FR2477295B1 - Composition resineuse photosensible d'urethane - Google Patents

Composition resineuse photosensible d'urethane

Info

Publication number
FR2477295B1
FR2477295B1 FR8104013A FR8104013A FR2477295B1 FR 2477295 B1 FR2477295 B1 FR 2477295B1 FR 8104013 A FR8104013 A FR 8104013A FR 8104013 A FR8104013 A FR 8104013A FR 2477295 B1 FR2477295 B1 FR 2477295B1
Authority
FR
France
Prior art keywords
resin composition
urethane resin
photosensitive urethane
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8104013A
Other languages
English (en)
Other versions
FR2477295A1 (fr
Inventor
Kiichi Iida
Tadashi Kawamoto
Kazuhito Miyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Publication of FR2477295A1 publication Critical patent/FR2477295A1/fr
Application granted granted Critical
Publication of FR2477295B1 publication Critical patent/FR2477295B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C08F299/065—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes from polyurethanes with side or terminal unsaturations
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/675—Low-molecular-weight compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Polymerisation Methods In General (AREA)
FR8104013A 1980-02-28 1981-02-27 Composition resineuse photosensible d'urethane Expired FR2477295B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2433780A JPS56120718A (en) 1980-02-28 1980-02-28 Improved polyurethane type photosensitive resin composition

Publications (2)

Publication Number Publication Date
FR2477295A1 FR2477295A1 (fr) 1981-09-04
FR2477295B1 true FR2477295B1 (fr) 1987-02-13

Family

ID=12135358

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8104013A Expired FR2477295B1 (fr) 1980-02-28 1981-02-27 Composition resineuse photosensible d'urethane

Country Status (7)

Country Link
US (1) US4358354A (fr)
JP (1) JPS56120718A (fr)
DE (1) DE3107585C3 (fr)
FR (1) FR2477295B1 (fr)
GB (1) GB2070634B (fr)
IT (1) IT1194750B (fr)
NL (1) NL187815C (fr)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4436806A (en) 1981-01-16 1984-03-13 W. R. Grace & Co. Method and apparatus for making printed circuit boards
US4451636A (en) * 1981-01-16 1984-05-29 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4422914A (en) 1981-01-16 1983-12-27 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4481281A (en) * 1981-01-16 1984-11-06 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4442198A (en) * 1981-01-16 1984-04-10 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
GB2109392B (en) * 1981-11-03 1985-06-26 Sericol Group Ltd Photopolymerisable materials for use in producing screen printing stencils
JPS58204008A (ja) * 1982-05-24 1983-11-28 Hitachi Ltd 感光性樹脂組成物
US4789625A (en) * 1982-09-20 1988-12-06 Morton Thiokol, Inc. Radiation curable coating for photographic laminate, and development process
AU1911383A (en) * 1982-09-20 1984-03-29 Thiokol Corp. Radiation curable coating for photographic laminate
JPS6120939A (ja) * 1984-07-10 1986-01-29 Fuji Photo Film Co Ltd 平版印刷版用感光性組成物
US4702994A (en) * 1984-10-01 1987-10-27 W. R. Grace & Co. Projection imaged relief printing plates
JPH0610886B2 (ja) * 1984-11-01 1994-02-09 株式会社リコー 光情報記録媒体
DE3447357A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Trockenfilmresist und verfahren zur herstellung von resistmustern
US4650743A (en) * 1985-07-31 1987-03-17 E. I. Du Pont De Nemours And Company Optical coating composition
US4786586A (en) * 1985-08-06 1988-11-22 Morton Thiokol, Inc. Radiation curable coating for photographic laminate
JPH07120038B2 (ja) * 1985-11-22 1995-12-20 富士写真フイルム株式会社 感光性組成物
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
US5288571A (en) * 1986-10-02 1994-02-22 Asahi Kasei Kogyo Kabushiki Kaisha Photoresin printing plate for use in printing a corrugated board
JPH07120039B2 (ja) * 1986-11-14 1995-12-20 富士写真フイルム株式会社 感光性組成物
JP2610468B2 (ja) * 1988-02-24 1997-05-14 日本合成ゴム株式会社 放射線硬化性ポリウレタンの製造方法
DE3841025A1 (de) * 1988-12-06 1990-06-07 Hoechst Ag Durch strahlung polymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JPH031145A (ja) * 1989-05-29 1991-01-07 Kuraray Co Ltd 感光性樹脂組成物、それを用いたパターンおよびパターン作製法
DE3927632A1 (de) * 1989-08-22 1991-02-28 Basf Ag Umsetzungsprodukt, verfahren zu dessen herstellung und damit erhaltenes strahlungsempfindliches material
GB9122577D0 (en) * 1991-10-24 1991-12-04 Hercules Inc Improved moulding resin with quick-release properties
EP0545081B1 (fr) * 1991-11-01 1998-12-23 MacDermid Imaging Technology Inc. Plastifiants à groupements carboxyle dans des compositions photopolymérisables pour film à sec
US5341799A (en) * 1991-12-23 1994-08-30 Hercules Incorporated Urethane polymers for printing plate compositions
US5426166A (en) * 1994-01-26 1995-06-20 Caschem, Inc. Urethane adhesive compositions
US7728049B2 (en) * 1996-10-08 2010-06-01 Zamore Alan M Irradiation conversion of thermoplastic to thermoset polymers
US6656550B1 (en) 1996-10-08 2003-12-02 Alan M. Zamore Dilatation device of uniform outer diameter
US5900444A (en) * 1996-10-08 1999-05-04 Zamore; Alan Irradiation conversion of thermoplastic to thermoset polyurethane
US7749585B2 (en) 1996-10-08 2010-07-06 Alan Zamore Reduced profile medical balloon element
US6596818B1 (en) * 1996-10-08 2003-07-22 Alan M. Zamore Irradiation conversion of thermoplastic to thermoset polymers
US5936055A (en) * 1997-02-19 1999-08-10 The Dow Chemical Company Acid functionalized polyurethane adducts
AT404733B (de) * 1997-04-09 1999-02-25 Vianova Kunstharz Ag Verfahren zur herstellung von strahlungshärtbaren wasserverdünnbaren urethanharzen und deren verwendung
US6010598A (en) * 1997-05-08 2000-01-04 The Procter & Gamble Company Papermaking belt with improved life
US6696221B1 (en) 1997-05-19 2004-02-24 Day International, Inc. Printing plate and method of making using digital imaging photopolymerization
JP2007254705A (ja) * 2005-09-29 2007-10-04 Toray Ind Inc 活性エネルギー線硬化組成物、およびそれを用いたディスプレイ用部材並びにその製造方法
JP4938675B2 (ja) * 2005-10-04 2012-05-23 株式会社Ｄｎｐファインケミカル 特定の表面形状と物性を有する構造体及びその構造体形成用の（メタ）アクリル系重合性組成物
US7935776B2 (en) * 2007-03-21 2011-05-03 Agi Corporation Radiation curable and developable polyurethane and radiation curable and developable photo resist composition containing the same
US20100314988A1 (en) * 2007-12-21 2010-12-16 E.I. Du Pont De Nemours And Company Resinates containing acqueous developable photoimageable carbon nanotube pastes with enhanced performance
JP5902953B2 (ja) * 2012-02-07 2016-04-13 根上工業株式会社 活性エネルギー線硬化型樹脂組成物
USD739103S1 (en) * 2013-03-25 2015-09-15 Haier Group Corporation Pulsator for washing machine

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3891523A (en) * 1970-01-19 1975-06-24 Dainippon Ink & Chemicals Photopolymerizable, isocyanate-containing prepolymers
US3960572A (en) * 1973-02-21 1976-06-01 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions comprising a polyester-polyether block polymer
JPS5921885B2 (ja) * 1974-07-03 1984-05-23 大日本インキ化学工業株式会社 重合性樹脂組成物
DE2443665A1 (de) * 1974-09-12 1976-03-25 Basf Ag Photovernetzbare formmasse fuer die herstellung von waessrig-alkalisch entwickelbaren druckformen
DE2557408C2 (de) * 1975-12-19 1983-08-25 Bayer Ag, 5090 Leverkusen Verfahren zur Herstellung eines in organischen Lösungsmitteln löslichen, vernetzbaren Acryloyl- und/oder Methacryloylgruppen und Carboxylgruppen enthaltenden Urethanharzes und seine Verwendung
FR2361450A1 (fr) * 1976-08-13 1978-03-10 Basf Ag Matiere de revetement durcissable
JPS5923326B2 (ja) * 1977-04-18 1984-06-01 日立化成工業株式会社 重合によりエラストマ−性を有する樹脂組成物
US4216267A (en) * 1977-12-29 1980-08-05 Gaf Corporation Flexible substrates containing a radiation curable coating composition
JPS54110290A (en) * 1978-02-17 1979-08-29 Toagosei Chem Ind Co Ltd Photosensitive resin composition for cast curing
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
FR2431514A1 (fr) * 1978-07-19 1980-02-15 Poudres & Explosifs Ste Nale Nouveaux poly (carbonates-urethannes) insatures et leurs applications a la photoreticulation
JPS5525441A (en) * 1978-08-11 1980-02-23 Mitsubishi Petrochem Co Ltd Photo-setting acrylic urethane resin coating composition

Also Published As

Publication number Publication date
IT8119975A0 (it) 1981-02-25
NL187815C (nl) 1992-01-16
JPH0210165B2 (fr) 1990-03-07
GB2070634A (en) 1981-09-09
JPS56120718A (en) 1981-09-22
FR2477295A1 (fr) 1981-09-04
IT1194750B (it) 1988-09-28
NL187815B (nl) 1991-08-16
DE3107585C3 (de) 1997-01-16
DE3107585A1 (de) 1982-01-07
NL8100981A (nl) 1981-10-01
IT8119975A1 (it) 1982-08-25
GB2070634B (en) 1983-09-28
US4358354A (en) 1982-11-09
DE3107585C2 (de) 1985-02-07

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