FR2741624B1 - Photoamorceurs monomoleculaires a base de borates et leurs utilisations en tant qu'amorceurs de polymerisation de composes a insaturation ethylenique - Google Patents
Photoamorceurs monomoleculaires a base de borates et leurs utilisations en tant qu'amorceurs de polymerisation de composes a insaturation ethyleniqueInfo
- Publication number
- FR2741624B1 FR2741624B1 FR9614200A FR9614200A FR2741624B1 FR 2741624 B1 FR2741624 B1 FR 2741624B1 FR 9614200 A FR9614200 A FR 9614200A FR 9614200 A FR9614200 A FR 9614200A FR 2741624 B1 FR2741624 B1 FR 2741624B1
- Authority
- FR
- France
- Prior art keywords
- photoraments
- monorolecular
- borates
- ethylenically unsaturated
- unsaturated compounds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 150000001642 boronic acid derivatives Chemical class 0.000 title 1
- 150000001875 compounds Chemical class 0.000 title 1
- 238000006116 polymerization reaction Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic System
- C07F5/02—Boron compounds
- C07F5/027—Organoboranes and organoborohydrides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/116—Redox or dye sensitizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
- Y10S430/123—Sulfur in heterocyclic ring
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH334495 | 1995-11-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2741624A1 FR2741624A1 (fr) | 1997-05-30 |
FR2741624B1 true FR2741624B1 (fr) | 1998-12-04 |
Family
ID=4253942
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9614200A Expired - Fee Related FR2741624B1 (fr) | 1995-11-24 | 1996-11-21 | Photoamorceurs monomoleculaires a base de borates et leurs utilisations en tant qu'amorceurs de polymerisation de composes a insaturation ethylenique |
Country Status (18)
Country | Link |
---|---|
US (2) | US5932393A (fr) |
JP (1) | JPH09188710A (fr) |
KR (1) | KR970028790A (fr) |
CN (1) | CN1159450A (fr) |
AT (1) | AT406777B (fr) |
AU (1) | AU712075B2 (fr) |
BE (1) | BE1010765A5 (fr) |
BR (1) | BR9605696A (fr) |
CA (1) | CA2191056A1 (fr) |
DE (1) | DE19648256A1 (fr) |
ES (1) | ES2126500B1 (fr) |
FR (1) | FR2741624B1 (fr) |
GB (1) | GB2307472B (fr) |
IT (1) | IT1286499B1 (fr) |
MX (1) | MX9605720A (fr) |
NL (1) | NL1004599C2 (fr) |
SG (1) | SG49990A1 (fr) |
TW (1) | TW467933B (fr) |
Families Citing this family (110)
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JP2000507499A (ja) * | 1996-03-29 | 2000-06-20 | ザ・ダウ・ケミカル・カンパニー | メタロセン用共触媒 |
CA2280098C (fr) * | 1997-02-06 | 2007-01-09 | Showa Denko K.K. | Methode de production d'un compose a base de bore |
JPH11316458A (ja) * | 1998-03-03 | 1999-11-16 | Fuji Photo Film Co Ltd | 感光性組成物 |
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US7056639B2 (en) * | 2001-08-21 | 2006-06-06 | Eastman Kodak Company | Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid |
US6806020B2 (en) * | 2001-08-21 | 2004-10-19 | Kodak Polychrome Graphics Llc | Negative working imageable composition containing sulfonic acid |
JP3969109B2 (ja) * | 2002-02-08 | 2007-09-05 | コニカミノルタホールディングス株式会社 | 感光性平版印刷版及びその記録方法 |
JP2003322968A (ja) * | 2002-05-01 | 2003-11-14 | Fuji Photo Film Co Ltd | 光重合性組成物及びそれを用いた記録材料 |
US20050153239A1 (en) | 2004-01-09 | 2005-07-14 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method using the same |
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US7893130B2 (en) * | 2004-05-13 | 2011-02-22 | Bluestar Silicones France Sas | Photocurable dental composition |
WO2005111717A2 (fr) | 2004-05-19 | 2005-11-24 | Fujifilm Corporation | Méthode d’enregistrement d’image |
US20050263021A1 (en) | 2004-05-31 | 2005-12-01 | Fuji Photo Film Co., Ltd. | Platemaking method for lithographic printing plate precursor and planographic printing method |
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JP5976523B2 (ja) | 2011-12-28 | 2016-08-23 | 富士フイルム株式会社 | 光学部材セット及びこれを用いた固体撮像素子 |
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EP2940090A4 (fr) | 2012-12-28 | 2016-01-06 | Fujifilm Corp | Composition de résine durcissable pour formation de film réfléchissant les rayons infrarouges, film réfléchissant les rayons infrarouges ainsi que procédé de fabrication de celui-ci, filtre bloquant les rayons infrarouges, et élément d'imagerie à semi-conducteurs mettant en uvre ce filtre |
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-
1996
- 1996-11-11 TW TW085113755A patent/TW467933B/zh not_active IP Right Cessation
- 1996-11-15 AU AU71792/96A patent/AU712075B2/en not_active Ceased
- 1996-11-21 DE DE19648256A patent/DE19648256A1/de not_active Withdrawn
- 1996-11-21 MX MX9605720A patent/MX9605720A/es unknown
- 1996-11-21 US US08/755,771 patent/US5932393A/en not_active Expired - Fee Related
- 1996-11-21 FR FR9614200A patent/FR2741624B1/fr not_active Expired - Fee Related
- 1996-11-22 IT IT96MI002437A patent/IT1286499B1/it active IP Right Grant
- 1996-11-22 CA CA002191056A patent/CA2191056A1/fr not_active Abandoned
- 1996-11-22 SG SG1996011378A patent/SG49990A1/en unknown
- 1996-11-22 BE BE9600980A patent/BE1010765A5/fr not_active IP Right Cessation
- 1996-11-22 AT AT0204296A patent/AT406777B/de not_active IP Right Cessation
- 1996-11-22 NL NL1004599A patent/NL1004599C2/nl not_active IP Right Cessation
- 1996-11-22 CN CN96121744A patent/CN1159450A/zh active Pending
- 1996-11-22 ES ES009602465A patent/ES2126500B1/es not_active Expired - Lifetime
- 1996-11-22 GB GB9624328A patent/GB2307472B/en not_active Expired - Fee Related
- 1996-11-23 KR KR1019960056881A patent/KR970028790A/ko not_active Application Discontinuation
- 1996-11-25 JP JP8329222A patent/JPH09188710A/ja active Pending
- 1996-11-25 BR BR9605696A patent/BR9605696A/pt not_active Application Discontinuation
-
1999
- 1999-02-09 US US09/247,147 patent/US6045974A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
NL1004599C2 (nl) | 1998-01-12 |
GB2307472B (en) | 1999-11-17 |
AT406777B (de) | 2000-09-25 |
GB9624328D0 (en) | 1997-01-08 |
ES2126500A1 (es) | 1999-03-16 |
US5932393A (en) | 1999-08-03 |
AU7179296A (en) | 1997-05-29 |
NL1004599A1 (nl) | 1997-05-27 |
US6045974A (en) | 2000-04-04 |
JPH09188710A (ja) | 1997-07-22 |
GB2307472A (en) | 1997-05-28 |
KR970028790A (ko) | 1997-06-24 |
BR9605696A (pt) | 1998-08-18 |
CN1159450A (zh) | 1997-09-17 |
AU712075B2 (en) | 1999-10-28 |
IT1286499B1 (it) | 1998-07-15 |
BE1010765A5 (fr) | 1999-01-05 |
TW467933B (en) | 2001-12-11 |
ATA204296A (de) | 2000-01-15 |
FR2741624A1 (fr) | 1997-05-30 |
MX9605720A (es) | 1997-05-31 |
SG49990A1 (en) | 2001-01-16 |
ITMI962437A1 (it) | 1998-05-22 |
DE19648256A1 (de) | 1997-05-28 |
CA2191056A1 (fr) | 1997-05-25 |
ITMI962437A0 (it) | 1996-11-22 |
ES2126500B1 (es) | 1999-11-16 |
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