JP2002534797A5 - - Google Patents

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Publication number
JP2002534797A5
JP2002534797A5 JP2000592857A JP2000592857A JP2002534797A5 JP 2002534797 A5 JP2002534797 A5 JP 2002534797A5 JP 2000592857 A JP2000592857 A JP 2000592857A JP 2000592857 A JP2000592857 A JP 2000592857A JP 2002534797 A5 JP2002534797 A5 JP 2002534797A5
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JP
Japan
Prior art keywords
gas
gas injector
substrate
injector
outlet
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JP2000592857A
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Japanese (ja)
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JP4588885B2 (ja
JP2002534797A (ja
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Priority claimed from US09/223,273 external-priority patent/US6230651B1/en
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Publication of JP2002534797A5 publication Critical patent/JP2002534797A5/ja
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Publication of JP4588885B2 publication Critical patent/JP4588885B2/ja
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JP2000592857A 1998-12-30 1999-12-07 プラズマ処理システム及びプラズマ処理方法並びにガス注入器 Expired - Lifetime JP4588885B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/223,273 US6230651B1 (en) 1998-12-30 1998-12-30 Gas injection system for plasma processing
US09/223,273 1998-12-30
PCT/US1999/027917 WO2000041212A1 (en) 1998-12-30 1999-12-07 Gas injection system for plasma processing

Publications (3)

Publication Number Publication Date
JP2002534797A JP2002534797A (ja) 2002-10-15
JP2002534797A5 true JP2002534797A5 (enExample) 2007-04-05
JP4588885B2 JP4588885B2 (ja) 2010-12-01

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JP2000592857A Expired - Lifetime JP4588885B2 (ja) 1998-12-30 1999-12-07 プラズマ処理システム及びプラズマ処理方法並びにガス注入器

Country Status (7)

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US (3) US6230651B1 (enExample)
EP (1) EP1145277B1 (enExample)
JP (1) JP4588885B2 (enExample)
KR (1) KR100665646B1 (enExample)
IL (1) IL144001A (enExample)
TW (1) TW548680B (enExample)
WO (1) WO2000041212A1 (enExample)

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