JP4588885B2 - プラズマ処理システム及びプラズマ処理方法並びにガス注入器 - Google Patents

プラズマ処理システム及びプラズマ処理方法並びにガス注入器 Download PDF

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JP4588885B2
JP4588885B2 JP2000592857A JP2000592857A JP4588885B2 JP 4588885 B2 JP4588885 B2 JP 4588885B2 JP 2000592857 A JP2000592857 A JP 2000592857A JP 2000592857 A JP2000592857 A JP 2000592857A JP 4588885 B2 JP4588885 B2 JP 4588885B2
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gas
gas injector
substrate
injector
chamber
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JP2002534797A (ja
JP2002534797A5 (enExample
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トゥクイアング ニー，
アレックス デモス，
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Lam Research Corp
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Lam Research Corp
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    • H01L21/205—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
JP2000592857A 1998-12-30 1999-12-07 プラズマ処理システム及びプラズマ処理方法並びにガス注入器 Expired - Lifetime JP4588885B2 (ja)

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Application Number Priority Date Filing Date Title
US09/223,273 US6230651B1 (en) 1998-12-30 1998-12-30 Gas injection system for plasma processing
US09/223,273 1998-12-30
PCT/US1999/027917 WO2000041212A1 (en) 1998-12-30 1999-12-07 Gas injection system for plasma processing

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JP2002534797A JP2002534797A (ja) 2002-10-15
JP2002534797A5 JP2002534797A5 (enExample) 2007-04-05
JP4588885B2 true JP4588885B2 (ja) 2010-12-01

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US (3) US6230651B1 (enExample)
EP (1) EP1145277B1 (enExample)
JP (1) JP4588885B2 (enExample)
KR (1) KR100665646B1 (enExample)
IL (1) IL144001A (enExample)
TW (1) TW548680B (enExample)
WO (1) WO2000041212A1 (enExample)

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US20010010257A1 (en) 2001-08-02
IL144001A0 (en) 2002-04-21
KR100665646B1 (ko) 2007-01-09
US20100327085A1 (en) 2010-12-30
WO2000041212A1 (en) 2000-07-13
US7785417B2 (en) 2010-08-31
KR20010101359A (ko) 2001-11-14
TW548680B (en) 2003-08-21
US6230651B1 (en) 2001-05-15
US8025731B2 (en) 2011-09-27
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IL144001A (en) 2005-12-18
EP1145277B1 (en) 2012-02-08

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