CA2179904A1 - Method and device for electrolytically depositing metals from electrolytes containing organic additives - Google Patents
Method and device for electrolytically depositing metals from electrolytes containing organic additivesInfo
- Publication number
- CA2179904A1 CA2179904A1 CA002179904A CA2179904A CA2179904A1 CA 2179904 A1 CA2179904 A1 CA 2179904A1 CA 002179904 A CA002179904 A CA 002179904A CA 2179904 A CA2179904 A CA 2179904A CA 2179904 A1 CA2179904 A1 CA 2179904A1
- Authority
- CA
- Canada
- Prior art keywords
- additives
- organics
- relevant
- containing organic
- process organics
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
Abstract
The invention relates to a method of electrolytic deposition of metals from electrolytes, which contain additives or process organics in order to achieve specific physical properties. Such additives are subject to continuous consumption during electrolysis, decomposition products forming from these additives, which deposit in the entire electrolytic system and thus also on the material for treatment.
Thus the object underlying the invention is to avoid quality shortfalls in the deposited coatings caused by organic residues, and in this way to achieve a continuous metal deposition with uniform quality of the metal coatings. This object is achieved by spatial limitation of the concentration of the process organics to the electrolyte region in the electrolytic system in which it is relevant to the process. The circulated electrolyte is kept free of process organics by filters. Renewed metered addition of process organics is effected in dependence on consumption directly before the region relevant to the process.
Thus the object underlying the invention is to avoid quality shortfalls in the deposited coatings caused by organic residues, and in this way to achieve a continuous metal deposition with uniform quality of the metal coatings. This object is achieved by spatial limitation of the concentration of the process organics to the electrolyte region in the electrolytic system in which it is relevant to the process. The circulated electrolyte is kept free of process organics by filters. Renewed metered addition of process organics is effected in dependence on consumption directly before the region relevant to the process.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4405741A DE4405741C1 (en) | 1994-02-23 | 1994-02-23 | Electrolytic deposition of metal coating |
DEP4405741.5 | 1994-02-23 | ||
PCT/DE1995/000297 WO1995023247A2 (en) | 1994-02-23 | 1995-02-23 | Method of electrolytically depositing metals from electrolytes containing organic additives |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2179904A1 true CA2179904A1 (en) | 1995-08-31 |
CA2179904C CA2179904C (en) | 2006-01-31 |
Family
ID=6510942
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002179904A Expired - Fee Related CA2179904C (en) | 1994-02-23 | 1995-02-23 | Method and device for electrolytically depositing metals from electrolytes containing organic additives |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0746640B1 (en) |
JP (1) | JP3454829B2 (en) |
AT (1) | ATE181118T1 (en) |
CA (1) | CA2179904C (en) |
DE (2) | DE4405741C1 (en) |
ES (1) | ES2133751T3 (en) |
WO (1) | WO1995023247A2 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19539866C2 (en) * | 1995-10-26 | 1997-09-18 | Lea Ronal Gmbh | Device for chemical or electrolytic surface treatment of plate-shaped objects |
WO1997015702A2 (en) * | 1995-10-26 | 1997-05-01 | Lea Ronal Gmbh | Device for chemical or electrolytic surface treatment of plate-like objects |
DE19539865A1 (en) * | 1995-10-26 | 1997-04-30 | Lea Ronal Gmbh | Continuous electroplating system |
WO1999057340A2 (en) * | 1998-05-01 | 1999-11-11 | Dj Parker Company, Inc. | Chemical mixing, replenishment, and waste management system |
DE10314279A1 (en) * | 2003-03-29 | 2004-10-14 | Daimlerchrysler Ag | Method and device for controlling at least one operating variable of an electrolytic bath |
US7851222B2 (en) | 2005-07-26 | 2010-12-14 | Applied Materials, Inc. | System and methods for measuring chemical concentrations of a plating solution |
US9303329B2 (en) | 2013-11-11 | 2016-04-05 | Tel Nexx, Inc. | Electrochemical deposition apparatus with remote catholyte fluid management |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2729387A1 (en) * | 1977-06-27 | 1979-01-18 | Schering Ag | PROCESS FOR CONTINUOUS PREPARATION OF A GALVANIC NICKEL BATH AND DEVICE FOR CARRYING OUT THE PROCESS |
DD215589B5 (en) * | 1983-05-11 | 1994-06-01 | Heinz Dr Rer Nat Liebscher | Process for electrolytic metal deposition in forced convection |
DE4031979A1 (en) * | 1990-09-26 | 1992-04-02 | Huang Yun Fu | Equipment for removing contaminants from chrome plating baths - comprises membrane tank with one or more membrane cylinders of sintered ceramic, clarifying tank and pumped circulation systems |
DE4137377A1 (en) * | 1991-11-13 | 1993-05-19 | Jatzke Rudolf Fa | METHOD, MEANS AND DEVICE FOR THE ELECTRODIALYTIC REGENERATION OF THE ELECTROLYTE OF A GALVANIC BATH OR THE LIKE. |
-
1994
- 1994-02-23 DE DE4405741A patent/DE4405741C1/en not_active Expired - Fee Related
-
1995
- 1995-02-23 EP EP95912124A patent/EP0746640B1/en not_active Expired - Lifetime
- 1995-02-23 AT AT95912124T patent/ATE181118T1/en not_active IP Right Cessation
- 1995-02-23 DE DE59506171T patent/DE59506171D1/en not_active Expired - Fee Related
- 1995-02-23 ES ES95912124T patent/ES2133751T3/en not_active Expired - Lifetime
- 1995-02-23 WO PCT/DE1995/000297 patent/WO1995023247A2/en active IP Right Grant
- 1995-02-23 JP JP52207195A patent/JP3454829B2/en not_active Expired - Fee Related
- 1995-02-23 CA CA002179904A patent/CA2179904C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
ES2133751T3 (en) | 1999-09-16 |
WO1995023247A2 (en) | 1995-08-31 |
WO1995023247A3 (en) | 1996-01-11 |
CA2179904C (en) | 2006-01-31 |
EP0746640A1 (en) | 1996-12-11 |
ATE181118T1 (en) | 1999-06-15 |
DE4405741C1 (en) | 1995-06-01 |
DE59506171D1 (en) | 1999-07-15 |
JP3454829B2 (en) | 2003-10-06 |
EP0746640B1 (en) | 1999-06-09 |
JPH09509222A (en) | 1997-09-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKLA | Lapsed |