JP2003506732A - 調節可能な使用波長を有する多層光学素子 - Google Patents

調節可能な使用波長を有する多層光学素子

Info

Publication number
JP2003506732A
JP2003506732A JP2001514437A JP2001514437A JP2003506732A JP 2003506732 A JP2003506732 A JP 2003506732A JP 2001514437 A JP2001514437 A JP 2001514437A JP 2001514437 A JP2001514437 A JP 2001514437A JP 2003506732 A JP2003506732 A JP 2003506732A
Authority
JP
Japan
Prior art keywords
reflector
ray
electromagnetic
curvature
multilayer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001514437A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003506732A5 (enExample
Inventor
ジアン、リカイ
ヴァーマン、ボリス
Original Assignee
オスミック，インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by オスミック，インコーポレイテッド filed Critical オスミック，インコーポレイテッド
Publication of JP2003506732A publication Critical patent/JP2003506732A/ja
Publication of JP2003506732A5 publication Critical patent/JP2003506732A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0883—Mirrors with a refractive index gradient
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Aerials With Secondary Devices (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Semiconductor Lasers (AREA)
  • Optical Filters (AREA)
JP2001514437A 1999-08-02 2000-08-01 調節可能な使用波長を有する多層光学素子 Pending JP2003506732A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/366,028 US6421417B1 (en) 1999-08-02 1999-08-02 Multilayer optics with adjustable working wavelength
US09/366,028 1999-08-02
PCT/US2000/021060 WO2001009904A2 (en) 1999-08-02 2000-08-01 Multilayer optics with adjustable working wavelength

Publications (2)

Publication Number Publication Date
JP2003506732A true JP2003506732A (ja) 2003-02-18
JP2003506732A5 JP2003506732A5 (enExample) 2005-06-09

Family

ID=23441383

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001514437A Pending JP2003506732A (ja) 1999-08-02 2000-08-01 調節可能な使用波長を有する多層光学素子

Country Status (9)

Country Link
US (1) US6421417B1 (enExample)
EP (1) EP1200967B1 (enExample)
JP (1) JP2003506732A (enExample)
AT (1) ATE280993T1 (enExample)
AU (1) AU6511100A (enExample)
CA (2) CA2642736A1 (enExample)
CZ (1) CZ301738B6 (enExample)
DE (1) DE60015346T2 (enExample)
WO (1) WO2001009904A2 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003014894A (ja) * 2001-06-27 2003-01-15 Rigaku Corp Ｘ線分光方法及びｘ線分光装置
JP2011510752A (ja) * 2008-01-30 2011-04-07 リフレクティブ エックス−レイ オプティクス エルエルシー Ｘ線撮影法によるｘ線撮像システムのためのミラーの取り付け、位置合わせ、走査機構および走査方法、それらを備えたｘ線撮像装置
JP2013210377A (ja) * 2003-06-13 2013-10-10 Osmic Inc ビーム調整システム
CN109799612A (zh) * 2019-03-15 2019-05-24 重庆大学 曲面反射镜制造方法及变曲率半径点光源线聚焦成像系统

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US6870896B2 (en) 2000-12-28 2005-03-22 Osmic, Inc. Dark-field phase contrast imaging
US6804324B2 (en) * 2001-03-01 2004-10-12 Osmo, Inc. X-ray phase contrast imaging using a fabry-perot interferometer concept
US6510200B1 (en) 2001-06-29 2003-01-21 Osmic, Inc. Multi-layer structure with variable bandpass for monochromatization and spectroscopy
US6643353B2 (en) 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
JP2003255089A (ja) * 2002-03-05 2003-09-10 Rigaku Industrial Co Ｘ線分光素子およびそれを用いた蛍光ｘ線分析装置
JP3629520B2 (ja) * 2002-03-05 2005-03-16 理学電機工業株式会社 Ｘ線分光素子およびそれを用いた蛍光ｘ線分析装置
EP1403882B1 (en) 2002-09-03 2012-06-13 Rigaku Corporation Parabolic mirror and movable X-ray source for obtaining parallel x-ray beams having different wavelengths
DE10254026C5 (de) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflektor für Röntgenstrahlung
US7280634B2 (en) 2003-06-13 2007-10-09 Osmic, Inc. Beam conditioning system with sequential optic
WO2006014376A1 (en) * 2004-07-02 2006-02-09 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Naval Research Laboratory Deformable mirror apparatus
JP4432822B2 (ja) * 2005-04-19 2010-03-17 船井電機株式会社 形状可変ミラー及びそれを備えた光ピックアップ装置
US7425193B2 (en) * 2005-04-21 2008-09-16 Michigan State University Tomographic imaging system using a conformable mirror
DE102006015933B3 (de) * 2006-04-05 2007-10-31 Incoatec Gmbh Vorrichtung und Verfahren zum Justieren eines optischen Elements
JP4278108B2 (ja) * 2006-07-07 2009-06-10 株式会社リガク 超小角ｘ線散乱測定装置
US7555098B2 (en) * 2007-05-02 2009-06-30 HD Technologies Inc. Method and apparatus for X-ray fluorescence analysis and detection
US7920676B2 (en) * 2007-05-04 2011-04-05 Xradia, Inc. CD-GISAXS system and method
US8130902B2 (en) * 2007-07-31 2012-03-06 Uchicago Argonne, Llc High-resolution, active-optic X-ray fluorescence analyzer
DE102007048743B4 (de) * 2007-10-08 2010-06-24 Ifg - Institute For Scientific Instruments Gmbh Verfahren und Vorrichtung zur Bestimmung der energetischen Zusammensetzung von elektromagnetischen Wellen
US7848483B2 (en) * 2008-03-07 2010-12-07 Rigaku Innovative Technologies Magnesium silicide-based multilayer x-ray fluorescence analyzers
US8126117B2 (en) * 2010-02-03 2012-02-28 Rigaku Innovative Technologies, Inc. Multi-beam X-ray system
JP4974391B2 (ja) * 2010-02-21 2012-07-11 株式会社リガク Ｘ線分光方法及びｘ線分光装置
US8406374B2 (en) 2010-06-25 2013-03-26 Rigaku Innovative Technologies, Inc. X-ray optical systems with adjustable convergence and focal spot size
WO2012023141A1 (en) * 2010-08-19 2012-02-23 Convergent Radiotherapy, Inc System for x-ray irradiation of target volume
CN102525492A (zh) * 2010-12-31 2012-07-04 上海西门子医疗器械有限公司 一种x射线能谱选择装置
KR101332502B1 (ko) * 2011-06-14 2013-11-26 전남대학교산학협력단 국부적 방사선 치료용 ｘ―선 바늘 모듈
US20130182827A1 (en) * 2011-12-02 2013-07-18 Canon Kabushiki Kaisha X-ray waveguide and x-ray waveguide system
US9513238B2 (en) * 2012-11-29 2016-12-06 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Method and device for performing an x-ray fluorescence analysis
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
JP6025211B2 (ja) * 2013-11-28 2016-11-16 株式会社リガク Ｘ線トポグラフィ装置
WO2017009302A1 (en) * 2015-07-14 2017-01-19 Koninklijke Philips N.V. Imaging with enhanced x-ray radiation
DE102017202802A1 (de) * 2017-02-21 2018-08-23 Carl Zeiss Smt Gmbh Objektiv und optisches System mit einem solchen Objektiv
DE112019002822T5 (de) * 2018-06-04 2021-02-18 Sigray, Inc. Wellenlängendispersives röntgenspektrometer
CN112470245B (zh) 2018-07-26 2025-03-18 斯格瑞公司 高亮度x射线反射源
EP3603516A1 (de) * 2018-08-02 2020-02-05 Siemens Healthcare GmbH Röntgenvorrichtung und verfahren zum betrieb der röntgenvorrichtung
US10962491B2 (en) 2018-09-04 2021-03-30 Sigray, Inc. System and method for x-ray fluorescence with filtering
WO2020051221A2 (en) 2018-09-07 2020-03-12 Sigray, Inc. System and method for depth-selectable x-ray analysis
US11217357B2 (en) 2020-02-10 2022-01-04 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal/hyperbolic surface profiles

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US4693933A (en) 1983-06-06 1987-09-15 Ovonic Synthetic Materials Company, Inc. X-ray dispersive and reflective structures and method of making the structures
US4717632A (en) 1983-08-22 1988-01-05 Ovonic Synthetic-Materials Company, Inc. Adhesion and composite wear resistant coating and method
US4716083A (en) 1983-09-23 1987-12-29 Ovonic Synthetic Materials Company Disordered coating
US4525853A (en) 1983-10-17 1985-06-25 Energy Conversion Devices, Inc. Point source X-ray focusing device
US4785470A (en) 1983-10-31 1988-11-15 Ovonic Synthetic Materials Company, Inc. Reflectivity and resolution X-ray dispersive and reflective structures for carbon, beryllium and boron analysis
US4643951A (en) 1984-07-02 1987-02-17 Ovonic Synthetic Materials Company, Inc. Multilayer protective coating and method
US4724169A (en) 1984-10-09 1988-02-09 Ovonic Synthetic Materials Company, Inc. Method of producing multilayer coatings on a substrate
US4675889A (en) 1985-07-08 1987-06-23 Ovonic Synthetic Materials Company, Inc. Multiple wavelength X-ray dispersive devices and method of making the devices
US4969175A (en) * 1986-08-15 1990-11-06 Nelson Robert S Apparatus for narrow bandwidth and multiple energy x-ray imaging
US4958363A (en) 1986-08-15 1990-09-18 Nelson Robert S Apparatus for narrow bandwidth and multiple energy x-ray imaging
US4777090A (en) 1986-11-03 1988-10-11 Ovonic Synthetic Materials Company Coated article and method of manufacturing the article
US4783374A (en) 1987-11-16 1988-11-08 Ovonic Synthetic Materials Company Coated article and method of manufacturing the article
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US4867785A (en) 1988-05-09 1989-09-19 Ovonic Synthetic Materials Company, Inc. Method of forming alloy particulates having controlled submicron crystallite size distributions
JP2569447B2 (ja) * 1988-11-28 1997-01-08 株式会社ニコン 多層膜反射鏡の製造方法
JPH02210299A (ja) 1989-02-10 1990-08-21 Olympus Optical Co Ltd Ｘ線用光学系及びそれに用いる多層膜反射鏡
US5027377A (en) 1990-01-09 1991-06-25 The United States Of America As Represented By The United States Department Of Energy Chromatic X-ray magnifying method and apparatus by Bragg reflective planes on the surface of Abbe sphere
FR2658619B1 (fr) 1990-02-19 1993-04-02 Megademini Taoufik Miroirs interferentiels multifractals de dimensions fractales entre 0 et 1.
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RU1820354C (ru) * 1990-11-11 1993-06-07 Ленинградский Институт Точной Механики И Оптики Оптический элемент с регулируемой кривизной
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US5265143A (en) * 1993-01-05 1993-11-23 At&T Bell Laboratories X-ray optical element including a multilayer coating
US5384817A (en) 1993-07-12 1995-01-24 Ovonic Synthetic Materials Company X-ray optical element and method for its manufacture
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JPH08179099A (ja) * 1994-12-22 1996-07-12 Ishikawajima Harima Heavy Ind Co Ltd Ｘ線ミラー装置
JP3278317B2 (ja) 1995-03-24 2002-04-30 キヤノン株式会社 露光装置及びデバイス製造方法
US5757882A (en) 1995-12-18 1998-05-26 Osmic, Inc. Steerable x-ray optical system
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US6069934A (en) 1998-04-07 2000-05-30 Osmic, Inc. X-ray diffractometer with adjustable image distance

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003014894A (ja) * 2001-06-27 2003-01-15 Rigaku Corp Ｘ線分光方法及びｘ線分光装置
JP2013210377A (ja) * 2003-06-13 2013-10-10 Osmic Inc ビーム調整システム
JP2011510752A (ja) * 2008-01-30 2011-04-07 リフレクティブ エックス−レイ オプティクス エルエルシー Ｘ線撮影法によるｘ線撮像システムのためのミラーの取り付け、位置合わせ、走査機構および走査方法、それらを備えたｘ線撮像装置
CN109799612A (zh) * 2019-03-15 2019-05-24 重庆大学 曲面反射镜制造方法及变曲率半径点光源线聚焦成像系统

Also Published As

Publication number Publication date
WO2001009904A2 (en) 2001-02-08
CZ2002791A3 (cs) 2002-11-13
CZ301738B6 (cs) 2010-06-09
US6421417B1 (en) 2002-07-16
US20020080916A1 (en) 2002-06-27
ATE280993T1 (de) 2004-11-15
DE60015346D1 (de) 2004-12-02
CA2380922C (en) 2008-12-09
WO2001009904A9 (en) 2002-09-12
EP1200967A2 (en) 2002-05-02
DE60015346T2 (de) 2005-11-10
CA2380922A1 (en) 2001-02-08
WO2001009904A3 (en) 2001-09-27
AU6511100A (en) 2001-02-19
CA2642736A1 (en) 2001-02-08
EP1200967B1 (en) 2004-10-27

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