JPS54110290A - Photosensitive resin composition for cast curing - Google Patents

Photosensitive resin composition for cast curing

Info

Publication number
JPS54110290A
JPS54110290A JP1639978A JP1639978A JPS54110290A JP S54110290 A JPS54110290 A JP S54110290A JP 1639978 A JP1639978 A JP 1639978A JP 1639978 A JP1639978 A JP 1639978A JP S54110290 A JPS54110290 A JP S54110290A
Authority
JP
Japan
Prior art keywords
meth
acrylate
resin composition
oligourethane
photosensitizer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1639978A
Other languages
Japanese (ja)
Inventor
Hisaaki Naito
Hiroyuki Kato
Hidemaro Tatemichi
Original Assignee
Toagosei Chem Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toagosei Chem Ind Co Ltd filed Critical Toagosei Chem Ind Co Ltd
Priority to JP1639978A priority Critical patent/JPS54110290A/en
Publication of JPS54110290A publication Critical patent/JPS54110290A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: The title flowable nd quickly curable composition having a small cure shrinkage, consisting of a polymerizable oligomer having (meth)acryloyl groups and urethane bonds, a polymerizable compound having no urethane bond, a photosensitizer, and a thermal polymerization inhibitor.
CONSTITUTION: A) A polymerizable oligomer having (meth)acryloyl groups and urethane bonds [an oligourethane (meth)acrylate is obtained by reacting A1) a prepolymer, prepared from a) polyethylene glcol and b) toluylene diisocyanate in excess with A2) hydroxypolyethylene glycol mono (meth)acrylate. A) Not less than 50 wt% of the oligourethane (meth)acrylate is blended with B) preferably 5W20 wt. % of a polymerizable compound obtained by esterifying ethylene glycol with (meth)acrylic acid, c) 0.05W5 wt. % of a photosensitizer, e.g., benzoin, and D) 50ppmW1 wt. % of a polymerization inhibitor, e.g., hydroquinone.
COPYRIGHT: (C)1979,JPO&Japio
JP1639978A 1978-02-17 1978-02-17 Photosensitive resin composition for cast curing Pending JPS54110290A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1639978A JPS54110290A (en) 1978-02-17 1978-02-17 Photosensitive resin composition for cast curing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1639978A JPS54110290A (en) 1978-02-17 1978-02-17 Photosensitive resin composition for cast curing

Publications (1)

Publication Number Publication Date
JPS54110290A true JPS54110290A (en) 1979-08-29

Family

ID=11915160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1639978A Pending JPS54110290A (en) 1978-02-17 1978-02-17 Photosensitive resin composition for cast curing

Country Status (1)

Country Link
JP (1) JPS54110290A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56120718A (en) * 1980-02-28 1981-09-22 Asahi Chem Ind Co Ltd Improved polyurethane type photosensitive resin composition
JPS61204216A (en) * 1985-03-07 1986-09-10 Daicel Chem Ind Ltd Resin composition for sealing electronic part
JPS61211372A (en) * 1985-03-15 1986-09-19 Daicel Chem Ind Ltd Coating agent for electronic part

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50133005A (en) * 1974-04-08 1975-10-21

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50133005A (en) * 1974-04-08 1975-10-21

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56120718A (en) * 1980-02-28 1981-09-22 Asahi Chem Ind Co Ltd Improved polyurethane type photosensitive resin composition
JPH0210165B2 (en) * 1980-02-28 1990-03-07 Asahi Chemical Ind
JPS61204216A (en) * 1985-03-07 1986-09-10 Daicel Chem Ind Ltd Resin composition for sealing electronic part
JPS61211372A (en) * 1985-03-15 1986-09-19 Daicel Chem Ind Ltd Coating agent for electronic part

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