NL187815B - Fotogevoelige harsachtige urethaansamenstelling. - Google Patents

Fotogevoelige harsachtige urethaansamenstelling.

Info

Publication number
NL187815B
NL187815B NLAANVRAGE8100981,A NL8100981A NL187815B NL 187815 B NL187815 B NL 187815B NL 8100981 A NL8100981 A NL 8100981A NL 187815 B NL187815 B NL 187815B
Authority
NL
Netherlands
Prior art keywords
resiny
photosensitive
urethane composition
urethane
composition
Prior art date
Application number
NLAANVRAGE8100981,A
Other languages
English (en)
Other versions
NL8100981A (nl
NL187815C (nl
Original Assignee
Asahi Chemical Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Ind filed Critical Asahi Chemical Ind
Publication of NL8100981A publication Critical patent/NL8100981A/nl
Publication of NL187815B publication Critical patent/NL187815B/nl
Application granted granted Critical
Publication of NL187815C publication Critical patent/NL187815C/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C08F299/065—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes from polyurethanes with side or terminal unsaturations
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/675—Low-molecular-weight compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyurethanes Or Polyureas (AREA)
NLAANVRAGE8100981,A 1980-02-28 1981-02-27 Fotogevoelige harsachtige urethaansamenstelling. NL187815C (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2433780 1980-02-28
JP2433780A JPS56120718A (en) 1980-02-28 1980-02-28 Improved polyurethane type photosensitive resin composition

Publications (3)

Publication Number Publication Date
NL8100981A NL8100981A (nl) 1981-10-01
NL187815B true NL187815B (nl) 1991-08-16
NL187815C NL187815C (nl) 1992-01-16

Family

ID=12135358

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE8100981,A NL187815C (nl) 1980-02-28 1981-02-27 Fotogevoelige harsachtige urethaansamenstelling.

Country Status (7)

Country Link
US (1) US4358354A (nl)
JP (1) JPS56120718A (nl)
DE (1) DE3107585C3 (nl)
FR (1) FR2477295B1 (nl)
GB (1) GB2070634B (nl)
IT (1) IT1194750B (nl)
NL (1) NL187815C (nl)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4481281A (en) * 1981-01-16 1984-11-06 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4451636A (en) * 1981-01-16 1984-05-29 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4422914A (en) 1981-01-16 1983-12-27 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4436806A (en) 1981-01-16 1984-03-13 W. R. Grace & Co. Method and apparatus for making printed circuit boards
US4442198A (en) * 1981-01-16 1984-04-10 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
GB2109392B (en) * 1981-11-03 1985-06-26 Sericol Group Ltd Photopolymerisable materials for use in producing screen printing stencils
JPS58204008A (ja) * 1982-05-24 1983-11-28 Hitachi Ltd 感光性樹脂組成物
ZA836832B (en) * 1982-09-20 1984-05-30 Thiokol Corp Radiation curable coating for photographic laminate
US4789625A (en) * 1982-09-20 1988-12-06 Morton Thiokol, Inc. Radiation curable coating for photographic laminate, and development process
JPS6120939A (ja) * 1984-07-10 1986-01-29 Fuji Photo Film Co Ltd 平版印刷版用感光性組成物
US4702994A (en) * 1984-10-01 1987-10-27 W. R. Grace & Co. Projection imaged relief printing plates
JPH0610886B2 (ja) * 1984-11-01 1994-02-09 株式会社リコー 光情報記録媒体
DE3447357A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Trockenfilmresist und verfahren zur herstellung von resistmustern
US4650743A (en) * 1985-07-31 1987-03-17 E. I. Du Pont De Nemours And Company Optical coating composition
US4786586A (en) * 1985-08-06 1988-11-22 Morton Thiokol, Inc. Radiation curable coating for photographic laminate
JPH07120038B2 (ja) * 1985-11-22 1995-12-20 富士写真フイルム株式会社 感光性組成物
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
US5288571A (en) * 1986-10-02 1994-02-22 Asahi Kasei Kogyo Kabushiki Kaisha Photoresin printing plate for use in printing a corrugated board
JPH07120039B2 (ja) * 1986-11-14 1995-12-20 富士写真フイルム株式会社 感光性組成物
JP2610468B2 (ja) * 1988-02-24 1997-05-14 日本合成ゴム株式会社 放射線硬化性ポリウレタンの製造方法
DE3841025A1 (de) * 1988-12-06 1990-06-07 Hoechst Ag Durch strahlung polymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JPH031145A (ja) * 1989-05-29 1991-01-07 Kuraray Co Ltd 感光性樹脂組成物、それを用いたパターンおよびパターン作製法
DE3927632A1 (de) * 1989-08-22 1991-02-28 Basf Ag Umsetzungsprodukt, verfahren zu dessen herstellung und damit erhaltenes strahlungsempfindliches material
GB9122577D0 (en) * 1991-10-24 1991-12-04 Hercules Inc Improved moulding resin with quick-release properties
DE69227982T2 (de) * 1991-11-01 1999-05-12 Macdermid Imaging Technology Inc., Waterbury, Conn. Carboxyl-Gruppen enthaltende Weichmacher in photopolymerisierbaren Trockenfilmzusammensetzungen
US5341799A (en) * 1991-12-23 1994-08-30 Hercules Incorporated Urethane polymers for printing plate compositions
US5426166A (en) * 1994-01-26 1995-06-20 Caschem, Inc. Urethane adhesive compositions
US7749585B2 (en) 1996-10-08 2010-07-06 Alan Zamore Reduced profile medical balloon element
US7728049B2 (en) * 1996-10-08 2010-06-01 Zamore Alan M Irradiation conversion of thermoplastic to thermoset polymers
US6656550B1 (en) 1996-10-08 2003-12-02 Alan M. Zamore Dilatation device of uniform outer diameter
US6596818B1 (en) * 1996-10-08 2003-07-22 Alan M. Zamore Irradiation conversion of thermoplastic to thermoset polymers
US5900444A (en) * 1996-10-08 1999-05-04 Zamore; Alan Irradiation conversion of thermoplastic to thermoset polyurethane
US5936055A (en) * 1997-02-19 1999-08-10 The Dow Chemical Company Acid functionalized polyurethane adducts
AT404733B (de) * 1997-04-09 1999-02-25 Vianova Kunstharz Ag Verfahren zur herstellung von strahlungshärtbaren wasserverdünnbaren urethanharzen und deren verwendung
US6010598A (en) * 1997-05-08 2000-01-04 The Procter & Gamble Company Papermaking belt with improved life
US6696221B1 (en) 1997-05-19 2004-02-24 Day International, Inc. Printing plate and method of making using digital imaging photopolymerization
JP2007254705A (ja) * 2005-09-29 2007-10-04 Toray Ind Inc 活性エネルギー線硬化組成物、およびそれを用いたディスプレイ用部材並びにその製造方法
US7897243B2 (en) * 2005-10-04 2011-03-01 The Inctec Inc. Structure having specific surface shape and properties and (meth)acrylic polymerizable composition for formation of the structure
US7935776B2 (en) * 2007-03-21 2011-05-03 Agi Corporation Radiation curable and developable polyurethane and radiation curable and developable photo resist composition containing the same
US20100314988A1 (en) * 2007-12-21 2010-12-16 E.I. Du Pont De Nemours And Company Resinates containing acqueous developable photoimageable carbon nanotube pastes with enhanced performance
JP5902953B2 (ja) * 2012-02-07 2016-04-13 根上工業株式会社 活性エネルギー線硬化型樹脂組成物
USD739103S1 (en) * 2013-03-25 2015-09-15 Haier Group Corporation Pulsator for washing machine

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3891523A (en) * 1970-01-19 1975-06-24 Dainippon Ink & Chemicals Photopolymerizable, isocyanate-containing prepolymers
US3960572A (en) * 1973-02-21 1976-06-01 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions comprising a polyester-polyether block polymer
JPS5921885B2 (ja) * 1974-07-03 1984-05-23 大日本インキ化学工業株式会社 重合性樹脂組成物
DE2443665A1 (de) * 1974-09-12 1976-03-25 Basf Ag Photovernetzbare formmasse fuer die herstellung von waessrig-alkalisch entwickelbaren druckformen
DE2557408C2 (de) * 1975-12-19 1983-08-25 Bayer Ag, 5090 Leverkusen Verfahren zur Herstellung eines in organischen Lösungsmitteln löslichen, vernetzbaren Acryloyl- und/oder Methacryloylgruppen und Carboxylgruppen enthaltenden Urethanharzes und seine Verwendung
FR2361450A1 (fr) * 1976-08-13 1978-03-10 Basf Ag Matiere de revetement durcissable
JPS5923326B2 (ja) * 1977-04-18 1984-06-01 日立化成工業株式会社 重合によりエラストマ−性を有する樹脂組成物
US4216267A (en) * 1977-12-29 1980-08-05 Gaf Corporation Flexible substrates containing a radiation curable coating composition
JPS54110290A (en) * 1978-02-17 1979-08-29 Toagosei Chem Ind Co Ltd Photosensitive resin composition for cast curing
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
FR2431514A1 (fr) * 1978-07-19 1980-02-15 Poudres & Explosifs Ste Nale Nouveaux poly (carbonates-urethannes) insatures et leurs applications a la photoreticulation
JPS5525441A (en) * 1978-08-11 1980-02-23 Mitsubishi Petrochem Co Ltd Photo-setting acrylic urethane resin coating composition

Also Published As

Publication number Publication date
IT1194750B (it) 1988-09-28
DE3107585A1 (de) 1982-01-07
IT8119975A0 (it) 1981-02-25
IT8119975A1 (it) 1982-08-25
FR2477295A1 (fr) 1981-09-04
GB2070634B (en) 1983-09-28
JPS56120718A (en) 1981-09-22
GB2070634A (en) 1981-09-09
DE3107585C2 (de) 1985-02-07
US4358354A (en) 1982-11-09
FR2477295B1 (fr) 1987-02-13
NL8100981A (nl) 1981-10-01
NL187815C (nl) 1992-01-16
JPH0210165B2 (nl) 1990-03-07
DE3107585C3 (de) 1997-01-16

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Legal Events

Date Code Title Description
A1A A request for search or an international-type search has been filed
BB A search report has been drawn up
A85 Still pending on 85-01-01
BC A request for examination has been filed
V1 Lapsed because of non-payment of the annual fee

Effective date: 19950901