DE60015346T2 - Mehrschichtige optik mit abstimmbaren betriebswellenlängen - Google Patents

Mehrschichtige optik mit abstimmbaren betriebswellenlängen Download PDF

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Publication number
DE60015346T2
DE60015346T2 DE60015346T DE60015346T DE60015346T2 DE 60015346 T2 DE60015346 T2 DE 60015346T2 DE 60015346 T DE60015346 T DE 60015346T DE 60015346 T DE60015346 T DE 60015346T DE 60015346 T2 DE60015346 T2 DE 60015346T2
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DE
Germany
Prior art keywords
reflector
spacing
electromagnetic
curvature
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60015346T
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German (de)
English (en)
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DE60015346D1 (de
Inventor
Licai Jiang
Boris Verman
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Osmic Inc
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Osmic Inc
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Publication of DE60015346D1 publication Critical patent/DE60015346D1/de
Publication of DE60015346T2 publication Critical patent/DE60015346T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0883—Mirrors with a refractive index gradient
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Aerials With Secondary Devices (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Semiconductor Lasers (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Optical Filters (AREA)
DE60015346T 1999-08-02 2000-08-01 Mehrschichtige optik mit abstimmbaren betriebswellenlängen Expired - Lifetime DE60015346T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/366,028 US6421417B1 (en) 1999-08-02 1999-08-02 Multilayer optics with adjustable working wavelength
US366028 1999-08-02
PCT/US2000/021060 WO2001009904A2 (en) 1999-08-02 2000-08-01 Multilayer optics with adjustable working wavelength

Publications (2)

Publication Number Publication Date
DE60015346D1 DE60015346D1 (de) 2004-12-02
DE60015346T2 true DE60015346T2 (de) 2005-11-10

Family

ID=23441383

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60015346T Expired - Lifetime DE60015346T2 (de) 1999-08-02 2000-08-01 Mehrschichtige optik mit abstimmbaren betriebswellenlängen

Country Status (9)

Country Link
US (1) US6421417B1 (enExample)
EP (1) EP1200967B1 (enExample)
JP (1) JP2003506732A (enExample)
AT (1) ATE280993T1 (enExample)
AU (1) AU6511100A (enExample)
CA (2) CA2642736A1 (enExample)
CZ (1) CZ301738B6 (enExample)
DE (1) DE60015346T2 (enExample)
WO (1) WO2001009904A2 (enExample)

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US20150300966A1 (en) * 2012-11-29 2015-10-22 Helmut Fischer GmbH Institut fur Elektronik und IV Method and device for performing an x-ray fluorescence analysis

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US6510200B1 (en) 2001-06-29 2003-01-21 Osmic, Inc. Multi-layer structure with variable bandpass for monochromatization and spectroscopy
US6643353B2 (en) 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
JP3629520B2 (ja) * 2002-03-05 2005-03-16 理学電機工業株式会社 Ｘ線分光素子およびそれを用いた蛍光ｘ線分析装置
JP2003255089A (ja) * 2002-03-05 2003-09-10 Rigaku Industrial Co Ｘ線分光素子およびそれを用いた蛍光ｘ線分析装置
US6917667B2 (en) * 2002-09-03 2005-07-12 Rigaku Corporation Method and apparatus for making parallel X-ray beam and X-ray diffraction apparatus
DE10254026C5 (de) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflektor für Röntgenstrahlung
EP1642304B1 (en) 2003-06-13 2008-03-19 Osmic, Inc. Beam conditioning system
US7280634B2 (en) 2003-06-13 2007-10-09 Osmic, Inc. Beam conditioning system with sequential optic
WO2006014376A1 (en) * 2004-07-02 2006-02-09 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Naval Research Laboratory Deformable mirror apparatus
JP4432822B2 (ja) * 2005-04-19 2010-03-17 船井電機株式会社 形状可変ミラー及びそれを備えた光ピックアップ装置
US7425193B2 (en) * 2005-04-21 2008-09-16 Michigan State University Tomographic imaging system using a conformable mirror
DE102006015933B3 (de) * 2006-04-05 2007-10-31 Incoatec Gmbh Vorrichtung und Verfahren zum Justieren eines optischen Elements
JP4278108B2 (ja) * 2006-07-07 2009-06-10 株式会社リガク 超小角ｘ線散乱測定装置
US7555098B2 (en) * 2007-05-02 2009-06-30 HD Technologies Inc. Method and apparatus for X-ray fluorescence analysis and detection
US7920676B2 (en) * 2007-05-04 2011-04-05 Xradia, Inc. CD-GISAXS system and method
US8130902B2 (en) * 2007-07-31 2012-03-06 Uchicago Argonne, Llc High-resolution, active-optic X-ray fluorescence analyzer
DE102007048743B4 (de) * 2007-10-08 2010-06-24 Ifg - Institute For Scientific Instruments Gmbh Verfahren und Vorrichtung zur Bestimmung der energetischen Zusammensetzung von elektromagnetischen Wellen
CA2709216C (en) * 2008-01-30 2013-07-02 Reflective X-Ray Optics Llc Mirror mounting, alignment, and scanning mechanism and scanning method for radiographic x-ray imaging, and x-ray imaging device having same
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US8126117B2 (en) * 2010-02-03 2012-02-28 Rigaku Innovative Technologies, Inc. Multi-beam X-ray system
JP4974391B2 (ja) * 2010-02-21 2012-07-11 株式会社リガク Ｘ線分光方法及びｘ線分光装置
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EP2606490B1 (en) 2010-08-19 2018-06-27 Convergent R.N.R Ltd System for x-ray irradiation of target volume
CN102525492A (zh) * 2010-12-31 2012-07-04 上海西门子医疗器械有限公司 一种x射线能谱选择装置
KR101332502B1 (ko) * 2011-06-14 2013-11-26 전남대학교산학협력단 국부적 방사선 치료용 ｘ―선 바늘 모듈
CN103137233A (zh) * 2011-12-02 2013-06-05 佳能株式会社 X射线波导和x射线波导系统
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
JP6025211B2 (ja) * 2013-11-28 2016-11-16 株式会社リガク Ｘ線トポグラフィ装置
CN107847200B (zh) * 2015-07-14 2022-04-01 皇家飞利浦有限公司 利用增强的x射线辐射的成像装置和系统
DE102017202802A1 (de) * 2017-02-21 2018-08-23 Carl Zeiss Smt Gmbh Objektiv und optisches System mit einem solchen Objektiv
US10845491B2 (en) 2018-06-04 2020-11-24 Sigray, Inc. Energy-resolving x-ray detection system
CN112470245B (zh) 2018-07-26 2025-03-18 斯格瑞公司 高亮度x射线反射源
EP3603516A1 (de) * 2018-08-02 2020-02-05 Siemens Healthcare GmbH Röntgenvorrichtung und verfahren zum betrieb der röntgenvorrichtung
CN112638261B (zh) 2018-09-04 2025-06-27 斯格瑞公司 利用滤波的x射线荧光的系统和方法
WO2020051221A2 (en) 2018-09-07 2020-03-12 Sigray, Inc. System and method for depth-selectable x-ray analysis
CN109799612B (zh) * 2019-03-15 2020-03-31 重庆大学 曲面反射镜制造方法及变曲率半径点光源线聚焦成像系统
US11217357B2 (en) 2020-02-10 2022-01-04 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal/hyperbolic surface profiles

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150300966A1 (en) * 2012-11-29 2015-10-22 Helmut Fischer GmbH Institut fur Elektronik und IV Method and device for performing an x-ray fluorescence analysis
US9513238B2 (en) 2012-11-29 2016-12-06 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Method and device for performing an x-ray fluorescence analysis

Also Published As

Publication number Publication date
US20020080916A1 (en) 2002-06-27
CA2642736A1 (en) 2001-02-08
EP1200967A2 (en) 2002-05-02
WO2001009904A9 (en) 2002-09-12
US6421417B1 (en) 2002-07-16
ATE280993T1 (de) 2004-11-15
DE60015346D1 (de) 2004-12-02
WO2001009904A3 (en) 2001-09-27
CA2380922A1 (en) 2001-02-08
WO2001009904A2 (en) 2001-02-08
CA2380922C (en) 2008-12-09
CZ2002791A3 (cs) 2002-11-13
AU6511100A (en) 2001-02-19
CZ301738B6 (cs) 2010-06-09
JP2003506732A (ja) 2003-02-18
EP1200967B1 (en) 2004-10-27

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