FR2886934B1 - Lingots de verre de quartz a formation libre et procede de fabrication de ceux-ci - Google Patents

Lingots de verre de quartz a formation libre et procede de fabrication de ceux-ci

Info

Publication number
FR2886934B1
FR2886934B1 FR0604995A FR0604995A FR2886934B1 FR 2886934 B1 FR2886934 B1 FR 2886934B1 FR 0604995 A FR0604995 A FR 0604995A FR 0604995 A FR0604995 A FR 0604995A FR 2886934 B1 FR2886934 B1 FR 2886934B1
Authority
FR
France
Prior art keywords
manufacturing
same
quartz glass
free formation
glass ingots
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR0604995A
Other languages
English (en)
Other versions
FR2886934A1 (fr
Inventor
Michael Peter Winnen
Todd R Springer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of FR2886934A1 publication Critical patent/FR2886934A1/fr
Application granted granted Critical
Publication of FR2886934B1 publication Critical patent/FR2886934B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26B—HAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B29/00—Guards or sheaths or guides for hand cutting tools; Arrangements for guiding hand cutting tools
    • B26B29/06—Arrangements for guiding hand cutting tools
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/02—Other methods of shaping glass by casting molten glass, e.g. injection moulding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26B—HAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B11/00—Hand knives combined with other implements, e.g. with corkscrew, with scissors, with writing implement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26B—HAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B3/00—Hand knives with fixed blades
    • B26B3/08—Hand knives with fixed blades specially adapted for cutting cardboard, or wall, floor, or like covering materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • C03C10/0009—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing silica as main constituent
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C03B2201/04—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C03B2201/075—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Forests & Forestry (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
FR0604995A 2005-06-10 2006-06-06 Lingots de verre de quartz a formation libre et procede de fabrication de ceux-ci Active FR2886934B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US68950705P 2005-06-10 2005-06-10
US11/266,638 US20060281623A1 (en) 2005-06-10 2005-11-03 Free-formed quartz glass ingots and method for making the same

Publications (2)

Publication Number Publication Date
FR2886934A1 FR2886934A1 (fr) 2006-12-15
FR2886934B1 true FR2886934B1 (fr) 2015-04-24

Family

ID=37440122

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0604995A Active FR2886934B1 (fr) 2005-06-10 2006-06-06 Lingots de verre de quartz a formation libre et procede de fabrication de ceux-ci

Country Status (7)

Country Link
US (2) US20060281623A1 (fr)
JP (1) JP5068015B2 (fr)
KR (1) KR101287275B1 (fr)
DE (1) DE102005057194B4 (fr)
FR (1) FR2886934B1 (fr)
NL (1) NL1031227C2 (fr)
TW (1) TWI419849B (fr)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060281623A1 (en) 2005-06-10 2006-12-14 General Electric Company Free-formed quartz glass ingots and method for making the same
US8524319B2 (en) 2011-11-18 2013-09-03 Memc Electronic Materials, Inc. Methods for producing crucibles with a reduced amount of bubbles
US8857214B2 (en) * 2011-11-18 2014-10-14 Sunedison Semiconductor Limited Methods for producing crucibles with a reduced amount of bubbles
CN103224326B (zh) * 2013-04-14 2015-03-11 久智光电子材料科技有限公司 一种用于制备低水峰大直径光纤预制棒套管的制备方法
JP6208576B2 (ja) * 2013-12-24 2017-10-04 信越石英株式会社 成型用型及び石英ガラスインゴットの成型方法
KR101690988B1 (ko) 2014-11-18 2016-12-29 한국세라믹기술원 석영 유리 잉곳의 사이즈-업 방법
KR101806791B1 (ko) 2015-09-03 2017-12-08 한국세라믹기술원 대면적 석영 유리 잉곳의 제조방법
CN108698883A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 石英玻璃制备中的二氧化硅的喷雾造粒
US11952303B2 (en) 2015-12-18 2024-04-09 Heraeus Quarzglas Gmbh & Co. Kg Increase in silicon content in the preparation of quartz glass
CN109153593A (zh) 2015-12-18 2019-01-04 贺利氏石英玻璃有限两合公司 合成石英玻璃粉粒的制备
TW201731782A (zh) 2015-12-18 2017-09-16 何瑞斯廓格拉斯公司 在多腔式爐中製備石英玻璃體
EP3390290B1 (fr) 2015-12-18 2023-03-15 Heraeus Quarzglas GmbH & Co. KG Fabrication d'un corps en verre de quartz opaque
TWI794150B (zh) 2015-12-18 2023-03-01 德商何瑞斯廓格拉斯公司 自二氧化矽顆粒製備石英玻璃體
CN108698887B (zh) 2015-12-18 2022-01-21 贺利氏石英玻璃有限两合公司 由均质石英玻璃制得的玻璃纤维和预成形品
TWI812586B (zh) 2015-12-18 2023-08-21 德商何瑞斯廓格拉斯公司 石英玻璃體、其製備方法與應用、及用於控制烘箱出口處之露點
KR20180095616A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 용융 가열로에서 이슬점 조절을 이용한 실리카 유리체의 제조
JP7044454B2 (ja) 2015-12-18 2022-03-30 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 石英ガラス調製時の中間体としての炭素ドープ二酸化ケイ素造粒体の調製
CN107487985B (zh) * 2017-08-30 2023-06-09 嘉善冠得光学玻璃有限公司 光学玻璃材料浇铸车
CN109437551B (zh) * 2018-12-12 2020-12-15 长飞光纤光缆股份有限公司 一种利用尾料制备高纯石英材料的方法
KR102132252B1 (ko) 2019-03-07 2020-07-09 비씨엔씨 주식회사 쿼츠 재가공 방법
KR102566720B1 (ko) 2022-12-23 2023-08-14 비씨엔씨 주식회사 쿼츠 재가공 방법

Family Cites Families (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2038627A (en) * 1935-07-18 1936-04-28 Corning Glass Works Method of making glass
US2382187A (en) * 1942-08-25 1945-08-14 Stevenson Jordan & Harrison In Apparatus for treating glass
US3093456A (en) * 1958-09-02 1963-06-11 Texas Instruments Inc Method for recovery and reuse of quartz containers
US3764286A (en) * 1971-04-22 1973-10-09 Gen Electric Manufacture of elongated fused quartz member
US4122293A (en) * 1977-04-19 1978-10-24 Georgy Mikhailovich Grigorenko Feed system for plasma-arc furnace
JPS5746671Y2 (fr) * 1977-08-11 1982-10-14
US4200621A (en) * 1978-07-18 1980-04-29 Motorola, Inc. Sequential purification and crystal growth
JPS6015566B2 (ja) * 1979-11-05 1985-04-20 昭和電工株式会社 溶融シリカの連続製造装置
DE3226451C2 (de) * 1982-07-15 1984-09-27 Heraeus Quarzschmelze Gmbh, 6450 Hanau Verfahren zur Herstellung von schlierenfreien, blasenfreien und homogenen Quarzglasplatten und Vorrichtung zur Durchführung des Verfahrens
JPH0243720B2 (ja) * 1982-09-10 1990-10-01 Toshiba Ceramics Co Handotaishoryosekieigarasuseiroshinkan
JPS59164644A (ja) 1983-03-11 1984-09-17 Denki Kagaku Kogyo Kk 溶融石英インゴツトの製法
JPS6071593A (ja) * 1983-09-26 1985-04-23 Fujitsu Ltd 結晶成長方法
JPS60141630A (ja) 1983-12-27 1985-07-26 Toshiba Ceramics Co Ltd ガラス管製造装置
DE3581455D1 (de) * 1984-08-30 1991-02-28 Nippon Oxygen Co Ltd Verfahren zur herstellung von glas.
JPS61122131A (ja) 1984-11-14 1986-06-10 Toshiba Ceramics Co Ltd 溶融石英の製造方法及び装置
CA1271316A (fr) * 1984-12-21 1990-07-10 Koichi Abe Fabrication d'un guide d'ondes optiques
JPS643027A (en) * 1987-06-26 1989-01-06 Nkk Corp Production of silicic acid
JP2630613B2 (ja) 1988-02-29 1997-07-16 東芝セラミックス株式会社 円筒状透明石英ガラスインゴットの製造方法
JPH029727A (ja) * 1988-06-28 1990-01-12 Sumitomo Electric Ind Ltd 光フアイバ用母材の製造方法
JPH03153537A (ja) 1989-11-09 1991-07-01 Toshiba Ceramics Co Ltd 石英ガラスインゴットの製造法
US6012304A (en) * 1991-09-30 2000-01-11 Loxley; Ted A. Sintered quartz glass products and methods for making same
JPH05178632A (ja) * 1991-12-26 1993-07-20 Asahi Glass Co Ltd 光学用高耐熱性石英ガラスとその製造方法
DE4204406C2 (de) * 1992-02-14 1995-04-06 Heraeus Quarzglas Verfahren zur Herstellung eines homogenen, schlierenfreien Körpers aus Quarzglas oder aus einem hochkieselsäurehaltigen Glas durch Umformen eines stabförmigen Ausgangskörpers
GB9210327D0 (en) * 1992-05-14 1992-07-01 Tsl Group Plc Heat treatment facility for synthetic vitreous silica bodies
JPH08133753A (ja) * 1994-10-31 1996-05-28 Tosoh Corp 光学用合成石英ガラス及びその製造方法並びにその用途
JPH08290928A (ja) * 1995-04-17 1996-11-05 Tosoh Corp 透明石英ガラス板の製造方法
JP3188624B2 (ja) * 1995-12-27 2001-07-16 信越石英株式会社 遠紫外線用高純度合成シリカガラス及びその製造方法
US5934893A (en) * 1996-01-05 1999-08-10 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Burner and utilization of such burner in glass furnace
DE69739984D1 (de) * 1996-12-09 2010-10-21 Shinetsu Chemical Co Verfahren und Vorrichtung zum Herstellen einer Glasvorform für optische Fasern durch Ziehen einer Vorform
JP2001524920A (ja) * 1997-05-15 2001-12-04 ショット エムエル ゲーエムベーハー 均一でストリークのない石英ガラス板の製造方法および装置
US6143676A (en) * 1997-05-20 2000-11-07 Heraeus Quarzglas Gmbh Synthetic silica glass used with uv-rays and method producing the same
JP2001220157A (ja) * 2000-02-01 2001-08-14 Tosoh Corp 非晶質合成シリカ粉体及びこれを用いたガラス成形体
JP2002037637A (ja) 2000-07-26 2002-02-06 Tosoh Quartz Corp 溶融石英ガラスの製造方法
JP4509342B2 (ja) 2000-09-21 2010-07-21 東ソー・クォーツ株式会社 長尺石英ガラスの製造方法及びその装置
US6502422B1 (en) * 2000-10-27 2003-01-07 General Electric Company Method for quartz crucible fabrication
US6422861B1 (en) * 2000-11-20 2002-07-23 General Electric Company Quartz fusion furnace and method for forming quartz articles
US6534966B2 (en) * 2001-05-10 2003-03-18 Linear Technology Corporation Methods and apparatus for power measuring receiver
JP3498182B2 (ja) * 2001-12-05 2004-02-16 東芝セラミックス株式会社 半導体用シリカガラス部材とその製造方法
DE10159962A1 (de) 2001-12-06 2003-07-03 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben
JP2003292337A (ja) 2002-04-01 2003-10-15 Tosoh Corp プラズマ耐食性石英ガラス、その製造方法及びこれを用いた装置
US7074033B2 (en) * 2003-03-22 2006-07-11 David Lloyd Neary Partially-open fired heater cycle providing high thermal efficiencies and ultra-low emissions
US7155936B2 (en) * 2003-08-08 2007-01-02 Corning Incorporated Doped silica glass articles and methods of forming doped silica glass boules and articles
DE102004017031B4 (de) * 2004-04-02 2008-10-23 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben
US7365037B2 (en) 2004-09-30 2008-04-29 Shin-Etsu Quartz Products Co., Ltd. Quartz glass having excellent resistance against plasma corrosion and method for producing the same
US7589039B2 (en) * 2004-12-29 2009-09-15 Corning Incorporated Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same
US20060281623A1 (en) 2005-06-10 2006-12-14 General Electric Company Free-formed quartz glass ingots and method for making the same
WO2012074934A1 (fr) * 2010-11-30 2012-06-07 Rec Silicon Inc. Système et procédé de fusion et de moulage par de coulée d'une charge d'alimentation

Also Published As

Publication number Publication date
NL1031227A1 (nl) 2006-12-12
US20060281623A1 (en) 2006-12-14
JP2006342041A (ja) 2006-12-21
TWI419849B (zh) 2013-12-21
NL1031227C2 (nl) 2007-03-01
JP5068015B2 (ja) 2012-11-07
DE102005057194A1 (de) 2006-12-14
KR20060128619A (ko) 2006-12-14
US9290404B2 (en) 2016-03-22
FR2886934A1 (fr) 2006-12-15
TW200710048A (en) 2007-03-16
US20140123705A1 (en) 2014-05-08
KR101287275B1 (ko) 2013-07-17
DE102005057194B4 (de) 2020-11-12

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