DE68922306T2 - Optische vorrichtungen und methoden für ihre herstellung. - Google Patents

Optische vorrichtungen und methoden für ihre herstellung.

Info

Publication number
DE68922306T2
DE68922306T2 DE68922306T DE68922306T DE68922306T2 DE 68922306 T2 DE68922306 T2 DE 68922306T2 DE 68922306 T DE68922306 T DE 68922306T DE 68922306 T DE68922306 T DE 68922306T DE 68922306 T2 DE68922306 T2 DE 68922306T2
Authority
DE
Germany
Prior art keywords
cylinder
production
methods
optical devices
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68922306T
Other languages
English (en)
Other versions
DE68922306D1 (de
Inventor
Technology Group Ltd L British
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BTG International Ltd
Original Assignee
British Technology Group Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB888805776A external-priority patent/GB8805776D0/en
Priority claimed from GB888816374A external-priority patent/GB8816374D0/en
Priority claimed from GB888830403A external-priority patent/GB8830403D0/en
Application filed by British Technology Group Ltd filed Critical British Technology Group Ltd
Publication of DE68922306D1 publication Critical patent/DE68922306D1/de
Application granted granted Critical
Publication of DE68922306T2 publication Critical patent/DE68922306T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/38—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal at least one coating being a coating of an organic material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G02B19/0023—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Saccharide Compounds (AREA)
  • Compounds Of Unknown Constitution (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
  • Mirrors, Picture Frames, Photograph Stands, And Related Fastening Devices (AREA)
  • Particle Accelerators (AREA)
  • Optical Integrated Circuits (AREA)
DE68922306T 1988-03-11 1989-03-13 Optische vorrichtungen und methoden für ihre herstellung. Expired - Fee Related DE68922306T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
GB888805776A GB8805776D0 (en) 1988-03-11 1988-03-11 Grazing incidence reflecting optics for expanding & collamating synchrotron radiation
GB888816374A GB8816374D0 (en) 1988-07-08 1988-07-08 Mirror that expands collimates & homogenizes x-rays emmitted by synchrotron source for lithography
GB888830403A GB8830403D0 (en) 1988-12-30 1988-12-30 Optical devices and methods of fabrication thereof
PCT/GB1989/000256 WO1989008920A1 (en) 1988-03-11 1989-03-13 Optical devices and methods of fabrication thereof

Publications (2)

Publication Number Publication Date
DE68922306D1 DE68922306D1 (de) 1995-05-24
DE68922306T2 true DE68922306T2 (de) 1995-11-02

Family

ID=27263818

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68922306T Expired - Fee Related DE68922306T2 (de) 1988-03-11 1989-03-13 Optische vorrichtungen und methoden für ihre herstellung.

Country Status (6)

Country Link
EP (1) EP0403561B1 (de)
JP (1) JPH03504271A (de)
AT (1) ATE121555T1 (de)
DE (1) DE68922306T2 (de)
GB (1) GB2217036B (de)
WO (1) WO1989008920A1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2302598B (en) * 1988-09-02 1997-08-13 Marconi Gec Ltd Reflective scatter detector
GB9006493D0 (en) * 1990-03-22 1990-05-23 Rosser Roy J Mirrors
US5394451A (en) * 1991-10-08 1995-02-28 Canon Kabushiki Kaisha Optical arrangement for exposure apparatus
DE9317031U1 (de) * 1993-11-08 1994-03-31 Installation Europ De Rayonnem Doppelkristall-Monochromator
DE19931848A1 (de) * 1999-07-09 2001-01-11 Zeiss Carl Fa Astigmatische Komponenten zur Reduzierung des Wabenaspektverhältnisses bei EUV-Beleuchtungssystemen
EP1200879B1 (de) * 1999-07-30 2007-06-20 Carl Zeiss SMT AG Steuerung der Beleuchtungsverteilung in der Austrittspupille eines EUV-Beleuchtungssystems
US6421417B1 (en) * 1999-08-02 2002-07-16 Osmic, Inc. Multilayer optics with adjustable working wavelength
DE19954520A1 (de) * 1999-11-12 2001-05-17 Helmut Fischer Gmbh & Co Vorrichtung zur Führung von Röntgenstrahlen
CN1332399C (zh) * 2002-06-19 2007-08-15 谢诺思公司 用于x射线应用的光学装置
JP2007114327A (ja) * 2005-10-19 2007-05-10 Matsushita Electric Ind Co Ltd 回転式反射鏡および回転表示装置
DE102014208770A1 (de) * 2013-07-29 2015-01-29 Carl Zeiss Smt Gmbh Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik
NL2016266A (en) * 2015-03-02 2016-09-30 Asml Netherlands Bv Radiation System.
WO2016163373A1 (ja) * 2015-04-10 2016-10-13 旭硝子株式会社 ガラス板
KR101897869B1 (ko) * 2016-07-07 2018-10-04 고려대학교 산학협력단 비구면거울이 내장된 레이저수술장치
CN110133776A (zh) * 2019-05-23 2019-08-16 深圳市华讯方舟太赫兹科技有限公司 曲面反射镜及应用其的太赫兹成像检测装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB318147A (en) * 1928-08-28 1930-06-05 Zeiss Ikon Ag Improvements in reflectors for a punctiform source of light
GB512319A (en) * 1938-01-25 1939-09-01 Alfred Whitaker Improvements in or relating to apparatus adapted to radiate energy and reflectors therefor
US4028547A (en) * 1975-06-30 1977-06-07 Bell Telephone Laboratories, Incorporated X-ray photolithography
US4116540A (en) * 1976-06-25 1978-09-26 Thomas David E Non-perverting mirror
US4538886A (en) * 1983-04-19 1985-09-03 Stellar Energy Ststems, Inc. Circular arc solar concentrator

Also Published As

Publication number Publication date
EP0403561B1 (de) 1995-04-19
EP0403561A1 (de) 1990-12-27
ATE121555T1 (de) 1995-05-15
GB2217036B (en) 1992-08-12
GB8905743D0 (en) 1989-04-26
GB2217036A (en) 1989-10-18
JPH03504271A (ja) 1991-09-19
DE68922306D1 (de) 1995-05-24
WO1989008920A1 (en) 1989-09-21

Similar Documents

Publication Publication Date Title
DE68922306D1 (de) Optische vorrichtungen und methoden für ihre herstellung.
DE3878485D1 (de) Einrichtung zur zirkumferenziellen bestrahlung von objekten.
SE9201254D0 (sv) Bockningspressystem
ES281691U (es) Instalacion de espejos para reflejar y concentrar energia de radiacion.
DE68903199D1 (de) Ophthalmische glaslinsen mit einfaerbbare beschichtungen.
RU96101830A (ru) Зеркало с пространственно неоднородным комплексным коэффициентом отражения
CA2173564A1 (en) Method of and Device for Measuring the Refractive Index of Wafers of Vitreous Material
SU1571440A1 (ru) Устройство дл измерени крут щего момента вращающегос вала
RU1775597C (ru) Прибор дл определени геометрических характеристик и оптических свойств кристаллов
SU1188543A1 (ru) Щелева диафрагма
JPS56118609A (en) Measuring method for azimuth angle of magnetic head
SU1061173A2 (ru) Устройство дл фасонной обрезки двойной трости духовых музыкальных инструментов
RU97122002A (ru) Интерферометр для измерения перемещений
RU2004996C1 (ru) Устройство дл обработки асферических поверхностей
IT1222224B (it) Sistema ottico autofocheggiante per misure di spettrofotometria e simili,con sensori in fibra ottica
RU93020136A (ru) Устройство для измерения интенсивности рассеянного света
JPS537391A (en) Measuring apparatus for reflection factor
SU1448419A1 (ru) Устройство дл сборки акустических преобразователей
JPS5461557A (en) Measuring device for transmission loss of optical fibers
JPS5657020A (en) Polygon mirror
ITMI950808V0 (it) Porta uovo che mantiene l'asse maggiore dell'uovo parallelo rispetto al piano di appoggio del porta uovo stesso
ES2063870T3 (es) Dispositivo para la medicion de la turbiedad de gas de humo.
JPS6227316U (de)
JPS5754826A (en) Spectroscope
JPS5780509A (en) Method for measuring radius of curvature

Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: BRITISH TECHNOLOGY GROUP LTD., LONDON, GB

8381 Inventor (new situation)

Free format text: ERFINDER IST ANMELDER

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee