JP2003048780A - 多孔質窒化アルミニウム - Google Patents
多孔質窒化アルミニウムInfo
- Publication number
- JP2003048780A JP2003048780A JP2001233369A JP2001233369A JP2003048780A JP 2003048780 A JP2003048780 A JP 2003048780A JP 2001233369 A JP2001233369 A JP 2001233369A JP 2001233369 A JP2001233369 A JP 2001233369A JP 2003048780 A JP2003048780 A JP 2003048780A
- Authority
- JP
- Japan
- Prior art keywords
- aln
- aluminum nitride
- heat treatment
- porous aluminum
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 title claims abstract description 100
- 239000011148 porous material Substances 0.000 claims abstract description 33
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims description 58
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 26
- 238000005245 sintering Methods 0.000 claims description 11
- 238000010304 firing Methods 0.000 claims description 5
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims description 5
- 229910006360 Si—O—N Inorganic materials 0.000 claims description 4
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 4
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 claims description 2
- 239000013078 crystal Substances 0.000 abstract description 21
- 238000009826 distribution Methods 0.000 abstract description 12
- 238000000034 method Methods 0.000 abstract description 9
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000005121 nitriding Methods 0.000 abstract description 4
- 239000000203 mixture Substances 0.000 description 12
- 239000000843 powder Substances 0.000 description 10
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 7
- 229910052753 mercury Inorganic materials 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000012298 atmosphere Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 239000000470 constituent Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 229910052573 porcelain Inorganic materials 0.000 description 4
- 239000006104 solid solution Substances 0.000 description 4
- 239000004677 Nylon Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005238 degreasing Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000011812 mixed powder Substances 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 229920001778 nylon Polymers 0.000 description 3
- 229910052761 rare earth metal Inorganic materials 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000010292 electrical insulation Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000012188 paraffin wax Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- -1 rare earth compound Chemical class 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 235000001674 Agaricus brunnescens Nutrition 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 102100025490 Slit homolog 1 protein Human genes 0.000 description 1
- 101710123186 Slit homolog 1 protein Proteins 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 230000002902 bimodal effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 210000003743 erythrocyte Anatomy 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000002843 nonmetals Chemical group 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000002459 porosimetry Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
Landscapes
- Ceramic Products (AREA)
- Porous Artificial Stone Or Porous Ceramic Products (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001233369A JP2003048780A (ja) | 2001-08-01 | 2001-08-01 | 多孔質窒化アルミニウム |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001233369A JP2003048780A (ja) | 2001-08-01 | 2001-08-01 | 多孔質窒化アルミニウム |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2003048780A true JP2003048780A (ja) | 2003-02-21 |
JP2003048780A5 JP2003048780A5 (enrdf_load_stackoverflow) | 2008-09-25 |
Family
ID=19065152
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001233369A Pending JP2003048780A (ja) | 2001-08-01 | 2001-08-01 | 多孔質窒化アルミニウム |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2003048780A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7876053B2 (en) | 2004-06-21 | 2011-01-25 | Tokuyama Corporation | Nitride sintered body and method for manufacturing thereof |
CN106653652A (zh) * | 2015-10-30 | 2017-05-10 | 日本碍子株式会社 | 半导体制造装置用部件、其制法以及附带有轴的加热器 |
CN114477988A (zh) * | 2022-03-28 | 2022-05-13 | 天通控股股份有限公司 | 一种易成型、高强度铁氧体材料及其制备方法 |
CN115141022A (zh) * | 2022-07-28 | 2022-10-04 | 江苏正力新能电池技术有限公司 | 一种多孔陶瓷底托板的制备方法、多孔陶瓷底托板及电池 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6270210A (ja) * | 1985-09-24 | 1987-03-31 | Natl Inst For Res In Inorg Mater | 窒化アルミニウム−炭化けい素複合微粉末の製造法 |
JPH02175666A (ja) * | 1988-12-27 | 1990-07-06 | Ibiden Co Ltd | 窒化アルミニウム焼結体の製造方法 |
JPH046161A (ja) * | 1990-04-23 | 1992-01-10 | Kawasaki Steel Corp | AlN焼結体の製造方法 |
JPH04108668A (ja) * | 1990-08-29 | 1992-04-09 | Kyocera Corp | 窒化アルミニウムポリタイプ焼結体及びその製法 |
-
2001
- 2001-08-01 JP JP2001233369A patent/JP2003048780A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6270210A (ja) * | 1985-09-24 | 1987-03-31 | Natl Inst For Res In Inorg Mater | 窒化アルミニウム−炭化けい素複合微粉末の製造法 |
JPH02175666A (ja) * | 1988-12-27 | 1990-07-06 | Ibiden Co Ltd | 窒化アルミニウム焼結体の製造方法 |
JPH046161A (ja) * | 1990-04-23 | 1992-01-10 | Kawasaki Steel Corp | AlN焼結体の製造方法 |
JPH04108668A (ja) * | 1990-08-29 | 1992-04-09 | Kyocera Corp | 窒化アルミニウムポリタイプ焼結体及びその製法 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7876053B2 (en) | 2004-06-21 | 2011-01-25 | Tokuyama Corporation | Nitride sintered body and method for manufacturing thereof |
US7973481B2 (en) | 2004-06-21 | 2011-07-05 | Tokuyama Corporation | Nitride sintered body and method for manufacturing thereof |
JP2012025660A (ja) * | 2004-06-21 | 2012-02-09 | Tokuyama Corp | 窒化物焼結体、及びその製造方法 |
JP4937738B2 (ja) * | 2004-06-21 | 2012-05-23 | 株式会社トクヤマ | 窒化物焼結体、及びその製造方法 |
EP2420482A3 (en) * | 2004-06-21 | 2012-08-01 | Tokuyama Corporation | Nitride sintered body and method for manufacturing thereof |
CN106653652A (zh) * | 2015-10-30 | 2017-05-10 | 日本碍子株式会社 | 半导体制造装置用部件、其制法以及附带有轴的加热器 |
KR20170051310A (ko) * | 2015-10-30 | 2017-05-11 | 엔지케이 인슐레이터 엘티디 | 반도체 제조 장치용 부재, 그 제법 및 샤프트를 갖는 히터 |
CN106653652B (zh) * | 2015-10-30 | 2021-11-26 | 日本碍子株式会社 | 半导体制造装置用部件、其制法以及附带有轴的加热器 |
KR102461566B1 (ko) | 2015-10-30 | 2022-10-31 | 엔지케이 인슐레이터 엘티디 | 반도체 제조 장치용 부재, 그 제법 및 샤프트를 갖는 히터 |
CN114477988A (zh) * | 2022-03-28 | 2022-05-13 | 天通控股股份有限公司 | 一种易成型、高强度铁氧体材料及其制备方法 |
CN115141022A (zh) * | 2022-07-28 | 2022-10-04 | 江苏正力新能电池技术有限公司 | 一种多孔陶瓷底托板的制备方法、多孔陶瓷底托板及电池 |
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