JP2004006716A5 - - Google Patents

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Publication number
JP2004006716A5
JP2004006716A5 JP2003073637A JP2003073637A JP2004006716A5 JP 2004006716 A5 JP2004006716 A5 JP 2004006716A5 JP 2003073637 A JP2003073637 A JP 2003073637A JP 2003073637 A JP2003073637 A JP 2003073637A JP 2004006716 A5 JP2004006716 A5 JP 2004006716A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2003073637A
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Japanese (ja)
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JP2004006716A (ja
JP4298336B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2003073637A external-priority patent/JP4298336B2/ja
Priority to JP2003073637A priority Critical patent/JP4298336B2/ja
Priority to US10/512,312 priority patent/US7274435B2/en
Priority to CNB038090902A priority patent/CN100375238C/zh
Priority to EP03747216A priority patent/EP1502291A4/en
Priority to KR1020047017241A priority patent/KR100627167B1/ko
Priority to PCT/JP2003/004644 priority patent/WO2003092056A1/en
Priority to TW092109249A priority patent/TWI294560B/zh
Publication of JP2004006716A publication Critical patent/JP2004006716A/ja
Publication of JP2004006716A5 publication Critical patent/JP2004006716A5/ja
Publication of JP4298336B2 publication Critical patent/JP4298336B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003073637A 2002-04-26 2003-03-18 露光装置、光源装置及びデバイス製造方法 Expired - Fee Related JP4298336B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2003073637A JP4298336B2 (ja) 2002-04-26 2003-03-18 露光装置、光源装置及びデバイス製造方法
KR1020047017241A KR100627167B1 (ko) 2002-04-26 2003-04-11 노광장치 및 이것을 이용한 디바이스의 제조방법
CNB038090902A CN100375238C (zh) 2002-04-26 2003-04-11 曝光设备以及使用该曝光设备的器件制造方法
EP03747216A EP1502291A4 (en) 2002-04-26 2003-04-11 EXPOSURE SYSTEM AND METHOD FOR MANUFACTURING A DEVICE USING THE SAME
US10/512,312 US7274435B2 (en) 2002-04-26 2003-04-11 Exposure apparatus and device fabrication method using the same
PCT/JP2003/004644 WO2003092056A1 (en) 2002-04-26 2003-04-11 Exposure apparatus and device fabrication method using the same
TW092109249A TWI294560B (en) 2002-04-26 2003-04-21 Exposure apparatus and device fabrication method using the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002127343 2002-04-26
JP2003073637A JP4298336B2 (ja) 2002-04-26 2003-03-18 露光装置、光源装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2004006716A JP2004006716A (ja) 2004-01-08
JP2004006716A5 true JP2004006716A5 (enExample) 2006-04-27
JP4298336B2 JP4298336B2 (ja) 2009-07-15

Family

ID=29272380

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003073637A Expired - Fee Related JP4298336B2 (ja) 2002-04-26 2003-03-18 露光装置、光源装置及びデバイス製造方法

Country Status (7)

Country Link
US (1) US7274435B2 (enExample)
EP (1) EP1502291A4 (enExample)
JP (1) JP4298336B2 (enExample)
KR (1) KR100627167B1 (enExample)
CN (1) CN100375238C (enExample)
TW (1) TWI294560B (enExample)
WO (1) WO2003092056A1 (enExample)

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JP6080481B2 (ja) * 2012-01-26 2017-02-15 ギガフォトン株式会社 極端紫外光生成装置
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CN103513519A (zh) * 2013-09-13 2014-01-15 华中科技大学 一种极紫外光刻机光源中液滴靶空间位置的监控系统
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IL234729B (en) 2013-09-20 2021-02-28 Asml Netherlands Bv A light source operated by a laser and a method using a mode mixer
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CN104460242B (zh) * 2014-12-11 2016-04-27 北京理工大学 一种基于自由曲面式光阑复眼的极紫外光刻照明系统
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