HK1147781A1 - Optical thin film deposition device and optical thin film fabrication method - Google Patents
Optical thin film deposition device and optical thin film fabrication methodInfo
- Publication number
- HK1147781A1 HK1147781A1 HK11101970.9A HK11101970A HK1147781A1 HK 1147781 A1 HK1147781 A1 HK 1147781A1 HK 11101970 A HK11101970 A HK 11101970A HK 1147781 A1 HK1147781 A1 HK 1147781A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- thin film
- optical thin
- fabrication method
- deposition device
- film deposition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/225—Oblique incidence of vaporised material on substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/004—Charge control of objects or beams
- H01J2237/0041—Neutralising arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3132—Evaporating
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2008/064647 WO2010018639A1 (ja) | 2008-08-15 | 2008-08-15 | 蒸着装置及び薄膜デバイスの製造方法 |
PCT/JP2009/064403 WO2010018876A1 (ja) | 2008-08-15 | 2009-08-17 | 光学薄膜蒸着装置及び光学薄膜の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1147781A1 true HK1147781A1 (en) | 2011-08-19 |
Family
ID=41668793
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK11101970.9A HK1147781A1 (en) | 2008-08-15 | 2011-02-28 | Optical thin film deposition device and optical thin film fabrication method |
Country Status (8)
Country | Link |
---|---|
US (2) | US8826856B2 (zh) |
EP (1) | EP2319951B1 (zh) |
JP (2) | JPWO2010018639A1 (zh) |
KR (1) | KR100984221B1 (zh) |
CN (1) | CN101861408B (zh) |
HK (1) | HK1147781A1 (zh) |
TW (1) | TW201006943A (zh) |
WO (2) | WO2010018639A1 (zh) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2010018639A1 (ja) * | 2008-08-15 | 2012-01-26 | 株式会社シンクロン | 蒸着装置及び薄膜デバイスの製造方法 |
CN102084025B (zh) * | 2008-09-05 | 2013-12-04 | 新柯隆株式会社 | 成膜方法以及防油性基材 |
KR102407182B1 (ko) * | 2011-05-31 | 2022-06-10 | 클라렌슈 피티와이 리미티드 | 광선 요법 장치 |
JPWO2013042247A1 (ja) * | 2011-09-22 | 2015-03-26 | 株式会社シンクロン | 薄膜形成装置 |
WO2013042247A1 (ja) * | 2011-09-22 | 2013-03-28 | 株式会社シンクロン | 薄膜形成装置 |
CN103014617B (zh) | 2011-09-22 | 2014-05-14 | 株式会社新柯隆 | 薄膜形成装置 |
JP5769857B2 (ja) * | 2011-09-30 | 2015-08-26 | 株式会社シンクロン | 成膜方法及び成膜装置 |
WO2013046440A1 (ja) * | 2011-09-30 | 2013-04-04 | 株式会社シンクロン | 成膜方法及び成膜装置 |
JP5638147B2 (ja) * | 2011-09-30 | 2014-12-10 | 株式会社シンクロン | 成膜方法及び成膜装置 |
WO2013047605A1 (ja) * | 2011-09-30 | 2013-04-04 | 株式会社シンクロン | 成膜方法及び成膜装置 |
CN103668075B (zh) * | 2012-09-05 | 2015-11-11 | 财团法人工业技术研究院 | 具有弧形载盘的旋转定位装置、自动取放系统及其操作方法 |
US9373534B2 (en) | 2012-09-05 | 2016-06-21 | Industrial Technology Research Institute | Rotary positioning apparatus with dome carrier, automatic pick-and-place system, and operating method thereof |
US10007039B2 (en) | 2012-09-26 | 2018-06-26 | 8797625 Canada Inc. | Multilayer optical interference filter |
CN105143500B (zh) * | 2012-10-04 | 2017-10-10 | 康宁股份有限公司 | 光学涂覆方法、设备和产品 |
JP6219594B2 (ja) * | 2013-05-15 | 2017-10-25 | Hoya株式会社 | 薄膜形成装置、及び薄膜形成方法 |
KR20150031819A (ko) | 2013-09-17 | 2015-03-25 | 삼성디스플레이 주식회사 | 박막 증착방법 및 그를 이용한 유기전계발광 표시장치의 제조방법 |
WO2016003400A1 (en) * | 2014-06-30 | 2016-01-07 | Halliburton Energy Services, Inc. | System and method for deposition of integrated computational elements (ice) using a translation stage |
MX2016015360A (es) | 2014-06-30 | 2017-03-03 | Halliburton Energy Services Inc | Deposicion de elementos informaticos integrados (ice) mediante una etapa de traslacion. |
DE102016201564A1 (de) | 2016-02-02 | 2017-08-03 | Carl Zeiss Smt Gmbh | Verfahren zur Herstellung eines reflektiven optischen Elements und reflektives optisches Element |
EP3366804B1 (en) * | 2017-02-22 | 2022-05-11 | Satisloh AG | Box coating apparatus for vacuum coating of substrates, in particular spectacle lenses |
EP3715499A1 (en) * | 2019-03-29 | 2020-09-30 | Picosun Oy | Substrate coating |
CN110172669A (zh) * | 2019-06-28 | 2019-08-27 | 信利光电股份有限公司 | 一种氧化物膜层的制备方法 |
CN113621929B (zh) * | 2020-05-08 | 2023-04-11 | 武汉光谷创元电子有限公司 | 微波器件的制造设备和制造方法 |
KR102430708B1 (ko) * | 2021-07-19 | 2022-08-10 | (주)코미코 | 대면적 코팅을 위한 박막 스트레스 제어 기반 코팅 방법 및 이를 이용한 코팅 구조물 |
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GB1280012A (en) * | 1969-02-05 | 1972-07-05 | Atomic Energy Authority Uk | Improvements in or relating to ion beam sources |
US3858547A (en) * | 1973-12-14 | 1975-01-07 | Nils H Bergfelt | Coating machine having an adjustable rotation system |
CH650028A5 (de) * | 1980-09-26 | 1985-06-28 | Balzers Hochvakuum | Anordnung zum gleichfoermigen beschichten von rotationsflaechen durch bedampfen im hochvakuum. |
CH652754A5 (de) * | 1981-03-13 | 1985-11-29 | Balzers Hochvakuum | Anordnung zum beschichten von substraten in einer vakuumbeschichtungsanlage. |
DE3775459D1 (de) * | 1986-04-28 | 1992-02-06 | Nissin Electric Co Ltd | Verfahren zur herstellung einer diamantenschicht. |
JP2817164B2 (ja) * | 1989-02-08 | 1998-10-27 | ミノルタ株式会社 | 電子写真用感光体 |
JPH1088325A (ja) * | 1996-09-09 | 1998-04-07 | Nissin Electric Co Ltd | 薄膜形成装置 |
DE69730591T3 (de) * | 1996-10-23 | 2015-05-21 | Fujikura Ltd. | Verfahren zur herstellung von polykristallinem dünnen film, verfahren zur herstellung von oxidsupraleitern und vorrichtung dafür |
US6153061A (en) * | 1998-03-02 | 2000-11-28 | Auburn University | Method of synthesizing cubic boron nitride films |
DE19822064A1 (de) * | 1998-05-16 | 1999-11-18 | Leybold Ag | Vorrichtung zum Halten von Linsen, insbesondere für in einer Vakuum-Aufdampfanlage oder Sputteranlage zu beschichtender Brillengläser |
JP3838796B2 (ja) * | 1998-10-23 | 2006-10-25 | 株式会社荏原製作所 | 摺動部材用硬質膜 |
US6236163B1 (en) * | 1999-10-18 | 2001-05-22 | Yuri Maishev | Multiple-beam ion-beam assembly |
US6777699B1 (en) * | 2002-03-25 | 2004-08-17 | George H. Miley | Methods, apparatus, and systems involving ion beam generation |
US20030234371A1 (en) * | 2002-06-19 | 2003-12-25 | Ziegler Byron J. | Device for generating reactive ions |
JP2004053720A (ja) * | 2002-07-17 | 2004-02-19 | Matsushita Electric Works Ltd | 赤外線透過フィルターの製造方法 |
US6899928B1 (en) * | 2002-07-29 | 2005-05-31 | The Regents Of The University Of California | Dual ion beam assisted deposition of biaxially textured template layers |
JP2004131783A (ja) * | 2002-10-09 | 2004-04-30 | Furukawa Electric Co Ltd:The | 成膜装置、成膜方法および光学素子の製造方法 |
CN100489149C (zh) * | 2003-06-03 | 2009-05-20 | 株式会社新柯隆 | 薄膜的形成方法及其形成装置 |
DE10324928A1 (de) * | 2003-06-03 | 2005-07-14 | Leybold Optics Gmbh | Vakuumbeschichtungsanlage |
US7531205B2 (en) * | 2003-06-23 | 2009-05-12 | Superpower, Inc. | High throughput ion beam assisted deposition (IBAD) |
US7718574B2 (en) * | 2004-04-08 | 2010-05-18 | Superpower, Inc. | Biaxially-textured film deposition for superconductor coated tapes |
JP2006045632A (ja) | 2004-08-05 | 2006-02-16 | Shincron:Kk | 蒸着装置 |
JP2006091600A (ja) * | 2004-09-27 | 2006-04-06 | Konica Minolta Opto Inc | レンズへの膜形成方法及び装置 |
KR100497623B1 (ko) * | 2004-12-21 | 2005-07-01 | (주)브이씨티 | 램프히터의 근적외선 투과용 다층 박막 증착 시스템 및 그 방법 |
JP4873455B2 (ja) * | 2006-03-16 | 2012-02-08 | 株式会社シンクロン | 光学薄膜形成方法および装置 |
JP4757689B2 (ja) * | 2006-03-31 | 2011-08-24 | 株式会社昭和真空 | 成膜装置及び成膜方法 |
JP4642789B2 (ja) * | 2006-07-14 | 2011-03-02 | セイコーエプソン株式会社 | 成膜装置及び成膜方法 |
JPWO2010018639A1 (ja) * | 2008-08-15 | 2012-01-26 | 株式会社シンクロン | 蒸着装置及び薄膜デバイスの製造方法 |
-
2008
- 2008-08-15 JP JP2008541521A patent/JPWO2010018639A1/ja active Pending
- 2008-08-15 WO PCT/JP2008/064647 patent/WO2010018639A1/ja active Application Filing
-
2009
- 2009-08-17 JP JP2009552944A patent/JP4540746B2/ja active Active
- 2009-08-17 WO PCT/JP2009/064403 patent/WO2010018876A1/ja active Application Filing
- 2009-08-17 CN CN2009801009918A patent/CN101861408B/zh active Active
- 2009-08-17 EP EP09806764A patent/EP2319951B1/en active Active
- 2009-08-17 KR KR1020107010439A patent/KR100984221B1/ko active IP Right Grant
- 2009-08-17 TW TW098127558A patent/TW201006943A/zh unknown
- 2009-08-17 US US13/058,557 patent/US8826856B2/en not_active Expired - Fee Related
-
2011
- 2011-02-28 HK HK11101970.9A patent/HK1147781A1/xx not_active IP Right Cessation
- 2011-07-08 US US13/179,004 patent/US20110262656A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP2319951A4 (en) | 2011-08-03 |
EP2319951A1 (en) | 2011-05-11 |
US20110151135A1 (en) | 2011-06-23 |
US8826856B2 (en) | 2014-09-09 |
JP4540746B2 (ja) | 2010-09-08 |
TWI332994B (zh) | 2010-11-11 |
US20110262656A1 (en) | 2011-10-27 |
JPWO2010018639A1 (ja) | 2012-01-26 |
KR100984221B1 (ko) | 2010-09-28 |
JPWO2010018876A1 (ja) | 2012-01-26 |
KR20100084655A (ko) | 2010-07-27 |
EP2319951B1 (en) | 2013-03-13 |
WO2010018639A1 (ja) | 2010-02-18 |
TW201006943A (en) | 2010-02-16 |
CN101861408A (zh) | 2010-10-13 |
WO2010018876A1 (ja) | 2010-02-18 |
CN101861408B (zh) | 2011-09-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20180817 |