JP2001351856A5 - - Google Patents
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- Publication number
- JP2001351856A5 JP2001351856A5 JP2000404376A JP2000404376A JP2001351856A5 JP 2001351856 A5 JP2001351856 A5 JP 2001351856A5 JP 2000404376 A JP2000404376 A JP 2000404376A JP 2000404376 A JP2000404376 A JP 2000404376A JP 2001351856 A5 JP2001351856 A5 JP 2001351856A5
- Authority
- JP
- Japan
- Prior art keywords
- masses
- object table
- balanced
- projection apparatus
- equilibrium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 26
- 230000005855 radiation Effects 0.000 claims 24
- 238000003384 imaging method Methods 0.000 claims 13
- 238000000059 patterning Methods 0.000 claims 4
- 230000001186 cumulative effect Effects 0.000 claims 1
- 230000007774 longterm Effects 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP99310371.2 | 1999-12-21 | ||
| EP99310371 | 1999-12-21 |
Related Child Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005155600A Division JP4490875B2 (ja) | 1999-12-21 | 2005-05-27 | リソグラフィ投影装置に使うための平衡位置決めシステム |
| JP2008321451A Division JP4914885B2 (ja) | 1999-12-21 | 2008-12-17 | リソグラフィ投影装置に使うための平衡位置決めシステム |
| JP2008321432A Division JP4621765B2 (ja) | 1999-12-21 | 2008-12-17 | リソグラフィ投影装置に使うための平衡位置決めシステム |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001351856A JP2001351856A (ja) | 2001-12-21 |
| JP2001351856A5 true JP2001351856A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 2005-10-06 |
| JP4279449B2 JP4279449B2 (ja) | 2009-06-17 |
Family
ID=8241828
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000404376A Expired - Fee Related JP4279449B2 (ja) | 1999-12-21 | 2000-12-19 | リソグラフィ投影装置に使うための平衡位置決めシステム |
| JP2005155600A Expired - Lifetime JP4490875B2 (ja) | 1999-12-21 | 2005-05-27 | リソグラフィ投影装置に使うための平衡位置決めシステム |
| JP2008321432A Expired - Fee Related JP4621765B2 (ja) | 1999-12-21 | 2008-12-17 | リソグラフィ投影装置に使うための平衡位置決めシステム |
| JP2008321451A Expired - Fee Related JP4914885B2 (ja) | 1999-12-21 | 2008-12-17 | リソグラフィ投影装置に使うための平衡位置決めシステム |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005155600A Expired - Lifetime JP4490875B2 (ja) | 1999-12-21 | 2005-05-27 | リソグラフィ投影装置に使うための平衡位置決めシステム |
| JP2008321432A Expired - Fee Related JP4621765B2 (ja) | 1999-12-21 | 2008-12-17 | リソグラフィ投影装置に使うための平衡位置決めシステム |
| JP2008321451A Expired - Fee Related JP4914885B2 (ja) | 1999-12-21 | 2008-12-17 | リソグラフィ投影装置に使うための平衡位置決めシステム |
Country Status (5)
Families Citing this family (54)
| Publication number | Priority date | Publication date | Assignee | Title |
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| TW546551B (en) * | 1999-12-21 | 2003-08-11 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
| JP3814453B2 (ja) | 2000-01-11 | 2006-08-30 | キヤノン株式会社 | 位置決め装置、半導体露光装置およびデバイス製造方法 |
| TW588222B (en) * | 2000-02-10 | 2004-05-21 | Asml Netherlands Bv | Cooling of voice coil motors in lithographic projection apparatus |
| JP4474020B2 (ja) * | 2000-06-23 | 2010-06-02 | キヤノン株式会社 | 移動装置及び露光装置 |
| EP1189018B1 (de) * | 2000-09-15 | 2009-02-25 | Vistec Electron Beam GmbH | Sechsachsiges Positioniersystem mit magnetfeldfreiem Raum |
| US6593997B1 (en) | 2000-11-16 | 2003-07-15 | Nikon Corporation | Stage assembly including a reaction assembly |
| US6958808B2 (en) * | 2000-11-16 | 2005-10-25 | Nikon Corporation | System and method for resetting a reaction mass assembly of a stage assembly |
| US6885430B2 (en) * | 2000-11-16 | 2005-04-26 | Nikon Corporation | System and method for resetting a reaction mass assembly of a stage assembly |
| US6603531B1 (en) | 2000-11-16 | 2003-08-05 | Nikon Corporation | Stage assembly including a reaction assembly that is connected by actuators |
| US6757053B1 (en) | 2000-11-16 | 2004-06-29 | Nikon Corporation | Stage assembly including a reaction mass assembly |
| US6906334B2 (en) * | 2000-12-19 | 2005-06-14 | Nikon Corporation | Curved I-core |
| US6987558B2 (en) * | 2001-01-16 | 2006-01-17 | Nikon Corporation | Reaction mass for a stage device |
| JP2002283174A (ja) * | 2001-03-26 | 2002-10-03 | Fanuc Ltd | 直線駆動装置 |
| JP2003059797A (ja) * | 2001-08-09 | 2003-02-28 | Canon Inc | 移動装置、ステージ装置及び露光装置 |
| US6597435B2 (en) * | 2001-10-09 | 2003-07-22 | Nikon Corporation | Reticle stage with reaction force cancellation |
| JP4011919B2 (ja) * | 2002-01-16 | 2007-11-21 | キヤノン株式会社 | 移動装置及び露光装置並びに半導体デバイスの製造方法 |
| CN1252538C (zh) * | 2002-02-12 | 2006-04-19 | Asml荷兰有限公司 | 光刻装置和器件制造方法 |
| JP3679767B2 (ja) | 2002-02-26 | 2005-08-03 | キヤノン株式会社 | ステージ位置決め装置及びその制御方法、露光装置、半導体デバイスの製造方法 |
| US7061577B2 (en) | 2002-03-26 | 2006-06-13 | Nikon Corporation | Image adjustor including damping assembly |
| US6724466B2 (en) * | 2002-03-26 | 2004-04-20 | Nikon Corporation | Stage assembly including a damping assembly |
| US7268504B2 (en) * | 2002-05-24 | 2007-09-11 | Kollomorgen Corporation | Stator position feedback controller |
| US6906786B2 (en) * | 2002-06-07 | 2005-06-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN100421024C (zh) * | 2002-09-30 | 2008-09-24 | Asml荷兰有限公司 | 光刻装置及器件制造方法 |
| JP3962669B2 (ja) * | 2002-10-08 | 2007-08-22 | キヤノン株式会社 | 移動装置及び露光装置並びにデバイスの製造方法 |
| JP2004152902A (ja) * | 2002-10-29 | 2004-05-27 | Canon Inc | 位置決め装置 |
| US6963821B2 (en) * | 2003-02-11 | 2005-11-08 | Nikon Corporation | Stage counter mass system |
| KR101225884B1 (ko) * | 2003-04-11 | 2013-01-28 | 가부시키가이샤 니콘 | 액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법 |
| TWI442694B (zh) * | 2003-05-30 | 2014-06-21 | Asml Netherlands Bv | 微影裝置及元件製造方法 |
| US20040252287A1 (en) * | 2003-06-11 | 2004-12-16 | Michael Binnard | Reaction frame assembly that functions as a reaction mass |
| TW201721717A (zh) | 2003-06-19 | 2017-06-16 | 尼康股份有限公司 | 曝光裝置、曝光方法、及元件製造方法 |
| TWI245163B (en) * | 2003-08-29 | 2005-12-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| US7221433B2 (en) | 2004-01-28 | 2007-05-22 | Nikon Corporation | Stage assembly including a reaction assembly having a connector assembly |
| US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| US7224432B2 (en) * | 2004-05-14 | 2007-05-29 | Canon Kabushiki Kaisha | Stage device, exposure apparatus, and device manufacturing method |
| WO2006046101A1 (en) * | 2004-10-27 | 2006-05-04 | Carl Zeiss Smt Ag | A six degree of freedom (dof) actuator reaction mass |
| US7193683B2 (en) * | 2005-01-06 | 2007-03-20 | Nikon Corporation | Stage design for reflective optics |
| US7456935B2 (en) * | 2005-04-05 | 2008-11-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a positioning device for positioning an object table |
| US7696652B2 (en) | 2005-11-01 | 2010-04-13 | Asml Netherlands B.V. | Electromagnetic actuator, method of manufacturing a part of an electromagnetic actuator, and lithographic apparatus comprising and electromagnetic actuator |
| US20070268475A1 (en) * | 2006-05-16 | 2007-11-22 | Nikon Corporation | System and method for controlling a stage assembly |
| US7502103B2 (en) * | 2006-05-31 | 2009-03-10 | Asml Netherlands B.V. | Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate |
| US7538273B2 (en) * | 2006-08-08 | 2009-05-26 | Asml Netherlands B.V. | Cable connection to decrease the passing on of vibrations from a first object to a second object |
| US20080285004A1 (en) * | 2007-05-18 | 2008-11-20 | Nikon Corporation | Monolithic, Non-Contact Six Degree-of-Freedom Stage Apparatus |
| NL1036161A1 (nl) * | 2007-11-20 | 2009-05-25 | Asml Netherlands Bv | Combination of structure and an active damping system, and a lithographic apparatus. |
| JP5505871B2 (ja) * | 2008-03-07 | 2014-05-28 | 株式会社ニコン | 移動体装置及び露光装置 |
| US8144310B2 (en) | 2008-04-14 | 2012-03-27 | Asml Netherlands B.V. | Positioning system, lithographic apparatus and device manufacturing method |
| CN102782806A (zh) * | 2010-03-04 | 2012-11-14 | 株式会社安川电机 | 工作台装置 |
| DE102011006024A1 (de) * | 2011-03-24 | 2012-09-27 | Carl Zeiss Smt Gmbh | Anordnung zur Vibrationsisolation einer Nutzlast |
| WO2013039389A2 (en) * | 2011-09-12 | 2013-03-21 | Mapper Lithography Ip B.V. | Target positioning device, method for driving a target positioning device, and a lithography system comprising such a target positioning device |
| NL2009902A (en) | 2011-12-27 | 2013-07-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| NL2010628A (en) * | 2012-04-27 | 2013-10-29 | Asml Netherlands Bv | Lithographic apparatus comprising an actuator, and method for protecting such actuator. |
| CN103809384B (zh) * | 2012-11-12 | 2016-03-09 | 上海微电子装备有限公司 | 工件台与掩模台公用的平衡质量系统及光刻机 |
| NL2014645A (en) | 2014-04-16 | 2015-11-02 | Asml Netherlands Bv | Lithographic apparatus, method for positioning an object in a lithographic apparatus and device manufacturing method. |
| DE102019207940A1 (de) * | 2019-05-29 | 2020-12-03 | Brose Fahrzeugteile SE & Co. Kommanditgesellschaft, Würzburg | Verfahren zum dynamischen Wuchten eines Rotationskörpers |
| US12346010B2 (en) * | 2022-04-29 | 2025-07-01 | International Business Machines Corporation | Alignment system and tool for visual inspection |
Family Cites Families (49)
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| JPS6018918A (ja) * | 1983-07-13 | 1985-01-31 | Canon Inc | ステージ装置 |
| US4781067A (en) * | 1987-04-30 | 1988-11-01 | Sonoscan, Inc. | Balanced scanning mechanism |
| US5523193A (en) * | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
| JP2960423B2 (ja) * | 1988-11-16 | 1999-10-06 | 株式会社日立製作所 | 試料移動装置及び半導体製造装置 |
| US5208497A (en) | 1989-04-17 | 1993-05-04 | Sharp Kabushiki Kaisha | Linear driving apparatus |
| NL8902471A (nl) | 1989-10-05 | 1991-05-01 | Philips Nv | Tweetraps positioneerinrichting. |
| JPH03273607A (ja) | 1990-03-23 | 1991-12-04 | Canon Inc | 移動テーブル装置 |
| ATE123885T1 (de) * | 1990-05-02 | 1995-06-15 | Fraunhofer Ges Forschung | Belichtungsvorrichtung. |
| JP2752248B2 (ja) * | 1990-11-30 | 1998-05-18 | シャープ株式会社 | リニアモータ装置 |
| NL9100202A (nl) | 1991-02-05 | 1992-09-01 | Asm Lithography Bv | Lithografische inrichting met een hangende objecttafel. |
| NL9100407A (nl) * | 1991-03-07 | 1992-10-01 | Philips Nv | Optisch lithografische inrichting met een krachtgecompenseerd machinegestel. |
| US5301013A (en) * | 1991-07-30 | 1994-04-05 | U.S. Philips Corporation | Positioning device having two manipulators operating in parallel, and optical lithographic device provided with such a positioning device |
| JP2714502B2 (ja) * | 1991-09-18 | 1998-02-16 | キヤノン株式会社 | 移動ステージ装置 |
| US5229872A (en) * | 1992-01-21 | 1993-07-20 | Hughes Aircraft Company | Exposure device including an electrically aligned electronic mask for micropatterning |
| DE69322983T2 (de) | 1992-02-21 | 1999-07-15 | Canon K.K., Tokio/Tokyo | System zum Steuern von Trägerplatten |
| US5477304A (en) * | 1992-10-22 | 1995-12-19 | Nikon Corporation | Projection exposure apparatus |
| JP3277581B2 (ja) * | 1993-02-01 | 2002-04-22 | 株式会社ニコン | ステージ装置および露光装置 |
| US5537186A (en) * | 1993-08-03 | 1996-07-16 | Canon Kabushiki Kaisha | Movable stage mechanism and exposure apparatus using the same |
| JP3073879B2 (ja) * | 1994-03-25 | 2000-08-07 | キヤノン株式会社 | 除振装置 |
| US5874820A (en) * | 1995-04-04 | 1999-02-23 | Nikon Corporation | Window frame-guided stage mechanism |
| US5528118A (en) * | 1994-04-01 | 1996-06-18 | Nikon Precision, Inc. | Guideless stage with isolated reaction stage |
| US5715064A (en) * | 1994-06-17 | 1998-02-03 | International Business Machines Corporation | Step and repeat apparatus having enhanced accuracy and increased throughput |
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| JP3800616B2 (ja) * | 1994-06-27 | 2006-07-26 | 株式会社ニコン | 目標物移動装置、位置決め装置及び可動ステージ装置 |
| US5826129A (en) * | 1994-06-30 | 1998-10-20 | Tokyo Electron Limited | Substrate processing system |
| US5623853A (en) * | 1994-10-19 | 1997-04-29 | Nikon Precision Inc. | Precision motion stage with single guide beam and follower stage |
| US5763966A (en) * | 1995-03-15 | 1998-06-09 | Hinds; Walter E. | Single plane motor system generating orthogonal movement |
| JP3506158B2 (ja) | 1995-04-14 | 2004-03-15 | 株式会社ニコン | 露光装置及び走査型露光装置、並びに走査露光方法 |
| TW316874B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1995-05-30 | 1997-10-01 | Philips Electronics Nv | |
| US5750897A (en) * | 1995-06-14 | 1998-05-12 | Canon Kabushiki Kaisha | Active anti-vibration apparatus and method of manufacturing the same |
| WO1997033205A1 (en) | 1996-03-06 | 1997-09-12 | Philips Electronics N.V. | Differential interferometer system and lithographic step-and-scan apparatus provided with such a system |
| JP3571471B2 (ja) * | 1996-09-03 | 2004-09-29 | 東京エレクトロン株式会社 | 処理方法,塗布現像処理システム及び処理システム |
| JP3548353B2 (ja) * | 1996-10-15 | 2004-07-28 | キヤノン株式会社 | ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法 |
| DE69735016T2 (de) | 1996-12-24 | 2006-08-17 | Asml Netherlands B.V. | Lithographisches Gerät mit zwei Objekthaltern |
| US5815246A (en) | 1996-12-24 | 1998-09-29 | U.S. Philips Corporation | Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device |
| US6170622B1 (en) * | 1997-03-07 | 2001-01-09 | Canon Kabushiki Kaisha | Anti-vibration apparatus and anti-vibration method thereof |
| JP3626504B2 (ja) * | 1997-03-10 | 2005-03-09 | アーエスエム リソグラフィ ベスローテン フェンノートシャップ | 2個の物品ホルダを有する位置決め装置 |
| US5981118A (en) * | 1997-04-11 | 1999-11-09 | Fujitsu Ltd. | Method for charged particle beam exposure with fixed barycenter through balancing stage scan |
| US6028376A (en) * | 1997-04-22 | 2000-02-22 | Canon Kabushiki Kaisha | Positioning apparatus and exposure apparatus using the same |
| US6408045B1 (en) * | 1997-11-11 | 2002-06-18 | Canon Kabushiki Kaisha | Stage system and exposure apparatus with the same |
| US5959427A (en) * | 1998-03-04 | 1999-09-28 | Nikon Corporation | Method and apparatus for compensating for reaction forces in a stage assembly |
| JP4109747B2 (ja) * | 1998-05-07 | 2008-07-02 | キヤノン株式会社 | アクティブ除振装置および露光装置 |
| TWI242113B (en) * | 1998-07-17 | 2005-10-21 | Asml Netherlands Bv | Positioning device and lithographic projection apparatus comprising such a device |
| US6252234B1 (en) * | 1998-08-14 | 2001-06-26 | Nikon Corporation | Reaction force isolation system for a planar motor |
| US6286655B1 (en) * | 1999-04-29 | 2001-09-11 | Advanced Sorting Technologies, Llc | Inclined conveyor |
| WO2001027978A1 (fr) * | 1999-10-07 | 2001-04-19 | Nikon Corporation | Substrat, dispositif a etage, procede d'attaque d'etage, systeme d'exposition et procede d'exposition |
| TWI264617B (en) * | 1999-12-21 | 2006-10-21 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
| TW546551B (en) * | 1999-12-21 | 2003-08-11 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
| US6281655B1 (en) * | 1999-12-23 | 2001-08-28 | Nikon Corporation | High performance stage assembly |
-
2000
- 2000-12-12 TW TW089126470A patent/TW546551B/zh not_active IP Right Cessation
- 2000-12-19 US US09/739,098 patent/US6449030B1/en not_active Expired - Lifetime
- 2000-12-19 JP JP2000404376A patent/JP4279449B2/ja not_active Expired - Fee Related
- 2000-12-19 DE DE60033773T patent/DE60033773T2/de not_active Expired - Fee Related
- 2000-12-19 KR KR1020000078676A patent/KR100570252B1/ko not_active Expired - Fee Related
-
2002
- 2002-08-02 US US10/209,926 patent/US6671036B2/en not_active Expired - Lifetime
-
2003
- 2003-08-28 US US10/649,608 patent/US6924882B2/en not_active Expired - Lifetime
-
2005
- 2005-05-27 JP JP2005155600A patent/JP4490875B2/ja not_active Expired - Lifetime
-
2008
- 2008-12-17 JP JP2008321432A patent/JP4621765B2/ja not_active Expired - Fee Related
- 2008-12-17 JP JP2008321451A patent/JP4914885B2/ja not_active Expired - Fee Related
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