HK1101451A1 - Bipolar electrostatic chuck - Google Patents

Bipolar electrostatic chuck

Info

Publication number
HK1101451A1
HK1101451A1 HK07106111.4A HK07106111A HK1101451A1 HK 1101451 A1 HK1101451 A1 HK 1101451A1 HK 07106111 A HK07106111 A HK 07106111A HK 1101451 A1 HK1101451 A1 HK 1101451A1
Authority
HK
Hong Kong
Prior art keywords
electrostatic chuck
bipolar electrostatic
bipolar
chuck
electrostatic
Prior art date
Application number
HK07106111.4A
Other languages
English (en)
Inventor
Hiroshi Fujisawa
Kinya Miyashita
Original Assignee
Creative Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Creative Tech Corp filed Critical Creative Tech Corp
Publication of HK1101451A1 publication Critical patent/HK1101451A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Jigs For Machine Tools (AREA)
HK07106111.4A 2004-03-19 2007-06-07 Bipolar electrostatic chuck HK1101451A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004081432 2004-03-19
JP2004191280 2004-06-29
PCT/JP2005/004557 WO2005091356A1 (fr) 2004-03-19 2005-03-15 Mandrin electrostatique bipolaire

Publications (1)

Publication Number Publication Date
HK1101451A1 true HK1101451A1 (en) 2007-10-18

Family

ID=34993968

Family Applications (1)

Application Number Title Priority Date Filing Date
HK07106111.4A HK1101451A1 (en) 2004-03-19 2007-06-07 Bipolar electrostatic chuck

Country Status (8)

Country Link
US (2) US20070223173A1 (fr)
JP (1) JP4684222B2 (fr)
KR (1) KR101212246B1 (fr)
DE (1) DE112005000621B4 (fr)
HK (1) HK1101451A1 (fr)
MY (1) MY138415A (fr)
TW (1) TWI370509B (fr)
WO (1) WO2005091356A1 (fr)

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CN107636820B (zh) * 2015-06-04 2022-01-07 应用材料公司 透明静电载具
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CN111670491A (zh) 2018-01-31 2020-09-15 朗姆研究公司 静电卡盘(esc)基座电压隔离
KR20190106119A (ko) * 2018-03-07 2019-09-18 어플라이드 머티어리얼스, 인코포레이티드 부분적으로 전극이 형성된 바이폴라 정전척
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Also Published As

Publication number Publication date
JPWO2005091356A1 (ja) 2008-02-07
US8238072B2 (en) 2012-08-07
JP4684222B2 (ja) 2011-05-18
KR101212246B1 (ko) 2012-12-12
DE112005000621B4 (de) 2019-01-31
DE112005000621T5 (de) 2007-02-08
US20070223173A1 (en) 2007-09-27
WO2005091356A1 (fr) 2005-09-29
MY138415A (en) 2009-06-30
TWI370509B (en) 2012-08-11
KR20070008640A (ko) 2007-01-17
US20100149720A1 (en) 2010-06-17
TW200605260A (en) 2006-02-01

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20160315