DE69514810T2 - Optisches element für röntgenstrahlen und neutronen mit einem mehrschichtigen dünnfilm - Google Patents

Optisches element für röntgenstrahlen und neutronen mit einem mehrschichtigen dünnfilm

Info

Publication number
DE69514810T2
DE69514810T2 DE69514810T DE69514810T DE69514810T2 DE 69514810 T2 DE69514810 T2 DE 69514810T2 DE 69514810 T DE69514810 T DE 69514810T DE 69514810 T DE69514810 T DE 69514810T DE 69514810 T2 DE69514810 T2 DE 69514810T2
Authority
DE
Germany
Prior art keywords
neutron
ray
thin film
optical element
layer thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69514810T
Other languages
English (en)
Other versions
DE69514810D1 (de
Inventor
George Gutman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osmic Inc
Original Assignee
Osmic Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osmic Inc filed Critical Osmic Inc
Application granted granted Critical
Publication of DE69514810D1 publication Critical patent/DE69514810D1/de
Publication of DE69514810T2 publication Critical patent/DE69514810T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/068—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements specially adapted for particle beams

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE69514810T 1994-08-01 1995-08-01 Optisches element für röntgenstrahlen und neutronen mit einem mehrschichtigen dünnfilm Expired - Fee Related DE69514810T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US28361094A 1994-08-01 1994-08-01
US08/487,936 US5646976A (en) 1994-08-01 1995-06-07 Optical element of multilayered thin film for X-rays and neutrons
PCT/US1995/009769 WO1996004665A1 (en) 1994-08-01 1995-08-01 Optical element of multilayered thin film for x-rays and neutrons

Publications (2)

Publication Number Publication Date
DE69514810D1 DE69514810D1 (de) 2000-03-02
DE69514810T2 true DE69514810T2 (de) 2000-07-06

Family

ID=26962149

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69514810T Expired - Fee Related DE69514810T2 (de) 1994-08-01 1995-08-01 Optisches element für röntgenstrahlen und neutronen mit einem mehrschichtigen dünnfilm

Country Status (4)

Country Link
US (2) US5646976A (de)
EP (1) EP0774156B1 (de)
DE (1) DE69514810T2 (de)
WO (1) WO1996004665A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10337996A1 (de) * 2003-07-26 2005-03-03 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Monochromatisierende röntgenoptische Anordnung

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5757882A (en) * 1995-12-18 1998-05-26 Osmic, Inc. Steerable x-ray optical system
US5958605A (en) * 1997-11-10 1999-09-28 Regents Of The University Of California Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography
US6041099A (en) * 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
US6014423A (en) * 1998-02-19 2000-01-11 Osmic, Inc. Multiple corner Kirkpatrick-Baez beam conditioning optic assembly
JP3734366B2 (ja) 1998-03-20 2006-01-11 株式会社リガク Ｘ線分析装置
DE19833524B4 (de) 1998-07-25 2004-09-23 Bruker Axs Gmbh Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
DE19844300C2 (de) * 1998-09-17 2002-07-18 Hahn Meitner Inst Berlin Gmbh Neutronenoptisches Bauelement
AU2368900A (en) 1998-12-18 2000-07-03 Symyx Technologies, Inc. Apparatus and method for characterizing libraries of different materials using x-ray scattering
US6285506B1 (en) 1999-01-21 2001-09-04 X-Ray Optical Systems, Inc. Curved optical device and method of fabrication
JP3048569B1 (ja) 1999-03-08 2000-06-05 理化学研究所 中性子ビ―ム制御装置及び中性子エネルギ―測定装置
US6389100B1 (en) 1999-04-09 2002-05-14 Osmic, Inc. X-ray lens system
TWI267704B (en) * 1999-07-02 2006-12-01 Asml Netherlands Bv Capping layer for EUV optical elements
US6421417B1 (en) * 1999-08-02 2002-07-16 Osmic, Inc. Multilayer optics with adjustable working wavelength
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
FR2802311B1 (fr) * 1999-12-08 2002-01-18 Commissariat Energie Atomique Dispositif de lithographie utilisant une source de rayonnement dans le domaine extreme ultraviolet et des miroirs multicouches a large bande spectrale dans ce domaine
US6330301B1 (en) * 1999-12-17 2001-12-11 Osmic, Inc. Optical scheme for high flux low-background two-dimensional small angle x-ray scattering
US6580940B2 (en) 2000-02-02 2003-06-17 George Gutman X-ray system with implantable needle for treatment of cancer
DE10028970C1 (de) * 2000-06-05 2002-01-24 Fraunhofer Ges Forschung Röntgenoptische Anordnung zur Erzeugung einer parallelen Röntgenstrahlung
US6493421B2 (en) 2000-10-16 2002-12-10 Advanced X-Ray Technology, Inc. Apparatus and method for generating a high intensity X-ray beam with a selectable shape and wavelength
US6870896B2 (en) 2000-12-28 2005-03-22 Osmic, Inc. Dark-field phase contrast imaging
DE10107914A1 (de) * 2001-02-14 2002-09-05 Fraunhofer Ges Forschung Anordnung für röntgenanalytische Anwendungen
US6804324B2 (en) * 2001-03-01 2004-10-12 Osmo, Inc. X-ray phase contrast imaging using a fabry-perot interferometer concept
WO2002097485A2 (fr) * 2001-06-01 2002-12-05 Xenocs Procede de modification controlee de proprietes reflectives d'un multicouche
US6510200B1 (en) 2001-06-29 2003-01-21 Osmic, Inc. Multi-layer structure with variable bandpass for monochromatization and spectroscopy
JP3762665B2 (ja) * 2001-07-03 2006-04-05 株式会社リガク Ｘ線分析装置およびｘ線供給装置
US6678082B2 (en) 2001-09-12 2004-01-13 Harris Corporation Electro-optical component including a fluorinated poly(phenylene ether ketone) protective coating and related methods
US6643353B2 (en) 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
CN1324613C (zh) * 2002-06-19 2007-07-04 谢诺思公司 光学单元及有关方法
FR2850171B1 (fr) * 2003-01-21 2005-04-08 Xenocs Dispositif optique pour applications rayons x
DE10254026C5 (de) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflektor für Röntgenstrahlung
US7280634B2 (en) 2003-06-13 2007-10-09 Osmic, Inc. Beam conditioning system with sequential optic
US7076026B2 (en) 2003-06-13 2006-07-11 Osmic, Inc. Beam conditioning system
US7323423B2 (en) * 2004-06-30 2008-01-29 Intel Corporation Forming high-k dielectric layers on smooth substrates
WO2006107130A1 (en) * 2005-04-08 2006-10-12 Mxst, Inc. Quasi-monochromatic x-ray filter and x-ray imaging system using the same
KR100801186B1 (ko) 2005-04-08 2008-02-11 엠엑스에스티, 인크 준단색 엑스-선 필터 및 이를 이용한 엑스-선 촬영 장치
KR101278132B1 (ko) * 2006-09-21 2013-06-27 한화엘앤씨 주식회사 엑스-선 필터의 반사경
US7555098B2 (en) * 2007-05-02 2009-06-30 HD Technologies Inc. Method and apparatus for X-ray fluorescence analysis and detection
US7848483B2 (en) * 2008-03-07 2010-12-07 Rigaku Innovative Technologies Magnesium silicide-based multilayer x-ray fluorescence analyzers
US8309944B1 (en) * 2008-09-29 2012-11-13 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Grazing incidence neutron optics
JP5237186B2 (ja) * 2009-04-30 2013-07-17 株式会社リガク Ｘ線散乱測定装置およびｘ線散乱測定方法
US8249220B2 (en) 2009-10-14 2012-08-21 Rigaku Innovative Technologies, Inc. Multiconfiguration X-ray optical system
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
JP6025211B2 (ja) * 2013-11-28 2016-11-16 株式会社リガク Ｘ線トポグラフィ装置
DE102017202802A1 (de) * 2017-02-21 2018-08-23 Carl Zeiss Smt Gmbh Objektiv und optisches System mit einem solchen Objektiv
US10989822B2 (en) * 2018-06-04 2021-04-27 Sigray, Inc. Wavelength dispersive x-ray spectrometer
GB2591630B (en) 2018-07-26 2023-05-24 Sigray Inc High brightness x-ray reflection source
WO2020051061A1 (en) 2018-09-04 2020-03-12 Sigray, Inc. System and method for x-ray fluorescence with filtering
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
WO2021162947A1 (en) 2020-02-10 2021-08-19 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal / hyperbolic surface profiles

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4525853A (en) * 1983-10-17 1985-06-25 Energy Conversion Devices, Inc. Point source X-ray focusing device
US4698833A (en) * 1985-05-14 1987-10-06 Energy Conversion Devices, Inc. Subassembly, method and system for monochromatizing X-rays
JPS6370585A (ja) * 1986-09-12 1988-03-30 Toshiba Corp リング・レ−ザ・ジヤイロ
JPH02210299A (ja) * 1989-02-10 1990-08-21 Olympus Optical Co Ltd Ｘ線用光学系及びそれに用いる多層膜反射鏡
JPH04169898A (ja) * 1990-11-02 1992-06-17 Seiko Instr Inc Ｘ線多層膜鏡構造体
JPH0534500A (ja) * 1991-08-02 1993-02-09 Olympus Optical Co Ltd Ｘ線多層膜反射鏡
GB2266040B (en) * 1992-04-09 1996-03-13 Rigaku Ind Corp X-ray analysis apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10337996A1 (de) * 2003-07-26 2005-03-03 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Monochromatisierende röntgenoptische Anordnung

Also Published As

Publication number Publication date
EP0774156A4 (de) 1997-07-02
DE69514810D1 (de) 2000-03-02
US5646976A (en) 1997-07-08
EP0774156B1 (de) 2000-01-26
US5799056A (en) 1998-08-25
EP0774156A1 (de) 1997-05-21
WO1996004665A1 (en) 1996-02-15

Similar Documents

Publication Publication Date Title
DE69514810T2 (de) Optisches element für röntgenstrahlen und neutronen mit einem mehrschichtigen dünnfilm
DE69217606T2 (de) Filmpatrone mit einem integrierten, lichtblockierenden und spuleblockierenden Teil
DE69307746D1 (de) Photographischer Filmpackung und Kamera für einmalige Verwendung
DE69326040D1 (de) Sorbierender Einzelschicht- und Mehrschichtfilm
DE69723678D1 (de) Yehrschichtige polyesterfolie mit einem niedrigen reibungskoeffizienten
DE69614288D1 (de) Photographisches Element mit einer durchsichtigen magnetischen Aufzeichnungsschicht
DE69314516D1 (de) Filmentwicklungseinsatz und Tank für ein photographisches Entwicklungsgerät
DE69332386T2 (de) Kassette mit fotografischem Film
DE69402944T2 (de) Film für zahnärztliche Röntgenaufnahmen
DE69306192T2 (de) Getriebemechanismus sowie Positioniereinrichtung mit einem derartigen Getriebemechanismus und Lithographieeinrichtung mit einer derartigen Positioniereinrichtung
DE69524037T2 (de) Harzsysteme mit hohem Brechungsindex und/oder Röntgenopazität
DE69130045T2 (de) Zur Verwendung mit einer Filmkassette bestimmte Kamera mit Verriegelungseinrichtung für Belichtungszustandsindikator
MX174549B (es) Casete de pelicula con indicador de estado de exposicion
DE69430181T2 (de) Kamera zur Verwendung einer Filmkassette mit lichtundurchlässiger beweglicher Tür
DE68915475T2 (de) Photografische Kamera und Filmkassette mit einer Verteilervorrichtung für eine Flüssigkeit.
DE69430112T2 (de) Kamera zur Verwendung mit einer Filmkassette mit Lichtundurchlässiger beweglicher Tür
DE69429706D1 (de) Kamera zur Verwendung mit einer Filmkassette mit lichtundurchlässiger Beweglicher Tür
DE69523282D1 (de) Antrieb und röntgengerät mit einem solchen antrieb
DE69522732T2 (de) Sortiervorrichtung zur Verwendung mit einem Sortier-und Entwicklungsgerät
DE69412239D1 (de) Laminierter schichtträger für photographischen film
DE68926552T2 (de) Filmkassette und Kamera für eine solche Kassette
DE69418093D1 (de) Lichtabschirmgerät für Filmpatronen
EP0431529A3 (en) A self-advancing film cassette and a photographic camera for use with the same
DE69723013D1 (de) Photographisches Kopiergerät mit einem Bilddetektor und einem Kerbgerät für das Positionieren der Bildfelder
FI92141B (fi) Menetelmä ja laite filmin nimikoimiseksi pimiössä

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee