KR100665646B1 - 플라즈마 처리용 가스 주입 시스템 - Google Patents

플라즈마 처리용 가스 주입 시스템 Download PDF

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Publication number
KR100665646B1
KR100665646B1 KR1020017008435A KR20017008435A KR100665646B1 KR 100665646 B1 KR100665646 B1 KR 100665646B1 KR 1020017008435 A KR1020017008435 A KR 1020017008435A KR 20017008435 A KR20017008435 A KR 20017008435A KR 100665646 B1 KR100665646 B1 KR 100665646B1
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gas
gas injector
substrate
plasma
injector
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KR20010101359A (ko
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니투퀴앙
데모스알렉스
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램 리서치 코포레이션
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    • H01L21/205—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
KR1020017008435A 1998-12-30 1999-12-07 플라즈마 처리용 가스 주입 시스템 Expired - Lifetime KR100665646B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/223,273 US6230651B1 (en) 1998-12-30 1998-12-30 Gas injection system for plasma processing
US09/223,273 1998-12-30

Publications (2)

Publication Number Publication Date
KR20010101359A KR20010101359A (ko) 2001-11-14
KR100665646B1 true KR100665646B1 (ko) 2007-01-09

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US (3) US6230651B1 (enExample)
EP (1) EP1145277B1 (enExample)
JP (1) JP4588885B2 (enExample)
KR (1) KR100665646B1 (enExample)
IL (1) IL144001A (enExample)
TW (1) TW548680B (enExample)
WO (1) WO2000041212A1 (enExample)

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EP1145277A1 (en) 2001-10-17
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US20100327085A1 (en) 2010-12-30
TW548680B (en) 2003-08-21
US8025731B2 (en) 2011-09-27
US20010010257A1 (en) 2001-08-02
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US6230651B1 (en) 2001-05-15
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