JP2002270790A5 - - Google Patents

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Publication number
JP2002270790A5
JP2002270790A5 JP2001373071A JP2001373071A JP2002270790A5 JP 2002270790 A5 JP2002270790 A5 JP 2002270790A5 JP 2001373071 A JP2001373071 A JP 2001373071A JP 2001373071 A JP2001373071 A JP 2001373071A JP 2002270790 A5 JP2002270790 A5 JP 2002270790A5
Authority
JP
Japan
Prior art keywords
wiring
orthogonal
memory device
semiconductor memory
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001373071A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002270790A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001373071A priority Critical patent/JP2002270790A/ja
Priority claimed from JP2001373071A external-priority patent/JP2002270790A/ja
Priority to TW090131068A priority patent/TW521426B/zh
Priority to KR10-2001-0085014A priority patent/KR100431483B1/ko
Priority to US10/025,753 priority patent/US6661689B2/en
Priority to CNB011439599A priority patent/CN1244154C/zh
Publication of JP2002270790A publication Critical patent/JP2002270790A/ja
Publication of JP2002270790A5 publication Critical patent/JP2002270790A5/ja
Pending legal-status Critical Current

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JP2001373071A 2000-12-27 2001-12-06 半導体記憶装置 Pending JP2002270790A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2001373071A JP2002270790A (ja) 2000-12-27 2001-12-06 半導体記憶装置
TW090131068A TW521426B (en) 2000-12-27 2001-12-14 Semiconductor memory device
KR10-2001-0085014A KR100431483B1 (ko) 2000-12-27 2001-12-26 반도체 기억 장치
US10/025,753 US6661689B2 (en) 2000-12-27 2001-12-26 Semiconductor memory device
CNB011439599A CN1244154C (zh) 2000-12-27 2001-12-27 半导体存储装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000399223 2000-12-27
JP2000-399223 2000-12-27
JP2001373071A JP2002270790A (ja) 2000-12-27 2001-12-06 半導体記憶装置

Publications (2)

Publication Number Publication Date
JP2002270790A JP2002270790A (ja) 2002-09-20
JP2002270790A5 true JP2002270790A5 (OSRAM) 2004-07-22

Family

ID=26606944

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001373071A Pending JP2002270790A (ja) 2000-12-27 2001-12-06 半導体記憶装置

Country Status (5)

Country Link
US (1) US6661689B2 (OSRAM)
JP (1) JP2002270790A (OSRAM)
KR (1) KR100431483B1 (OSRAM)
CN (1) CN1244154C (OSRAM)
TW (1) TW521426B (OSRAM)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4656720B2 (ja) * 2000-09-25 2011-03-23 ルネサスエレクトロニクス株式会社 薄膜磁性体記憶装置
JP3808799B2 (ja) 2002-05-15 2006-08-16 株式会社東芝 磁気ランダムアクセスメモリ
US6940748B2 (en) * 2002-05-16 2005-09-06 Micron Technology, Inc. Stacked 1T-nMTJ MRAM structure
WO2003098636A2 (en) * 2002-05-16 2003-11-27 Micron Technology, Inc. STACKED 1T-nMEMORY CELL STRUCTURE
US7042749B2 (en) * 2002-05-16 2006-05-09 Micron Technology, Inc. Stacked 1T-nmemory cell structure
US6801450B2 (en) * 2002-05-22 2004-10-05 Hewlett-Packard Development Company, L.P. Memory cell isolation
JP4322481B2 (ja) * 2002-08-12 2009-09-02 株式会社東芝 半導体集積回路装置
JP3906139B2 (ja) * 2002-10-16 2007-04-18 株式会社東芝 磁気ランダムアクセスメモリ
JP4290494B2 (ja) * 2003-07-08 2009-07-08 株式会社ルネサステクノロジ 半導体記憶装置
US7166881B2 (en) * 2003-10-13 2007-01-23 Taiwan Semiconductor Manufacturing Company, Ltd. Multi-sensing level MRAM structures
KR100527536B1 (ko) * 2003-12-24 2005-11-09 주식회사 하이닉스반도체 마그네틱 램
WO2005088745A1 (ja) 2004-03-12 2005-09-22 Japan Science And Technology Agency 磁気抵抗素子及びその製造方法
US6946698B1 (en) 2004-04-02 2005-09-20 Taiwan Semiconductor Manufacturing Company, Ltd. MRAM device having low-k inter-metal dielectric
US7099176B2 (en) * 2004-04-19 2006-08-29 Taiwan Semiconductor Manufacturing Company, Ltd. Non-orthogonal write line structure in MRAM
US7265053B2 (en) * 2004-04-26 2007-09-04 Taiwan Semiconductor Manufacturing Company, Ltd. Trench photolithography rework for removal of photoresist residue
US20060039183A1 (en) * 2004-05-21 2006-02-23 Taiwan Semiconductor Manufacturing Co., Ltd. Multi-sensing level MRAM structures
US7221584B2 (en) * 2004-08-13 2007-05-22 Taiwan Semiconductor Manufacturing Company, Ltd. MRAM cell having shared configuration
US7170775B2 (en) * 2005-01-06 2007-01-30 Taiwan Semiconductor Manufacturing Company, Ltd. MRAM cell with reduced write current
JP2007317824A (ja) 2006-05-25 2007-12-06 Tdk Corp 磁気抵抗効果素子およびその製造方法、ならびに薄膜磁気ヘッド、ヘッドジンバルアセンブリ、ヘッドアームアセンブリおよび磁気ディスク装置
JP4384137B2 (ja) 2006-06-14 2009-12-16 Ｔｄｋ株式会社 Ｃｐｐ−ｇｍｒヘッド用の磁界検出素子の製造方法、ｃｐｐ−ｇｍｒヘッド用の磁界検出素子、積層体、ウエハ、ヘッドジンバルアセンブリ、およびハードディスク装置
JP5412640B2 (ja) 2008-11-13 2014-02-12 ルネサスエレクトロニクス株式会社 磁気メモリ装置
CN105449099B (zh) * 2015-10-15 2018-04-06 上海磁宇信息科技有限公司 交叉矩阵列式磁性随机存储器及其读写方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3392657B2 (ja) * 1996-09-26 2003-03-31 株式会社東芝 半導体記憶装置
JP4124844B2 (ja) 1997-10-02 2008-07-23 キヤノン株式会社 磁気薄膜メモリ
JP3593472B2 (ja) * 1998-06-30 2004-11-24 株式会社東芝 磁気素子とそれを用いた磁気メモリおよび磁気センサ
JP2000132961A (ja) * 1998-10-23 2000-05-12 Canon Inc 磁気薄膜メモリ、磁気薄膜メモリの読出し方法、及び磁気薄膜メモリの書込み方法
JP3803503B2 (ja) 1999-04-30 2006-08-02 日本電気株式会社 磁気ランダムアクセスメモリ回路
JP2001217398A (ja) 2000-02-03 2001-08-10 Rohm Co Ltd 強磁性トンネル接合素子を用いた記憶装置
DE10020128A1 (de) 2000-04-14 2001-10-18 Infineon Technologies Ag MRAM-Speicher
JP4477199B2 (ja) 2000-06-16 2010-06-09 株式会社ルネサステクノロジ 磁気ランダムアクセスメモリ、磁気ランダムアクセスメモリへのアクセス方法および磁気ランダムアクセスメモリの製造方法
JP2002170377A (ja) * 2000-09-22 2002-06-14 Mitsubishi Electric Corp 薄膜磁性体記憶装置
JP4726290B2 (ja) * 2000-10-17 2011-07-20 ルネサスエレクトロニクス株式会社 半導体集積回路
DE10053965A1 (de) * 2000-10-31 2002-06-20 Infineon Technologies Ag Verfahren zur Verhinderung unerwünschter Programmierungen in einer MRAM-Anordnung
JP2002216468A (ja) * 2000-11-08 2002-08-02 Canon Inc 半導体記憶装置
JP4637388B2 (ja) * 2001-03-23 2011-02-23 ルネサスエレクトロニクス株式会社 薄膜磁性体記憶装置
JP2003016777A (ja) * 2001-06-28 2003-01-17 Mitsubishi Electric Corp 薄膜磁性体記憶装置

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