CZ301738B6 - Reflektor elektromagnetického zárení - Google Patents

Reflektor elektromagnetického zárení Download PDF

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Publication number
CZ301738B6
CZ301738B6 CZ20020791A CZ2002791A CZ301738B6 CZ 301738 B6 CZ301738 B6 CZ 301738B6 CZ 20020791 A CZ20020791 A CZ 20020791A CZ 2002791 A CZ2002791 A CZ 2002791A CZ 301738 B6 CZ301738 B6 CZ 301738B6
Authority
CZ
Czechia
Prior art keywords
reflector
spacing
curvature
multilayer
ray
Prior art date
Application number
CZ20020791A
Other languages
Czech (cs)
English (en)
Other versions
CZ2002791A3 (cs
Inventor
Jiang@Licai
Verman@Boris
Original Assignee
Osmic, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osmic, Inc. filed Critical Osmic, Inc.
Publication of CZ2002791A3 publication Critical patent/CZ2002791A3/cs
Publication of CZ301738B6 publication Critical patent/CZ301738B6/cs

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0883—Mirrors with a refractive index gradient
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Aerials With Secondary Devices (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Semiconductor Lasers (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Optical Filters (AREA)
CZ20020791A 1999-08-02 2000-08-01 Reflektor elektromagnetického zárení CZ301738B6 (cs)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/366,028 US6421417B1 (en) 1999-08-02 1999-08-02 Multilayer optics with adjustable working wavelength

Publications (2)

Publication Number Publication Date
CZ2002791A3 CZ2002791A3 (cs) 2002-11-13
CZ301738B6 true CZ301738B6 (cs) 2010-06-09

Family

ID=23441383

Family Applications (1)

Application Number Title Priority Date Filing Date
CZ20020791A CZ301738B6 (cs) 1999-08-02 2000-08-01 Reflektor elektromagnetického zárení

Country Status (9)

Country Link
US (1) US6421417B1 (enExample)
EP (1) EP1200967B1 (enExample)
JP (1) JP2003506732A (enExample)
AT (1) ATE280993T1 (enExample)
AU (1) AU6511100A (enExample)
CA (2) CA2642736A1 (enExample)
CZ (1) CZ301738B6 (enExample)
DE (1) DE60015346T2 (enExample)
WO (1) WO2001009904A2 (enExample)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6870896B2 (en) 2000-12-28 2005-03-22 Osmic, Inc. Dark-field phase contrast imaging
US6804324B2 (en) * 2001-03-01 2004-10-12 Osmo, Inc. X-ray phase contrast imaging using a fabry-perot interferometer concept
JP4657506B2 (ja) * 2001-06-27 2011-03-23 株式会社リガク Ｘ線分光方法及びｘ線分光装置
US6510200B1 (en) 2001-06-29 2003-01-21 Osmic, Inc. Multi-layer structure with variable bandpass for monochromatization and spectroscopy
US6643353B2 (en) 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
JP3629520B2 (ja) * 2002-03-05 2005-03-16 理学電機工業株式会社 Ｘ線分光素子およびそれを用いた蛍光ｘ線分析装置
JP2003255089A (ja) * 2002-03-05 2003-09-10 Rigaku Industrial Co Ｘ線分光素子およびそれを用いた蛍光ｘ線分析装置
US6917667B2 (en) * 2002-09-03 2005-07-12 Rigaku Corporation Method and apparatus for making parallel X-ray beam and X-ray diffraction apparatus
DE10254026C5 (de) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflektor für Röntgenstrahlung
EP1642304B1 (en) 2003-06-13 2008-03-19 Osmic, Inc. Beam conditioning system
US7280634B2 (en) 2003-06-13 2007-10-09 Osmic, Inc. Beam conditioning system with sequential optic
WO2006014376A1 (en) * 2004-07-02 2006-02-09 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Naval Research Laboratory Deformable mirror apparatus
JP4432822B2 (ja) * 2005-04-19 2010-03-17 船井電機株式会社 形状可変ミラー及びそれを備えた光ピックアップ装置
US7425193B2 (en) * 2005-04-21 2008-09-16 Michigan State University Tomographic imaging system using a conformable mirror
DE102006015933B3 (de) * 2006-04-05 2007-10-31 Incoatec Gmbh Vorrichtung und Verfahren zum Justieren eines optischen Elements
JP4278108B2 (ja) * 2006-07-07 2009-06-10 株式会社リガク 超小角ｘ線散乱測定装置
US7555098B2 (en) * 2007-05-02 2009-06-30 HD Technologies Inc. Method and apparatus for X-ray fluorescence analysis and detection
US7920676B2 (en) * 2007-05-04 2011-04-05 Xradia, Inc. CD-GISAXS system and method
US8130902B2 (en) * 2007-07-31 2012-03-06 Uchicago Argonne, Llc High-resolution, active-optic X-ray fluorescence analyzer
DE102007048743B4 (de) * 2007-10-08 2010-06-24 Ifg - Institute For Scientific Instruments Gmbh Verfahren und Vorrichtung zur Bestimmung der energetischen Zusammensetzung von elektromagnetischen Wellen
CA2709216C (en) * 2008-01-30 2013-07-02 Reflective X-Ray Optics Llc Mirror mounting, alignment, and scanning mechanism and scanning method for radiographic x-ray imaging, and x-ray imaging device having same
US7848483B2 (en) * 2008-03-07 2010-12-07 Rigaku Innovative Technologies Magnesium silicide-based multilayer x-ray fluorescence analyzers
US8126117B2 (en) * 2010-02-03 2012-02-28 Rigaku Innovative Technologies, Inc. Multi-beam X-ray system
JP4974391B2 (ja) * 2010-02-21 2012-07-11 株式会社リガク Ｘ線分光方法及びｘ線分光装置
US8406374B2 (en) 2010-06-25 2013-03-26 Rigaku Innovative Technologies, Inc. X-ray optical systems with adjustable convergence and focal spot size
EP2606490B1 (en) 2010-08-19 2018-06-27 Convergent R.N.R Ltd System for x-ray irradiation of target volume
CN102525492A (zh) * 2010-12-31 2012-07-04 上海西门子医疗器械有限公司 一种x射线能谱选择装置
KR101332502B1 (ko) * 2011-06-14 2013-11-26 전남대학교산학협력단 국부적 방사선 치료용 ｘ―선 바늘 모듈
CN103137233A (zh) * 2011-12-02 2013-06-05 佳能株式会社 X射线波导和x射线波导系统
EP2926124B1 (de) * 2012-11-29 2019-01-09 Helmut Fischer GmbH Verfahren und vorrichtung zur durchführung einer röntgenfluoreszenzanalyse
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
JP6025211B2 (ja) * 2013-11-28 2016-11-16 株式会社リガク Ｘ線トポグラフィ装置
CN107847200B (zh) * 2015-07-14 2022-04-01 皇家飞利浦有限公司 利用增强的x射线辐射的成像装置和系统
DE102017202802A1 (de) * 2017-02-21 2018-08-23 Carl Zeiss Smt Gmbh Objektiv und optisches System mit einem solchen Objektiv
US10845491B2 (en) 2018-06-04 2020-11-24 Sigray, Inc. Energy-resolving x-ray detection system
CN112470245B (zh) 2018-07-26 2025-03-18 斯格瑞公司 高亮度x射线反射源
EP3603516A1 (de) * 2018-08-02 2020-02-05 Siemens Healthcare GmbH Röntgenvorrichtung und verfahren zum betrieb der röntgenvorrichtung
CN112638261B (zh) 2018-09-04 2025-06-27 斯格瑞公司 利用滤波的x射线荧光的系统和方法
WO2020051221A2 (en) 2018-09-07 2020-03-12 Sigray, Inc. System and method for depth-selectable x-ray analysis
CN109799612B (zh) * 2019-03-15 2020-03-31 重庆大学 曲面反射镜制造方法及变曲率半径点光源线聚焦成像系统
US11217357B2 (en) 2020-02-10 2022-01-04 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal/hyperbolic surface profiles

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02146000A (ja) * 1988-11-28 1990-06-05 Nikon Corp 多層膜反射鏡の製造方法
EP0403561A1 (en) * 1988-03-11 1990-12-27 Rosser Roy J OPTICAL APPARATUS AND METHODS OF MAKING SAME.
US5022064A (en) * 1989-02-10 1991-06-04 Olympus Optical Co., Ltd. X-ray optical system formed by multilayer reflecting mirrors for reflecting X-rays of different wavelengths
US5044736A (en) * 1990-11-06 1991-09-03 Motorola, Inc. Configurable optical filter or display
EP0534535A1 (fr) * 1991-09-25 1993-03-31 Laboratoires D'electronique Philips Dispositif incluant un miroir fonctionnant dans le domaine des rayons X ou des neutrons
JPH08179099A (ja) * 1994-12-22 1996-07-12 Ishikawajima Harima Heavy Ind Co Ltd Ｘ線ミラー装置
US5646976A (en) * 1994-08-01 1997-07-08 Osmic, Inc. Optical element of multilayered thin film for X-rays and neutrons

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4693933A (en) 1983-06-06 1987-09-15 Ovonic Synthetic Materials Company, Inc. X-ray dispersive and reflective structures and method of making the structures
US4727000A (en) 1983-06-06 1988-02-23 Ovonic Synthetic Materials Co., Inc. X-ray dispersive and reflective structures
US4717632A (en) 1983-08-22 1988-01-05 Ovonic Synthetic-Materials Company, Inc. Adhesion and composite wear resistant coating and method
US4716083A (en) 1983-09-23 1987-12-29 Ovonic Synthetic Materials Company Disordered coating
US4525853A (en) 1983-10-17 1985-06-25 Energy Conversion Devices, Inc. Point source X-ray focusing device
US4785470A (en) 1983-10-31 1988-11-15 Ovonic Synthetic Materials Company, Inc. Reflectivity and resolution X-ray dispersive and reflective structures for carbon, beryllium and boron analysis
US4643951A (en) 1984-07-02 1987-02-17 Ovonic Synthetic Materials Company, Inc. Multilayer protective coating and method
US4724169A (en) 1984-10-09 1988-02-09 Ovonic Synthetic Materials Company, Inc. Method of producing multilayer coatings on a substrate
US4675889A (en) 1985-07-08 1987-06-23 Ovonic Synthetic Materials Company, Inc. Multiple wavelength X-ray dispersive devices and method of making the devices
US4958363A (en) 1986-08-15 1990-09-18 Nelson Robert S Apparatus for narrow bandwidth and multiple energy x-ray imaging
US4969175A (en) * 1986-08-15 1990-11-06 Nelson Robert S Apparatus for narrow bandwidth and multiple energy x-ray imaging
US4777090A (en) 1986-11-03 1988-10-11 Ovonic Synthetic Materials Company Coated article and method of manufacturing the article
US4783374A (en) 1987-11-16 1988-11-08 Ovonic Synthetic Materials Company Coated article and method of manufacturing the article
US4867785A (en) 1988-05-09 1989-09-19 Ovonic Synthetic Materials Company, Inc. Method of forming alloy particulates having controlled submicron crystallite size distributions
US5027377A (en) 1990-01-09 1991-06-25 The United States Of America As Represented By The United States Department Of Energy Chromatic X-ray magnifying method and apparatus by Bragg reflective planes on the surface of Abbe sphere
FR2658619B1 (fr) 1990-02-19 1993-04-02 Megademini Taoufik Miroirs interferentiels multifractals de dimensions fractales entre 0 et 1.
US5082621A (en) 1990-07-31 1992-01-21 Ovonic Synthetic Materials Company, Inc. Neutron reflecting supermirror structure
US5167912A (en) 1990-07-31 1992-12-01 Ovonic Synthetic Materials Company, Inc. Neutron reflecting supermirror structure
RU1820354C (ru) * 1990-11-11 1993-06-07 Ленинградский Институт Точной Механики И Оптики Оптический элемент с регулируемой кривизной
US5265143A (en) * 1993-01-05 1993-11-23 At&T Bell Laboratories X-ray optical element including a multilayer coating
US5384817A (en) 1993-07-12 1995-01-24 Ovonic Synthetic Materials Company X-ray optical element and method for its manufacture
JP3278317B2 (ja) 1995-03-24 2002-04-30 キヤノン株式会社 露光装置及びデバイス製造方法
US5757882A (en) 1995-12-18 1998-05-26 Osmic, Inc. Steerable x-ray optical system
US5923720A (en) * 1997-06-17 1999-07-13 Molecular Metrology, Inc. Angle dispersive x-ray spectrometer
US6038285A (en) * 1998-02-02 2000-03-14 Zhong; Zhong Method and apparatus for producing monochromatic radiography with a bent laue crystal
US6014423A (en) 1998-02-19 2000-01-11 Osmic, Inc. Multiple corner Kirkpatrick-Baez beam conditioning optic assembly
US6041099A (en) 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
US6069934A (en) 1998-04-07 2000-05-30 Osmic, Inc. X-ray diffractometer with adjustable image distance

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0403561A1 (en) * 1988-03-11 1990-12-27 Rosser Roy J OPTICAL APPARATUS AND METHODS OF MAKING SAME.
JPH02146000A (ja) * 1988-11-28 1990-06-05 Nikon Corp 多層膜反射鏡の製造方法
US5022064A (en) * 1989-02-10 1991-06-04 Olympus Optical Co., Ltd. X-ray optical system formed by multilayer reflecting mirrors for reflecting X-rays of different wavelengths
US5044736A (en) * 1990-11-06 1991-09-03 Motorola, Inc. Configurable optical filter or display
EP0534535A1 (fr) * 1991-09-25 1993-03-31 Laboratoires D'electronique Philips Dispositif incluant un miroir fonctionnant dans le domaine des rayons X ou des neutrons
US5646976A (en) * 1994-08-01 1997-07-08 Osmic, Inc. Optical element of multilayered thin film for X-rays and neutrons
JPH08179099A (ja) * 1994-12-22 1996-07-12 Ishikawajima Harima Heavy Ind Co Ltd Ｘ線ミラー装置

Also Published As

Publication number Publication date
US20020080916A1 (en) 2002-06-27
CA2642736A1 (en) 2001-02-08
EP1200967A2 (en) 2002-05-02
WO2001009904A9 (en) 2002-09-12
US6421417B1 (en) 2002-07-16
ATE280993T1 (de) 2004-11-15
DE60015346T2 (de) 2005-11-10
DE60015346D1 (de) 2004-12-02
WO2001009904A3 (en) 2001-09-27
CA2380922A1 (en) 2001-02-08
WO2001009904A2 (en) 2001-02-08
CA2380922C (en) 2008-12-09
CZ2002791A3 (cs) 2002-11-13
AU6511100A (en) 2001-02-19
JP2003506732A (ja) 2003-02-18
EP1200967B1 (en) 2004-10-27

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MK4A Patent expired

Effective date: 20200801