JP2002523869A - エネルギ・フィルタリング透過電子顕微鏡の自動設定 - Google Patents
エネルギ・フィルタリング透過電子顕微鏡の自動設定Info
- Publication number
- JP2002523869A JP2002523869A JP2000566874A JP2000566874A JP2002523869A JP 2002523869 A JP2002523869 A JP 2002523869A JP 2000566874 A JP2000566874 A JP 2000566874A JP 2000566874 A JP2000566874 A JP 2000566874A JP 2002523869 A JP2002523869 A JP 2002523869A
- Authority
- JP
- Japan
- Prior art keywords
- magnification
- image
- energy
- energy filtering
- average
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001914 filtration Methods 0.000 title claims abstract description 162
- 230000005540 biological transmission Effects 0.000 title claims abstract description 79
- 230000004075 alteration Effects 0.000 claims abstract description 80
- 238000000034 method Methods 0.000 claims abstract description 77
- 238000006073 displacement reaction Methods 0.000 claims abstract description 38
- 230000003287 optical effect Effects 0.000 claims abstract description 26
- 230000008859 change Effects 0.000 claims description 133
- 238000001514 detection method Methods 0.000 claims description 48
- 238000005259 measurement Methods 0.000 claims description 42
- 230000000694 effects Effects 0.000 claims description 31
- 238000010894 electron beam technology Methods 0.000 claims description 27
- 238000009826 distribution Methods 0.000 abstract description 21
- 238000001228 spectrum Methods 0.000 description 66
- 230000003595 spectral effect Effects 0.000 description 28
- 230000007547 defect Effects 0.000 description 22
- 238000012937 correction Methods 0.000 description 15
- 101100063432 Caenorhabditis elegans dim-1 gene Proteins 0.000 description 14
- 238000005286 illumination Methods 0.000 description 14
- 230000001133 acceleration Effects 0.000 description 11
- 230000007246 mechanism Effects 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- 238000013459 approach Methods 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 230000008520 organization Effects 0.000 description 4
- 238000011160 research Methods 0.000 description 4
- 230000001143 conditioned effect Effects 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- BFTGQIQVUVTBJU-UHFFFAOYSA-N 5,6-dihydroimidazo[2,1-c][1,2,4]dithiazole-3-thione Chemical compound C1CN2C(=S)SSC2=N1 BFTGQIQVUVTBJU-UHFFFAOYSA-N 0.000 description 2
- MVBPAIHFZZKRGD-UHFFFAOYSA-N MTIC Chemical compound CNN=NC=1NC=NC=1C(N)=O MVBPAIHFZZKRGD-UHFFFAOYSA-N 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- 238000000286 energy filtered transmission electron microscopy Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000011017 operating method Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000000750 progressive effect Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000004627 transmission electron microscopy Methods 0.000 description 2
- 238000003491 array Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24485—Energy spectrometers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/282—Determination of microscope properties
- H01J2237/2826—Calibration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/138,416 US6184524B1 (en) | 1996-08-07 | 1998-08-24 | Automated set up of an energy filtering transmission electron microscope |
| US09/138,416 | 1998-08-24 | ||
| PCT/US1999/018186 WO2000011702A1 (en) | 1998-08-24 | 1999-08-11 | Automated set up of an energy filtering transmission electron microscope |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002523869A true JP2002523869A (ja) | 2002-07-30 |
| JP2002523869A5 JP2002523869A5 (enExample) | 2006-10-05 |
Family
ID=22481908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000566874A Pending JP2002523869A (ja) | 1998-08-24 | 1999-08-11 | エネルギ・フィルタリング透過電子顕微鏡の自動設定 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6184524B1 (enExample) |
| EP (1) | EP1110232B1 (enExample) |
| JP (1) | JP2002523869A (enExample) |
| DE (1) | DE69941711D1 (enExample) |
| WO (1) | WO2000011702A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7615499B2 (ja) | 2020-11-12 | 2025-01-17 | エフ イー アイ カンパニ | 荷電粒子ビームのエネルギー幅を決定する方法 |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1009959C2 (nl) * | 1998-08-28 | 2000-02-29 | Univ Delft Tech | Elektronenmicroscoop. |
| JP3687541B2 (ja) * | 1999-01-04 | 2005-08-24 | 株式会社日立製作所 | 元素マッピング装置、走査透過型電子顕微鏡および元素マッピング方法 |
| EP1209720A3 (en) * | 2000-11-21 | 2006-11-15 | Hitachi High-Technologies Corporation | Energy spectrum measurement |
| US20020170887A1 (en) * | 2001-03-01 | 2002-11-21 | Konica Corporation | Optical element producing method, base material drawing method and base material drawing apparatus |
| US6878935B2 (en) * | 2002-04-03 | 2005-04-12 | General Phosphorix | Method of measuring sizes in scan microscopes |
| GB2393571B (en) * | 2002-09-26 | 2007-03-21 | Leo Electron Microscopy Ltd | Improvements in and relating to the control of instruments |
| JP2004288519A (ja) * | 2003-03-24 | 2004-10-14 | Hitachi High-Technologies Corp | 電子顕微鏡 |
| DE102005014794B4 (de) * | 2005-03-31 | 2009-01-15 | Advanced Micro Devices, Inc., Sunnyvale | Verfahren zum Prüfen einer Halbleiterprobe mit mehreren Abtastungen |
| JP4464857B2 (ja) * | 2005-04-05 | 2010-05-19 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| NL1029129C2 (nl) * | 2005-05-25 | 2006-11-28 | Univ Delft Tech | Scanningtransmissie-elektronenmicroscoop. |
| US7238938B2 (en) * | 2005-06-16 | 2007-07-03 | Gatan, Inc. | Energy selecting slit and energy selective sample analysis systems utilizing the same |
| JP5315033B2 (ja) * | 2008-12-09 | 2013-10-16 | 株式会社日立ハイテクノロジーズ | 電子分光器を備えた透過型電子顕微鏡 |
| US8373137B2 (en) * | 2010-09-24 | 2013-02-12 | Nion Co. | High resolution energy-selecting electron beam apparatus |
| JP6340216B2 (ja) * | 2014-03-07 | 2018-06-06 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡 |
| CN106804114B (zh) * | 2014-06-27 | 2019-05-28 | 加坦公司 | 电子能量损失光谱仪 |
| EP2998979A1 (en) * | 2014-09-22 | 2016-03-23 | Fei Company | Improved spectroscopy in a transmission charged-particle microscope |
| JP2017143060A (ja) | 2016-01-20 | 2017-08-17 | ガタン インコーポレイテッドＧａｔａｎ，Ｉｎｃ． | 直接検出センサを用いる電子エネルギー損失分光器 |
| US20240201112A1 (en) * | 2022-12-14 | 2024-06-20 | Gatan, Inc. | System and method of operating an electron energy loss spectrometer |
| US20250308838A1 (en) * | 2024-03-29 | 2025-10-02 | Fei Company | Automatic correction of energy dependent defocus in particle beam systems due to a configuration change |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2002547A (en) * | 1977-07-30 | 1979-02-21 | Tee W | Investigation of astigmatism in electron beam probe instruments |
| WO1998006125A1 (en) * | 1996-08-07 | 1998-02-12 | Gatan, Inc. | Automated adjustment of an energy filtering transmissiion electron microscope |
| JPH10284384A (ja) * | 1997-04-09 | 1998-10-23 | Fujitsu Ltd | 荷電粒子ビーム露光方法及び装置 |
Family Cites Families (56)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL6716628A (enExample) | 1967-12-07 | 1969-06-10 | ||
| NL7012388A (enExample) | 1970-08-21 | 1972-02-23 | ||
| US4017403A (en) | 1974-07-31 | 1977-04-12 | United Kingdom Atomic Energy Authority | Ion beam separators |
| SU516316A1 (ru) | 1975-03-03 | 1976-11-25 | Ордена Ленина Физико-Технический Институт Им. А.Ф.Иоффе | Электроннооптическое устройство со скорректированной сферической аберрацией |
| US4379250A (en) | 1979-10-19 | 1983-04-05 | Hitachi, Ltd. | Field emission cathode and method of fabricating the same |
| JPS5848011B2 (ja) | 1979-11-26 | 1983-10-26 | 日本鋼管株式会社 | 加熱炉燃焼制御方法 |
| SU920892A1 (ru) | 1980-07-23 | 1982-04-15 | Ордена Ленина физико-технический институт им.А.Ф.Иоффе | Электроннооптическое устройство со скорректированной сферической аберрацией |
| NL8100142A (nl) | 1981-01-14 | 1982-08-02 | Philips Nv | Inrichting voor het weergeven van beelden met behulp van een kathodestraalbuis. |
| NL8101888A (nl) | 1981-04-16 | 1982-11-16 | Philips Nv | Beeldweergeefinrichting. |
| GB2109539A (en) | 1981-11-02 | 1983-06-02 | Philips Electronic Associated | Electron beam alignment |
| GB2109538A (en) | 1981-11-02 | 1983-06-02 | Philips Electronic Associated | Electron beam alignment |
| US4414474A (en) | 1982-02-17 | 1983-11-08 | University Patents, Inc. | Corrector for axial aberrations in electron optic instruments |
| SU1048532A1 (ru) | 1982-05-14 | 1983-10-15 | Предприятие П/Я М-5273 | Электроннооптическое устройство с коррекцией аберраций |
| GB8322017D0 (en) | 1983-08-16 | 1983-09-21 | Vg Instr Ltd | Charged particle energy spectrometer |
| DE3423149A1 (de) | 1984-06-22 | 1986-01-02 | Fa. Carl Zeiss, 7920 Heidenheim | Verfahren und anordnung zur elektronenenergiegefilterten abbildung eines objektes oder eines objektbeugungsdiagrammes mit einem transmissions-elektronenmikroskop |
| JPS61277141A (ja) | 1985-05-31 | 1986-12-08 | Jeol Ltd | 磁界型エネルギ−フイルタ− |
| DE3532698A1 (de) | 1985-09-13 | 1987-03-26 | Zeiss Carl Fa | Elektronenenergiefilter vom alpha-typ |
| DE3532699A1 (de) | 1985-09-13 | 1987-03-26 | Zeiss Carl Fa | Elektronenenergiefilter vom omega-typ |
| JPS6298724A (ja) | 1985-10-25 | 1987-05-08 | Hitachi Ltd | 電子線描画装置 |
| NL8600685A (nl) | 1986-03-18 | 1987-10-16 | Philips Nv | Apparaat voor energie selectieve afbeelding. |
| JPS62240442A (ja) | 1986-04-09 | 1987-10-21 | Hitachi Ltd | 燃料制御装置 |
| NL8602177A (nl) | 1986-08-27 | 1988-03-16 | Philips Nv | Electronen detectie met energie discriminatie. |
| US4743756A (en) | 1987-08-10 | 1988-05-10 | Gatan Inc. | Parallel-detection electron energy-loss spectrometer |
| US4851670A (en) | 1987-08-28 | 1989-07-25 | Gatan Inc. | Energy-selected electron imaging filter |
| NL8702400A (nl) | 1987-10-09 | 1989-05-01 | Philips Nv | Kleurenbeeldbuis met asymmetrische deflektie-elektroden. |
| JPH01107532A (ja) | 1987-10-21 | 1989-04-25 | Hitachi Ltd | 電子線描画装置 |
| NL8702700A (nl) | 1987-11-12 | 1989-06-01 | Philips Nv | Werkwijze en inrichting voor automatische fasecorrectie van complexe nmr spectra. |
| NL8801050A (nl) | 1988-04-22 | 1989-11-16 | Philips Nv | Beeldversterkerbuis. |
| JP2686492B2 (ja) | 1988-12-12 | 1997-12-08 | 株式会社日立製作所 | 透過形電子顕微鏡の照射位置決め方法 |
| JP2842879B2 (ja) | 1989-01-06 | 1999-01-06 | 株式会社日立製作所 | 表面分析方法および装置 |
| NL8900067A (nl) | 1989-01-12 | 1990-08-01 | Philips Nv | Beeldweergeefinrichting. |
| US5343112A (en) | 1989-01-18 | 1994-08-30 | Balzers Aktiengesellschaft | Cathode arrangement |
| FR2642243B1 (fr) | 1989-01-24 | 1991-04-19 | Labo Electronique Physique | Circuit de predistorsion adaptative |
| GB2233124B (en) | 1989-06-06 | 1994-02-09 | Mitsubishi Electric Corp | Ion implantation apparatus |
| JP2791103B2 (ja) | 1989-06-09 | 1998-08-27 | 株式会社日立製作所 | 表面計測方法および装置 |
| US5004919A (en) | 1989-07-05 | 1991-04-02 | Jeol, Ltd. | Transmission electron microscope |
| US5225999A (en) | 1990-07-06 | 1993-07-06 | The Trustees Of The University Of Pennsylvania | Magnetic environment stabilization for effective operation of magnetically sensitive instruments |
| DE69030996T2 (de) | 1990-08-09 | 1998-01-02 | Philips Electronics Nv | Elektronenstrahlvorrichtung mit monopolförmigem, magnetischem Feld |
| NL9100380A (nl) | 1991-03-01 | 1992-10-01 | Philips Nv | Kathodestraalbuis met elektronenkanon met planparallelle optiek. |
| US5177631A (en) | 1991-06-28 | 1993-01-05 | Eastman Kodak Company | Magnetic position sensor |
| DE69213157T2 (de) | 1991-10-24 | 1997-03-06 | Philips Electronics Nv | Elektronenstrahlvorrichtung |
| DE69322890T2 (de) | 1992-02-12 | 1999-07-29 | Koninklijke Philips Electronics N.V., Eindhoven | Verfahren zur Verringerung einer räumlichen energiedispersiven Streuung eines Elektronenstrahlenbündels und eine für den Einsatz eines solchen Verfahrens geeignete Elektronenstrahlvorrichtung |
| DE69316960T2 (de) | 1992-11-12 | 1998-07-30 | Koninkl Philips Electronics Nv | Elektronenröhre mit Halbleiterkathode |
| US5432347A (en) | 1992-11-12 | 1995-07-11 | U.S. Philips Corporation | Method for image reconstruction in a high-resolution electron microscope, and electron microscope suitable for use of such a method |
| US5393976A (en) | 1992-11-26 | 1995-02-28 | Kabushiki Kaisha Topcon | Apparatus for displaying a sample image |
| JP3397347B2 (ja) | 1992-11-26 | 2003-04-14 | 日本電子株式会社 | オメガフィルタ |
| DE4310559A1 (de) | 1993-03-26 | 1994-09-29 | Zeiss Carl Fa | Abbildendes Elektronenenergiefilter |
| DE69402283T2 (de) | 1993-05-21 | 1997-09-18 | Philips Electronics Nv | Energiefilter mit Korrektur von chromatischen Aberrationen zweiter ordnung |
| JPH0712755A (ja) * | 1993-06-23 | 1995-01-17 | Res Dev Corp Of Japan | 電子線装置の調整方法および装置 |
| US5414261A (en) | 1993-07-01 | 1995-05-09 | The Regents Of The University Of California | Enhanced imaging mode for transmission electron microscopy |
| DE4328649A1 (de) | 1993-08-26 | 1995-03-02 | Zeiss Carl Fa | Elektronenoptisches Abbildungssystem mit regelbaren Elementen |
| US5578823A (en) | 1994-12-16 | 1996-11-26 | Hitachi, Ltd. | Transmission electron microscope and method of observing element distribution by using the same |
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| JP3490597B2 (ja) * | 1997-01-07 | 2004-01-26 | 株式会社東芝 | マスク検査装置 |
| JP3439614B2 (ja) * | 1997-03-03 | 2003-08-25 | 株式会社日立製作所 | 透過型電子顕微鏡及び元素分布観察方法 |
-
1998
- 1998-08-24 US US09/138,416 patent/US6184524B1/en not_active Expired - Lifetime
-
1999
- 1999-08-11 WO PCT/US1999/018186 patent/WO2000011702A1/en not_active Ceased
- 1999-08-11 DE DE69941711T patent/DE69941711D1/de not_active Expired - Lifetime
- 1999-08-11 EP EP99967841A patent/EP1110232B1/en not_active Expired - Lifetime
- 1999-08-11 JP JP2000566874A patent/JP2002523869A/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2002547A (en) * | 1977-07-30 | 1979-02-21 | Tee W | Investigation of astigmatism in electron beam probe instruments |
| WO1998006125A1 (en) * | 1996-08-07 | 1998-02-12 | Gatan, Inc. | Automated adjustment of an energy filtering transmissiion electron microscope |
| JPH10284384A (ja) * | 1997-04-09 | 1998-10-23 | Fujitsu Ltd | 荷電粒子ビーム露光方法及び装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7615499B2 (ja) | 2020-11-12 | 2025-01-17 | エフ イー アイ カンパニ | 荷電粒子ビームのエネルギー幅を決定する方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1110232A1 (en) | 2001-06-27 |
| WO2000011702A1 (en) | 2000-03-02 |
| EP1110232B1 (en) | 2009-11-25 |
| DE69941711D1 (de) | 2010-01-07 |
| US6184524B1 (en) | 2001-02-06 |
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| Date | Code | Title | Description |
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