基-1,2,3 -三唑、3 -胺基-1-苄基-1Η-2,4-三唑等。 其中、Ν,Ν-二甲基-1,3-丙二胺、Ν,Ν-二乙基-1, 3 -丙二胺、1-(3 -胺基丙基)咪唑、3 -胺基-1,2,4 -三唑 較佳。分散劑原料之較佳配合比率爲相對於聚異氰酸酯化 合物100重量份 '在同一分子内具有1個或2個羥基之數 平均分子量300〜1〇, 〇〇〇之化合物爲1〇〜2〇〇重量份、較 佳爲20〜190重量份、更佳爲30〜18〇重量份、在同一分 子内具有活性氫與3級胺基之化合物爲0.2〜25重量份、 較佳爲0.3〜24重量份。 (e)具有鹼基官能基之高分子分散劑之GPC換算重 -33- (31)1343930 量平均分子量爲】,〇〇〇〜200,000、較佳爲 2,000〜 、更佳爲3,000〜50,000之範圍。分子量1,000以 性及分散安定性差、在200,000以上溶解性降低, 性差同時反應之控制困難,而高分子分散劑之製造 聚胺基甲酸乙酯樹脂製造之公知之方法進行。製造 溶媒、通常、使用丙酮、甲基乙基酮、甲基異丁基 戊酮、環己酮、異氟爾酮等之酮類、乙酸乙酯、乙 、乙酸溶纖劑等之酯類、苯、甲苯 '二甲苯、己烷 類、雙丙酮醇、異丙醇、第二丁醇、第三丁醇等一 類、二氯甲院(methylene chloride)、三氯甲垸等 物、四氫呋喃、二乙基醚等之醚類、二甲基甲醯胺 基吡咯烷酮、二甲基亞楓等之非質子性極性溶媒等 在上述製造之際、通常、係使用胺基甲酸乙酯 觸媒。例如、二丁基錫二月桂酸鹽、二辛基錫二月 、二丁基錫辛酸鹽、亞錫辛酸鹽等之錫系、鐵乙醯 酯、氯化鐵等之鐵系、三乙基胺、三亞乙基二胺等 胺系等》 在同一分子内具有活性氫與三級胺基之化合物 量,於反應後之胺價1〜lOOmg KOH/g之範圍予以 佳。更佳爲5〜9 5mg KOH/g之範圍。胺價、係使 基酸來中和滴定之、而以對應於酸値之KO Η之mg 示之値。胺價在上述範圍以下時分散能力傾向於降 、若超過上述範圍時顯像性易於降低。又、在以上 使異氰酸酯基殘存於高分子分散劑之場合,進而、 100,000 下分散 且分散 係依照 之際之 酮、環 酸丁酯 等之烴 部之醇 之氯化 、N-甲 〇 化反應 桂酸鹽 基乙酸 之三級 之導入 控制較 鹼性胺 數來表 低、又 之反應 以醇或 -34- (32)1343930 胺化合物使異氰酸酯基壓碎時,則生成物之經時安定性 高爲佳。又、使用高分子分散劑之場合、其使用比率相 於(a)黒色色材以0.1〜30重量%較佳、尤其是0.5〜 重量%較佳。 其次說明本發明之光聚合性組成物之製造方法。在 發明中、通常黒色色材、係預先使用塗刷調節裝置(pa conditioner )、砂濾器、球磨機、輥磨機、石磨機、噴 式磨機、均質機等進行分散處理較佳。藉由分散處理使 色色材微粒子化,而可達成抗蝕劑之遮光能力提高及塗 特性之提高, 在分散處理中具有黒色色材與溶劑或分散機能之有 結合劑、或者前述顔料分散劑進而予以倂用之系統中, 以處理較佳。尤其是使用高分子分散劑時,因經時之分 安定性優異故較佳。又、以抗蝕劑液配合之全成分予以 時在混合液下之分散處理、在分散時所產生發熱,會使 反應性之成分有變性之虞並不佳。 在以砂爐器(sand grinder)分散之場合、可恰當 使用0.1〜8mm徑之玻璃珠(bead)或銷氧(zirconia) 。使分散之條件、通常、温度爲〇°C至100°C、較佳爲 室温至80°C之範圍。分散時間會因油墨之組成(黒色色 、溶劑、分散劑)及砂磨機之裝置尺寸等因適正時間之 同而可適宜調節,控制油墨之光澤使抗蝕劑之20度光 値在100〜200之範圍,分散之目標。在抗蝕劑光澤降 時分散處理並非充分多有粗的顔料粒子之殘存、就顯像 變 對 25 本 i n t 射 黒 布 Uik 懷 予 散 同 局 的 珠 材 不 澤 低 性 -35- (33) (33)1343930 、密接性、解像性等之點而言並不充分。又、進行分散處 理時使光澤値超過上述範圍爲止,因超微粒子多數產生, 反而易於損及分散安定性。 其次上述分散處理所得黒色油墨與抗蝕劑成分,可添 加、混合必要的上述其他成分成爲均勻之溶液。在製造步 驟中因微細的灰塵多混在於感光液、故所得抗蝕劑感光液 藉由過濾器等來進行濾過處理爲所望。接著、就使用本發 明光聚合性組成物之濾色器之製造方法加以説明。 首先、在透明基板上、藉由旋轉器,盤條(wire bar ),淋塗機(flow coater),模塗敷機,輥塗敷機,噴灑 器等之塗敷裝置將本發明之光聚合性組成物予以塗敷乾燥 後、在該試料上放置光罩(photomask)、藉由該光罩使 畫像曝光,顯像,並因應需要藉由熱硬化或光硬化形成遮 光用BM畫像、進而使此操作就RGB 3色予以各自重複進 行、以形成濾色器畫像。 又、使用本發明之光聚合性組成物來形成濾色器畫素 之情形、因爲有非常高感度、高解像力、故不設置聚乙烯 醇等之氧遮斷層就可進行曝光、顯像以形成畫像。在此所 用之透明基板、係濾色器用透明基板、其材質並無特別限 定、例如、聚對苯二甲酸乙二酯等之聚酯或聚丙烯、聚乙 烯等之聚烯烴等、聚碳酸酯、聚甲基甲基丙烯酸酯、聚碾 等之熱可塑性塑膠薄片、環氧樹脂 '聚酯樹脂、聚甲基丙 烯酸酯樹脂等之熱硬化性塑膠薄片、或各種玻璃板等。尤 其是、就耐熱性之點而言以使用玻璃板、耐熱性塑膠較佳 -36- 1343930 預酸無 ~ 可甲並0.1 、基法ο 性胺方爲 物或敷厚 等劑塗膜 性合。之 着偶等質 接烷理基 之矽處色 面、膜黒 表理薄脂 良處之樹 改氧物之 爲臭合後 、、聚燥 板理種乾 基處各、 明電之敷 透放等塗 等暈物、 此電合定 在行聚限 進酯別 先乙特 2μηι、較佳爲 0,1〜1·5μιη、更佳爲 0.1〜Ιμηι範圍。又、 本發明之濾色器、就遮光性之點言之於膜厚1 μπι、光學濃 度爲3.0以上較佳。又、以顔料等固型成分之分散狀態爲 指標、則ΒΜ20度光澤値爲1〇〇〜200較爲有利。 在乾燥時可使用熱板、IR烤爐、對流烤爐( convection oven)等、較佳爲乾燥條件 40〜150 °C、乾燥 時間1 0秒〜00分之範圍。又、曝光所用光源、例如、氣 氣燈、鹵素燈、鎢燈、高壓水銀燈、超高壓水銀燈、金屬 鹵素燈、中壓水銀燈、低壓水銀燈等燈光源或氬離子雷射 、YAG雷射、激態原子(excimer )雷射、氮雷射等之雷 射光源等。在僅使用特定照射光波長之情形則可利用光學 過爐器。 顯像處理、若爲使未曝光部之抗蝕劑膜有溶解能力之 溶劑則無受特別限制。例如可使用丙酮、二氯乙烯、三氯 乙烯(trichlene )、環己酮等有機溶劑。但是、因有機溶 劑多具有環境汚染性、對人體有害性、火災危險性等、使 用此等無危險性之鹼性顯像液較好。此等鹼性顯像液、有 例如、碳酸鈉、碳酸鉀、矽酸鈉、矽酸鉀、氫氧化鈉、氫 氧化鉀等無機鹼性劑、或者二乙醇胺、三乙醇胺、羥基化 -37- (35) (35)!343930 四烷基銨鹽等之含有有機鹼性劑水溶液。在鹼性顯像液、 可因應必要、含有界面活性劑、水溶性之有機溶劑、具羥 基或羧基之低分子化合物等。尤其是、界面活性劑相對於 顯像性、解像性、質地汚染等多具有改良効果,故添加較 佳。 例如、顯像液用之界面活性劑、則有萘基磺酸鈉基、 苯基磺酸鈉基之陰離子性界面活性劑、聚烷基氧基之非離 子性界面活性劑、具四烷基銨基之陽離子性界面活性劑等 。在顯像處理方法方面並無特別限制、通常、在1 0〜50°C 、較佳是以1 5〜45 °C之顯像温度、澄清顯像、噴灑顯像、 刷毛(brush )顯像、超音波顯像等方法來進行。 其次、就本發明之液晶顯示裝置(面板)加以説明。 本發明之液晶顯示裝置、係使用前述之濾色器所成爲其特 徵者。因此、可以下述方式製造。 首先、在濾色器上形成定向膜、在此定向膜上配置隔 件後、與對向基板貼合形成液晶晶胞。接著、在所形成之 液晶晶胞注入液晶、與對向電極結線而完成。 定向膜、以聚醯胺等之樹脂膜爲恰當。定向膜之形成 、通常、係採用照相凹版(gravure )印刷法或苯胺( flex〇graphy )印刷法、通常、使定向膜之厚度爲 〜l〇〇nm。在進行熱煅燒所致之定向膜硬化處理後、藉由 紫外線照射或磨光(lapping)塗敷處理所致之表面處理、 在可調節液晶傾斜之表面狀態予以加工。 隔件係使用於因應與對向基板之間隔(cap )(間隙 -38- (36) (36)1343930 )大小、通常2〜8μιη者爲恰當。在濾色器之基板上 '藉 由照相石板法(photolithography)法來形成透明樹脂膜之 光隔件(photo spacer) (PS)、可以此來取代隔件加以 活用。對向基板、通常、係使用(陣列)基板、尤其是 TFT (薄膜電晶體)基板爲恰當。 與對向基板貼合之間隔、因液晶顯示裝置之用途而異 、通常選擇2〜8μπι之範圍。與對向基板貼合後、在液晶 注入D以外部分、被環氧樹脂等之密封材料所密封。密封 材料係藉由UV照射及/或加熱使之硬化、並在液晶晶胞周 邊被密封。 周邊被密封之液晶晶胞、以面板切斷後、在真空反應 室内減壓、將上述之液晶注入口浸漬於液晶後 '藉由反應 室内之漏出、在液晶晶胞内注入液晶。液晶晶胞内之減壓 度、通常爲 lxl (Γ2 〜lxlO'7Pa、較佳爲 lxl0.3〜lxl〇-6Pa 。又、在減壓時使液晶晶胞加溫較佳、加温溫度、通常爲 30〜l〇〇°C、較佳爲50〜90°C,減壓時之加溫保持、通常 在1 0〜60分之範圍、其後浸漬於液晶中。在已注入液晶 之液晶晶胞、藉由UV硬化樹脂之硬化、可使液晶注入口 密封、而完成液晶顯示裝置(面板)。 液晶種類、並無特別限制、可爲芳香族系、脂肪族系 、多環狀化合物等、習知公知之液晶、液向性(lyotropic )液晶、熱向性液晶等任一均可。在熱向性( thermaltropic)液晶中,以向列相(nematic)液晶、距列 相(smectic)液晶、膽固醇相(ch〇resteric)液晶等爲周 -39- (37)1343930 知、而該等之中可任擇一種。 【實施方式】 〔實施例〕 以下參照實施例及比較例更詳細說明本 明在不超越要旨之範圍內,並非只限定於以 合成例-1 (高分子分散劑溶液調製) 亞苄基二異氰酸酯之三聚物(三菱 MytecGP75 0A、樹脂固形成分50重量% '乙 3 2 g與爲觸媒之二丁基錫二月桂酸鹽〇.〇2g 醚乙酸酯(PGMEA) 47g下稀釋溶解。在攪 方末端爲甲氧基之數平均分子量1,000之聚 油脂公司製、UNIOXM-1000 ) 1 4.4 g與霍 1,〇〇〇之聚丙二醇(三洋化成工業公司製 1 000 ) 9.6 g之混合物予以滴定後、於70°C 小時。接著、添加N,N ·二甲基胺基-1,3 - ί 4 〇 °C進而反應1小時。如此所得之含有高分 液之胺價藉由中和滴定來求得其値爲14mg 藉由乾燥法(dry up)來求得樹脂含有量( 鐘、在熱板上除去溶劑,依重量變化量來算 而爲40重量%。 合成例-2 (有機結合材之合成) 發明、但本發 下之實施例。 匕學公司製、 酸丁酯溶液) 在丙二醇單甲 拌下、使其一 乙二醇(日本 女平均分子量 、SUNIKSPP-進而使反應3 弓二胺1 g、於 子分散劑之溶 KOH/g。又、 1 5 0 〇C,3 0 分 出樹脂濃度) -40 - (38) (38)1343930 環氧當量200g/eq、軟化點6 5°C之鄰甲酚粉醛清漆環 氧樹脂200g、丙烯酸72g、對甲氧基酚0.2g、十二基三 甲基銨氯化物0.2 g、PGMEA 272g裝入燒瓶,在l〇〇t温 度下反應8小時(相對於環氧基1當量、使丙烯酸1當量 反應)。進而、添加四氫酞酸酐42g於80°C下反應3小時 。將此反應液再沈殿於水、使真空乾燥,得到具羧基之粉 醛清漆環氧丙烯酸酯樹脂。藉由KOH來進行中和滴定時 樹脂之酸値爲50mg KOH/g。 合成例-3 (有機結合材之合成) 除了四氫酞酸酐之添加量爲63g以外,其他則與合成 例-2同樣進行反應。所得之樹脂酸値爲70mg KOH/g。 (碳黑之分散) 以顏色用碳黑(三菱化學公司製、MA-220) 50重量 份' 合成例-1所示高分子分散劑爲固形成分之5重量份之 比率、且固形成分濃度爲50重量%之方式添加碳黑、高分 子分散劑溶液及PGMEA。分散液之全重量爲50g。使其藉 由攪拌機加以攪拌,來進行預混(Premixing)。 接著、藉由塗料攪拌器(Paint shaker )在25〜45 °C 範圍進行6小時分散處理。小珠係使用〇.5mm 0之鍩氧珠 、添加與分散液同樣的重量。分散完成後、藉由過濾器使 小珠與分散液分離。 -41 - (39) 1343930 . 實施例1〜3及比較例1〜3 ' (1 )抗蝕劑液之調合 * 使用上述之碳黑分散油墨,添加各成分(a) 、( b ) 、(c ) 、 ( d ) 、 ( e )、有機溶劑及界面活性劑使作爲 固形成分成爲下述之配合比率、藉由攪拌機(stirrers)攪 拌、溶解、來調整黑色抗蝕劑感光液。 (a )黒色色材 50g ® 碳黑(三菱化學公司製' MA-220 ) 30g (b )有機結合劑 (表2所記載) ^ ( d )光聚合性單體:乙烯性化合物 l〇g 、 二新戊四醇六丙烯酸酯 (c)光聚合引發劑 (表2所記載) 有機溶劑 ^ 丙二醇單甲基醚乙酸酯 3 00g (e)高分子分散劑(合成例-1) 5g 界面活性劑(住友3M公司製、FC-430) lOOppm (2 )抗蝕劑之評價 將黑色抗蝕劑感光液在旋轉塗膜機予以塗敷於玻璃基 板(Corning公司製、7059)、在熱板乾燥80°C、1分鐘 。乾燥後之抗蝕劑膜厚以觸針式膜厚計(Tencor公司製、 α-步驟)測定則爲1 μπι。接著、將此樣本透過掩罩以高壓 -42- (40) (40)1343930 水銀燈改變曝光量予以像曝光。使用温度25 °C、濃度 0.8%之碳酸鈉水溶液藉由噴灑顯像而獲得抗蝕劑圖案。感 度、解像力及遮光性係以下述基準評價、得到表2結果。 1. 感度 20μηι之掩罩圖案係以按照尺寸來形成之適正曝光量 (mj/cm2 )來表示。亦即、曝光量少的抗蝕劑在低曝光量 可使畫像形成,故顯示爲高感度。 2. 解像力 在可使20μιη掩罩圖案忠實再現之曝光量中,以可解 像之抗蝕劑最小圖案尺寸於200倍倍率的顕微鏡觀察。最 小圖案尺寸爲ΙΟμπι以下,解像力超過〇、1〇μηι者以X表 示。 3 .遮光性 畫線部之光學濃度(OD)以馬克白(macbeth)反射 濃度計(Gretag Macbeth(前 Komolgun)公司製、TR 9 2 7 )測定。又、OD値係表示遮光能力之數値若數値越大則 爲高遮光性。 (S > -43- (41) (41)Ϊ343930 【表2】 (b)有機結合材 (C)光聚合引發劑 感度 解像力 遮光性 mj/cm2 實施例1 合成例2 C-1 40 〇 3.5 實施例2 合成例3 C-1 50 〇 3.5 實施例3 合成例3 C-4 30 〇 3.5 比較例1 合成例2 C-2 100 〇 3.5 比較例2 a-1 C-1 150 X 3.5 比較例3 合成例2 c-3 200 〇 3.5 又、表2中、記號之意義係如下述。 a-1 :丙烯聚合物 (Daicel化學工業公司製、ACA-200M) c-1:光聚合引發劑(千葉•特用化學品公司製、CGI-124).........(5g) -44- (42)1343930Rl3: a substituted benzamidine group, preferably a toluene group, and particularly preferably an ortho-methyl group. The compounds of the above general formulas (3), (4), (5) and (6) are also the same as the ones which are known per se, for example, in the publication of the Japanese Patent Publication No. 2 000-8 006 8 a compound of one kind. Further, the photopolymerization initiator of the present invention can be used alone or in combination with other photopolymerization initiators, and can be expected to have high sensitivity due to use. For example, the following compounds are mentioned. 2-(4-Methoxyphenyl)-4,6-bis(trichloromethyl)-s-three tillage, 2-(4-methoxynaphthyl)-4,6-bis(trichloromethane) -s-triterpene, 2-(4-ethoxynaphthyl)6-bis(trichloromethyl)-s-trin, 2-(4-ethoxycarbonylnaphthyl)-4,6 - Halomethylated triterpene derivative of bis(trichloromethyl)-s-three tillage, 2-trichloromethyl-5-(2'-benzofuranyl)-1,3, -21 - (19) (19) 1343930 4-oxadiazepine, 2-trichloromethyl·5·[ P-( 2,-benzofuranyl)vinyl]-1,3,4-oxadiazepine, 2-trichloromethyl-5-[β-(2,-(6-benzofuranyl)vinyl)]-1 '3' 4 oxadiazepine, 2-trichloromethyl-5-furan Halomethylated oxydiazepine derivatives of the group -1 '3,4-oxadiazepine, 2-(2·-chlorophenyl)-4' 5-diphenylimidazole dimer, 2- (2·-Chlorophenyl)-4,5-bis(3,-methoxyphenyl)imidazole dimer, 2-(2·-fluorophenyl)-4,5·diphenylimidazole dimerization , 2·(2'-methoxyphenyl)-4' 5-diphenylimidate dimer, (4^methoxyphenyl)-4,5-diphenylimidazole dimer, etc. Imidazole derivative, rest Benzoyl methyl ether, benzoin phenyl ether, benzoin isobutyl ether, benzoin isopropyl ether, etc., benzoin acid, 2-methyl bacterium '2-ethyl bacterium' 2 - Diterpenoids such as dibutyl onion, 1-chloro onion, etc., benzanthrone derivatives, diphenyl hydrazine, rice egg '嗣 (Michlers ketone), 2-methyldiphenyl Diphenyl ketone derivatives such as ketone, 3-methyl-benzyl fluorene, 4-methyl-phenyl ketone, 2-chlorodiphenyl ketone, 4-bromodiphenyl ketone, 2-carboxydiphenyl ketone , 2,2-dimethoxy-2-phenylethyl benzene, 2' 2 -dimethoxy acetophenone, 1-hydroxycyclohexyl phenyl ketone, a-hydroxy-2-methyl phenyl ketone, 1-hydroxy-1-methylethyl-(P-isopropylphenyl)one, hydroxy-indole-(P-dodecyl)one, 2-methyl-(4'•(methylsulfide) Generation) phenyl)-2 - morpholino -I - propyl hydrazine, 1 ' 1 ' 丨 _ dichloromethyl-(P-butylphenyl) ketone, etc. Ketone (thioxanth〇ne), 2-ethylthioxanthene, 2-isopropylthioxanthone, 2-chlorothioxanthone, 2.4-dimethylthioxanthone, 2, 4_2 Thioxanthone derivatives such as thioxanthone, 2,4-isopropylthiathione, P-dimethylaminobenzoic acid, E-22-(20) (20)1343930 vinegar, P-diethyl a benzoate derivative such as ethyl benzoate or an acridine derivative of 9-phenyl acridine '9-(p-methoxyphenyl) acridine or the like, 9,10-dimethyl A phenanthrene derivative such as benzphenazine, bis-cyclopentadiene-Ti-dichloride, bis-cyclopentadiene_Ti-bis-phenyl, bis-cyclopentadiene_Ti • bis-(2,3,4,5,6-pentafluorophenyl), bis-cyclopentadiene-Ti-bis-(2,3,5,6-tetrafluorobenzene-U-based), double -cyclopentadiene-Ti-bis-(2,4,6-trifluorophenyl-1-yl), bis-cyclopentadiene-Ti-2' 6-di-fluorophenyl-1-yl, bis- Cyclopentadiene-Ti-2,4-di-fluorophenyl-1·yl, bis-methylcyclopentadiene-Ti_bis-(2' 3,4,5,6-pentafluorobenzene-1- , bis-methylcyclopentadiene-Ti·bis-(^^di-fluorophenyl), bis-cyclopentadiene-Ti-2,6-di-fluoro-3-(pyrryl)丨 基 基 基 ti ti 基 基 -1- -1- -1- -1- -1- -1- -1- -1- -1- -1- ti -1- -1- ti 。. In addition to the above-described initiator component, the photopolymerizable composition of the present invention may further contain a sensitizing dye. It is preferred to add a sensitizing dye to the photopolymerization reaction under high light shielding. For example, the coumarin compound having a heterocyclic ring described in Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. The benzoic acid ketocoumarin compound described in the Japanese Patent Publication No. Hei. ), a pyrromethene dye described in Japanese Patent Laid-Open Publication No. Hei 6-19240, Japanese Laid-Open Patent Publication No. SHO-47-252 No., No. Sho. 56- 1 6 6 1 54 and JP-A-59-56403 (p-dialkyl-23-(21)(21)1343930 benzylidene) ketone, benzene A base dye, a bismuth dye having a duralidyl group, and a diaminobenzene compound described in JP-A No. Hei 1-326624. Among these sensitizing dyes, an amine group-containing sensitizing dye and a diphenyl sulfonium pigment are particularly preferred. (d) Photopolymerizable monomer The photopolymerizable monomer of the present invention is one or more compounds having an ethylenically unsaturated group (hereinafter referred to as an ethylenic compound). Specifically, there are esters of aliphatic (poly)hydroxy compounds and unsaturated carboxylic acids, esters of aromatic (poly)hydroxy compounds and unsaturated carboxylic acids, unsaturated carboxylic acids and polyvalent carboxylic acids, and aliphatic polyhydroxy compounds. The obtained ester, an ethylene oxide of an aromatic polyhydroxy compound, an esterification reaction of a propylene oxide adduct with an unsaturated carboxylic acid, an ethylene oxide or a propylene oxide adduct of an aliphatic polyhydroxy compound, Esterification reactant of unsaturated carboxylic acid, ester of decarboxylated polyvalent alcohol and unsaturated carboxylic acid, reaction of polyvalent alcohol with polyvalent isocyanate and unsaturated carboxylic acid, styryl terminal compound, phosphoric acid a saturated compound, an adduct of a polyepoxy group and an unsaturated carboxylic acid, or the like, an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid, specifically, ethylene glycol diacrylate, triethylene glycol Alcohol diacrylate 'nepentanediol diacrylate, hexanediol diacrylate, trimethylolpropane tripropylene sulphuric acid vinegar, three methyl ketone triacetic acid vinegar, neopentyl alcohol dipropylene Acid ester, neopentyl alcohol triacrylate, neopentyl alcohol Acrylate, new < S > -24- (22) (22) 1343930 Acrylates such as pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, glycerin acrylate, etc. The acrylate of the exemplified compound is substituted with a methacrylate of methacrylate, the same itaconate substituted with itaconate, a butenoate substituted with a butenoate or replaced by a horse. The acid maleate and the like. An ester of an aromatic polyhydroxy compound with an unsaturated carboxylic acid, hydroquinone diacrylate, hydroquinone dimethacrylate, resorcinol diacrylate, isophthalic dimethyl propylene vinegar, caramel Discretion (pyrogallol) and so on. The ester obtained by esterification of an unsaturated carboxylic acid with a polyvalent carboxylic acid and a polyvalent hydroxy compound is not a single substance, and specific examples thereof include a condensate of methacrylic acid, citric acid and ethylene glycol, and methacrylic acid. a condensate of maleic acid and diethylene glycol, a condensate of methacrylic acid, p-citric acid and neopentyl alcohol, a condensate of methacrylic acid, adipic acid, butanediol and glycerin, and the like. Other examples of the ethylenic compound used in the present invention, acrylamides such as ethylene bis acrylamide; allyl esters such as diallyl citrate; propylene-containing compounds such as dipropylene phthalate; Also useful. Preferred among the above-mentioned ethylenic compounds are (meth) acrylonitrile groups, and more preferably those having acryl fluorenyl groups. These compounds are trimethylolpropane triacrylate, trimethylolethane triacrylate, neopentyl alcohol diacrylate, neopentyl alcohol triacrylate, neopentyl alcohol tetraacrylate, dipentaerythritol Alcohol tetraacrylate, dipentaerythritol pentenoate, dipentaerythritol hexenoate, and the like. The amount of the photopolymerizable composition of the present invention is (b) is usually -25-(23) (23) 1343930 0. 1~50 with respect to 100 parts by weight of the organic binder (C) photopolymerization initiator. The photopolymerizable monomer is usually 0 to 200 parts by weight, preferably 3 to 180 parts by weight, based on parts by weight, preferably 1 to 45 parts by weight. Further, (the ochre color material is usually 30 to 70% by weight in the total solid content except for the solvent, preferably 3 to 65 % by weight. Further, the sensitizing dye, relative to (b) the organic binder 1 〇 The amount by weight of the ruthenium is usually from 30 to 30 parts by weight, preferably from 10,000 to 10 parts by weight. When the photopolymerization initiator is less than the above range, it is low in sensitivity, and it is defective in terms of work efficiency, and if it exceeds the above In the range, when the photopolymerizable monomer (ethylenic compound) is less than the above, the crosslinking density is lowered, and problems such as durability and heat resistance are likely to occur, and when it exceeds the above range, When the coloring material is less than the above range, the light-shielding property is lowered, so that it is difficult to form the resin BM having a sufficient optical density. Conversely, if it exceeds the above range, sensitivity, resolution, and development are required. The reduction in the properties and the like is severe, and the formation of the image is difficult. The photopolymerizable composition of the present invention is usually composed of (a) a ochre color material, (b) an organic binder (a carboxyl group-containing epoxy acrylate resin), c) a photopolymerization initiator (an oxime ester compound), and if necessary, (d) a photopolymerizable monomer (ethylenic compound) is dissolved in a solvent. The solvent can be used as a component of the composition. It is preferred to dissolve or disperse, and it is preferred to select a boiling point of from 1 〇〇 to 200 ° C. More preferably, it has a boiling point of from 120 to 170 ° C. These solvents are, for example, ethylene glycol monomethyl ether, ethylene Alcohol monoethyl-26- (24) (24) 1343930 ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol third Ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, methoxymethylpentanol, propylene glycol monoethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, 3 - ethylene glycol monoalkyl ethers such as methyl-3-methoxybutanol and tripropylene glycol methyl ether; ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, two Ethylene glycol dialkyl ethers such as ethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, etc.; ethylene glycol monomethyl ether acetate, ethylene Monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, methoxypentyl acetate, dipropylene glycol Ethylene glycol acetate, 3-methyl-3-methoxybutyl acetate, etc.; ethylene glycol alkyl ether acetate; diethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, dipentane An ether such as an alkyl ether, ethyl isobutyl ether or dihexyl ether; acetone, methyl ethyl ketone, methyl pentanone, methyl isopropyl ketone, methyl isoamyl ketone, and Ketones such as isobutyl ketone, methyl isopropyl ketone, cyclohexanone, ethyl pentanone, methyl butyl ketone, methyl hexyl ketone, methyl decyl ketone; ethanol, propanol a monovalent or polyvalent alcohol such as an alcohol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol or glycerin; n-pentane, n-octane, diisobutylene, n-hexane, hexane Aliphatic hydrocarbons such as isoprene, dipentene, dodecane, etc.: Cyclohexane, methylcyclohexane, methylcyclohexene, dicyclohexyl, etc. -27- (25) (25 ) 1343930 Cyclic hydrocarbons: benzene Aromatic hydrocarbons such as toluene, xylene, cumene, etc. amyl formate, ethyl formate, ethyl acetate butyl acetate, propyl acetate, amyl acetate, ethylene glycol acetate Ester, ethyl propionate, propyl propionate, butyl butyrate, isopropyl butyrate, methyl isobutyrate, ethyl octanoate, propyl stearate, ethyl benzoate , methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate , chain or cyclic esters such as ethyl 3-methoxypropionate, propyl 3-methoxypropionate, butyl 3-methoxypropionate, γ-butyrolactone; 3-methoxy Alkoxycarboxylic acids such as propylpropionic acid and 3-ethoxypropionic acid; halogenated hydrocarbons such as butyl chloride and pentyl chloride: ether ketones such as methoxymethylpentanone: acetonitrile, benzonitrile, etc. Nitriles; should be in the above solvents, mineral spirit, Barsol #2, APCO #1 8 Solvent, APCO thinner (thinner), Solcal dissolve No.l and N0.2, Solbeso #150 , Shell TS28 solvent, carbiol, ethyl carbitol, butyl carb (Carbital), methyl cellosolve, ethyl cellosolve, ethyl cellosolve acetate, as Diglyme the trade names of commercially available products. These solvents may be used singly or in combination of several. Further, the photopolymerizable composition of the present invention is preferably a solvent which has a solid content concentration of 5 to 50% by weight, preferably 1 to 30% by weight, based on the solvent. -28- (26) (26) 1343930 In the present invention, these essential components (a), (b), and (c), can be added to the optional component (d), and a pigment dispersant can be appropriately added. , adhesion improver, coating improver, development improver, and the like. In particular, in the composition of the present invention, the ochre color material is finely dispersed and stabilized in a dispersed state, and it is important in quality stability. Therefore, it is desirable to blend a pigment dispersant. a pigment dispersant, a (a) ochre color material, and (b) an organic binder, both having affinity, a nonionic, cationic, anionic surfactant, a polymer dispersant, etc., wherein the polymer is dispersed Preferably, the polymer dispersant having a basic functional group, such as a primary, secondary or tertiary amine group, a pyridine, a pyrimidine, a pyrazine or the like, may be advantageously used. use. (e) As a polymer dispersing agent having a basic functional group, a preferred chemical structure, for example, a polyisofluoric acid ester compound, a compound having one or two hydroxyl groups in the molecule, and an active molecule in the same molecule are specifically exemplified. A dispersion resin obtained by reacting hydrogen with a compound of a tertiary amino group. Examples of the above polyisocyanate compound include p-phenylene diisocyanate, 2'4-benzylidene isocyanate, 2,6-benzylidene diisocyanate, 4,4^diphenylmethane diisocyanate, naphthyl-1, An aromatic diisocyanate such as 5-diisocyanate or tolidine diisocyanate, hexylene diisocyanate, lysine methyl diisocyanate, 2,4,4-trimethylhexylene diisocyanate, Aliphatic diisocyanate such as dimer acid diisocyanate, isophorone diisocyanate _, 4,4·-methylene bis(cyclohexyl isocyanate), ω, diisocyanate dimethyl ring-29 - (27) 1343930 alicyclic diisocyanate such as hexane, phenyldimethyl diisocyanate, α,, α,-tetramethyl benzene diisocyanate, etc. having an aromatic diisocyanate, lysine Acid ester triisocyanate, 1 '6 alkyl triisocyanate, 1,8-diisocyanate-4·isocyanate methyl: 3,6-hexamethylene triisocyanate, dicycloheptane triisocyanate isocyanate phenylmethane), tris(isocyanate) Phenyl) thio ( ) phosphate, etc. Isopropyl ester atmosphere, and terpolymers of such 'adducts of such polyhydric alcohols, and water (polyol). Polyisocyanate A terpolymer of an organic diisocyanate, preferably a trimer of a benzylidene diisocyanate and an isophorone diisocyanate, which may be used alone. A method for producing an isocyanate trimer, wherein the polyisocyanate is subjected to isocyanic acid using an appropriate trimerization catalyst, for example, a tertiary amine, a phosphine metal, a metal oxide, a carboxylate or the like. Trimerization, a method of removing a polyisocyanate after the trimerization is stopped by solvent extraction and thin film distillation to remove the isocyanurate cyanate ester of the target product by the addition of a catalytic poison. a compound having one or two hydroxyl groups in the same molecule, ethylene glycol, polyester glycol, polycarbonate ethylene glycol, polyolefin, and one of the compounds having a terminal hydroxyl group of 1 to 25 carbon atoms A base material and a mixture of the two or more types. Polyether glycols, polyether diols, polyether ester diols, and mixtures of the above. The polyether diol is a single vinegar, α,α: alicyclic grease, 11-fluorene-based octane, 1 ester, and tris(phosphate. adduct, ester, preferably ester) Separately used, cyanate esters, alkoxy ester groups, and vice versa, and obtained polyisomeric, polyether glycol or the like, such as two kinds of mono- or copolymerization -30- (28 (28) 1343930 The obtained product, for example, polyethylene glycol, polypropylene glycol, polyethylene-propylene glycol, polyoxytetramethylene glycol, polyoxyethylene diol, polyoxyoctanediol, and the like a mixture of a polyether ester diol, a mixture of an ether group-containing diol or another ethylene glycol, and a dicarboxylic acid or an anhydrate thereof, or a reaction of the epoxide in a polyester glycol. Such as poly(polyoxytetraethylene) adipate, etc. Polyether glycol, preferably polyethylene glycol, polypropylene glycol, polyoxytetramethylene glycol or one of the compounds The hydroxyl group is a compound which is alkoxylated with an alkyl group having 1 to 25 carbon atoms. Polyethylene glycol has a dicarboxylic acid (succinic acid, glutaric acid, adipic acid, Diacid, fumaric acid, maleic acid, citric acid, etc.) or such anhydrates and glycols (ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, Tripropylene glycol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, 3-methyl-1, 5-pentanediol, neopentyl Glycol, 2-methyl-1,3-propanediol, 2-methyl-2-propyl-1,3-propanediol, 2-butyl-2-ethyl-1,3-propanediol, 1,5- Pentyl glycol, 1 '6-hexanediol, 2-methyl-2,4-pentanediol, 2' 2,4-trimethyl-1,3-pentanediol, 2-ethyl-1, 3-pentanediol, 2,5-dimethyl-2,5-hexanediol, 1,8-octanediol, 2-methyl-, 8-octanediol, hydrazine, 9-decanediol An aliphatic diol such as an aliphatic ethylene glycol or a bishydroxymethylcyclohexane, an aromatic diol such as benzodimethyl glycol or bishydroxyethoxybenzene, or N-methyldiethanolamine The N-alkyl dialkanolamine or the like obtained by condensation polymerization, for example, polyethylene adipate, polybutylene adipate, polyhexene adipate, polyethylene/propylene adipate Etc. or the aforementioned diol Or a polyvalent lactone diol or a polylactone monool, such as polycaprolactone diol or polymethyl pentene, having a carbon number of 1 -31 - (29) (29) 1343930 to 25 valent alcohol as an initiator. a lactone (valerolactone) and a mixture of two or more of them. The polyester diol is preferably a polycaprolactone diol or a polycaprolactone having a carbon number of 1 to 25 as an initiator. Poly(1,6-hexylene) carbonate, poly(3-methyl-1,5-pentylene) carbonate, etc., polyolefin diol having polybutadiene diol, hydrogen addition type polybutadiene A diol, a hydrogen-added polyisoprene (isoprene) diol, or the like. The number average molecular weight of one or two hydroxyl compounds in the same molecule is from 300 to 10,000, preferably from 500 to 6,000, more preferably from 1,000 to 4,000. The compound having active hydrogen and a tertiary amino group in the same molecule used in the present invention will be described. An active hydrogen, that is, a hydrogen atom directly bonded to an oxygen atom, a nitrogen atom or a sulfur atom, a hydrogen atom in a functional group having a hydroxyl group, an amine group, a thiol group, or the like, wherein an amine group, especially The hydrogen atom of the amine group of the first order is preferred. The tertiary metal group is not particularly limited. Further, the tertiary amino group is an amine group having an alkyl group having 1 to 4 carbon atoms or a heterocyclic ring structure, more specifically, an imidazole ring or a triazole ring. Examples of the compound having an active hydrogen and a tertiary amino group in the same molecule are as follows, N,N-dimethyl-1,3-propanediamine, N,N-diethyl-1,3-propanediamine, Ν ' N -Dipropyl-1,3-propanediamine, N,N-dibutyl-1 '3-propanediamine, Ν' Ν-dimethylethylenediamine, hydrazine, hydrazine-diethyl Ethylenediamine, hydrazine, hydrazine-dipropylethylenediamine, Ν' Ν-dibutylethylenediamine, hydrazine, hydrazine-dimethyl-1,4-butanediamine, hydrazine, hydrazine-diethyl- 1,4-butanediamine, hydrazine, hydrazine-dipropyl-1,4-butanediamine, Ν' Ν-dibutyl hydrazine, 4-butanediamine, and the like. -32- (30) (30) 1343930 Further, the tertiary amine group is a nitrogen-containing heterocyclic ring, and then has a pyrazole (pyraz〇ie) ring, an imidazole ring, a triazole ring, a tetrazole ring, an anthracene ring, and a carbazole. (carbazole) ring, indazole ring, benzimidazole ring, benzotriazole ring, benzoxazole ring, benzothiazole ring, benzosoxadiazole ring, etc. Steep ring, pyridazine ring, mute steep ring, Sanxiao ring 'quinoline ring' acridine ring, isoquine ring, etc. containing N hetero 6 ring. The nitrogen-containing heterocyclic ring is preferably an imidazole ring or a triazole ring. Such compounds having an imidazole ring and an amine group, specifically exemplified by 1-(3-aminopropyl)imidazole, histizine, 2-aminoimidazole, 1·(2-aminoethyl) Base) imidazole and the like. Further, a compound having a triazole ring and an amine group, and specifically exemplified is 3-amino-1,2,4-triazole, 5-(2-amino-5-arylphenyl)-3-phenyl -1Η-1,2,4-diindole, 4-amino-4Η-1,2,4-triazole-3,5-diol, 3-amino-5-phenyl-1Η-1,3 , 4-triazole, 5-amino-1,4-diphenyl-1,2,3-triazole, 3-amino-1-benzyl-1Η-2,4-triazole, and the like. Wherein, hydrazine, hydrazine-dimethyl-1,3-propanediamine, hydrazine, hydrazine-diethyl-1,3-propanediamine, 1-(3-aminopropyl)imidazole, 3-amino group -1,2,4-triazole is preferred. The preferred blending ratio of the dispersant raw material is 100 parts by weight of the polyisocyanate compound, and the average molecular weight of the compound having 1 or 2 hydroxyl groups in the same molecule is 300 to 1 Å, and the compound of hydrazine is 1 〇 2 〇〇. The compound having an active hydrogen and a tertiary amino group in the same molecule is 0.2 to 25 parts by weight, preferably 0.3 to 24 parts by weight, preferably 20 to 190 parts by weight, more preferably 30 to 18 parts by weight. Share. (e) The GPC conversion weight of the polymer dispersing agent having a base functional group is -33-(31)1343930. The average molecular weight is 〇〇〇~200,000, preferably 2,000~, more preferably 3,000~50,000. . The molecular weight of 1,000 is poor and the dispersion stability is poor, the solubility is lowered at 200,000 or more, and the control of the reaction is difficult, and the production of the polymer dispersant is carried out by a known method for producing a polyurethane resin. A solvent is usually produced, and a ketone such as acetone, methyl ethyl ketone, methyl isobutyl pentanone, cyclohexanone or isophorone, or an ester such as ethyl acetate, ethyl acetate or cellosolve acetate is used. Benzene, toluene 'xylene, hexane, diacetone alcohol, isopropanol, second butanol, third butanol, etc., methylene chloride, chloroform, etc., tetrahydrofuran, two An aprotic polar solvent such as an ether such as ethyl ether, an aprotic polar solvent such as dimethylformamide pyrrolidone or dimethyl sulfoxide, or the like, is usually a urethane catalyst. For example, dibutyltin dilaurate, dioctyltin divalent, dibutyltin octoate, stannous octoate, etc., tin, iron ethoxide, iron chloride, etc., triethylamine, triacetate The amount of the compound having an active hydrogen and a tertiary amino group in the same molecule is preferably in the range of 1 to 100 mg KOH/g of the amine after the reaction. More preferably, it is in the range of 5 to 9 5 mg KOH/g. The amine valence is neutralized by titration with the acid, and is shown by the mg corresponding to the acid oxime. When the amine value is less than the above range, the dispersibility tends to decrease, and if it exceeds the above range, the developability tends to decrease. In the case where the isocyanate group remains in the polymer dispersant as described above, the chlorination and N-methylation reaction of the alcohol in the hydrocarbon portion such as ketone or butyl ketone are dispersed and dispersed in accordance with 100,000. The third-order introduction control of citrate-based acetic acid is lower than that of the basic amine, and the reaction is stabilized by the reaction of the isocyanate group with an alcohol or -34-(32)1343930 amine compound. Gao is good. Further, in the case of using a polymer dispersant, the use ratio thereof is preferably 0.1 to 30% by weight, particularly preferably 0.5 to 5% by weight, based on (a) the ochre color material. Next, a method for producing the photopolymerizable composition of the present invention will be described. In the invention, it is preferred that the ochre color material is previously subjected to dispersion treatment using a brush conditioner, a sand filter, a ball mill, a roll mill, a stone mill, a jet mill, a homogenizer or the like. By dispersing the color material to be finely divided, the light-shielding ability of the resist can be improved and the coating property can be improved. In the dispersion treatment, the coloring material has a binder with a solvent or a dispersing function, or the pigment dispersing agent is further In the system to be used, it is better to handle it. In particular, when a polymer dispersant is used, it is preferred because it has excellent stability over time. Further, when the entire composition of the resist liquid is blended, the dispersion treatment under the mixed liquid and the heat generated during the dispersion cause degeneration of the reactive component, which is not preferable. In the case of dispersing in a sand grinder, glass beads (bead) or zirconia having a diameter of 0.1 to 8 mm can be suitably used. The conditions for dispersion, usually, the temperature is in the range of 〇 ° C to 100 ° C, preferably from room temperature to 80 ° C. The dispersion time can be adjusted according to the composition of the ink (color, solvent, dispersant) and the size of the sander, etc., and the gloss of the ink can be adjusted to make the 20 degree of the resist in the 100~ The scope of 200, the goal of dispersion. When the resist gloss is lowered, the dispersion treatment is not enough to have the residual of the coarse pigment particles, and the image is changed to 25. The int 黒 U U Uik 怀 散 同 的 的 的 的 - - - - - - - - - - - - - - - - - - - - - - - 33) 1343930, adhesion, resolution, etc. are not sufficient. Further, when the dispersing treatment is carried out, the gloss 値 exceeds the above range, and most of the ultrafine particles are generated, which in turn tends to impair the dispersion stability. Next, the ochre ink and the resist component obtained by the above dispersion treatment can be added and mixed with the above-mentioned other components to form a homogeneous solution. In the manufacturing step, fine dust is often mixed in the photosensitive liquid, so that the resulting resist photosensitive liquid is subjected to filtration treatment by a filter or the like. Next, a method of producing a color filter using the photopolymerizable composition of the present invention will be described. First, the photopolymerization of the present invention is carried out on a transparent substrate by a coating device such as a spinner, a wire bar, a flow coater, a die coater, a roll coater, a sprayer or the like. After the composition is applied and dried, a photomask is placed on the sample, and the image is exposed and developed by the mask, and a BM image for shading is formed by heat hardening or light hardening as needed. This operation is repeated for each of the RGB 3 colors to form a color filter image. Further, in the case where the photopolymerizable composition of the present invention is used to form a color filter pixel, since it has a very high sensitivity and a high resolution, exposure and development can be performed without forming an oxygen barrier layer such as polyvinyl alcohol. portrait. The transparent substrate and the transparent substrate for a color filter used herein are not particularly limited, and examples thereof include polyester such as polyethylene terephthalate or polyolefin such as polypropylene or polyethylene, and polycarbonate. , Thermoplastic plastic sheets such as polymethyl methacrylate, poly-rolling, thermosetting plastic sheets such as epoxy resin 'polyester resin, polymethacrylate resin, or various glass plates. In particular, in terms of heat resistance, it is preferable to use a glass plate or a heat-resistant plastic -36- 1343930, a pre-acid, a non-acid, a 0.1, a base method, or a thick coating agent. . After the symmetry of the condensate, the color of the surface, the membrane 黒 薄 薄 薄 之 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改 改The coating is equal to the smear, and the electricity is determined to be in the range of 2, η, preferably 0, 1 to 1 , 5 μηη, more preferably 0.1 to Ι μηι. Further, the color filter of the present invention is preferably one having a light-shielding property of 1 μm and an optical density of 3.0 or more. Further, it is advantageous to use a dispersion state of a solid component such as a pigment as an index, and a 度20 degree gloss 値 of 1 〇〇 to 200. A hot plate, an IR oven, a convection oven, or the like may be used for drying, preferably in a drying condition of 40 to 150 ° C and a drying time of 10 to 00 minutes. And light source for exposure, for example, gas lamp, halogen lamp, tungsten lamp, high pressure mercury lamp, ultra high pressure mercury lamp, metal halide lamp, medium pressure mercury lamp, low pressure mercury lamp, etc. or argon ion laser, YAG laser, excited state A laser source such as an excimer laser or a nitrogen laser. An optical pulverizer can be utilized where only a particular illumination light wavelength is used. The developing treatment is not particularly limited as long as it is a solvent for dissolving the resist film in the unexposed portion. For example, an organic solvent such as acetone, dichloroethylene, tricholene or cyclohexanone can be used. However, it is preferred that the organic solvent is environmentally polluting, harmful to humans, fire hazard, etc., and it is preferable to use such a non-hazardous alkaline developing solution. Such basic imaging liquids, for example, inorganic alkaline agents such as sodium carbonate, potassium carbonate, sodium citrate, potassium citrate, sodium hydroxide, potassium hydroxide, or diethanolamine, triethanolamine, hydroxylated-37- (35) (35)! 343930 A tetraalkylammonium salt or the like containing an aqueous solution of an organic alkaline agent. In the alkaline developing solution, it may be necessary, including a surfactant, a water-soluble organic solvent, a low molecular compound having a hydroxyl group or a carboxyl group, and the like. In particular, the surfactant has an improved effect with respect to development, resolution, texture contamination, etc., so that it is preferably added. For example, a surfactant for a developing solution, an anionic surfactant having a naphthylsulfonate-based sodium group, a sodium phenylsulfonate group, a polyalkyloxy group-containing nonionic surfactant, and a tetraalkyl group. An ammonium-based cationic surfactant or the like. There is no particular limitation on the development processing method, and usually, at a temperature of 10 to 50 ° C, preferably at a temperature of 15 to 45 ° C, clarification, spray imaging, and brush imaging. , ultrasonic imaging and other methods to carry out. Next, a liquid crystal display device (panel) of the present invention will be described. The liquid crystal display device of the present invention is characterized by the use of the above-described color filter. Therefore, it can be manufactured in the following manner. First, an alignment film is formed on a color filter, and a spacer is placed on the alignment film, and then bonded to the opposite substrate to form a liquid crystal cell. Next, liquid crystal cells are injected into the formed liquid crystal cell, and the alignment is completed with the counter electrode. The alignment film and the resin film such as polyamine are suitable. The formation of the alignment film is usually carried out by a gravure printing method or an flexography printing method, and usually, the thickness of the alignment film is 〜1 〇〇 nm. After the orientation film hardening treatment by the thermal calcination, the surface treatment by the ultraviolet irradiation or the lapping coating treatment is performed on the surface state in which the liquid crystal is tilted. The spacer is preferably used in accordance with the interval (cap) of the counter substrate (gap -38-(36) (36) 1343930), usually 2 to 8 μm. On the substrate of the color filter, a photo spacer (PS) of a transparent resin film is formed by a photolithography method, and the spacer can be used instead. It is appropriate to use an (array) substrate, in particular, a TFT (thin film transistor) substrate for a counter substrate. The interval to be bonded to the counter substrate is different depending on the use of the liquid crystal display device, and a range of 2 to 8 μm is usually selected. After bonding to the counter substrate, the portion other than the liquid crystal injection D is sealed with a sealing material such as an epoxy resin. The sealing material is hardened by UV irradiation and/or heating and sealed around the liquid crystal cell. After the liquid crystal cell sealed in the periphery is cut by the panel, decompressed in the vacuum reaction chamber, and the liquid crystal injection port is immersed in the liquid crystal, "the liquid crystal is injected into the liquid crystal cell by leakage in the reaction chamber." The degree of decompression in the liquid crystal cell is usually lxl (Γ2 to lxlO'7Pa, preferably lxl0.3~lxl〇-6Pa. Further, when the pressure is reduced, the liquid crystal cell is preferably heated, the heating temperature is It is usually 30 to 10 ° C, preferably 50 to 90 ° C, and is heated at a reduced pressure, usually in the range of 10 to 60 minutes, and thereafter immersed in a liquid crystal. The liquid crystal display device (panel) can be completed by curing the UV-curable resin, and the liquid crystal injection port can be sealed. The liquid crystal type is not particularly limited, and may be an aromatic system, an aliphatic system, a polycyclic compound, or the like. Any known liquid crystal, lyotropic liquid crystal, or thermal liquid crystal, etc. In a thermaltropic liquid crystal, nematic liquid crystal, smectic The liquid crystal, the cholesterol phase (ch〇resteric) liquid crystal, etc. are known as -39-(37)1343930, and one of these may be selected. [Embodiment] [Examples] Hereinafter, the details will be described in more detail with reference to examples and comparative examples. In the scope of not exceeding the gist of the present, it is not limited to Synthesis Example-1 (polymer Preparation of powder solution) Terpolymer of benzylidene diisocyanate (Mitsubishi Mytec GP75 0A, resin solid content 50% by weight 'B 3 2 g and dibutyl tin dilaurate as catalyst 〇. 〇 2g ether acetate (PGMEA) Diluted and dissolved at 47g. The number of methoxy groups at the end of the stirrer is 1,000, and the average molecular weight is 1,000. UNIOXM-1000) 1 4.4 g with Huo, propylene glycol (Sanyo Chemical Industry Co., Ltd. 1 000) After the titration of 9.6 g of the mixture was carried out at 70 ° C. Then, N,N-dimethylamino-1,3 - ί 4 〇 ° C was added to further react for 1 hour. The thus obtained high-liquid fraction was obtained. The amine valence was determined by neutralization titration to obtain 14 mg. The resin content was determined by a dry up method (clock, the solvent was removed on a hot plate, and the weight change was 40% by weight. Synthesis Example-2 (Synthesis of Organic Bonding Material) Invention, but the example of the present invention. 匕 公司 公司 酸 酸 酸 在 在 在 在 在 丙 丙 丙 丙 丙 丙 丙 丙 丙 丙 丙 丙 丙 丙SUNIKSPP - in turn, the reaction 3 is diamine, 1 g, dissolved in the dispersant KOH/g. Further, 1 50 〇C, 30 points of resin concentration) -40 - (38) (38) 1343930 Ethylene phenol varnish ring with epoxy equivalent of 200g/eq and softening point of 65 °C 200 g of oxyresin, 72 g of acrylic acid, 0.2 g of p-methoxyphenol, 0.2 g of dodecyltrimethylammonium chloride, and 272 g of PGMEA were placed in a flask, and reacted at a temperature of 1 Torr for 8 hours (relative to epoxy group 1). Equivalent, 1 equivalent of acrylic acid is reacted). Further, 42 g of tetrahydrophthalic anhydride was added and reacted at 80 ° C for 3 hours. The reaction solution was again poured into water and vacuum dried to obtain a powdery aldehyde varnish epoxy acrylate resin. Neutralization titration by KOH The acid hydrazine of the resin was 50 mg KOH/g. Synthesis Example-3 (Synthesis of Organic Binding Material) The reaction was carried out in the same manner as in Synthesis Example 2 except that the amount of tetrahydrophthalic anhydride added was 63 g. The obtained resin strontium was 70 mg KOH/g. (Dispersion of carbon black) 50 parts by weight of the carbon black (manufactured by Mitsubishi Chemical Corporation, MA-220), and the polymer dispersant represented by Synthesis Example-1 is a ratio of 5 parts by weight of the solid component, and the solid content concentration is Carbon black, a polymer dispersant solution, and PGMEA were added in an amount of 50% by weight. The total weight of the dispersion was 50 g. Premixing is carried out by stirring it with a mixer. Then, dispersion treatment was carried out for 6 hours in a range of 25 to 45 ° C by a Paint shaker. The beads were made of 55 mm 0 鍩 oxygen beads, and the same weight as the dispersion was added. After the dispersion is completed, the beads are separated from the dispersion by a filter. -41 - (39) 1343930 . Examples 1 to 3 and Comparative Examples 1 to 3 ' (1) Preparation of resist liquid * Using the carbon black dispersion ink described above, each component (a), (b), ( c), (d), (e), an organic solvent, and a surfactant adjust the black resist photosensitive liquid by setting the solid content to the blending ratio described below, stirring and dissolving by a stirrer. (a) Green color material 50g ® carbon black (Mitsubishi Chemical Co., Ltd. 'MA-220) 30g (b) Organic binder (described in Table 2) ^ (d) Photopolymerizable monomer: ethylenic compound l〇g Dipentaerythritol hexaacrylate (c) Photopolymerization initiator (described in Table 2) Organic solvent ^ Propylene glycol monomethyl ether acetate 3 00 g (e) Polymer dispersant (Synthesis Example-1) 5 g Interface activity Agent (manufactured by Sumitomo 3M Co., Ltd., FC-430) lOOppm (2) Evaluation of resist The black resist photosensitive liquid was applied to a glass substrate (manufactured by Corning, Inc., 7059) in a spin coater, and dried on a hot plate. 80 ° C, 1 minute. The thickness of the resist film after drying was 1 μm by a stylus film thickness meter (manufactured by Tencor Co., Ltd., α-step). Next, the sample was exposed to light by a mask using a high pressure -42-(40) (40) 1343930 mercury lamp to change the exposure. A resist pattern was obtained by spray development using a sodium carbonate aqueous solution having a temperature of 25 ° C and a concentration of 0.8%. The sensitivity, the resolution, and the light-shielding property were evaluated by the following criteria, and the results of Table 2 were obtained. 1. Sensitivity The mask pattern of 20μηι is expressed by a suitable amount of exposure (mj/cm2) formed by size. In other words, since the resist having a small exposure amount can form an image at a low exposure amount, it is displayed as high sensitivity. 2. Resolution The 顕 micromirror was observed at a magnification of 200 times in the minimum pattern size of the solvable resist in the exposure amount which faithfully reproduced the 20 μm mask pattern. The minimum pattern size is ΙΟμπι or less, and the resolution is more than 〇, 1〇μηι is indicated by X. 3. Light-shielding The optical density (OD) of the line portion was measured by a Macbeth reflection densitometer (Gretag Macbeth (formerly Komolgun), TR 9 2 7). Further, the OD system indicates that the number of light-shielding capabilities is high, and the higher the light-shielding property. (S > -43- (41) (41) Ϊ 343930 [Table 2] (b) Organic binder (C) Photopolymerization initiator sensitivity resolution light-shielding property mj/cm2 Example 1 Synthesis Example 2 C-1 40 〇3.5 Example 2 Synthesis Example 3 C-1 50 〇 3.5 Example 3 Synthesis Example 3 C-4 30 〇 3.5 Comparative Example 1 Synthesis Example 2 C-2 100 〇 3.5 Comparative Example 2 a-1 C-1 150 X 3.5 Comparative Example 3 Synthesis Example 2 c-3 200 〇3.5 Further, the meanings of the symbols in Table 2 are as follows: a-1: propylene polymer (manufactured by Daicel Chemical Industry Co., Ltd., ACA-200M) c-1: photopolymerization initiator ( Chiba Special Chemicals Co., Ltd., CGI-124).........(5g) -44- (42)1343930

【化8】【化8】

c-2:4-(間溴對甲氧基苯基)-2,6-二(三氯甲基)-s-三 嗪.........·( 5 g ) c-3:2,2'—雙(鄰氯苯基)-4,4' 5,5’-s四苯基二咪唑 (2g)十4,4’ -雙(二乙基胺)二苯基酮(lg)十2-氫 硫基苯并噻唑(1 g )C-2: 4-(m-bromo-p-methoxyphenyl)-2,6-di(trichloromethyl)-s-triazine... (5 g ) c-3 :2,2'-bis(o-chlorophenyl)-4,4' 5,5'-s tetraphenyldiimidazole (2g) deca 4,4'-bis(diethylamine)diphenyl ketone ( Lg) Dec-2-thiothiabenzothiazole (1 g )

c-4:光聚合引發劑(千葉·特用化學品公司製、CGI-242 ) .........(5 g ) 【化9】C-4: Photopolymerization initiator (manufactured by Chiba Special Chemicals Co., Ltd., CGI-242) ... (5 g ) [Chem. 9]

(S ) -45- (43) (43)1343930(S) -45- (43) (43) 1343930

產業上利用可能性 本發明之光聚合性組成物及使用此組成物之濾色器, 可用於彩色電視,液晶顯示元件,固體攝影元件,照相機 等。 -46 -Industrial Applicability The photopolymerizable composition of the present invention and a color filter using the same can be used for a color television, a liquid crystal display element, a solid-state imaging device, a camera, and the like. -46 -

Claims (1)

V * 第095M6906號專利申請案中文申請專利範圍修正本 > • 民國100年2月1曰修正 . 十、申請專利範圍 1 . 一種光聚合性組成物,其係含有(a )黒色色材、 (b )有機結合材及(c )光聚合引發劑之光聚合性組成物 ’其特徵爲(b)有機結合材爲具有羧基之環氧丙烯酸酯 樹脂' (c )光聚合引發劑爲—般式(6)所示之肟酯系化合 % 物者V * Patent Application No. 095M6906, Revision of Chinese Patent Application Scope; • Amendment of the Republic of China on February 1st, 100. Patent Application No. 1. A photopolymerizable composition containing (a) a twilight color material, (b) an organic binder and (c) a photopolymerizable composition of a photopolymerization initiator, characterized in that (b) the organic binder is an epoxy acrylate resin having a carboxyl group' (c) a photopolymerization initiator The compound of the oxime ester compound represented by the formula (6) (式中,R1爲可取代之碳數1〜10之烷基,R2爲各自可 取代之碳數2〜10之烷醯基、苯甲醯基,rIQ互相獨立表 示氫原子、各自爲可取代之碳數1〜1 2之烷基、碳數2〜4 之經基院基、碳數3〜5之嫌基或苯基,r 1Q係亦可經由 R 1 〇所鍵結之氮原子而與所鍵結之芳香族環之雙方或—方 之進一步之取代基或芳香族環之1個碳原子鍵結而形成環 構造’ R12、R14及R15爲氫原子,R13表示可取代之苯甲 醯基)。 2 ·如申請專利範圍第1項之光聚合性組成物,其中 光聚合性組成物進而含有(d)光聚合性單體。 3.如申請專利範圍第1項或第2項之光聚合性組成 物’其中光聚合性組成物,進而含有(e)具有鹼性官能基之 1343930 高分子分散劑。。 4.如申請專利範圍第丨項或第2項之光聚合性組成 物,其中,(b )有機結合材係使酚醛清漆型環氧樹脂與( 甲基)丙烧酸之反應生成物與(氫)酞酸酐反應所得之環 氧丙烯酸酯。(wherein R1 is an alkyl group having 1 to 10 carbon atoms which may be substituted, R2 is an alkanoyl group having 2 to 10 carbon atoms which may be substituted, and a benzhydryl group, and rIQ independently represents a hydrogen atom, each of which is replaceable The alkyl group having a carbon number of 1 to 12, the base group having a carbon number of 2 to 4, the susceptor having a carbon number of 3 to 5 or a phenyl group, and the r 1Q system may also be a nitrogen atom bonded via R 1 〇. It is bonded to one of the bonded aromatic rings or one of the further substituents or one carbon atom of the aromatic ring to form a ring structure. R12, R14 and R15 are hydrogen atoms, and R13 represents a replaceable benzene.醯基). 2. The photopolymerizable composition according to claim 1, wherein the photopolymerizable composition further contains (d) a photopolymerizable monomer. 3. The photopolymerizable composition of claim 1 or 2 wherein the photopolymerizable composition further comprises (e) a 1343930 polymer dispersant having a basic functional group. . 4. The photopolymerizable composition of claim 2 or 2, wherein (b) the organic binder is a reaction product of a novolac type epoxy resin and (meth)propionic acid; Epoxy acrylate obtained by the reaction of hydrogen) phthalic anhydride. 5 · —種濾色器,其係在透明基板上,具有由申請專 利範圍第1〜4項中任一項記載之光聚合性組成物所形成之 黑色基質者。 6 - —種液晶顯示裝置,其係使用申請專利範圍第5項 之濾色器所形成者。A color filter comprising a black matrix formed of the photopolymerizable composition according to any one of claims 1 to 4, which is a transparent substrate. 6 - A liquid crystal display device which is formed by using a color filter of the fifth application of the patent application. [S] -2-[S] -2-
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Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4595374B2 (en) * 2003-04-24 2010-12-08 住友化学株式会社 Black photosensitive resin composition
JP2005300994A (en) * 2004-04-13 2005-10-27 Jsr Corp Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel
JP4448381B2 (en) * 2004-05-26 2010-04-07 東京応化工業株式会社 Photosensitive composition
JP4492238B2 (en) * 2004-07-26 2010-06-30 Jsr株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display panel
TWI385485B (en) * 2004-11-17 2013-02-11 Jsr Corp A photosensitive resin composition, a display panel spacer, and a display panel
JP2006195425A (en) * 2004-12-15 2006-07-27 Jsr Corp Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel
KR100671106B1 (en) * 2004-12-29 2007-01-17 제일모직주식회사 High photosensitive resin composition and black matrix thereof
JP4640971B2 (en) * 2005-09-08 2011-03-02 東京応化工業株式会社 Photosensitive resin composition for light shielding pattern formation of plasma display
JP4867466B2 (en) * 2006-05-12 2012-02-01 凸版印刷株式会社 Color filter and liquid crystal display device using the same
KR101471644B1 (en) 2006-12-27 2014-12-10 가부시키가이샤 아데카 Oxime ester compound and photopolymerization initiator comprising the compound
EP2072500B1 (en) 2006-12-27 2012-09-26 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the compound
JP5030638B2 (en) 2007-03-29 2012-09-19 富士フイルム株式会社 Color filter and manufacturing method thereof
JP5270113B2 (en) * 2007-06-06 2013-08-21 新日鉄住金化学株式会社 Photosensitive resin composition for black resist, light shielding film and color filter using the same
KR101032275B1 (en) * 2007-11-08 2011-05-06 주식회사 엘지화학 Colored dispersions, photoresist resin composition and black matrix
CN101855201B (en) 2007-12-25 2013-09-18 株式会社艾迪科 Oxime esters and photopolymerization initiators containing the same
JP5344843B2 (en) * 2008-03-31 2013-11-20 富士フイルム株式会社 Polymerizable composition and solid-state imaging device
JP5336274B2 (en) 2008-07-09 2013-11-06 東京応化工業株式会社 Colored photosensitive resin composition and oxime photopolymerization initiator
JP4818458B2 (en) 2009-11-27 2011-11-16 株式会社Adeka Oxime ester compound and photopolymerization initiator containing the compound
KR101435652B1 (en) 2014-01-17 2014-08-28 주식회사 삼양사 NOVEL FLUORENYL β-OXIME ESTER COMPOUNDS, PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING THE SAME
KR101824429B1 (en) 2015-01-26 2018-02-06 주식회사 삼양사 Novel di-oxime ester compounds and photopolymerization initiator and photoresist composition containing the same
KR101828927B1 (en) 2015-02-06 2018-02-14 주식회사 삼양사 Novel oxime ester compounds, photopolymerization initiator and photoresist composition containing the same
KR101824443B1 (en) 2015-04-09 2018-02-05 주식회사 삼양사 Novel fluorenyl oxime ester compounds, photopolymerization initiator and photoresist composition containing the same
KR101777845B1 (en) 2015-06-08 2017-09-12 주식회사 삼양사 Novel fluoranthene oxime ester derivates, photopolymerization initiator and photoresist composition containing the same
KR102613079B1 (en) 2015-07-17 2023-12-12 타코마테크놀러지 주식회사 Oxime ester compound and photosensitive resin composition containing the compound
KR102509606B1 (en) 2015-10-30 2023-03-14 주식회사 삼양사 Novel quinolinyl beta oxime ester derivative compound, photopolymerization initiator, and photoresist composition containing the same
KR101892086B1 (en) 2016-05-19 2018-08-27 주식회사 삼양사 Oxime ester derivative compounds, photopolymerization initiator, and photosensitive composition containing the same
KR20180090135A (en) 2017-02-02 2018-08-10 주식회사 삼양사 Oxime ester biphenyl compounds, photopolymerization initiator, and photosensitive composition containing the same
KR101991903B1 (en) 2017-12-07 2019-10-01 주식회사 삼양사 Carbazole oxime ester derivative compounds and, photopolymerization initiator and photosensitive composition containing the same
KR102228630B1 (en) 2018-12-28 2021-03-16 주식회사 삼양사 Carbazole multi β-oxime ester derivative compounds and, photopolymerization initiator and photoresist composition containing the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1184126A (en) * 1997-09-03 1999-03-26 Mitsubishi Chem Corp Photopolymerizable composition for color filter and color filter
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
NL1016815C2 (en) * 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester photo initiators.
KR100467360B1 (en) * 2002-04-02 2005-01-24 (주)아이컴포넌트 Coating agent of organic/inorganic hybrid type for display
JP2004113367A (en) * 2002-09-25 2004-04-15 Kyowa:Kk Hanger provided on bag

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