ITMI922707A0 - Struttura periferica di una piastrina come un dispositivo a semiconduttore e suo procedimento di fabbricazione - Google Patents

Struttura periferica di una piastrina come un dispositivo a semiconduttore e suo procedimento di fabbricazione

Info

Publication number
ITMI922707A0
ITMI922707A0 IT92MI2707A ITMI922707A ITMI922707A0 IT MI922707 A0 ITMI922707 A0 IT MI922707A0 IT 92MI2707 A IT92MI2707 A IT 92MI2707A IT MI922707 A ITMI922707 A IT MI922707A IT MI922707 A0 ITMI922707 A0 IT MI922707A0
Authority
IT
Italy
Prior art keywords
die
semiconductor device
manufacturing procedure
peripheral structure
peripheral
Prior art date
Application number
IT92MI2707A
Other languages
English (en)
Inventor
Masanobu Iwasaki
Katsuniro Tsukamoto
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of ITMI922707A0 publication Critical patent/ITMI922707A0/it
Publication of ITMI922707A1 publication Critical patent/ITMI922707A1/it
Application granted granted Critical
Publication of IT1255960B publication Critical patent/IT1255960B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/74—Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
    • H01L21/743—Making of internal connections, substrate contacts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/562—Protection against mechanical damage
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/585—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries comprising conductive layers or plates or strips or rods or rings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54426—Marks applied to semiconductor devices or parts for alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
    • H01L2223/5446—Located in scribe lines
ITMI922707A 1991-11-27 1992-11-26 Struttura periferica di una piastrina come un dispositivo a semiconduttore e suo procedimento di fabbricazione IT1255960B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3312257A JP2890380B2 (ja) 1991-11-27 1991-11-27 半導体装置およびその製造方法

Publications (3)

Publication Number Publication Date
ITMI922707A0 true ITMI922707A0 (it) 1992-11-26
ITMI922707A1 ITMI922707A1 (it) 1994-05-26
IT1255960B IT1255960B (it) 1995-11-17

Family

ID=18027064

Family Applications (1)

Application Number Title Priority Date Filing Date
ITMI922707A IT1255960B (it) 1991-11-27 1992-11-26 Struttura periferica di una piastrina come un dispositivo a semiconduttore e suo procedimento di fabbricazione

Country Status (6)

Country Link
US (2) US5945716A (it)
JP (1) JP2890380B2 (it)
KR (1) KR960016772B1 (it)
DE (1) DE4239457C2 (it)
IT (1) IT1255960B (it)
TW (1) TW222711B (it)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07176688A (ja) * 1993-12-20 1995-07-14 Mitsubishi Electric Corp 半導体集積回路
US6184118B1 (en) * 1998-03-02 2001-02-06 United Microelectronics Corp. Method for preventing the peeling of the tungsten metal after the metal-etching process
JPH11340167A (ja) 1998-05-22 1999-12-10 Mitsubishi Electric Corp 半導体装置及びその製造方法
JP2000269293A (ja) * 1999-03-18 2000-09-29 Fujitsu Ltd 半導体装置
JP3548061B2 (ja) * 1999-10-13 2004-07-28 三洋電機株式会社 半導体装置の製造方法
US6610592B1 (en) * 2000-04-24 2003-08-26 Taiwan Semiconductor Manufacturing Company Method for integrating low-K materials in semiconductor fabrication
US6630746B1 (en) * 2000-05-09 2003-10-07 Motorola, Inc. Semiconductor device and method of making the same
JP2003197854A (ja) * 2001-12-26 2003-07-11 Nec Electronics Corp 両面接続型半導体装置、多段積層型半導体装置、その製造方法および該半導体装置を搭載した電子部品
JP4434606B2 (ja) 2003-03-27 2010-03-17 株式会社東芝 半導体装置、半導体装置の製造方法
JP2005109145A (ja) 2003-09-30 2005-04-21 Toshiba Corp 半導体装置
FR2893182B1 (fr) * 2005-11-10 2007-12-28 Atmel Grenoble Soc Par Actions Procede de decoupe de puces de circuit-integre sur substrat aminci
ITTO20100332A1 (it) * 2010-04-21 2011-10-22 St Microelectronics Srl Procedimento per la fabbricazione di piastrine semiconduttrici e piastrina semiconduttrice con trincea di protezione
JP2017028056A (ja) * 2015-07-21 2017-02-02 トヨタ自動車株式会社 半導体装置の製造方法
US10109599B2 (en) * 2016-12-21 2018-10-23 Globalfoundries Inc. Integrated circuit structure with continuous metal crack stop
KR102542621B1 (ko) * 2018-08-17 2023-06-15 삼성전자주식회사 반도체 장치
JP7443097B2 (ja) * 2020-03-09 2024-03-05 キオクシア株式会社 半導体ウェハおよび半導体チップ

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4392150A (en) * 1980-10-27 1983-07-05 National Semiconductor Corporation MOS Integrated circuit having refractory metal or metal silicide interconnect layer
JPS5776860A (en) * 1980-10-31 1982-05-14 Toshiba Corp Semiconductor device and its manufacture
US5045916A (en) * 1985-01-22 1991-09-03 Fairchild Semiconductor Corporation Extended silicide and external contact technology
US4745081A (en) * 1985-10-31 1988-05-17 International Business Machines Corporation Method of trench filling
JPS63127551A (ja) * 1986-11-17 1988-05-31 Toshiba Corp 半導体装置の製造方法
US4977439A (en) * 1987-04-03 1990-12-11 Esquivel Agerico L Buried multilevel interconnect system
US4879257A (en) * 1987-11-18 1989-11-07 Lsi Logic Corporation Planarization process
JPH01186655A (ja) * 1988-01-14 1989-07-26 Fujitsu Ltd 半導体集積回路
JP2769331B2 (ja) * 1988-09-12 1998-06-25 株式会社日立製作所 半導体集積回路の製造方法
JPH02188942A (ja) * 1989-01-17 1990-07-25 Fujitsu Ltd 多層配線構造を備えた半導体装置の製造方法
JP2737979B2 (ja) * 1989-02-10 1998-04-08 三菱電機株式会社 半導体装置
JPH0750700B2 (ja) * 1989-06-27 1995-05-31 三菱電機株式会社 半導体チップの製造方法
US4987099A (en) * 1989-12-29 1991-01-22 North American Philips Corp. Method for selectively filling contacts or vias or various depths with CVD tungsten

Also Published As

Publication number Publication date
IT1255960B (it) 1995-11-17
JP2890380B2 (ja) 1999-05-10
US5945716A (en) 1999-08-31
ITMI922707A1 (it) 1994-05-26
KR930011167A (ko) 1993-06-23
KR960016772B1 (ko) 1996-12-20
DE4239457A1 (en) 1993-06-03
US6211070B1 (en) 2001-04-03
DE4239457C2 (de) 1995-04-06
TW222711B (it) 1994-04-21
JPH05152433A (ja) 1993-06-18

Similar Documents

Publication Publication Date Title
ITMI921651A0 (it) Dispositivo a semiconduttore e suo metodo di fabbricazione
ITMI922707A0 (it) Struttura periferica di una piastrina come un dispositivo a semiconduttore e suo procedimento di fabbricazione
IT1248860B (it) Dispositivo a semiconduttore e suo metodo di fabbricazione
ITMI920845A1 (it) Struttura di interconnessione di un dispositivo a circuito integrato a semicondutture e suo prcedimento di fabbricazione
DE69210942D1 (de) Halbleiterherstellung
ITMI912260A0 (it) Struttura di interconnessione di un dispositivo a circuito integrato a semiconduttore e procedimento per la fabbricazione di essa
ITMI922403A1 (it) Dispositivo a semiconduttore e procedimento per la sua fabbricazione
IT1282087B1 (it) Dispositivo di memoria a semiconduttore e metodo per fabbricare il medesimo
DE69430511T2 (de) Halbleiteranordnung und Herstellungverfahren
KR910008793A (ko) 반도체장치 및 그 제조방법
ITMI921873A0 (it) Dispositivo semiconduttore e metodo per fabbicarlo
DE69208937D1 (de) Halbleiter-Herstellungseinrichtung
KR900010954A (ko) Cmos반도체장치의 제조방법
ITMI911174A0 (it) Dispositivo di memoria a semiconduttori avente una pluralita' di regioni di well(pozzo) di conduttivita' diversa e procedimento per la sua fabbricazione
ITMI941237A0 (it) Disposizione a semiconduttori e procedimento di fabbricazione
KR960012451A (ko) 반도체 장치 및 리드프레임
ITMI921562A0 (it) Wafer semiconduttore e suo procedimento di fabricazione
IT9021853A0 (it) Dispositivo di memoria a semiconduttore altamente integrato e suo metodo di fabbricazione
ITMI921295A0 (it) Dispositivo di memoria a semiconduttore e procedimento per la sua fabbricazione
KR900015301A (ko) 반도체장치 및 그 제조방법
ITMI923001A0 (it) Dispositivo di memoria a semiconduttore e suo metodo di funzionamento
ITMI911148A1 (it) Struttura di contatto interstrato di un dispositivo a semiconduttore e suo metodo di fabbricazione
KR900015277A (ko) 반도체장치 및 그 제조방법
KR900019242A (ko) 반도체장치 및 그 제조방법
KR900015310A (ko) 반도체장치와 그 제조방법

Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19971129