JP2002515027A - 改良された金属―配位子錯体で触媒作用されたプロセス - Google Patents
改良された金属―配位子錯体で触媒作用されたプロセスInfo
- Publication number
- JP2002515027A JP2002515027A JP52138297A JP52138297A JP2002515027A JP 2002515027 A JP2002515027 A JP 2002515027A JP 52138297 A JP52138297 A JP 52138297A JP 52138297 A JP52138297 A JP 52138297A JP 2002515027 A JP2002515027 A JP 2002515027A
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- Prior art keywords
- organic
- phosphite
- catalyst
- reaction
- hydroformylation
- Prior art date
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6564—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
- C07F9/6571—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and oxygen atoms as the only ring hetero atoms
- C07F9/6574—Esters of oxyacids of phosphorus
- C07F9/65746—Esters of oxyacids of phosphorus the molecule containing more than one cyclic phosphorus atom
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- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
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- B01J38/74—Regeneration or reactivation of catalysts, in general utilising ion-exchange
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- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/49—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reaction with carbon monoxide
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- C07C45/49—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reaction with carbon monoxide
- C07C45/50—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reaction with carbon monoxide by oxo-reactions
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- C—CHEMISTRY; METALLURGY
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- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/49—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reaction with carbon monoxide
- C07C45/50—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reaction with carbon monoxide by oxo-reactions
- C07C45/505—Asymmetric hydroformylation
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
- C07F9/02—Phosphorus compounds
- C07F9/025—Purification; Separation; Stabilisation; Desodorisation of organo-phosphorus compounds
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
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- C07F9/06—Phosphorus compounds without P—C bonds
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Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.金属−有機亜リン酸エステル配位子錯体触媒及びそれを溶解した水並びに任 意に遊離有機亜リン酸エステル配位子の存在下で一以上の反応物を反応させて一 以上の生成物から成る反応生成物液体を製造することから成るプロセスであって 、そのいかなる有機亜リン酸エステル配位子を実質的に分解し及び/又は前記金 属−有機亜リン酸エステル配位子錯体触媒を実質的に失活させることに影響しな いような量の二酸化炭素の存在下で行われるヒドロホルミル化プロセス、ヒドロ アシル化(分子間及び分子内)プロセス、ヒドロアミド化プロセス、ヒドロエス テル化プロセス又はカルボニル化プロセス。 2.請求項1に記載のプロセスであって、金属−有機亜リン酸エステル配位子錯 体触媒及びそれを溶解した水並びに任意に遊離有機亜リン酸エステル配位子の存 在下でオレフィン系不飽和化合物を一酸化炭素及び水素と反応させて一以上のア ルデヒドから成る反応生成物液体を製造することから成るヒドロホルミル化プロ セス。 3.(i)少なくとも一つの反応域で金属−有機亜リン酸エステル配位子錯体触媒 及びそれを溶解した水並びに任意に遊離有機亜リン酸エステル配位子の存在下で 一以上のオレフィン系不飽和化合物を一酸化炭素及び水素と反応物を反応させて 一以上のアルデヒドから成る反応生成物液体を製造する段階及び(ii)少なくとも 一つの分離域又は少なくとも一つの反応域で一以上のアルデヒドをその反応生成 物液体から分離する段階とから成る請求項1又は2に記載のヒドロホルミル化プ ロセスを改良したプロセスであって、その改良点が前記の少なくとも一つの反応 域に加える前に一酸化炭素及び水素の混合物から二酸化炭素を除去する必要をな くしたことである改良されたヒドロホルミル化プロセス。 4.前記触媒がロジウム−有機亜リン酸エステル配位子錯体触媒である請求項1 〜3のいずれか一の請求項に記載のプロセス。 5.全ガス混合物に対して0.1〜70モル%の二酸化炭素の存在下で行われる 請求項1〜4のいずれか一の請求項に記載のヒドロホルミル化プロセス。 6.前記二酸化炭素の分圧が全ガス混合物に対して5モル%以上である請求項5 に記載のプロセス。 7.前記溶解した水がヒドロホルミル化反応生成物液体の全重量に対して0.01〜 10重量%で存在する請求項1〜6のいずれか一の請求項に記載のプロセス。 8.連続液状再循環プロセスから成る請求項2又は3に記載のヒドロホルミル化 プロセス。 9.前記金属−有機亜リン酸エステル配位子錯体触媒が均一系又は不均一系であ る請求項1〜8のいずれか一の請求項に記載のプロセス。 10.前記反応生成物液体が均一若しくは不均一の金属−有機亜リン酸エステル 配位子錯体触媒を含むか又は前記プロセスの間に前記反応生成物液体の少なくと も一部が固定された不均一金属−有機亜リン酸エステル配位子錯体触媒に接触す る請求項1〜8のいずれか一の請求項に記載のプロセス。 11.前記金属−有機亜リン酸エステル配位子錯体触媒が (i)下式 で表されるモノ有機亜リン酸エステル(式中R1は、炭素数が4〜40又はそれ以 上である置換又は非置換の、三価の非環式又は環式基のような三価炭化水素基を 表わす。)、 (ii)下式 で表されるジ有機亜リン酸エステル(式中R2は、炭素数が4〜40又はそれ以上であ る置換又は非置換の二価の炭化水素基を表わし、Wは炭素数が1〜18又はそれ以 上である置換又は非置換の一価の炭化水素基を表わす。)、 (iii)下式で表されるトリ有機亜リン酸エステル(式中R6は同じか又は異なっていてもよく 置換又は非置換の一価の炭化水素基を表わす。)及び (iv)下式 で表され、二以上の三級(三価)のリン原子を含む有機ポリ亜リン酸エステル( 式中Xは炭素数が2〜40である置換又は非置換のn価の有機架橋基を表わし、R7 は同じか又は異なっていてもよい炭素数が4〜40である二価の有機基を表わし、R8 は同じか又は異なっていてもよい炭素数が1〜24である置換又は非置換の一価の 炭化水素基を表わし、a及びbは同じか又は異なっていてもよく0〜6の値であり (但しa+bは2〜6の値である。)、nはa+bに等しい。)から成る群から選択される 有機亜リン酸エステル配位子と錯体形成したロジウムから成る請求項1〜10の いずれか一の請求項に記載のプロセス。 12.前記反応生成物液体が亜リン酸化合物を含む請求項1〜11のいずれか一 の請求項に記載のプロセス。 13.前記前記反応生成物液体中に存在する前記亜リン酸化合物が水性緩衝溶液 で処理される請求項12に記載のプロセス。 14.前記性緩衝溶液がpHが3〜9のオキシ酸の塩の混合物から成る請求項13に 記載のプロセス。 15.前記水性緩衝溶液がリン酸塩、炭酸塩、クエン酸塩及びホウ酸塩化合物か ら成る群から選択されるアニオン並びにアンモニウム及びナトリウム、カリウム 等のアルカリ金属から成る群から選択されるカチオンを含む請求項14に記載の プロセス。 16.前記反応生成物液体中に存在する前記亜リン酸化合物が前記反応生成物液 体中に存在する有機窒素化合物に捕捉され、かつ前記亜リン酸化合物と前記有機 窒素化合物の反応生成物である前記亜リン酸化合物が前記水性緩衝溶液処理によ り除去される請求項12に記載のプロセス。 17.前記有機窒素化合物がジアゾール、トリアゾール、ジアジン及びトリアジ ンから成る群から選択される請求項16に記載のプロセス。 18.前記有機窒素化合物がベンゾイミダゾール又はベンゾトリアゾールである 請求項17に記載のプロセス。
Applications Claiming Priority (11)
Application Number | Priority Date | Filing Date | Title |
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US828695P | 1995-12-06 | 1995-12-06 | |
US876395P | 1995-12-06 | 1995-12-06 | |
US828495P | 1995-12-06 | 1995-12-06 | |
US828995P | 1995-12-06 | 1995-12-06 | |
US60/008,763 | 1995-12-06 | ||
US60/008,284 | 1995-12-06 | ||
US60/008,289 | 1995-12-06 | ||
US60/008,286 | 1995-12-06 | ||
US08/753,498 US5731473A (en) | 1995-12-06 | 1996-11-26 | Metal-ligand complex catalyzed processes |
US08/753,498 | 1996-11-26 | ||
PCT/US1996/019276 WO1997020792A1 (en) | 1995-12-06 | 1996-12-05 | Improved metal-ligand complex catalyzed processes |
Publications (3)
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JP2002515027A true JP2002515027A (ja) | 2002-05-21 |
JP3970927B2 JP3970927B2 (ja) | 2007-09-05 |
JP3970927B6 JP3970927B6 (ja) | 2007-11-28 |
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JP2006306815A (ja) * | 2005-04-28 | 2006-11-09 | Mitsubishi Chemicals Corp | アルデヒドの製造方法 |
JP2008508355A (ja) * | 2004-08-02 | 2008-03-21 | ユニオン・カーバイド・ケミカルズ・アンド・プラスティックス・テクノロジー・コーポレイション | ヒドロホルミル化プロセスの安定化 |
JP2012046429A (ja) * | 2010-08-24 | 2012-03-08 | Mitsubishi Chemicals Corp | アルデヒドの製造方法 |
JP2013508274A (ja) * | 2009-10-16 | 2013-03-07 | ダウ テクノロジー インベストメンツ リミティド ライアビリティー カンパニー | 気相ヒドロホルミル化方法 |
JP2016514112A (ja) * | 2013-03-15 | 2016-05-19 | ダウ テクノロジー インベストメンツ リミティド ライアビリティー カンパニー | ヒドロホルミル化プロセス中の触媒安定剤としてのヘテロ環式剤 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2008508355A (ja) * | 2004-08-02 | 2008-03-21 | ユニオン・カーバイド・ケミカルズ・アンド・プラスティックス・テクノロジー・コーポレイション | ヒドロホルミル化プロセスの安定化 |
JP2006306815A (ja) * | 2005-04-28 | 2006-11-09 | Mitsubishi Chemicals Corp | アルデヒドの製造方法 |
JP2013508274A (ja) * | 2009-10-16 | 2013-03-07 | ダウ テクノロジー インベストメンツ リミティド ライアビリティー カンパニー | 気相ヒドロホルミル化方法 |
JP2012046429A (ja) * | 2010-08-24 | 2012-03-08 | Mitsubishi Chemicals Corp | アルデヒドの製造方法 |
JP2016514112A (ja) * | 2013-03-15 | 2016-05-19 | ダウ テクノロジー インベストメンツ リミティド ライアビリティー カンパニー | ヒドロホルミル化プロセス中の触媒安定剤としてのヘテロ環式剤 |
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