JP2002076252A - 半導体装置 - Google Patents
半導体装置Info
- Publication number
- JP2002076252A JP2002076252A JP2000263015A JP2000263015A JP2002076252A JP 2002076252 A JP2002076252 A JP 2002076252A JP 2000263015 A JP2000263015 A JP 2000263015A JP 2000263015 A JP2000263015 A JP 2000263015A JP 2002076252 A JP2002076252 A JP 2002076252A
- Authority
- JP
- Japan
- Prior art keywords
- chip
- substrate
- semiconductor
- semiconductor device
- semiconductor chips
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
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- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2924/156—Material
- H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
- H01L2924/15787—Ceramics, e.g. crystalline carbides, nitrides or oxides
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Abstract
(57)【要約】
【課題】 基板とチップの熱膨張率差を吸収して、信頼
性の高い半導体装置を提供する。 【解決手段】 基板1上に複数の半導体チップ2、3、
4を積層させた半導体装置において、前記基板1上に前
記複数の半導体チップの内のチップサイズの最も小さい
半導体チップ2を組み付け、この半導体チップ2上に順
にチップサイズの大きな半導体チップ2、3を積層し、
この積層した半導体チップ2、3、4のボンディングパ
ッド2a、3a、4a直上に当たる前記基板1の部位に
は、ボンディングワイヤー5挿通用の貫通孔6を設け、
前記ボンディングワイヤー5は、前記貫通孔6を挿通せ
しめ、且つ、前記半導体チップ3s、4sの表面に対し
て、ほぼ垂直をなすように配線したことを特徴とする。
性の高い半導体装置を提供する。 【解決手段】 基板1上に複数の半導体チップ2、3、
4を積層させた半導体装置において、前記基板1上に前
記複数の半導体チップの内のチップサイズの最も小さい
半導体チップ2を組み付け、この半導体チップ2上に順
にチップサイズの大きな半導体チップ2、3を積層し、
この積層した半導体チップ2、3、4のボンディングパ
ッド2a、3a、4a直上に当たる前記基板1の部位に
は、ボンディングワイヤー5挿通用の貫通孔6を設け、
前記ボンディングワイヤー5は、前記貫通孔6を挿通せ
しめ、且つ、前記半導体チップ3s、4sの表面に対し
て、ほぼ垂直をなすように配線したことを特徴とする。
Description
【0001】
【発明の属する技術分野】本発明は、半導体装置に係わ
り、特に、複数の半導体チップを積層した半導体装置に
関する。
り、特に、複数の半導体チップを積層した半導体装置に
関する。
【0002】
【従来の技術】図2に示した半導体装置は、特開平10
−84076号公報に示された半導体装置である。
−84076号公報に示された半導体装置である。
【0003】この半導体装置は、小チップ10、大チッ
プ20と、内部端子33と外部端子36とが電気配線3
8で接続された配線基板30と、チップ側端子43と基
板側端子46とが電気配線47で接続された補助枠40
とから構成され、小チップ10は、配線基板30の中央
部に配置されて、その電極パッド13が、半田ボール1
4を介して配線基板30の内部端子33に接続し、ま
た、補助枠40は、小チップ10の外周に嵌合されて、
補助枠40の電極パッド46は、半田ボール48を介し
て配線基板30の内部端子33に接続されている。更
に、大チップ20は、小チップ10と及び補助枠40上
に重ねられて、その電極パッド23が、補助枠40のチ
ップ側端子43に半田ボール24を介して接続する構造
になっている。
プ20と、内部端子33と外部端子36とが電気配線3
8で接続された配線基板30と、チップ側端子43と基
板側端子46とが電気配線47で接続された補助枠40
とから構成され、小チップ10は、配線基板30の中央
部に配置されて、その電極パッド13が、半田ボール1
4を介して配線基板30の内部端子33に接続し、ま
た、補助枠40は、小チップ10の外周に嵌合されて、
補助枠40の電極パッド46は、半田ボール48を介し
て配線基板30の内部端子33に接続されている。更
に、大チップ20は、小チップ10と及び補助枠40上
に重ねられて、その電極パッド23が、補助枠40のチ
ップ側端子43に半田ボール24を介して接続する構造
になっている。
【0004】しかし、上記した半導体装置は、基板30
と大チップ20の接続を補助枠40を用いて行っている
が、この補助枠40は、製造が困難なのでコストが高
い。更に、上記した半導体装置は、チップと基板の接合
力が大きく、このため、基板とチップの熱膨張率差に基
づき生じる基板とチップの熱応力を逃がすことができに
くく、温度サイクル信頼性が低いという欠点があった。
と大チップ20の接続を補助枠40を用いて行っている
が、この補助枠40は、製造が困難なのでコストが高
い。更に、上記した半導体装置は、チップと基板の接合
力が大きく、このため、基板とチップの熱膨張率差に基
づき生じる基板とチップの熱応力を逃がすことができに
くく、温度サイクル信頼性が低いという欠点があった。
【0005】又、図3に示す基板70上に半導体チップ
71、72、73を順に積層した積層型半導体装置の場
合、基板70にスルーホール74を設ける必要であり、
このため、基板70の製造コストが高くなるという欠点
がある。
71、72、73を順に積層した積層型半導体装置の場
合、基板70にスルーホール74を設ける必要であり、
このため、基板70の製造コストが高くなるという欠点
がある。
【0006】
【発明が解決しようとする課題】本発明の目的は、上記
した従来技術の欠点を改良し、特に、基板とチップの熱
膨張率差を吸収して、信頼性の高い半導体装置を提供す
ると共に、製造コストが安価な新規な半導体装置を提供
することにある。
した従来技術の欠点を改良し、特に、基板とチップの熱
膨張率差を吸収して、信頼性の高い半導体装置を提供す
ると共に、製造コストが安価な新規な半導体装置を提供
することにある。
【0007】
【課題を解決するための手段】本発明は上記した目的を
達成するため、基本的には、以下に記載されたような技
術構成を採用するものである。
達成するため、基本的には、以下に記載されたような技
術構成を採用するものである。
【0008】即ち、本発明に係わる半導体装置は、基板
上に複数の半導体チップを積層させた半導体装置におい
て、前記基板上に前記複数の半導体チップの内のチップ
サイズの最も小さい半導体チップを組み付け、この半導
体チップ上に順にチップサイズの大きな半導体チップを
積層し、この積層した半導体チップのボンディングパッ
ド直上に当たる前記基板の部位には、ボンディングワイ
ヤー挿通用の貫通孔を設け、前記ボンディングワイヤー
は、前記貫通孔を挿通せしめ、且つ、前記半導体チップ
の表面に対して、ほぼ垂直をなすように配線したことを
特徴とするものである。
上に複数の半導体チップを積層させた半導体装置におい
て、前記基板上に前記複数の半導体チップの内のチップ
サイズの最も小さい半導体チップを組み付け、この半導
体チップ上に順にチップサイズの大きな半導体チップを
積層し、この積層した半導体チップのボンディングパッ
ド直上に当たる前記基板の部位には、ボンディングワイ
ヤー挿通用の貫通孔を設け、前記ボンディングワイヤー
は、前記貫通孔を挿通せしめ、且つ、前記半導体チップ
の表面に対して、ほぼ垂直をなすように配線したことを
特徴とするものである。
【0009】
【発明の実施の形態】本発明に係わる半導体装置は、基
板上に複数の半導体チップを積層させた半導体装置にお
いて、前記基板上に前記複数の半導体チップの内のチッ
プサイズの最も小さい半導体チップを組み付け、この半
導体チップ上に順にチップサイズの大きな半導体チップ
を積層し、この積層した半導体チップのボンディングパ
ッド直上に当たる前記基板の部位には、ボンディングワ
イヤー挿通用の貫通孔を設け、前記ボンディングワイヤ
ーは、前記貫通孔を挿通せしめ、且つ、前記半導体チッ
プの表面に対して、ほぼ垂直をなすように配線したこと
を特徴とするものである。
板上に複数の半導体チップを積層させた半導体装置にお
いて、前記基板上に前記複数の半導体チップの内のチッ
プサイズの最も小さい半導体チップを組み付け、この半
導体チップ上に順にチップサイズの大きな半導体チップ
を積層し、この積層した半導体チップのボンディングパ
ッド直上に当たる前記基板の部位には、ボンディングワ
イヤー挿通用の貫通孔を設け、前記ボンディングワイヤ
ーは、前記貫通孔を挿通せしめ、且つ、前記半導体チッ
プの表面に対して、ほぼ垂直をなすように配線したこと
を特徴とするものである。
【0010】このような構造の場合、基板とチップの熱
膨張率差に基づき生じる基板及びチップの熱応力が小さ
いから、温度サイクル信頼性が向上し、しかも、安価に
製造できる優れた特徴を有する。
膨張率差に基づき生じる基板及びチップの熱応力が小さ
いから、温度サイクル信頼性が向上し、しかも、安価に
製造できる優れた特徴を有する。
【0011】
【実施例】以下に、本発明に係わる半導体装置の具体例
を図面を参照しながら詳細に説明する。
を図面を参照しながら詳細に説明する。
【0012】図1は、本発明に係わる半導体装置の具体
例を示す断面図であって、この図1には、基板1上に複
数の半導体チップ2、3、4を積層させた半導体装置に
おいて、前記基板1上に前記複数の半導体チップの内の
チップサイズの最も小さい半導体チップ2を組み付け、
この半導体チップ2上に順にチップサイズの大きな半導
体チップ2、3を積層し、この積層した半導体チップ
2、3、4のボンディングパッド2a、3a、4a直上
に当たる前記基板1の部位には、ボンディングワイヤー
5挿通用の貫通孔6を設け、前記ボンディングワイヤー
5は、前記貫通孔6を挿通せしめ、且つ、前記半導体チ
ップ3s、4sの表面に対して、ほぼ垂直をなすように
配線したことを特徴とする半導体装置が示されている。
例を示す断面図であって、この図1には、基板1上に複
数の半導体チップ2、3、4を積層させた半導体装置に
おいて、前記基板1上に前記複数の半導体チップの内の
チップサイズの最も小さい半導体チップ2を組み付け、
この半導体チップ2上に順にチップサイズの大きな半導
体チップ2、3を積層し、この積層した半導体チップ
2、3、4のボンディングパッド2a、3a、4a直上
に当たる前記基板1の部位には、ボンディングワイヤー
5挿通用の貫通孔6を設け、前記ボンディングワイヤー
5は、前記貫通孔6を挿通せしめ、且つ、前記半導体チ
ップ3s、4sの表面に対して、ほぼ垂直をなすように
配線したことを特徴とする半導体装置が示されている。
【0013】以下に、本発明の半導体装置の具体例を更
に詳細に説明する。
に詳細に説明する。
【0014】ガラスエポキシ基板(もしくはテープ基板
もしくはセラミック基板)1のはんだボール7を搭載接
合する面には、銅等の導電性金属からなる配線8が形成
され、また、ガラスエポキシ基板1上の配線8にワイヤ
ーボンディングするため、ガラスエポキシ基板1に貫通
孔6を設けている。
もしくはセラミック基板)1のはんだボール7を搭載接
合する面には、銅等の導電性金属からなる配線8が形成
され、また、ガラスエポキシ基板1上の配線8にワイヤ
ーボンディングするため、ガラスエポキシ基板1に貫通
孔6を設けている。
【0015】図では、半導体チップを三つ重ねている
が、二つでも、或いは、三つ以上の複数個を積み重ねて
接合してもよい。各チップのサイズはそれぞれ異なり、
チップサイズの小さいものから順に、基板1上へ絶縁性
のエポキシ樹脂とアクリルゴムの混合接着剤9を用いて
接合する。チップを接合する位置は、チップの中心と基
板の中心とを一致させるように一般的には接合するが、
偏心していてもよい。チップは回路が形成されている面
を基板1側へ向けて接合し、各チップ2、3、4のパッ
ド2a、3a、4aから基板1の貫通孔6を通して基板
1へワイヤーボンディングを行う。ワイヤーボンディン
グは、各パッドから基板1上の配線8へ最短距離で配線
するが、パッドや配線のレイアウト上、困難であれば長
めに結線しても良い。
が、二つでも、或いは、三つ以上の複数個を積み重ねて
接合してもよい。各チップのサイズはそれぞれ異なり、
チップサイズの小さいものから順に、基板1上へ絶縁性
のエポキシ樹脂とアクリルゴムの混合接着剤9を用いて
接合する。チップを接合する位置は、チップの中心と基
板の中心とを一致させるように一般的には接合するが、
偏心していてもよい。チップは回路が形成されている面
を基板1側へ向けて接合し、各チップ2、3、4のパッ
ド2a、3a、4aから基板1の貫通孔6を通して基板
1へワイヤーボンディングを行う。ワイヤーボンディン
グは、各パッドから基板1上の配線8へ最短距離で配線
するが、パッドや配線のレイアウト上、困難であれば長
めに結線しても良い。
【0016】図1では、最小チップ2のパッド2aは、
チップ2の中心付近に位置しており、2番目3番目のチ
ップ3、4は、それぞれチップの周辺にパッド3a、4
aが形成されている。最小チップ2のパッド位置2a
は、中心付近でも周辺でもよいが、2番目3番目のチッ
プでは、周辺部にパッドを位置させなければならない。
チップ2の中心付近に位置しており、2番目3番目のチ
ップ3、4は、それぞれチップの周辺にパッド3a、4
aが形成されている。最小チップ2のパッド位置2a
は、中心付近でも周辺でもよいが、2番目3番目のチッ
プでは、周辺部にパッドを位置させなければならない。
【0017】チップ全体と基板1の貫通孔6付近を覆う
ように金型にてエポキシ樹脂10にて封入する。
ように金型にてエポキシ樹脂10にて封入する。
【0018】なお、最外側の最もサイズの大きいチップ
4の裏面は樹脂封入せず、露出させて、チップからの放
熱効果を上げている。そして、基板1に、はんだボール
7を搭載して、本発明の半導体装置を完成させる。
4の裏面は樹脂封入せず、露出させて、チップからの放
熱効果を上げている。そして、基板1に、はんだボール
7を搭載して、本発明の半導体装置を完成させる。
【0019】
【発明の効果】本発明に係わる半導体装置は、上述のよ
うに構成したので、以下のような効果を奏する。 (1)基板が片面配線のため、基板を製造する製造工程
が少なく、製造コストが安くなる。また、片面配線のた
め、基板に表裏配線を結ぶ微細な貫通孔が不要となり、
基板製造コストが安くなる。 (2)ワイヤが短いので、ワイヤコストが安い。 (3)チップで一番小さいものから順に基板に接合搭載
するために、基板とチップの熱膨張率差をエポキシ樹脂
にて緩和でき、温度サイクル信頼性が向上する。
うに構成したので、以下のような効果を奏する。 (1)基板が片面配線のため、基板を製造する製造工程
が少なく、製造コストが安くなる。また、片面配線のた
め、基板に表裏配線を結ぶ微細な貫通孔が不要となり、
基板製造コストが安くなる。 (2)ワイヤが短いので、ワイヤコストが安い。 (3)チップで一番小さいものから順に基板に接合搭載
するために、基板とチップの熱膨張率差をエポキシ樹脂
にて緩和でき、温度サイクル信頼性が向上する。
【図1】本発明に係わる半導体装置を示す断面図であ
る。
る。
【図2】従来の半導体装置の断面図である。
【図3】従来の他の半導体装置の断面図である。
1 基板 2、3、4 半導体チップ 5 ワイヤー 6 貫通孔 7 半田ボール 8 基板上の配線 9 接着剤 10 封止樹脂
Claims (1)
- 【請求項1】 基板上に複数の半導体チップを積層させ
た半導体装置において、 前記基板上に前記複数の半導体チップの内のチップサイ
ズの最も小さい半導体チップを組み付け、この半導体チ
ップ上に順にチップサイズの大きな半導体チップを積層
し、この積層した半導体チップのボンディングパッド直
上に当たる前記基板の部位には、ボンディングワイヤー
挿通用の貫通孔を設け、前記ボンディングワイヤーは、
前記貫通孔を挿通せしめ、且つ、前記半導体チップの表
面に対して、ほぼ垂直をなすように配線したことを特徴
とする半導体装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000263015A JP2002076252A (ja) | 2000-08-31 | 2000-08-31 | 半導体装置 |
KR10-2001-0052047A KR100426825B1 (ko) | 2000-08-31 | 2001-08-28 | 반도체 장치 |
US09/942,313 US6600221B2 (en) | 2000-08-31 | 2001-08-29 | Semiconductor device with stacked semiconductor chips |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000263015A JP2002076252A (ja) | 2000-08-31 | 2000-08-31 | 半導体装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2002076252A true JP2002076252A (ja) | 2002-03-15 |
Family
ID=18750612
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000263015A Abandoned JP2002076252A (ja) | 2000-08-31 | 2000-08-31 | 半導体装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US6600221B2 (ja) |
JP (1) | JP2002076252A (ja) |
KR (1) | KR100426825B1 (ja) |
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Also Published As
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US20020053727A1 (en) | 2002-05-09 |
US6600221B2 (en) | 2003-07-29 |
KR100426825B1 (ko) | 2004-04-13 |
KR20020018058A (ko) | 2002-03-07 |
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