DE69514810D1 - Optisches element für röntgenstrahlen und neutronen mit einem mehrschichtigen dünnfilm - Google Patents

Optisches element für röntgenstrahlen und neutronen mit einem mehrschichtigen dünnfilm

Info

Publication number
DE69514810D1
DE69514810D1 DE69514810T DE69514810T DE69514810D1 DE 69514810 D1 DE69514810 D1 DE 69514810D1 DE 69514810 T DE69514810 T DE 69514810T DE 69514810 T DE69514810 T DE 69514810T DE 69514810 D1 DE69514810 D1 DE 69514810D1
Authority
DE
Germany
Prior art keywords
neutron
ray
thin film
optical element
layer thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69514810T
Other languages
English (en)
Other versions
DE69514810T2 (de
Inventor
George Gutman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osmic Inc
Original Assignee
Osmic Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osmic Inc filed Critical Osmic Inc
Publication of DE69514810D1 publication Critical patent/DE69514810D1/de
Application granted granted Critical
Publication of DE69514810T2 publication Critical patent/DE69514810T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/068—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements specially adapted for particle beams

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE69514810T 1994-08-01 1995-08-01 Optisches element für röntgenstrahlen und neutronen mit einem mehrschichtigen dünnfilm Expired - Fee Related DE69514810T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US28361094A 1994-08-01 1994-08-01
US08/487,936 US5646976A (en) 1994-08-01 1995-06-07 Optical element of multilayered thin film for X-rays and neutrons
PCT/US1995/009769 WO1996004665A1 (en) 1994-08-01 1995-08-01 Optical element of multilayered thin film for x-rays and neutrons

Publications (2)

Publication Number Publication Date
DE69514810D1 true DE69514810D1 (de) 2000-03-02
DE69514810T2 DE69514810T2 (de) 2000-07-06

Family

ID=26962149

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69514810T Expired - Fee Related DE69514810T2 (de) 1994-08-01 1995-08-01 Optisches element für röntgenstrahlen und neutronen mit einem mehrschichtigen dünnfilm

Country Status (4)

Country Link
US (2) US5646976A (de)
EP (1) EP0774156B1 (de)
DE (1) DE69514810T2 (de)
WO (1) WO1996004665A1 (de)

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US5757882A (en) * 1995-12-18 1998-05-26 Osmic, Inc. Steerable x-ray optical system
US5958605A (en) * 1997-11-10 1999-09-28 Regents Of The University Of California Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography
US6014423A (en) * 1998-02-19 2000-01-11 Osmic, Inc. Multiple corner Kirkpatrick-Baez beam conditioning optic assembly
US6041099A (en) * 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
JP3734366B2 (ja) 1998-03-20 2006-01-11 株式会社リガク Ｘ線分析装置
DE19833524B4 (de) 1998-07-25 2004-09-23 Bruker Axs Gmbh Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
DE19844300C2 (de) * 1998-09-17 2002-07-18 Hahn Meitner Inst Berlin Gmbh Neutronenoptisches Bauelement
EP1149282A2 (de) * 1998-12-18 2001-10-31 Symyx Technologies, Inc. Verfahren zur charakterisierung von bibliotheken verschiedener materialien mittels röntgenstrahlen
US6285506B1 (en) 1999-01-21 2001-09-04 X-Ray Optical Systems, Inc. Curved optical device and method of fabrication
JP3048569B1 (ja) * 1999-03-08 2000-06-05 理化学研究所 中性子ビ―ム制御装置及び中性子エネルギ―測定装置
US6389100B1 (en) 1999-04-09 2002-05-14 Osmic, Inc. X-ray lens system
TW561279B (en) * 1999-07-02 2003-11-11 Asml Netherlands Bv Reflector for reflecting radiation in a desired wavelength range, lithographic projection apparatus containing the same and method for their preparation
US6421417B1 (en) * 1999-08-02 2002-07-16 Osmic, Inc. Multilayer optics with adjustable working wavelength
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
FR2802311B1 (fr) 1999-12-08 2002-01-18 Commissariat Energie Atomique Dispositif de lithographie utilisant une source de rayonnement dans le domaine extreme ultraviolet et des miroirs multicouches a large bande spectrale dans ce domaine
US6330301B1 (en) * 1999-12-17 2001-12-11 Osmic, Inc. Optical scheme for high flux low-background two-dimensional small angle x-ray scattering
US6580940B2 (en) 2000-02-02 2003-06-17 George Gutman X-ray system with implantable needle for treatment of cancer
DE10028970C1 (de) * 2000-06-05 2002-01-24 Fraunhofer Ges Forschung Röntgenoptische Anordnung zur Erzeugung einer parallelen Röntgenstrahlung
US6493421B2 (en) 2000-10-16 2002-12-10 Advanced X-Ray Technology, Inc. Apparatus and method for generating a high intensity X-ray beam with a selectable shape and wavelength
US6870896B2 (en) 2000-12-28 2005-03-22 Osmic, Inc. Dark-field phase contrast imaging
DE10107914A1 (de) * 2001-02-14 2002-09-05 Fraunhofer Ges Forschung Anordnung für röntgenanalytische Anwendungen
US6804324B2 (en) * 2001-03-01 2004-10-12 Osmo, Inc. X-ray phase contrast imaging using a fabry-perot interferometer concept
EP1395857A2 (de) * 2001-06-01 2004-03-10 Xenocs Verfahren zur kontrollierten modifizierung der reflektiven eigenschaften eines vielschichtsystems
US6510200B1 (en) 2001-06-29 2003-01-21 Osmic, Inc. Multi-layer structure with variable bandpass for monochromatization and spectroscopy
JP3762665B2 (ja) * 2001-07-03 2006-04-05 株式会社リガク Ｘ線分析装置およびｘ線供給装置
US6678082B2 (en) 2001-09-12 2004-01-13 Harris Corporation Electro-optical component including a fluorinated poly(phenylene ether ketone) protective coating and related methods
US6643353B2 (en) 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
US7430277B2 (en) * 2002-06-19 2008-09-30 Xeoncs Optical device for X-ray applications
FR2850171B1 (fr) * 2003-01-21 2005-04-08 Xenocs Dispositif optique pour applications rayons x
DE10254026C5 (de) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflektor für Röntgenstrahlung
US7280634B2 (en) 2003-06-13 2007-10-09 Osmic, Inc. Beam conditioning system with sequential optic
JP5392982B2 (ja) * 2003-06-13 2014-01-22 オスミック、インコーポレイテッド ビーム調整システム
DE10337996A1 (de) * 2003-07-26 2005-03-03 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Monochromatisierende röntgenoptische Anordnung
US7323423B2 (en) * 2004-06-30 2008-01-29 Intel Corporation Forming high-k dielectric layers on smooth substrates
KR100801186B1 (ko) 2005-04-08 2008-02-11 엠엑스에스티, 인크 준단색 엑스-선 필터 및 이를 이용한 엑스-선 촬영 장치
WO2006107130A1 (en) * 2005-04-08 2006-10-12 Mxst, Inc. Quasi-monochromatic x-ray filter and x-ray imaging system using the same
KR101278132B1 (ko) * 2006-09-21 2013-06-27 한화엘앤씨 주식회사 엑스-선 필터의 반사경
US7555098B2 (en) * 2007-05-02 2009-06-30 HD Technologies Inc. Method and apparatus for X-ray fluorescence analysis and detection
US7848483B2 (en) * 2008-03-07 2010-12-07 Rigaku Innovative Technologies Magnesium silicide-based multilayer x-ray fluorescence analyzers
US8309944B1 (en) * 2008-09-29 2012-11-13 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Grazing incidence neutron optics
JP5237186B2 (ja) 2009-04-30 2013-07-17 株式会社リガク Ｘ線散乱測定装置およびｘ線散乱測定方法
US8249220B2 (en) 2009-10-14 2012-08-21 Rigaku Innovative Technologies, Inc. Multiconfiguration X-ray optical system
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
JP6025211B2 (ja) * 2013-11-28 2016-11-16 株式会社リガク Ｘ線トポグラフィ装置
DE102017202802A1 (de) * 2017-02-21 2018-08-23 Carl Zeiss Smt Gmbh Objektiv und optisches System mit einem solchen Objektiv
DE112019002822T5 (de) * 2018-06-04 2021-02-18 Sigray, Inc. Wellenlängendispersives röntgenspektrometer
CN112470245A (zh) 2018-07-26 2021-03-09 斯格瑞公司 高亮度x射线反射源
CN112638261A (zh) 2018-09-04 2021-04-09 斯格瑞公司 利用滤波的x射线荧光的系统和方法
CN112823280A (zh) 2018-09-07 2021-05-18 斯格瑞公司 用于深度可选x射线分析的系统和方法
US11217357B2 (en) 2020-02-10 2022-01-04 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal/hyperbolic surface profiles

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4525853A (en) * 1983-10-17 1985-06-25 Energy Conversion Devices, Inc. Point source X-ray focusing device
US4698833A (en) * 1985-05-14 1987-10-06 Energy Conversion Devices, Inc. Subassembly, method and system for monochromatizing X-rays
JPS6370585A (ja) * 1986-09-12 1988-03-30 Toshiba Corp リング・レ−ザ・ジヤイロ
JPH02210299A (ja) * 1989-02-10 1990-08-21 Olympus Optical Co Ltd Ｘ線用光学系及びそれに用いる多層膜反射鏡
JPH04169898A (ja) * 1990-11-02 1992-06-17 Seiko Instr Inc Ｘ線多層膜鏡構造体
JPH0534500A (ja) * 1991-08-02 1993-02-09 Olympus Optical Co Ltd Ｘ線多層膜反射鏡
GB2266040B (en) * 1992-04-09 1996-03-13 Rigaku Ind Corp X-ray analysis apparatus

Also Published As

Publication number Publication date
WO1996004665A1 (en) 1996-02-15
EP0774156A1 (de) 1997-05-21
EP0774156A4 (de) 1997-07-02
EP0774156B1 (de) 2000-01-26
US5646976A (en) 1997-07-08
US5799056A (en) 1998-08-25
DE69514810T2 (de) 2000-07-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee