ES2144789T3 - Procedimiento para la deposicion electrolitica de capas metalicas. - Google Patents

Procedimiento para la deposicion electrolitica de capas metalicas.

Info

Publication number
ES2144789T3
ES2144789T3 ES96939882T ES96939882T ES2144789T3 ES 2144789 T3 ES2144789 T3 ES 2144789T3 ES 96939882 T ES96939882 T ES 96939882T ES 96939882 T ES96939882 T ES 96939882T ES 2144789 T3 ES2144789 T3 ES 2144789T3
Authority
ES
Spain
Prior art keywords
pct
anodes
coatings
metal
sec
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES96939882T
Other languages
English (en)
Spanish (es)
Inventor
Wolfgang Dahms
Heinrich Meyer
Stefan Kretschmer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atotech Deutschland GmbH and Co KG
Original Assignee
Atotech Deutschland GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG
Application granted granted Critical
Publication of ES2144789T3 publication Critical patent/ES2144789T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S205/00—Electrolysis: processes, compositions used therein, and methods of preparing the compositions
    • Y10S205/92—Electrolytic coating of circuit board or printed circuit, other than selected area coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
ES96939882T 1995-11-21 1996-11-21 Procedimiento para la deposicion electrolitica de capas metalicas. Expired - Lifetime ES2144789T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19545231A DE19545231A1 (de) 1995-11-21 1995-11-21 Verfahren zur elektrolytischen Abscheidung von Metallschichten

Publications (1)

Publication Number Publication Date
ES2144789T3 true ES2144789T3 (es) 2000-06-16

Family

ID=7779164

Family Applications (1)

Application Number Title Priority Date Filing Date
ES96939882T Expired - Lifetime ES2144789T3 (es) 1995-11-21 1996-11-21 Procedimiento para la deposicion electrolitica de capas metalicas.

Country Status (9)

Country Link
US (1) US6099711A (enExample)
EP (1) EP0862665B1 (enExample)
JP (2) JP2000500529A (enExample)
AT (1) ATE190677T1 (enExample)
CA (1) CA2233329C (enExample)
DE (2) DE19545231A1 (enExample)
ES (1) ES2144789T3 (enExample)
TW (1) TW420728B (enExample)
WO (1) WO1997019206A1 (enExample)

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DE19736350C1 (de) * 1997-08-21 1999-08-05 Atotech Deutschland Gmbh Verfahren zur Konzentrationsregulierung von Stoffen in Elektrolyten und Vorrichtung zur Durchführung des Verfahrens
US6946065B1 (en) * 1998-10-26 2005-09-20 Novellus Systems, Inc. Process for electroplating metal into microscopic recessed features
US6793796B2 (en) 1998-10-26 2004-09-21 Novellus Systems, Inc. Electroplating process for avoiding defects in metal features of integrated circuit devices
ATE282248T1 (de) * 1999-01-21 2004-11-15 Atotech Deutschland Gmbh Verfahren zum galvanischen bilden von leiterstrukturen aus hochreinem kupfer bei der herstellung von integrierten schaltungen
DE19915146C1 (de) * 1999-01-21 2000-07-06 Atotech Deutschland Gmbh Verfahren zum galvanischen Bilden von Leiterstrukturen aus hochreinem Kupfer bei der Herstellung von integrierten Schaltungen
DE19925373B4 (de) * 1999-06-02 2006-04-06 Robert Bosch Gmbh Verfahren und Vorrichtung zum Galvanisieren
US20040045832A1 (en) * 1999-10-14 2004-03-11 Nicholas Martyak Electrolytic copper plating solutions
US6294060B1 (en) 1999-10-21 2001-09-25 Ati Properties, Inc. Conveyorized electroplating device
JP2001267726A (ja) * 2000-03-22 2001-09-28 Toyota Autom Loom Works Ltd 配線基板の電解メッキ方法及び配線基板の電解メッキ装置
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DE10061186C1 (de) * 2000-12-07 2002-01-17 Astrium Gmbh Verfahren und Anordnung zur galvanischen Abscheidung von Nickel, Kobalt, Nickellegierungen oder Kobaltlegierungen mit periodischen Strompulsen und Verwendung des Verfahrens
US20040060728A1 (en) * 2001-01-04 2004-04-01 Philippe Steiert Method for producing electroconductive structures
JP2002235189A (ja) * 2001-02-05 2002-08-23 Sansha Electric Mfg Co Ltd めっき電流供給電源装置
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EP1475463B2 (en) † 2002-12-20 2017-03-01 Shipley Company, L.L.C. Reverse pulse plating method
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US20050284766A1 (en) * 2004-06-25 2005-12-29 Herdman Roderick D Pulse reverse electrolysis of acidic copper electroplating solutions
US7329334B2 (en) * 2004-09-16 2008-02-12 Herdman Roderick D Controlling the hardness of electrodeposited copper coatings by variation of current profile
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US20070278107A1 (en) * 2006-05-30 2007-12-06 Northwest Aluminum Technologies Anode for use in aluminum producing electrolytic cell
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CN112210801A (zh) * 2019-07-09 2021-01-12 江西博泉化学有限公司 一种用于高纵横比电路板通孔电镀的电镀液及其电镀方法
KR102875198B1 (ko) * 2019-08-19 2025-10-22 아토테크 도이칠란트 게엠베하 운트 콤파니 카게 구리로 충전된 마이크로비아들을 포함하는 고밀도 상호연결 인쇄 회로 기판을 제조하는 방법
CN114342569A (zh) 2019-08-19 2022-04-12 德国艾托特克有限两合公司 高密度互连印刷电路板的制造顺序及高密度互连印刷电路板
EP3901331A1 (en) 2020-04-23 2021-10-27 ATOTECH Deutschland GmbH Acidic aqueous composition for electrolytically depositing a copper deposit
EP3933073B1 (en) 2020-06-29 2023-11-29 Atotech Deutschland GmbH & Co. KG Copper electroplating bath
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EP4032930B1 (en) 2021-01-22 2023-08-30 Atotech Deutschland GmbH & Co. KG Biuret-based quaternized polymers and their use in metal or metal alloy plating baths
CN113106527B (zh) * 2021-04-19 2024-09-10 深圳铱创科技有限公司 不溶性阳极及脉冲电镀设备
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CN120239188B (zh) * 2025-05-29 2025-09-16 珠海市航达科技有限公司 一种pcb板铜电镀方法

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Also Published As

Publication number Publication date
ATE190677T1 (de) 2000-04-15
WO1997019206A1 (de) 1997-05-29
TW420728B (en) 2001-02-01
EP0862665B1 (de) 2000-03-15
CA2233329C (en) 2005-07-26
JP2000500529A (ja) 2000-01-18
JP2009299195A (ja) 2009-12-24
CA2233329A1 (en) 1997-05-29
US6099711A (en) 2000-08-08
EP0862665A1 (de) 1998-09-09
JP5417112B2 (ja) 2014-02-12
DE59604701D1 (de) 2000-04-20
DE19545231A1 (de) 1997-05-22

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